CN211247559U - Resin cleaning system for ion exchange column - Google Patents
Resin cleaning system for ion exchange column Download PDFInfo
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- CN211247559U CN211247559U CN201922137365.XU CN201922137365U CN211247559U CN 211247559 U CN211247559 U CN 211247559U CN 201922137365 U CN201922137365 U CN 201922137365U CN 211247559 U CN211247559 U CN 211247559U
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Abstract
The utility model relates to an ion exchange column resin cleaning system, including washing tower and buffer tank, the washing tower passes through charge-in pipeline and backflow pipeline and communicates with each other with the ion exchange column, the resin that treats in the ion exchange column is transmitted to the washing tower through the charge-in pipeline and is washd, the resin that washs in the washing tower is returned to the ion exchange column through the backflow pipeline again, set up the diaphragm pump that carries the washing resin on the backflow pipeline, set up the washing auxiliary line in the bottom of ion exchange column and washing tower, let in purified water or compressed air respectively to the ion exchange column and washing tower through this washing auxiliary line; the washing tower is internally provided with a distributor, a collecting tank and a spraying device, the inlet end of the distributor is communicated with the washing auxiliary pipeline, and the collecting tank is communicated with the buffer tank through a collecting pipeline. The utility model has the characteristics of simple structure convenient to use, the problem that the operation post that effectively solves resin caking, resin pollution, resin damage etc. and arouse presses height, operating duration are short.
Description
Technical Field
The utility model belongs to the technical field of the washing of ion exchange column, in particular to ion exchange column resin cleaning system.
Background
Ion exchange resin is mainly macroporous resin at present, is widely applied to the production process of starch sugar, and has the function of removing impurities such as anions and cations, pigments, soluble proteins and the like in syrup and water by utilizing the adsorption and exchange capacity of the resin. In the operation process of the ion exchange column, the problems of resin breakage, protein and other flocs increase (resin agglomeration caused by breakage and protein floc increase), resin pollution and the like occur, so that the operation pressure of the ion exchange column is high, the failure is fast, and the exchange capacity is reduced. The common treatment method comprises back flushing, back regeneration, saline-alkali soaking and the like in the ion column. However, the back flushing and back flushing need to ensure that the pressure is 0.4MPa, and the repeated and long-time large-flow back flushing and back flushing can cause the structure of the ion exchange column to crack, thus threatening the equipment and production safety and being not beneficial to the continuous operation of production.
For example, the patent with publication number CN208879206U discloses a resin cleaning device, which separates the column cleaning according to different cleaning solutions for resin, where the cleaning is mainly regeneration, but most of the existing ion exchange columns are equipped with a regeneration cleaning pipeline, and the regeneration operation can be completed in the column without separately beating out the resin for regeneration. For example, CN206392084U discloses an ion exchange resin cleaning device for arabinose production line, which uses two layers of screens, one upper and one lower, with a resin inlet between the two screens, and the other lower, to retain the resin during cleaning, so that flocs such as protein and part of broken resin carried in the resin may be retained and effective separation cannot be achieved. Further, as disclosed in the patent publication No. CN2467505Y, there is a disadvantage in that a resin high-order backwashing device for a desalted water treatment system is proposed to backwash a resin by a high-order backwashing tower: firstly, need the backwash tower to need design at the high level, increased the construction degree of difficulty and cost, secondly this backwash tower can only be used for the backwash, and thirdly the backwash tower goes out water from the top, and the position is higher, and garrulous resin has not been discharged again and descends, still mixes in normal resin, increases and washes discharge then to have increased water consumption or to water pressure requirement higher, is unfavorable for cost control.
SUMMERY OF THE UTILITY MODEL
The utility model aims to solve the technical problem that a provide an from handing over to post resin cleaning system, change over to the washing tower over to resin in the from handing over to the column, carry out backwash, blowback, be assisted saline and alkaline simultaneously and soak to improve the adsorption efficiency of resin, resume its exchange capacity, solve the operation post that resin caking, resin pollution, resin damage etc. arouse and press the problem that height, operating duration are short, improve the production continuity, guarantee equipment safety simultaneously.
