CN211111078U - Trichlorosilane reaction furnace capable of improving silicon powder use efficiency - Google Patents

Trichlorosilane reaction furnace capable of improving silicon powder use efficiency Download PDF

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Publication number
CN211111078U
CN211111078U CN201922198132.0U CN201922198132U CN211111078U CN 211111078 U CN211111078 U CN 211111078U CN 201922198132 U CN201922198132 U CN 201922198132U CN 211111078 U CN211111078 U CN 211111078U
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furnace body
gas
furnace
silicon powder
end enclosure
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CN201922198132.0U
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孙亮
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Tangshan Sunfar Silicon Industries Co ltd
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Tangshan Sunfar Silicon Industries Co ltd
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Abstract

A trichlorosilane reaction furnace capable of improving the service efficiency of silicon powder belongs to the technical field of chemical reaction furnace equipment and is used for improving the service efficiency of the silicon powder. The technical scheme is as follows: the furnace body is the cylinder, the cylinder of furnace body has the tapering, the upper portion diameter of furnace body is greater than the lower part diameter of furnace body, the upper end and the lower extreme at the furnace body are installed respectively to furnace body upper cover and furnace body low head, there is the gas inlet furnace body low head one side, there is the gas outlet furnace body upper cover's top, gas distributor and spiral baffling board are installed respectively in the furnace body, gas distributor is located furnace body low head and furnace body junction top, the spiral baffling board is located the below of furnace body and furnace body upper cover junction, the heat exchange tube encircles and installs on the furnace body outer wall. The utility model has the advantages of simple structure and reasonable design, can reduce the interior air velocity of stove, increase silica flour and hydrogen chloride mixture detention time, increase the effect of subsiding of interior fine silica flour granule of stove, reach and reduce raw and other materials consumption, reduction in production cost's purpose.

