CN211103179U

CN211103179U - Polishing device

Info

Publication number: CN211103179U
Application number: CN201920923037.XU
Authority: CN
Inventors: 王伦
Original assignee: Shenzhen Beitian Robot Co ltd
Current assignee: Shenzhen Paitian Robot Technology Co ltd
Priority date: 2019-06-17
Filing date: 2019-06-17
Publication date: 2020-07-28
Anticipated expiration: 2029-06-17

Abstract

The application discloses grinding device, grinding device includes: the first substrate and the second substrate are fixedly arranged oppositely; the buffer assembly comprises a third substrate and an elastic piece, the third substrate is movably arranged between the first substrate and the second substrate, and the elastic piece is elastically arranged between the first substrate and the third substrate and used for applying elastic reaction force to the third substrate; and the polishing assembly penetrates through the first substrate, the second substrate and the third substrate and is fixedly connected with the third substrate so as to automatically adjust the pressing force of the polishing assembly by automatically adjusting the elastic reaction force applied to the third substrate by the buffer assembly. Through above-mentioned mode, this application can increase the packing force of the subassembly of polishing.

Description

Polishing device

Technical Field

The application relates to the technical field of polishing, in particular to a polishing device.

Background

At present, when metal parts such as a notebook rear cover and a filter cover plate are polished and deburred, most domestic manufacturers still adopt a manual handheld pneumatic polishing head to polish, the mode is low in efficiency, high in product reject ratio and rough and uneven in the surface of a processed product, and dust generated during polishing is harmful to human bodies greatly.

Consequently, along with the continuous deepening of industrial robot application, some producers begin to adopt industrial robot installation pneumatic grinding device to carry out the automation and polish, but because factors such as arm rigidity, positioning error, often take place following problem during polishing: the grinding pressing force is not enough, and the grinding effect is not good; when the grinding pressing force is increased, the rotating speed of the pneumatic grinding head is reduced, even the pneumatic grinding head stops rotating, and the grinding effect is influenced.

Disclosure of Invention

The main technical problem who solves of this application provides a grinding device, can increase the packing force of the subassembly of polishing.

In order to solve the technical problem, the application adopts a technical scheme that: providing a polishing apparatus, the polishing apparatus comprising: the first substrate and the second substrate are fixedly arranged oppositely; the buffer assembly comprises a third substrate and an elastic piece, the third substrate is movably arranged between the first substrate and the second substrate, and the elastic piece is elastically arranged between the first substrate and the third substrate and used for applying elastic reaction force to the third substrate; and the polishing assembly penetrates through the first substrate, the second substrate and the third substrate and is fixedly connected with the third substrate so as to automatically adjust the pressing force of the polishing assembly by automatically adjusting the elastic reaction force applied to the third substrate by the buffer assembly.

Wherein, the buffer assembly further comprises: at least one guide shaft fixedly arranged between the first substrate and the second substrate and penetrating through the third substrate; each linear bearing corresponds to each guide shaft, the linear bearings are sleeved on the peripheries of the guide shafts, and the linear bearings are fixedly connected with the third substrate.

The elastic piece is a spring, the guide shaft and the linear bearing are in one-to-one correspondence, and the spring is sleeved on the outer sides of the guide shaft and the linear bearing.

Wherein, the buffer assembly further comprises: the first limiting block is fixedly arranged on one side, facing the second substrate, of the first substrate; and/or the second limiting block is fixedly arranged on one side, facing the first substrate, of the second substrate.

Wherein, the subassembly of polishing includes: the mounting seat is fixedly connected with the third substrate and comprises a hollow area; the motor is positioned on one side of the second substrate, which is close to the first substrate, is fixedly connected with the mounting seat and comprises an output end, and the output end is positioned in the hollow area; the transmission subassembly is at least partially positioned in the hollow area and is fixedly connected with the output end of the motor; the connecting piece is at least partially positioned outside the hollow area and is fixedly connected with the transmission subassembly; and the polishing head is fixedly connected with the connecting piece.