The utility model is realized like this, a from handing-over post resin cleaning system is provided, including washing tower and buffer tank, the washing tower passes through charge-in pipeline and backflow pipeline and from handing-over post intercommunication each other, the resin that treats in the handing-over post is transmitted to washing tower through charge-in pipeline and is washd, the resin that washs in the washing tower is returned to in the handing-over post through backflow pipeline again, set up the diaphragm pump that carries the washing resin on the backflow pipeline, set up washing auxiliary line in the bottom of handing-over post and washing tower, let in purified water or compressed air respectively to in handing-over post and the washing tower through this washing auxiliary line; the washing tower is internally provided with a distributor, a collecting tank and a spraying device, the inlet end of the distributor is communicated with a washing auxiliary pipeline, and the collecting tank is communicated with a buffer tank through a collecting pipeline.
Furthermore, the collecting tank is located the middle part of washing tower, the collecting tank is equipped with a plurality of collectors, and is a plurality of the collector sets up in washing tower with the interval from top to bottom, every the collector all communicates with the buffer tank through collecting the pipeline.
Further, the distributor is located the bottom of washing tower, the distributor includes distribution seat and a plurality of distribution pipe, every the distribution pipe respectively with the distribution seat intercommunication, the distribution seat with wash auxiliary line intercommunication.
Furthermore, an alkali input pipeline and a salt input pipeline are respectively arranged on the buffer tank, and an immersion pipeline and a centrifugal pump are also arranged on the buffer tank and communicated with a cleaning auxiliary pipeline of the water washing tower.
Furthermore, a water spraying head is also arranged in the buffer tank.
Compared with the prior art, the utility model discloses an from friendship post resin cleaning system has following characteristics:
1. the operation is simple, and the problem that the resin is difficult to agglomerate and loosen in the ion exchange column is thoroughly solved;
2. long-time and large-flow backwashing and back flushing are not needed in the ion exchange column, so that the equipment damage rate is reduced, and the production safety is ensured;
3. the three-stage collector discharges water from different collecting tanks according to different resin amounts, so that the effects of removing impurities and broken resin are achieved, and the pressure of an ion exchange operation column is reduced by 30-50%;
4. the saline-alkali soaking, resin cleaning and resin fragment separation can be completed in the same system, and the equipment utilization rate is improved.
Drawings
FIG. 1 is a schematic structural view of a resin cleaning system according to the present invention;
FIG. 2 is a schematic view of the structure of the collecting tank of FIG. 1;
FIG. 3 is a front view of the distributor of FIG. 1;
fig. 4 is a top view of fig. 3.
Detailed Description
In order to make the technical problem, technical solution and advantageous effects to be solved by the present invention more clearly understood, the following description is given in conjunction with the accompanying drawings and embodiments to illustrate the present invention in further detail. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
Referring to fig. 1, the preferred embodiment of the present invention includes a washing tower 1 and a buffer tank 2. The water washing tower 1 is communicated with an ion exchange column 5 through a feed pipeline 3 and a reflux pipeline 4. The resin to be cleaned in the ion exchange column 5 is conveyed into the water washing tower 1 for cleaning through the feeding pipeline 3, and the cleaned resin in the water washing tower 1 is returned into the ion exchange column 5 through the return pipeline 4.
A diaphragm pump 6 for conveying the cleaning resin is provided in the return line 4. And cleaning auxiliary pipelines 7 are arranged at the bottoms of the ion exchange column 5 and the water washing tower 1, and purified water or compressed air is respectively introduced into the ion exchange column 5 and the water washing tower 1 through the cleaning auxiliary pipelines 7.
A distributor 8, a collecting tank 9 and a spraying device 10 are arranged in the water washing tower 1. The distributor 8 is positioned at the bottom of the water washing tower 1. The collecting tank 9 is located in the middle of the water washing tower 1. The spraying device 10 is arranged at the top of the water washing tower 1. In this embodiment, the spraying devices 10 are distributed on the top ring of three spraying heads, and each spraying head rotates 360 degrees to clean the water washing tower 1.
