CN211013752U - Macrostructure thermal acid etching device - Google Patents

Macrostructure thermal acid etching device Download PDF

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Publication number
CN211013752U
CN211013752U CN201921546083.9U CN201921546083U CN211013752U CN 211013752 U CN211013752 U CN 211013752U CN 201921546083 U CN201921546083 U CN 201921546083U CN 211013752 U CN211013752 U CN 211013752U
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acid etching
acid
tank
heating
macrostructure
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CN201921546083.9U
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刘叶华
向伯荣
李斌
李东徽
唐晓晓
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Hunan Huae Microwave Technology Co ltd
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Hunan Huae Microwave Technology Co ltd
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Abstract

The utility model discloses a macrostructure heat acid etching device, including acid etching groove, work piece washing pond, acid etching liquid feeding device and to the microwave heating device who loses the liquid heating to the acid in the acid etching liquid feeding device, acid etching liquid feeding device and acid etching groove intercommunication. The microwave heating mode is adopted, so that the heating device is prevented from directly contacting the acid etching solution, and the aim of safely and reliably heating the acid etching solution is fulfilled; the microwave heating has the advantages of high temperature rising speed, high heating efficiency, great energy consumption saving and production cost reduction; the microwave heating device, the acid etching liquid supply device and the acid etching tank are all independent equipment units, and the charged element and the circuit are not in direct contact with the acid etching liquid and cannot be corroded by the acid etching liquid; the microwave does not directly heat the acid etching solution in the acid etching tank, but flows into the acid etching tank after being heated by the acid etching solution supply device, so that the potential safety hazard that workpieces of the existing equipment are directly contacted with and heat the acid etching solution and can explode is solved, and the safety is high.