Wherein the output of the motor includes a key, the transmission subassembly comprising: the transmission shaft is sleeved on the periphery of the output end and is fixedly connected with the key; and one end of the connecting rotating shaft is fixedly connected with one side of the transmission shaft, which is far away from the motor, and the other end of the connecting rotating shaft is fixedly connected with the connecting piece.

Wherein, the subassembly of polishing still includes: the bearing is sleeved on the periphery of the transmission shaft and is positioned in the hollow area; the end cover is positioned on the surface of the mounting base, which is close to one side of the polishing head, and comprises a first base table and a step part extending from the surface of the first base table; the stepped part abuts against one side, close to the polishing head, of the bearing; a gap exists between the connecting rotating shaft and the inner wall of the mounting seat, and the first base station covers the gap.

Wherein, one end of the polishing head close to the connecting piece is provided with a bulge, and the outer side of the bulge is provided with an external thread; and one side of the connecting piece, which is close to the polishing head, is provided with a concave part, and the inner side of the concave part is provided with an internal thread matched with the external thread.

Wherein, grinding device still includes: the first side plate, the second side plate, the third side plate and the fourth side plate are fixedly connected with the side edge of the second base plate respectively; the fourth base plate is opposite to the second base plate and fixedly connected with the first side plate, the second side plate, the third side plate and the fourth side plate to form a closed space, and one end of the polishing assembly is movably arranged in the closed space.

Wherein, grinding device still includes: at least one water spray assembly fixedly disposed on an outer side of at least one of the side plates, the water spray assembly comprising: the device comprises a fixing block, a joint and a nozzle, wherein the joint and the nozzle are connected through the fixing block, and the fixing block is fixedly connected with at least one side plate; and/or the adapter plate is fixedly connected with the outer side of one side plate and is used for being connected with an external robot.

The beneficial effect of this application is: being different from the situation of the prior art, the grinding device provided by the application comprises: the first substrate and the second substrate are fixedly arranged oppositely; the buffer assembly comprises a third substrate and an elastic piece, the third substrate is movably arranged between the first substrate and the second substrate, and the elastic piece is elastically arranged between the first substrate and the third substrate and used for applying elastic reaction force to the third substrate; the polishing assembly penetrates through the first substrate, the second substrate and the third substrate and is fixedly connected with the third substrate so as to automatically adjust the pressing force of the polishing assembly through the elastic reaction force applied to the third substrate by the automatic adjustment buffer assembly. The polishing assembly floats through the buffer assembly, so that the probability of stopping the polishing assembly is reduced; and the polishing assembly can increase the pressing force between the polishing assembly and a sample to be polished through the elastic piece, so that the polishing effect is improved.

Drawings

In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts. Wherein:

FIG. 1 is a schematic structural view of an embodiment of a polishing apparatus according to the present application;

FIG. 2 is a schematic view of the polishing apparatus of FIG. 1 from another perspective;

FIG. 3 is a schematic structural view of one embodiment of the linear bearing of FIG. 2;

FIG. 4 is a schematic view of one embodiment of a structure between the first substrate and the second substrate of FIG. 2;

FIG. 5 is a schematic cross-sectional view of one embodiment of the sanding assembly of FIG. 1;

FIG. 6 is a schematic structural view of an embodiment of the drive shaft of FIG. 5;

FIG. 7 is a schematic structural view of an embodiment of the bearing of FIG. 5;

FIG. 8 is a schematic structural view of an embodiment of the end cap of FIG. 5;

Fig. 9 is a schematic structural view of another embodiment of the polishing device of the present application.

Detailed Description

The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.

Referring to fig. 1, fig. 1 is a schematic structural diagram of an embodiment of a polishing apparatus according to the present application, which includes a first substrate 10 and a second substrate 12, a buffer assembly 14, and a polishing assembly 16, which are relatively fixed.

Specifically, the first substrate 10 and the second substrate 12 may be fixedly connected by bolts or other external connectors. The material of the first substrate 10 and the second substrate 12 may be metal, for example, stainless steel, etc., and the first substrate 10 and the second substrate 12 may be rectangular, square, etc.