The inlet end of the distributor 8 is in communication with the purge aid line 7. The collecting vessel 9 communicates with the buffer vessel 2 via a collecting line 11. And the bottom of the water washing tower 1 is provided with a sewage pipeline 12 communicated with a sewage pool. The buffer tank 2 is provided with a sewage discharge pipe 13 and an impurity collecting pipe 14. The buffer tank 2 is used for separating impurities and water during cleaning, the water is discharged through an overflow port at the upper part of the buffer tank 2, namely the sewage discharge pipe 13, the impurities are settled in the buffer tank 2, the impurities are mainly broken resin, and the impurities are collected and treated uniformly.
Referring to fig. 1 and 2, the collecting tank 9 is provided with a plurality of collectors 15. A plurality of the collectors 15 are arranged in the washing tower at intervals up and down. Each of the collectors 15 communicates with the buffer tank 2 through a collecting line 11. In this embodiment, the collecting groove 9 is respectively 1-stage, 2-stage and 3-stage from top to bottom, and is supported by a triangular bracket 21, one end of the triangular bracket 21 is welded with the collector 15, the other end of the triangular bracket 21 is welded with the inner wall of the water washing tower 1, and an outlet 22 of each collector 15 is communicated with the buffer tank 2 through a collecting pipeline 11.
Referring to fig. 3 and 4, the distributor 8 includes a distribution base 81 and a plurality of distribution pipes 82. Each of the distribution pipes 82 is in communication with the distribution base 81. The distribution seat 81 communicates with the washing auxiliary line 7. In this embodiment, the distributor 8 is at the same angle as the taper angle of the bottom of the water washing tower 1, and the inlet end of the distributor 8 is communicated with the cleaning auxiliary pipeline 7. The cleaning auxiliary pipeline 7 is upwards reduced into a DN200 pipe from the bottom of the water washing tower 1, six threaded joints are welded on the periphery of the DN200 pipe in an inclined upward 30 degrees and fixed with the distribution seat 81, each of the six distribution pipes 82 is about 100cm long, and the axial tops of the distribution pipes are sealed.
An alkali input pipeline 16 and a salt input pipeline 17 are respectively arranged on the buffer tank 2. The buffer tank 2 is also provided with a dip pipe 18 and a centrifugal pump 19 which are communicated with the cleaning auxiliary pipeline 7 of the water washing tower 1. And preparing a resin-soaking saline alkali solution in the buffer tank 2, and inputting the solution into the water washing tower 1 through an additionally arranged immersion liquid pipeline 18 and a centrifugal pump 19 to soak the resin in the water washing tower 1. Still set up water in buffer tank 2 and drench head 20, evacuation buffer tank 2 interior liquid and impurity before the saline and alkaline liquid of preparation to wash buffer tank 2, still input purified water in to buffer tank 2 when preparing the saline and alkaline liquid.
The utility model discloses the principle that the resin cleaning system of ion exchange column utilized is: 1. the weight difference exists between the complete resin and impurities (including broken resin, protein flocculate and the like), and the effective separation is realized at a certain water flow speed; 2. recovering the resin by saline-alkali soaking, removing organic matters and recovering the resin exchange capacity.
The following will further describe a method for cleaning ion exchange column resin according to the present invention with reference to specific examples.