Description

Macrostructure thermal acid etching device
Technical Field
The utility model relates to a metalworking technical field especially relates to a macrostructure heat acid loses device.
Background
In the smelting, casting, forging and heat treatment processes of metal materials, various defects are inevitably generated on the surface or inside of the metal under the influence of technological processes, environmental factors and the like, and further the quality and the service performance of products are influenced. As a common metal material, various common defects of steel, such as shrinkage cavity, hot working crack, looseness, segregation, non-metallic inclusion and the like, can be evaluated through macroscopic structure detection.
The macroscopic structure inspection of steel is an inspection method for inspecting macroscopic structure and defects of steel by visual inspection or a magnifying glass with the magnification of 10 times or less. The macrostructure is an important content reflecting the quality of the steel, and the uniform and compact macrostructure is a basic guarantee for reducing the internal defects of the steel and improving the service performance of the steel. The common steel macrostructure inspection methods comprise low sulfur imprint inspection, hot acid etching, cold acid etching, dendritic crystal corrosion and the like, wherein the macrostructure hot acid etching inspection is an inspection method which can reflect the internal structure and the defect type, shape and distribution of the steel most.
The macrostructure thermal acid etching inspection of the steel generally adopts GB/T226-2015 'macrostructure and defect acid etching detection method of steel', and according to the national standard, the acid etching of a macrostructure steel sample needs to meet 3 conditions: 1) acid liquor type and concentration: 1:1 industrial hydrochloric acid aqueous solution by volume ratio, 2) acid liquor temperature: 60-80 ℃, 3) acid etching time: the type of the steel and the specific acid etching requirement are related; and comparing the steel sample after the acid etching treatment with a GB/T1979-2001 structural steel macrostructure defect rating chart, thereby realizing the hot acid etching inspection of the macrostructure of the steel.
The common heating modes of the thermal acid etching equipment for the steel macrostructure are electric heating and steam heating. The electric heating generally uses a resistance rod to directly contact and heat the acid liquor or uses an electric furnace to heat an acid container, and has the defects that: 1) the heating speed is slower and uneven, 2) the safety is poor, the heating components and parts directly contact high-temperature and highly corrosive acid etching liquid, on one hand, the heating components and parts are easily corroded and have the risks of electric leakage and short circuit, on the other hand, the acid etching liquid in the acid etching groove is directly heated and easily generates acid mist, when the acid mist reaches a certain concentration, the explosion risk exists, 3) the equipment cost is high, the general material with good heat conduction is not acid-resistant, the heat conduction of the acid-resistant material is poor, although quartz glass can simultaneously meet the requirements of heat conduction and acid resistance, on the one hand, the quartz brittleness is large and the processing and forming performance is poor, and on the other hand, the risk of explosion also exists in the direct electric heating quartz container. In addition, the steam heating mode is generally used as a large production device for low-power thermal acid etching of steel, electrical heating is mostly adopted for experimental equipment, the steam heating has obvious defects, the thermal efficiency is low, the energy consumption is high, the concentration of acid etching liquid can be reduced by steam, the accuracy of the steel macrostructure inspection result is affected, and the production efficiency can be reduced if acid liquor is frequently replaced.
Chinese invention patent, application number: CN201510855271.X discloses a steel macrostructure acid etching groove, includes the acid etching ware of compriseing cell body and capping, still includes electromagnetic induction heating device, electromagnetic induction heating device includes response dish and heating plate, the cell body is arranged in on the response dish, the heating plate is located the bottom of cell body inner chamber. The heating plate is arranged in the inner cavity of the tank body, and is directly contacted with acid liquor in the heating process, so that danger is easy to occur.
Although the existing steel macrostructure thermal acid etching equipment can realize the control of heating temperature and time, the existing steel macrostructure thermal acid etching equipment lacks a monitoring measure for the quality of acid etching liquid, and can not supplement or replace the acid etching liquid in time, thereby influencing the evaluation of the steel macrostructure defects after acid etching.
SUMMERY OF THE UTILITY MODEL
The utility model discloses aim at solving one of the technical problem that exists among the prior art at least. Therefore, the utility model provides a macrostructure heat acid etching device, heating acid etching liquid that can be safe and reliable fast.
The utility model adopts the technical proposal that: a macrostructure thermal acid etching device comprises an acid etching tank, a workpiece cleaning pool, an acid etching liquid supply device and a microwave heating device for heating acid etching liquid in the acid etching liquid supply device, wherein the acid etching liquid supply device is communicated with the acid etching tank.
Preferably, the acid etching liquid supply device comprises a constant temperature tank and a heating pipe, the heating pipe is arranged in a microwave heating field of the microwave heating device, a liquid inlet and a liquid outlet of the heating pipe are communicated with the constant temperature tank through a first circulation pipeline, and the constant temperature tank is communicated with the acid etching tank through a second circulation pipeline.
The acid liquor heating device is characterized by further comprising a control system, wherein the control system comprises a thermocouple, a pH meter, an acid liquor supplementing device and a controller, the thermocouple and the pH meter are arranged in the constant temperature bath, the output ends of the thermocouple and the pH meter are connected with the controller, the acid liquor supplementing device is communicated with the constant temperature bath through an acid corrosion resistant pipeline, and the microwave heating device is electrically connected with the acid liquor supplementing device and the controller.