Description

Trichlorosilane reaction furnace capable of improving silicon powder use efficiency
Technical Field
The utility model relates to a trichlorosilane reaction kettle device, which belongs to the technical field of chemical reaction furnace equipment.
Background
With the rapid development of polysilicon production, the yield of trichlorosilane products which are used as main raw materials for producing polysilicon is also greatly increased. In the process of increasing the yield of the trichlorosilane, the aims of improving the product quality, reducing the cost consumption and enlarging the production capacity become competitive pursuits of various manufacturers. In the trichlorosilane production practice, people find that the existing trichlorosilane reaction mode is mostly a fluidized bed mode, and trichlorosilane gas generated by the reaction carries part of fine silicon powder particles which do not fully participate in the reaction in a gas mode and enters a subsequent dedusting process along with the gas flow. The amount of the fine silicon powder particles carried in the fine silicon powder particles not only affects the working load of equipment in the next dust removal process, but also affects the unit silicon powder consumption of the final product, and the excessive fine silicon powder is carried and discharged, so that the production cost and the subsequent treatment cost of the product are greatly improved. Therefore, it is very necessary to research a trichlorosilane reaction furnace which can reduce the entrainment of fine silicon powder and improve the reaction efficiency of the silicon powder.
SUMMERY OF THE UTILITY MODEL
The utility model aims to solve the technical problem that a trichlorosilane reacting furnace that can improve silica flour availability factor is provided, this kind of reacting furnace can reduce the interior air velocity of stove, increases silica flour and hydrogen chloride mixture detention time, increases the effect of subsiding of interior fine silica flour granule, reaches the purpose that reduces raw and other materials consumption, reduction in production cost.
The technical scheme for solving the technical problems is as follows:
the utility model provides a can improve trichlorosilane reacting furnace of silica flour availability factor, it includes the furnace body, furnace body upper cover, furnace body lower cover, gas distributor, the spiral baffling board, the heat exchange tube, the furnace body is the cylinder, the cylinder of furnace body has the tapering, the upper portion diameter of furnace body is greater than the lower part diameter of furnace body, the upper end and the lower extreme at the furnace body are installed respectively to furnace body upper cover and furnace body lower cover, there is gas inlet furnace body lower cover one side, there is gas outlet at the top of furnace body upper cover, gas distributor and spiral baffling board are installed respectively in the furnace body, gas distributor is located furnace body lower cover and furnace body junction top, the spiral baffling board is located the below of furnace body and furnace body upper cover junction, the heat exchange tube encircles.
According to the trichlorosilane reaction furnace capable of improving the service efficiency of the silicon powder, the taper of the cylinder body of the furnace body is 8-15 degrees, the gas inlet of the lower end socket of the furnace body is connected with the hydrogen chloride gas pipeline, and the gas outlet of the upper end socket of the furnace body is connected with the chlorosilane gas pipeline.
The utility model has the advantages that: the utility model discloses a furnace body cylinder has the tapering, the upper portion diameter of furnace body is greater than the lower part diameter of furnace body, synthetic gas in the stove carries fine silica flour granule along with going on of reaction and removes to the furnace roof, along with the crescent of furnace interior sectional area, the gas velocity reduces gradually, the fine silica flour granule that smugglies secretly in the gas begins to subside along with the gas velocity reduces, increased with the reaction probability of hydrogen chloride gas, the spiral baffling board further makes fine silica flour granule take place to subside simultaneously, carry out the secondary reaction with hydrogen chloride gas, make fine silica flour granule obtain make full use of.
The utility model has the advantages of simple structure and reasonable design, can increase thin silica flour and hydrogen chloride mixture detention time effectively, increase the effect of subsiding of interior thin silica flour granule of stove, the thin silica flour make full use of that will be taken out by the synthetic gas has reduced raw and other materials consumption. Through statistics, 2-3 tons of silicon powder can be recovered by a single monthly furnace, the production cost can be saved by about 4 ten thousand yuan/month, the annual effect is created by about 50 ten thousand yuan, meanwhile, the maintenance period of subsequent dust removal equipment is shortened, the actual production continuity is prolonged, and the production efficiency is improved.
Drawings
Fig. 1 is a schematic structural diagram of the present invention.
The figures are labeled as follows: the furnace body 1, the furnace body upper end enclosure 2, the furnace body lower end enclosure 3, the gas inlet 4, the gas outlet 5, the gas distributor 6, the spiral baffle 7, the heat exchange tube 8, the fine silicon powder particles 9, the cooling liquid inlet 10 and the cooling liquid outlet 11.
Detailed Description
The utility model comprises a furnace body 1, a furnace body upper end socket 2, a furnace body lower end socket 3, a gas distributor 6, a spiral baffle plate 7 and a heat exchange tube 8.
The furnace body 1 is a cylinder body, the cylinder body of the furnace body 1 has taper, the upper diameter of the furnace body 1 is larger than the lower diameter of the furnace body 1, and the taper of the cylinder body of the furnace body 1 is 8-15 degrees. The furnace body 1 with the taper is adopted, so that the speed of the air flow ascending in the furnace body is gradually reduced, and the sedimentation and the secondary reaction of fine silicon powder particles carried in the synthetic gas are facilitated.
Since the height of the furnace body 1 is about 3 m and the taper of the furnace body 1 is 10 degrees, it can be measured that the gas flow cross-sectional area at the upper end of the furnace body 1 is about 3.2 times of the gas flow cross-sectional area at the lower part, according to the gas flow velocity formula, when the gas flow velocity in the furnace body 1 flows from the lower part to the upper part of the furnace body 1, the gas flow velocity is reduced by one third, which is the ideal gas flow velocity for the synthetic gas in the reaction furnace to carry solid particles and make them settle, and the reduction of the gas flow velocity in the furnace presents a linear decreasing relationship due to the form of the tapered furnace body 1.
The upper end enclosure 2 and the lower end enclosure 3 of the furnace body are respectively arranged at the upper end and the lower end of the furnace body 1. And a gas inlet 4 is formed in one side of the furnace body lower end socket 3, and the gas inlet 4 is connected with a hydrogen chloride gas pipeline. And a gas outlet 5 is arranged at the top of the furnace body upper end socket 2, and the gas outlet 5 is connected with a chlorosilane gas pipeline.
The gas distributor 6 is arranged in the furnace body 1, and the gas distributor 6 is positioned above the connection part of the furnace body lower end socket 3 and the furnace body 1. The hydrogen chloride gas enters the lower end enclosure 3 of the furnace body and then passes through the gas distributor 6 and then is uniformly introduced into the furnace body 1.
The figure shows that the spiral baffle plate 7 is arranged in the furnace body 1, and the spiral baffle plate 7 is positioned below the joint of the furnace body upper end enclosure 2 and the furnace body 1. The spiral baffle 7 enables the synthetic gas with reduced flow velocity to present a spiral rising form in the spiral baffle 7, and fine silicon powder particles carried in the synthetic gas are effectively settled in the furnace body 1 to carry out secondary reaction with hydrogen chloride gas. Then, the chlorosilane gas carries fine silicon powder particles with very little silicon powder into the upper end enclosure 2 of the furnace body for secondary sedimentation. And finally, the gas-phase chlorosilane enters a subsequent process after three times of sedimentation, so that the equipment load of the subsequent dust removal process is reduced.
The heat exchange tubes 8 are shown mounted around the outer wall of the furnace body 1. Because the heat exchange tube in the furnace body 1 is removed and the heat exchange tube 8 is moved to the outside of the furnace body 1, a space for installing the spiral baffle plate 7 is arranged in the furnace body 1.
The figure shows that the cooling liquid enters the heat exchange tube 8 from the cooling liquid inlet 10, absorbs heat, and flows out from the cooling liquid outlet 11 for cooling and recycling.
The utility model discloses a use as follows:
firstly, a valve of a gas inlet 4 is opened, hydrogen chloride gas is introduced into the furnace body lower end enclosure 3, and the hydrogen chloride gas enters the furnace body lower end enclosure 3 and then uniformly introduced into the furnace body 1 after passing through a gas distributor 6.
Hydrogen chloride gas enters a furnace body 1 filled with certain fine silicon powder particles 9, and chlorosilane gas is generated through high-temperature reaction in the furnace.
Chlorosilane gas generated by the reaction moves towards the upper end socket 2 of the furnace body, and fine silicon powder particles 9 are entrained in the chlorosilane gas; along with the gradual increase of the sectional area of the conical furnace body 1, the airflow speed of the chlorosilane gas is gradually reduced, fine silicon powder particles 9 carried in the chlorosilane gas begin to settle along with the reduction of the airflow speed, the probability of reaction of the settled fine silicon powder particles 9 with hydrogen chloride gas in the furnace is increased, and the free fine silicon powder particles 9 are greatly reduced.
The synthetic chlorosilane gas without most of the entrained fine silicon powder particles 9 enters a spiral baffle 7 at the upper part of the furnace body 1, and presents a spiral ascending form in the spiral baffle 7, and the fine silicon powder particles entrained in the synthetic chlorosilane gas are effectively settled in the furnace body 1 to carry out secondary reaction with hydrogen chloride gas. Then, the chlorosilane gas carries fine silicon powder particles with very little silicon powder into the upper end enclosure 2 of the furnace body for secondary sedimentation. And finally, the gas-phase chlorosilane enters a subsequent process after three times of sedimentation, so that the equipment load of the subsequent dust removal process is reduced. The cooling liquid enters the heat exchange tube 8 from the inlet 10 to protect the furnace body 1 and prevent the furnace body 1 from overtemperature. The coolant absorbs heat and flows out through the outlet pipe 11, and is cooled and recovered for reuse.
The utility model discloses an embodiment as follows:
the height of the furnace body 1 is 3 meters, the taper is 10 degrees, the diameter of the lower part is 600mm, and the diameter of the upper part is 1200 mm; the diameter of the furnace body upper end socket 2 is 1400mm, and the height is 1000 mm;
the diameter of the furnace body lower end socket 3 is 600mm, and the height is 600 mm;
the diameter of the gas inlet 4 is 100 mm;
the diameter of the gas outlet 5 is 100 mm;
the height of the spiral baffle plate 7 is 800mm, the inclination angle is 40 degrees, and the spiral baffle plate is arranged in a rotating way;
the diameter of the heat exchange tube 8 is 48mm, and the height is 3000 mm.