Example 1
The utility model relates to a first embodiment of an ion exchange column resin cleaning method, including following step:
(11) and transfer resin: from handing-over post 5 and water scrubber 1 intercommunication each other through charge-in pipeline 3 and backflow pipeline 4, set up valve N on charge-in pipeline 3, set up valve H and diaphragm pump 6 on backflow pipeline 4 from handing-over post 5 and water scrubber 1's bottom sets up washs auxiliary line 7, sets up valve A and valve D respectively on wasing auxiliary line 7. External purified water enters the cleaning auxiliary pipeline 7 through a valve C, external compressed air enters the cleaning auxiliary pipeline 7 through a valve B, and external purified water and compressed air access points are located between the valve A and the valve D. Be equipped with distributor 8, collecting vat 9 and spray set 10 in the washing tower 1, distributor 8 is located the bottom of washing tower 1, collecting vat 9 is located the middle part of washing tower 1, spray set 10 sets up the top at washing tower 1, the entrance point and the washing auxiliary line 7 intercommunication of distributor 8, collecting vat 9 is through collecting pipeline 11 and buffer tank 2 intercommunication, washing tower 1 bottom sets up sewage pipeline 12 and valve O and effluent water sump intercommunication, buffer tank 2 is equipped with sewage discharge pipe 13 and valve J, valve L, impurity collecting pipe 14. And (3) closing the valve D and the valve H, opening the valve N and the valve A, opening the valve C, introducing purified water from the bottom of the ion exchange column 5, controlling the water pressure to be more than or equal to 0.2MPa, introducing the purified water into the water washing tower 1 from the feed pipeline 3, and closing the valve C, the valve A and the valve N in sequence after all the resin is transferred.
(12) Backwashing and back blowing: the collecting vat 9 is equipped with three collector 15, and three collector 15 sets up in washing tower 1 from top to bottom at interval, and the collector 15 that is located upper portion communicates with buffer tank 2 through valve E and collection pipeline 11, and the collector 15 that is located the centre communicates with buffer tank 2 through valve F and collection pipeline 11, and the collector 15 that is located the lower part communicates with buffer tank 2 through valve G and collection pipeline 11 still set up water in the buffer tank 2 and drench head 20. And opening the valve C, the valve D and the valve E, enabling the purified water to enter a distributor 8 in the backwashing tower 1 through a cleaning auxiliary pipeline 7, controlling the flow pressure of the purified water to be 0.35-0.45 MPa, opening the valve B, introducing compressed air into the distributor through the cleaning auxiliary pipeline 7, controlling the pressure of the compressed air to be 0.35-0.45 MPa, and performing backwashing and back flushing cleaning on the resin by the purified water and the compressed air. When the liquid level of the buffer tank 2 reaches 3%, the feeding condition in the collecting pipeline 11 and the impurity discharge condition of the upper collector 15 are observed, then the valve F is opened, the opening degree is 45%, the valve E is closed, the feeding condition in the collecting pipeline 11 and the impurity discharge condition of the middle collector 15 are observed, the valve G is opened, the opening degree is 30%, the valve F is closed, the feeding condition in the collecting pipeline 11 and the impurity discharge condition of the lower collector 15 are observed, and impurities in the resin discharged by each collector are selected according to the observation result. And after washing for 100-120 min, closing the valve B, the valve C and the valve D, and stopping backwashing and back flushing.
(13) And resin repacking: and (5) after the water washing in the step (12) is finished, opening a valve H and an ion exchange column blow-down valve (not shown in the figure), starting a diaphragm pump 6, and completely transferring the resin cleaned in the water washing tower 1 into the ion exchange column 5.
(14) And collecting impurities: and (3) after the step (13) is finished, opening a drain valve (or a valve E, a valve F or a valve G) of the collector 15 corresponding to the impurity discharge, then opening the spraying device 10 of the washing tower 1, leaching for 10min, closing the drain valve of the corresponding collector, opening a valve L and a valve J, discharging the impurities and water in the buffer tank 2 into a packaging bag, and allowing the water to flow into a sewage tank after passing through the packaging bag. And after the water in the buffer tank 2 is drained, opening the water shower head 20 arranged in the buffer tank 2, showering for 1min, and closing the valve J and the valve L.
(15) And cleaning: and opening a drain valve of the collector 15 without impurity removal, opening the spray device 10 of the water washing tower 1, and leaching for 10 min. And opening the valve H, the valve M and the valve J, starting the diaphragm pump 6, and pumping the washing liquor into the ion exchange column 5, wherein the valve M is arranged on a pipeline, which is communicated with the diaphragm pump 6, at an access point between the valve J and the valve L of the buffer tank 2.