Further optimize, still include acid mist recovery unit, acid mist recovery unit includes that the acid mist collects cover and condensation purifier, the acid mist is collected the cover and is used for collecting the acid mist that the acid etching groove produced in the top of acid etching groove, the acid mist is collected the cover and is communicated with condensation purifier, condensation purifier communicates with the thermostatic bath.
Further optimizing, still include the waste liquid neutralization pond, be equipped with the waste liquid delivery pipe on the acid etching groove, waste liquid delivery pipe and waste liquid neutralization pond intercommunication.
Further preferably, the acid etching tank, the workpiece cleaning tank, the constant temperature tank and the pipeline are all made of PP materials.
Further preferably, the heating pipe is made of polytetrafluoroethylene materials.
The utility model has the advantages that: the microwave field generated by the microwave heating device penetrates through the container wall of the acid etching liquid supply device and then directly acts on the acid etching liquid, the self dielectric loss of the acid etching liquid in the microwave field is self-heated, the heating device is prevented from directly contacting with the acid etching liquid, and therefore the purpose of safely and reliably heating the acid etching liquid is achieved;
the microwave heating has the advantages of high temperature rising speed, high heating efficiency, great energy consumption saving and production cost reduction;
the microwave heating device, the acid etching liquid supply device and the acid etching tank are all independent equipment units, and the charged element and the circuit are not in direct contact with the acid etching liquid and cannot be corroded by the acid etching liquid;
the microwave does not directly heat the acid etching solution in the acid etching tank, but flows into the acid etching tank after being heated by the acid etching solution supply device, so that the potential safety hazard that workpieces of the existing equipment are directly contacted with and heat the acid etching solution and can explode is solved, and the safety is high.
Drawings
The present invention will be further described with reference to the accompanying drawings and embodiments.
Fig. 1 is a schematic structural diagram of an embodiment of the present invention.
Detailed Description
The macrostructure thermal etching apparatus according to the embodiment shown in fig. 1 includes an etching tank 100, a work cleaning tank 200, an etching liquid supply device, and a microwave heating device 400 for heating the etching liquid in the etching liquid supply device, and the etching liquid supply device is communicated with the etching tank 100.
The microwave field generated by the microwave heating device 400 penetrates through the container wall of the acid etching liquid supply device and then directly acts on the acid etching liquid, the self dielectric loss of the acid etching liquid in the microwave field is self-heated, the heating device is prevented from directly contacting with the acid etching liquid, and therefore the purpose of safely and reliably heating the acid etching liquid is achieved.
Heating the acid etching solution in the acid etching solution supply device to 60-80 ℃, then flowing into the acid etching tank 100, putting the workpiece to be subjected to acid etching into the acid etching tank 100, taking out the workpiece after specified acid etching for a certain time, washing away the acid solution remained on the workpiece through the workpiece cleaning pool 200, and then carrying out the next tissue inspection.
The microwave heating has the advantages of high temperature rising speed, high heating efficiency, great energy consumption saving and production cost reduction;
the microwave heating device 400, the acid etching solution supply device and the acid etching tank 100 are all independent equipment units, and the charged elements and circuits in the thermal acid etching device are not directly contacted with the acid etching solution, so that the device is not corroded by the acid etching solution;
the microwave heating device 400 does not directly heat the acid etching solution in the acid etching tank 100, but heats the acid etching solution in the acid etching solution supply device and then flows into the acid etching tank 100, so that the potential safety hazard that the workpiece of the existing equipment is directly contacted with and heats the acid etching solution and can explode is solved, and the safety is high.
Further, the acid etching solution supply device includes a constant temperature tank 310 and a heating pipe 320, the heating pipe 320 is disposed in a microwave heating field of the microwave heating device 400, a liquid inlet and a liquid outlet of the heating pipe 320 are communicated with the constant temperature tank 310 through a first circulation pipeline 910, and the constant temperature tank 310 is communicated with the acid etching tank 100 through a second circulation pipeline 920.
The utility model discloses an acid etching liquid feeding device also can adopt other modes, if directly choose for use the constant temperature tank 310, the constant temperature tank 310 is made by the material that can pass through the ripples, and the microwave that microwave heating device 400 produced directly uses the acid etching liquid in the constant temperature tank 310.
When the thermal acid etching device works, the delivery pump device of the first circulation pipeline 910 is started, the acid etching liquid in the thermostatic bath 310 enters the heating pipe 320 along the first circulation pipeline 910, the microwave field generated by the microwave heating device 400 is used for heating the acid etching liquid in the heating pipe 320, and the heated acid etching liquid flows into the thermostatic bath 310 again, the thermostatic bath 310 maintains a relatively sealed environment, so that heat loss is reduced, and the temperature of the acid etching liquid in the thermostatic bath 310 is ensured to be maintained in a relatively stable range.