The buffer assembly 14 includes a third substrate 140 and an elastic member 142, wherein the third substrate 140 is movably disposed between the first substrate 10 and the second substrate 12, and the elastic member 142 is elastically disposed between the first substrate 10 and the third substrate 140 for applying an elastic reaction force to the third substrate 140. The elastic member 142 may be a spring, elastic silicone rubber, or the like.

In this embodiment, referring to fig. 2, fig. 2 is a schematic structural view of the polishing apparatus in fig. 1 from another view angle, and the movable arrangement of the third substrate 140 between the first substrate 10 and the second substrate 12 may be: the cushion assembly 14 further includes: at least one guide shaft 144 and at least one linear bearing 146.

Specifically, the guide shaft 144 is fixedly disposed between the first substrate 10 and the second substrate 12, and a hole may be disposed in the third substrate 140 corresponding to the guide shaft 144, through which the guide shaft 144 may pass through the third substrate 140. The guide shaft 144 may not only fix the positions of the first and

second substrates

10 and 12, but also define the traveling direction of the third substrate 140. The guide shafts 144 may be cylinders, etc., and the number thereof may be four, and are respectively disposed at four corners of the first substrate 10. Both ends of the guide shaft 144 may be fixed to the first substrate 10 and the second substrate 12 by screws or the like.

Each linear bearing 146 corresponds to each guide shaft 144, the linear bearing 146 is sleeved on the periphery of the guide shaft 144, and the linear bearing 146 is fixedly connected with the third substrate 140 by screws or the like. The linear bearing 146 can assist sliding, so that sliding friction is changed into rolling friction, friction force is small, and sliding is smooth; of course, the linear bearing 146 may also be an oilless bushing or, in some instances, the linear bearing 146 may not be present. In this embodiment, please refer to fig. 3, fig. 3 is a schematic structural diagram of an embodiment of the linear bearing in fig. 2. The linear bearing 146 is a hollow structure, and may include a cylinder 1460 and a step 1462 fixedly connected to one end of the cylinder 1460, the cylinder 1460 and the step 1462 may be sleeved on the periphery of the guide shaft 144, and the step 1462 is further fixedly connected to the third substrate 140. For example, the step 1462 may be fixed to the side of the third substrate 140 facing the first substrate 10, or may be fixed to the side of the third substrate 140 facing the second substrate 12. Further, in this embodiment, when the elastic member 142 is a spring, as shown in fig. 2, the spring, the guide shaft 144 and the linear bearing 146 are in one-to-one correspondence, and the spring is sleeved outside the guide shaft 144 and the linear bearing 146 (especially, the cylinder 1460 of the linear bearing 146).

Of course, in other embodiments, other ways may be adopted to enable the third substrate 140 to be movably disposed between the first substrate 10 and the second substrate 12; for example, both ends of the elastic member 142 may be fixedly connected to the third substrate 140 and the first substrate 10, respectively, so that the third substrate 140 is movable between the first substrate 10 and the second substrate 12 by the elasticity of the elastic member 142.

In addition, in the present embodiment, in order to reduce the damage to the linear bearing 146 caused by the excessive pressing amount, please refer to fig. 4, and fig. 4 is a schematic structural diagram of an embodiment between the first substrate and the second substrate in fig. 2. The above-mentioned cushioning assembly 14 further includes: the first stopper 148 and/or the second stopper 141. The first limiting blocks 148 are fixedly disposed on a side of the first substrate 10 facing the second substrate 12, and the number of the first limiting blocks 148 may be at least one; for example, in the present embodiment, the number of the first stoppers 148 may be two, and the first stoppers are disposed on two opposite sides of the first substrate 10. The second stoppers 141 are fixedly disposed on one side of the second substrate 12 facing the first substrate 10, and the number of the second stoppers 141 may be at least one; for example, in the present embodiment, the number of the second stoppers 141 may be two, and the second stoppers are disposed on two opposite sides of the second substrate 12. The first limiting block 148 and the second limiting block 141 can be cylinders, and the two can be arranged just opposite to each other or arranged in a staggered manner. By means of the above-mentioned mechanical stop, it is possible to prevent the pressing force from being too great and damaging some elements in the grinding device, such as the linear bearing 146 and the like.