Claims (2)

1. A trichlorosilane reacting furnace capable of improving the service efficiency of silicon powder is characterized in that: the furnace comprises a furnace body (1), a furnace body upper end enclosure (2), a furnace body lower end enclosure (3), a gas distributor (6), a spiral baffle plate (7) and a heat exchange tube (8), wherein the furnace body (1) is a cylinder, the cylinder of the furnace body (1) has a taper, the upper part diameter of the furnace body (1) is larger than the lower part diameter of the furnace body (1), the furnace body upper end enclosure (2) and the furnace body lower end enclosure (3) are respectively arranged at the upper end and the lower end of the furnace body (1), a gas inlet (4) is arranged at one side of the furnace body lower end enclosure (3), a gas outlet (5) is arranged at the top of the furnace body upper end enclosure (2), the gas distributor (6) and the spiral baffle plate (7) are respectively arranged in the furnace body (1), the gas distributor (6) is positioned above the joint of the furnace body lower end enclosure (3) and the furnace body (1), the spiral baffle plate, the heat exchange tube (8) is arranged on the outer wall of the furnace body (1) in a surrounding way.
2. The trichlorosilane reaction furnace capable of improving the service efficiency of silicon powder according to claim 1, which is characterized in that: the taper of the cylinder of the furnace body (1) is 8-15 degrees, a gas inlet (4) of the furnace body lower end enclosure (3) is connected with a hydrogen chloride gas pipeline, and a gas outlet (5) of the furnace body upper end enclosure (2) is connected with a chlorosilane gas pipeline.
CN201922198132.0U 2019-12-10 2019-12-10 Trichlorosilane reaction furnace capable of improving silicon powder use efficiency Active CN211111078U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201922198132.0U CN211111078U (en) 2019-12-10 2019-12-10 Trichlorosilane reaction furnace capable of improving silicon powder use efficiency

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201922198132.0U CN211111078U (en) 2019-12-10 2019-12-10 Trichlorosilane reaction furnace capable of improving silicon powder use efficiency

Publications (1)

Publication Number Publication Date
CN211111078U true CN211111078U (en) 2020-07-28

Family

ID=71701645

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201922198132.0U Active CN211111078U (en) 2019-12-10 2019-12-10 Trichlorosilane reaction furnace capable of improving silicon powder use efficiency

Country Status (1)

Country Link
CN (1) CN211111078U (en)

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