Example 2
The utility model relates to an from a column resin cleaning method second embodiment, the step of this embodiment is different from embodiment 1 in that still sets up following two steps between step one and step two:
step a,Preparing a saline-alkali solution: an alkali input pipeline 16 and a salt input pipeline 17 are respectively arranged on the buffer tank 2, and water, 0.4 percent of NaOH alkali and 0.4 percent of NaCl salt are respectively injected into the buffer tank 2 through a water spray head 20, the alkali input pipeline 16 and the salt input pipeline 17, wherein the ratio of the NaOH alkali to the NaCl salt is 4:4:500(v/v/w, m3/kg) to prepare resin-soaked saline solution.
Step b, soaking in saline-alkali solution: the buffer tank 2 is also provided with a liquid immersion pipeline 18 and a centrifugal pump 19, the liquid immersion pipeline 18 is provided with a valve J, a valve K and a valve I, the centrifugal pump 19 is arranged between the valve K and the valve I, and one end of the valve K is communicated with an access point between the valve J and the valve L. And opening the valve I, the valve K and the valve J, starting the centrifugal pump 19, and inputting the resin-soaking saline solution prepared in the buffer tank 2 into the water washing tower 1. When the liquid level in the buffer tank 2 is reduced to 3%, the water shower head 20 in the buffer tank 2 is opened, all the saline alkali liquor in the buffer tank 2 is input into the washing tower 1, the valve I, the valve K and the valve J are closed, and the centrifugal pump 19 is stopped. The resin in the water scrubber 1 is soaked in the saline-alkali solution for 8-10 h. And (4) carrying out backwashing and back-blowing procedures in the second step after the resin in the washing tower 1 is soaked in the saline-alkali solution.
Example 3
The utility model relates to a third embodiment of ion exchange column resin cleaning method, mainly used cleaning process impurity and resin caking problem in the ion exchange column, resin volume 8m3Which comprises the following steps:
(31) and transferring the resin. And (3) checking that a valve D and a valve H are closed, opening a valve N and a valve A, opening a valve C, feeding water into the bottom of the ion exchange column 5, ensuring that the water pressure is more than or equal to 0.2MPa, feeding the water-carrying resin into the water washing tower 1 along with the feeding pipeline 3, and sequentially closing the valve C, the valve A and the valve N after the resin transfer is finished.
(32) Backwashing and back blowing. Opening a valve C, a valve D and a valve E, enabling purified water to enter a backwashing tower 1 through a cleaning auxiliary pipeline 7 and enter a distributor 8, controlling the pressure to be 0.45MPa, opening the valve B, enabling compressed air to enter the backwashing tower 1 through the cleaning auxiliary pipeline 7, controlling the compressed air pressure to be 0.45MPa, observing a feed pipe sight glass of a buffer tank 2 when the liquid level of the buffer tank 2 reaches 3%, checking the impurity discharge condition of an upper collector 15, opening the valve F and the valve E if no impurity is discharged, closing the valve E, observing the impurity discharge condition of a middle collector 15, slightly flocculating the flocculate, opening the valve G and the valve F again, opening the valve G and the valve F to 30%, closing the valve F, observing the impurity discharge condition of a lower collector 15, obviously crushing resin, adjusting the opening of the valve F to 30%, and closing the valve B, the valve C and the valve D after washing for 100 min.
(33) And (5) resin refilling. And 5min after the water washing is finished, opening a valve H and an upper inlet of the ion exchange column, starting a diaphragm pump 6, completely transferring the resin washed in the water washing tower 1 back to the ion exchange column 5, observing a pipeline viewing mirror, and stopping the diaphragm pump 6 when no liquid exists.
