CN211078928U - 一种双银低辐射镀膜玻璃 - Google Patents
一种双银低辐射镀膜玻璃 Download PDFInfo
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- CN211078928U CN211078928U CN201920840823.3U CN201920840823U CN211078928U CN 211078928 U CN211078928 U CN 211078928U CN 201920840823 U CN201920840823 U CN 201920840823U CN 211078928 U CN211078928 U CN 211078928U
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- film layer
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- aluminum alloy
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- 239000011521 glass Substances 0.000 title claims abstract description 104
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 53
- 239000004332 silver Substances 0.000 title claims abstract description 53
- 229910000838 Al alloy Inorganic materials 0.000 claims abstract description 44
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 claims abstract description 43
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 40
- 239000000956 alloy Substances 0.000 claims abstract description 40
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 34
- 229910000611 Zinc aluminium Inorganic materials 0.000 claims abstract description 28
- HXFVOUUOTHJFPX-UHFFFAOYSA-N alumane;zinc Chemical compound [AlH3].[Zn] HXFVOUUOTHJFPX-UHFFFAOYSA-N 0.000 claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 19
- JYMITAMFTJDTAE-UHFFFAOYSA-N aluminum zinc oxygen(2-) Chemical compound [O-2].[Al+3].[Zn+2] JYMITAMFTJDTAE-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910001120 nichrome Inorganic materials 0.000 claims abstract description 13
- 229910001093 Zr alloy Inorganic materials 0.000 claims abstract description 9
- 229910000623 nickel–chromium alloy Inorganic materials 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 15
- 239000005329 float glass Substances 0.000 abstract description 8
- 230000000694 effects Effects 0.000 abstract description 6
- 238000005034 decoration Methods 0.000 abstract description 2
- 239000007769 metal material Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 description 16
- 238000007872 degassing Methods 0.000 description 14
- 238000001755 magnetron sputter deposition Methods 0.000 description 14
- 238000000576 coating method Methods 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 239000007888 film coating Substances 0.000 description 8
- 238000009501 film coating Methods 0.000 description 8
- 238000007747 plating Methods 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 8
- 239000007789 gas Substances 0.000 description 7
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000013077 target material Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000003139 buffering effect Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000005344 low-emissivity glass Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 229910000925 Cd alloy Inorganic materials 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- OJIJEKBXJYRIBZ-UHFFFAOYSA-N cadmium nickel Chemical compound [Ni].[Cd] OJIJEKBXJYRIBZ-UHFFFAOYSA-N 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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Abstract
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CN201920840823.3U CN211078928U (zh) | 2019-06-05 | 2019-06-05 | 一种双银低辐射镀膜玻璃 |
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CN201920840823.3U CN211078928U (zh) | 2019-06-05 | 2019-06-05 | 一种双银低辐射镀膜玻璃 |
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CN211078928U true CN211078928U (zh) | 2020-07-24 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112125535A (zh) * | 2020-09-25 | 2020-12-25 | 山西隆腾机电科技有限公司 | 一种低辐射镀膜玻璃及其制备方法 |
CN114634315A (zh) * | 2022-03-21 | 2022-06-17 | 新福兴玻璃工业集团有限公司 | 一种节能型低辐射镀膜玻璃及其制备方法 |
CN114656164A (zh) * | 2022-03-31 | 2022-06-24 | 新福兴玻璃工业集团有限公司 | 一种热稳定型单银低辐射镀膜玻璃及其制备方法 |
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2019
- 2019-06-05 CN CN201920840823.3U patent/CN211078928U/zh active Active
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112125535A (zh) * | 2020-09-25 | 2020-12-25 | 山西隆腾机电科技有限公司 | 一种低辐射镀膜玻璃及其制备方法 |
CN114634315A (zh) * | 2022-03-21 | 2022-06-17 | 新福兴玻璃工业集团有限公司 | 一种节能型低辐射镀膜玻璃及其制备方法 |
CN114656164A (zh) * | 2022-03-31 | 2022-06-24 | 新福兴玻璃工业集团有限公司 | 一种热稳定型单银低辐射镀膜玻璃及其制备方法 |
CN114656164B (zh) * | 2022-03-31 | 2024-02-20 | 新福兴玻璃工业集团有限公司 | 一种热稳定型单银低辐射镀膜玻璃及其制备方法 |
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GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder |
Address after: Rock pocket Village Yuanhong Industrial District of Fuqing city Fuzhou City, Fujian province 350300 Patentee after: Xinfuxing Glass Industry Group Co.,Ltd. Address before: Rock pocket Village Yuanhong Industrial District of Fuqing city Fuzhou City, Fujian province 350300 Patentee before: XINFUXING GLASS Co.,Ltd. |
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CP01 | Change in the name or title of a patent holder | ||
TR01 | Transfer of patent right |
Effective date of registration: 20210401 Address after: 350300 Yandou village, Yuanhong Industrial Zone, Fuqing City, Fuzhou City, Fujian Province Patentee after: Xinfuxing Glass Industry Group Co.,Ltd. Patentee after: FUZHOU XINFUXING GLASS Co.,Ltd. Patentee after: Fuzhou Xinfuxing Float Glass Co.,Ltd. Patentee after: Fujian Xinfuxing glass Intelligent Technology Co.,Ltd. Address before: 350300 Yandou village, Yuanhong Industrial Zone, Fuqing City, Fuzhou City, Fujian Province Patentee before: Xinfuxing Glass Industry Group Co.,Ltd. |
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TR01 | Transfer of patent right | ||
CP03 | Change of name, title or address |
Address after: 350300 Yandou village, Yuanhong Industrial Zone, Fuqing City, Fuzhou City, Fujian Province Patentee after: Xinfuxing Glass Industry Group Co.,Ltd. Country or region after: China Patentee after: FUZHOU XINFUXING GLASS Co.,Ltd. Patentee after: Fuzhou Xinfuxing Glass Technology Co.,Ltd. Patentee after: Fujian Xinfuxing glass Intelligent Technology Co.,Ltd. Address before: 350300 Yandou village, Yuanhong Industrial Zone, Fuqing City, Fuzhou City, Fujian Province Patentee before: Xinfuxing Glass Industry Group Co.,Ltd. Country or region before: China Patentee before: FUZHOU XINFUXING GLASS Co.,Ltd. Patentee before: Fuzhou Xinfuxing Float Glass Co.,Ltd. Patentee before: Fujian Xinfuxing glass Intelligent Technology Co.,Ltd. |
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CP03 | Change of name, title or address |