Referring to fig. 1 again, the polishing assembly 16 of the polishing apparatus provided by the present application is disposed through the first substrate 10, the second substrate 12 and the third substrate 140, and is fixedly connected to the third substrate 140, so as to automatically adjust the pressing force of the polishing assembly 16 by automatically adjusting the elastic reaction force applied to the third substrate 140 by the buffer assembly 14. The grinding assembly 16 is floated by the cushion assembly 14 during grinding, and the pressing force between the grinding assembly 16 and the sample to be ground can be enhanced by the reaction force exerted by the elastic member 142 in the cushion assembly 14.

In this embodiment, referring to fig. 1 and 5 together, fig. 5 is a schematic cross-sectional view of an embodiment of the polishing assembly shown in fig. 1. The grinding assembly 16 may include a mounting base 160, a motor 162, a transmission subassembly 164, a connector 166, and a grinding head 168, wherein the motor 162 drives the grinding head 168 to rotate via the transmission subassembly 164 and the connector 166, thereby performing a grinding function.

Specifically, the mounting base 160 is fixedly connected to the third substrate 140, and includes a hollow space (not shown). The mounting base 160 may be a hollow cylinder, and the material thereof may be stainless steel; the mounting base 160 may be fixedly connected to the third substrate 140 by screws or the like.

The motor 162 is disposed on the second substrate 12 near the first substrate 10, and is fixedly connected to the mounting base 160, and includes an output end 1620, where the output end 1620 is disposed in the hollow area, and the output end 1620 may be a protruding rotating shaft. The motor 162 is used as a power source, so that the torque is large, the speed is stable, and stepless speed regulation can be performed according to the process requirements.

The drive subassembly 164 is at least partially disposed within the hollow region and is fixedly coupled to an output 1620 of the motor 162. In one embodiment, the output 1620 of the motor 162 includes a key a, and the transmission subassembly 164 includes: a transmission shaft 1640 and a connecting shaft 1642; wherein, the transmission shaft 1640 is sleeved on the periphery of the output end 1620 and is fixedly connected with the key A; specifically, as shown in fig. 6, fig. 6 is a schematic structural diagram of an embodiment of the transmission shaft in fig. 5. The key a corresponds to a protrusion of the output end 1620 of the motor 162, and the transmission shaft 1640 is provided with a recess 16400 corresponding to the protrusion, so that the transmission shaft 1640 is fixed with the key a by the matching of the key a and the recess 16400. A connecting rotating shaft 1642, one end of which is fixedly connected with one side of the transmission shaft 1640 far away from the motor 162, and the other end of which is fixedly connected with the connecting piece 166; in this embodiment, the fixed connection may be realized by a screw or the like.

The connecting member 166 is at least partially located outside the hollow region and is fixedly connected to the driving subassembly 164, for example, the connecting member 166 may be fixedly connected to the connecting shaft 1642; the connector 166 may be a connecting flange or the like.

A sanding head 168 is fixedly attached to the connector 166. the sanding head 168 may be a sanding pad having sandpaper E adhered to a surface thereof remote from the motor 162. In addition, one end of the polishing head 168 close to the connecting piece 166 is provided with a bulge C, and the outer side of the bulge C is provided with an external thread; the side of the connecting piece 166 close to the polishing head 168 is provided with a concave part D, the inner side of the concave part D is provided with an internal thread matched with the external thread, and the polishing head 168 can be easily screwed on the connecting piece 166 through self-threading so as to be fixed with the connecting piece 166.