(34) And collecting impurities. And opening the valve E, the valve F and the valve G, opening the spraying device 10 of the water washing tower 1, washing for 10min, closing the valve E, the valve F and the valve G, opening the valve L and the valve J, discharging impurities and water in the buffer tank 2 into a packaging bag, and enabling the water to flow into a sewage pool after passing through the packaging bag. And after the buffer tank 2 is drained, opening the water shower head 20, rinsing for 1min, and closing the valve J and the valve L.
(35) And (5) cleaning. And opening a valve H, starting the diaphragm pump 6, pumping the washing liquid of the water washing tower 1 into the ion exchange column 5, observing a pipeline sight glass, and stopping the diaphragm pump 6 when no liquid exists.
After the resin of example 3 is washed by the water washing tower, the resin is compared with the resin before being washed and the resin is normally washed in the ion exchange column, and the column pressure and the exchange capacity are respectively compared to obtain the comparative data shown in the following table:
| before cleaning | After the column is cleaned | After the washing tower is cleaned | |
| The operation time is 25h, and the column pressure/MPa of the positive column is higher than that of the negative column | 0.4～0.5 | 0.2～0.4 | 0.2～0.3 |
| Exchange amount/m3 | 500 | 650～700 | 800～900 |
The above table data shows that the resin cleaning effect using the water scrubber of example 3 is significantly better than the back-flushing in the column, the column pressure decreases, and the exchange capacity increases.
Example 4
The utility model relates to an from exchanging post resin cleaning method fourth embodiment, mainly used carries out saline and alkaline soaking + washing to the resin of mixed bed, and the resin volume is 5m3Which comprises the following steps:
(41) preparing saline alkali liquor, preparing the saline alkali liquor in the buffer tank 2, wherein water: NaOH (0.4%): the NaCl ratio was 4:4:500(v/v/w, m)3/kg)。
(42) And transferring the resin. And (3) checking that a valve D and a valve H are closed, opening a valve N and a valve A, opening a valve C, feeding water into the bottom of the ion exchange column 5, ensuring that the water pressure is more than or equal to 0.2MPa, feeding the water-carrying resin into the water washing tower 1 along with the feeding pipeline 3, and sequentially closing the valve C, the valve A and the valve N after the resin transfer is finished.
(43) And (5) saline-alkali soaking. And opening the valve I, the valve K and the valve J, starting the centrifugal pump 19, opening the leaching valve when the liquid level in the tank is reduced to 3 percent, pumping all the saline-alkali liquid in the tank into the washing tower, closing the valve I, K, J and stopping the centrifugal pump. Soaking for 8 h.
(44) Backwashing and back blowing. Opening a valve C, a valve D and a valve E, enabling purified water to enter a backwashing tower 1 through a cleaning auxiliary pipeline 7 and enter a distributor 8, controlling the pressure to be 0.4MPa, opening the valve B, enabling compressed air to enter the backwashing tower 1 through the cleaning auxiliary pipeline 7, controlling the compressed air pressure to be 0.4MPa, observing a feed pipe sight glass of a buffer tank 2 when the liquid level of the buffer tank 2 reaches 3%, checking the 15 impurity discharge condition of an upper collector, slightly flocculating, opening the valve F, opening 45%, closing the valve E, observing the impurity discharge condition of a middle collector 15, obviously crushing resin, opening the valve G, opening 30%, closing the valve F, observing the 15 impurity discharge condition of a lower collector, completely resin, closing the valve G, washing for 100min, closing the valve B, the valve C and the valve D, and stopping backwashing.
(45) And (5) resin refilling. And 5min after the water washing is finished, opening a valve H and an upper inlet, starting a diaphragm pump 6, transferring the resin washed in the water washing tower 1 into an ion exchange column 5, observing a pipeline sight glass, and stopping the diaphragm pump 6 when no liquid exists.
(46) And collecting impurities. And opening the valve E, the valve F and the valve G, opening the spraying device 10 of the water washing tower 1, washing for 10min, closing the valve E, the valve F and the valve G, opening the valve L and the valve J, discharging impurities and water in the buffer tank 2 into a packaging bag, and enabling the water to flow into a sewage pool after passing through the packaging bag. And after the buffer tank 2 is drained, opening the water shower head 20, rinsing for 1min, and closing the valve J and the valve L.