In one application scenario, to reduce damage to the motor 162 during sanding, the sanding assembly 16 further includes: the structure of the bearing 161 is shown in fig. 7, and fig. 7 is a schematic structural view of an embodiment of the bearing in fig. 5. The bearing 161 is disposed around the transmission shaft 1640 and located in the hollow region of the mounting seat 160. The bearing 161 can bear a large bending moment generated in the grinding process, and the probability of damage to the motor 162 is reduced.

In yet another application scenario, to increase the protection of the bearing 161, the grinding assembly 16 further comprises: an end cap 163; referring to fig. 5 and 8, fig. 8 is a schematic structural diagram of an embodiment of the end cap in fig. 5, in which an end cap 163 is located on a surface of the mounting base 160 near the polishing head 168, and includes a first pedestal 1630 and a step 1632 extending from a surface of the first pedestal 1630; the step 1632 abuts against the side of the bearing 161 close to the polishing head 168, thereby supporting the bearing 161. In addition, in this embodiment, the end cap 163 is a hollow structure, one end of the connecting shaft 1642 protrudes from the mounting seat 160 and the end cap 163, a gap exists between the connecting shaft 1642 and the inner wall of the mounting seat 160, and the first base 1630 covers the gap, so as to perform a sealing function, prevent outside dust from entering the bearing 161, and avoid the bearing 161 from being damaged.

Referring to fig. 9, fig. 9 is a schematic structural view of another embodiment of the polishing apparatus of the present application. The application provides a grinding device still includes: a first side plate 18, a second side plate 11, a third side plate 13, a fourth side plate 15, and a fourth base plate 17; the first side plate 18, the second side plate 11, the third side plate 13 and the fourth side plate 15 are respectively fixedly connected with four sides of the second substrate 12; of course, the first substrate 10 (not shown in fig. 9) may be fixedly connected to four sides of the first substrate at the same time. The fourth base plate 17 is disposed opposite to the second base plate 12, and is fixedly connected to the first side plate 18, the second side plate 11, the third side plate 13, and the fourth side plate 15 to form a sealed space, and one end of the polishing assembly 16 is movably disposed in the sealed space. By the method, key parts such as the motor 16 and the linear bearing 146 in the figure 1 can be sealed, and the influence of external dust on the key parts can be effectively reduced.

In addition, in the present embodiment, please continue to refer to fig. 9, the polishing apparatus further includes: at least one water spraying assembly 19 fixedly disposed on an outer side of at least one of the side plates, the water spraying assembly 19 including: a fixed block 190, a joint 192 and a nozzle 194; the joint 192 and the nozzle 194 are connected through a fixing block 190, and the fixing block 190 is fixedly connected with at least one of the side plates. The inside of the fixing block 190 is a hollow structure, one end of the joint 192 and one end of the nozzle 194 can be connected inside the fixing block 190, and an external water source is sprayed out after passing through the joint 192 and the nozzle 194; of course, in other embodiments, one end of the connector 192 and one end of the nozzle 194 may be disconnected inside the fixing block 190, and an external water source is sprayed out through the connector 192, the fixing block 190 and the nozzle 194. Further, the number of the nozzle assemblies 19 may be one, two, three, or the like; when the number of the nozzle assemblies 19 is two, the nozzle assemblies 19 may be symmetrically disposed on the two side plates. The nozzle assembly 19 can enable the grinding device provided by the application to be suitable for some occasions requiring wet grinding, and the nozzle assembly 19 can be used for grinding water in the process.

In addition, in the embodiment, please refer to fig. 1 and 9 again, the polishing apparatus provided by the present application may further include an adapter plate 20 fixedly connected to an outer side of one of the side plates for connecting with an external robot. Further, in this embodiment, a groove F may be disposed on an edge of the side plate fixedly connected to the adapter plate 20 for routing the motor 162. Of course, in other embodiments, the groove F may be provided on other side plates.

The above description is only for the purpose of illustrating embodiments of the present application and is not intended to limit the scope of the present application, and all modifications of equivalent structures and equivalent processes, which are made by the contents of the specification and the drawings of the present application or are directly or indirectly applied to other related technical fields, are also included in the scope of the present application.

Claims

1. An abrading device, characterized in that the abrading device comprises:

The first substrate and the second substrate are fixedly arranged oppositely;

The buffer assembly comprises a third substrate and an elastic piece, the third substrate is movably arranged between the first substrate and the second substrate, and the elastic piece is elastically arranged between the first substrate and the third substrate and used for applying elastic reaction force to the third substrate;

And the polishing assembly penetrates through the first substrate, the second substrate and the third substrate and is fixedly connected with the third substrate so as to automatically adjust the pressing force of the polishing assembly by automatically adjusting the elastic reaction force applied to the third substrate by the buffer assembly.

2. The abrading device of claim 1, wherein the cushioning assembly further comprises:

At least one guide shaft fixedly arranged between the first substrate and the second substrate and penetrating through the third substrate;

Each linear bearing corresponds to each guide shaft, the linear bearings are sleeved on the peripheries of the guide shafts, and the linear bearings are fixedly connected with the third substrate.

3. The polishing apparatus as set forth in claim 2, wherein the elastic member is a spring, the guide shaft and the linear bearing are in one-to-one correspondence, and the spring is sleeved outside the guide shaft and the linear bearing.

4. The abrading device of claim 1, wherein the cushioning assembly further comprises:

The first limiting block is fixedly arranged on one side, facing the second substrate, of the first substrate; and/or the second limiting block is fixedly arranged on one side, facing the first substrate, of the second substrate.

5. The abrading device of claim 1, wherein the abrading assembly comprises:

The mounting seat is fixedly connected with the third substrate and comprises a hollow area;

The motor is positioned on one side of the second substrate, which is close to the first substrate, is fixedly connected with the mounting seat and comprises an output end, and the output end is positioned in the hollow area;

The transmission subassembly is at least partially positioned in the hollow area and is fixedly connected with the output end of the motor;

The connecting piece is at least partially positioned outside the hollow area and is fixedly connected with the transmission subassembly;

And the polishing head is fixedly connected with the connecting piece.

6. The abrading device of claim 5, wherein the output of the motor comprises a key, the transmission sub-assembly comprising:

The transmission shaft is sleeved on the periphery of the output end and is fixedly connected with the key;

And one end of the connecting rotating shaft is fixedly connected with one side of the transmission shaft, which is far away from the motor, and the other end of the connecting rotating shaft is fixedly connected with the connecting piece.

7. The abrading device of claim 6, wherein the abrading assembly further comprises:

The bearing is sleeved on the periphery of the transmission shaft and is positioned in the hollow area;

The end cover is positioned on the surface of the mounting base, which is close to one side of the polishing head, and comprises a first base table and a step part extending from the surface of the first base table;

The stepped part abuts against one side, close to the polishing head, of the bearing; a gap exists between the connecting rotating shaft and the inner wall of the mounting seat, and the first base station covers the gap.

8. The sanding device of claim 5, wherein the sanding head is provided with a protrusion near one end of the connector, and the outer side of the protrusion is provided with an external thread; and one side of the connecting piece, which is close to the polishing head, is provided with a concave part, and the inner side of the concave part is provided with an internal thread matched with the external thread.

9. The abrading device of claim 1, further comprising:

The first side plate, the second side plate, the third side plate and the fourth side plate are fixedly connected with the side edge of the second base plate respectively;

The fourth base plate is opposite to the second base plate and fixedly connected with the first side plate, the second side plate, the third side plate and the fourth side plate to form a closed space, and one end of the polishing assembly is movably arranged in the closed space.

10. The abrading device of claim 9, further comprising:

At least one water spray assembly fixedly disposed on an outer side of at least one of the side plates, the water spray assembly comprising: the device comprises a fixing block, a joint and a nozzle, wherein the joint and the nozzle are connected through the fixing block, and the fixing block is fixedly connected with at least one side plate; and/or the presence of a gas in the gas,

The adapter plate is fixedly connected with the outer side of one side plate and used for being connected with an external robot.