(47) And (5) cleaning. And opening the valve G, opening the spraying device 10 of the water washing tower 1, and leaching for 10 min. Opening valve H, valve M, valve J, starting diaphragm pump 6, pumping lotion into the ion exchange column 5, observing the pipeline sight glass, and stopping diaphragm pump 6 when there is no liquid.
After the saline-alkali soaking and cleaning of the water washing tower in the embodiment 4, and before the saline-alkali soaking of the resin, the saline-alkali soaking and cleaning of the resin in the ion exchange column are compared, and the exchange capacity is compared, the comparative data shown in the following table are obtained:
| before soaking in saline alkali | After the saline-alkali soaking and cleaning in the column | After the water washing tower is soaked in saline and alkaline and washed | |
| Exchange amount/m3 | 210 | 240～260 | 300～320 |
The above table data shows that after the mixed bed resin is soaked and cleaned by the saline-alkali solution in the water scrubber of example 4, the adsorption capacity of the resin is improved and the exchange capacity is increased because the resin pollution is reduced and the impurities are removed.
The above description is only exemplary of the present invention and should not be taken as limiting the scope of the present invention, as any modifications, equivalents, improvements and the like made within the spirit and principles of the present invention are intended to be included within the scope of the present invention.
Claims (5)
1. A resin cleaning system for an ion exchange column is characterized by comprising a water washing tower and a buffer tank, wherein the water washing tower is communicated with the ion exchange column through a feeding pipeline and a return pipeline, resin to be cleaned in the ion exchange column is conveyed into the water washing tower through the feeding pipeline for cleaning, the cleaned resin in the water washing tower is returned into the ion exchange column through the return pipeline, a diaphragm pump for conveying the cleaned resin is arranged on the return pipeline, cleaning auxiliary pipelines are arranged at the bottoms of the ion exchange column and the water washing tower, and purified water or compressed air is respectively introduced into the ion exchange column and the water washing tower through the cleaning auxiliary pipelines; the washing tower is internally provided with a distributor, a collecting tank and a spraying device, the inlet end of the distributor is communicated with a washing auxiliary pipeline, and the collecting tank is communicated with a buffer tank through a collecting pipeline.
2. The ion exchange column resin cleaning system according to claim 1, wherein the collecting tank is located in the middle of the water washing tower, the collecting tank is provided with a plurality of collectors, the collectors are arranged in the water washing tower at intervals up and down, and each collector is communicated with the buffer tank through a collecting pipeline.
3. The ion-exchange column resin cleaning system according to claim 1, wherein the distributor is located at the bottom of the water washing tower, the distributor comprises a distribution seat and a plurality of distribution pipes, each distribution pipe is respectively communicated with the distribution seat, and the distribution seats are communicated with the cleaning auxiliary pipeline.
4. The ion exchange column resin cleaning system according to claim 1, wherein an alkali input pipeline and a salt input pipeline are respectively arranged on the buffer tank, and a dipping pipeline and a centrifugal pump are arranged on the buffer tank and communicated with a cleaning auxiliary pipeline of the water washing tower.
5. The ion exchange column resin cleaning system according to claim 1, wherein a water shower head is further provided in the buffer tank.
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| CN201922137365.XU CN211247559U (en) | 2019-12-03 | 2019-12-03 | Resin cleaning system for ion exchange column |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110860517A (en) * | 2019-12-03 | 2020-03-06 | 浙江华康药业股份有限公司 | Ion exchange resin cleaning system and cleaning method |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110860517A (en) * | 2019-12-03 | 2020-03-06 | 浙江华康药业股份有限公司 | Ion exchange resin cleaning system and cleaning method |
| CN110860517B (en) * | 2019-12-03 | 2023-09-15 | 浙江华康药业股份有限公司 | Ion exchange resin cleaning system and cleaning method |
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