After the acid etching solution in the constant temperature tank 310 reaches the set temperature (60-80 ℃), the delivery pump of the second circulation pipeline 920 is opened, and the acid etching solution in the constant temperature tank 310 is delivered to the acid etching tank 100. The acid liquor in the acid etching tank 100 and the constant temperature tank 310 is in a continuous circulation and exchange process, so that the condition that the temperature of the acid etching liquor in the acid etching tank 100 is reduced due to heat loss is continuously supplemented; and continuously replenishing the acid solution consumed by the acid etching tank 100 to ensure that the acid solution has sufficient acid solution concentration.
Further, the device comprises a control system, wherein the control system comprises a thermocouple 610, a pH meter 620, an acid liquid supplementing device 630 and a controller, the thermocouple 610 and the pH meter 620 are arranged in the constant temperature bath 310, the output ends of the thermocouple 610 and the pH meter 620 are connected with the controller, the acid liquid supplementing device 630 is communicated with the constant temperature bath 310 through an acid corrosion resistant pipeline, and the microwave heating device 400 and the acid liquid supplementing device 630 are both electrically connected with the controller.
Because the temperature of the acid etching solution is kept at 60-80 ℃, the heat of the acid etching solution in the acid etching tank 100 is greatly absorbed and lost in the acid etching process of the workpiece. Therefore, the temperature of the etching solution in the etching solution tank 100 and the constant temperature tank 310 is continuously decreased. When the thermocouple 610 detects that the temperature in the thermostatic bath 310 is lower than the set temperature, it feeds back to the controller. The controller restarts the microwave heating device 400 and the first circulation line 910 to heat the etching solution again, and stops heating until the etching solution in the constant temperature bath 310 is heated to the set temperature. It should be noted that, since the acid etching tank 100 is of an open design, it is not suitable to provide the thermocouple 610 and the pH meter 620 in the acid etching tank 100.
Meanwhile, as the acid etching process is performed, the acid solution in the acid etching tank 100 is continuously consumed, the concentration of the acid etching solution is continuously reduced, and when the pH meter 620 monitors that the concentration of the acid etching solution is lower than a set concentration threshold, the controller is fed back to control the acid solution supplementing device 630 to supplement the acid solution into the constant temperature tank 310, so that the consumed acid solution in the acid etching solution is supplemented, the concentration of the acid solution is increased, and the acid solution in the acid etching tank is ensured to be kept in a reasonable range.
Further, the acid mist recovery device is further included, the acid mist recovery device comprises an acid mist collection cover 710 and a condensation purification device 720, the acid mist collection cover 710 is arranged above the acid etching tank 100 and is used for collecting acid mist generated by the acid etching tank 100, the acid mist collection cover 710 is communicated with the condensation purification device 720 through an acid etching resistant pipeline, and the condensation purification device 720 is communicated with the constant temperature tank 310.
The acid etching solution generally adopts 1:1 industrial hydrochloric acid aqueous solution, and hydrochloric acid is easy to generate acid mist in the using process, particularly after being heated, and can cause environmental pollution if directly discharged without treatment. This application is through setting up acid mist recovery unit, during production, starts fan 730, and the acid mist that acid etching groove 100 produced is collected cover 710 by the acid mist and is absorbed, and through the condensation purifier 720 condensation effect becomes liquid and retrieves to thermostatic bath 310, can not only solve prior art acid mist and discharge the drawback of polluted environment, can also reduce the raw materials extravagant and reduction in production cost.
Further, the acid etching device further comprises a waste liquid neutralizing pool 800, wherein a waste liquid discharging pipe is arranged on the acid etching tank 100 and is communicated with the waste liquid neutralizing pool 800.
After the acid etching solution is used for a long time, the acid etching solution in the acid etching tank 100 needs to be completely discharged, a brand new acid etching solution is replaced, the waste acid solution is discharged into the neutralization tank 800 for neutralization, a pH meter can be arranged in the neutralization tank 800 to monitor whether the waste acid solution is completely neutralized, and further discharge treatment is performed after the neutralization is completely neutralized.
Further, the acid etching tank 100, the workpiece cleaning tank 200, the constant temperature tank 310, and the piping in the apparatus are made of PP material. The PP still has good acid resistance, alkali resistance, salt solution resistance and various organic solvents at the temperature of 80 ℃, and is not easy to deform, thereby prolonging the service life of equipment.
Further, the heating pipe 320 is made of polytetrafluoroethylene material, and the polytetrafluoroethylene has excellent chemical stability and corrosion resistance, so that the service life of the equipment is prolonged.
Of course, the present invention is not limited to the above-mentioned embodiments, and those skilled in the art can make equivalent modifications or substitutions without departing from the spirit of the present invention, and such equivalent modifications or substitutions are included in the scope defined by the claims of the present application.

Claims (7)

1. A macrostructure thermal acid etching device is characterized in that: the device comprises an acid etching tank (100), a workpiece cleaning pool (200), an acid etching liquid supply device and a microwave heating device (400) for heating the acid etching liquid in the acid etching liquid supply device, wherein the acid etching liquid supply device is communicated with the acid etching tank (100).
2. The macrostructure thermal acid etching apparatus according to claim 1, wherein: the acid etching liquid supply device comprises a constant temperature tank (310) and a heating pipe (320), the heating pipe (320) is arranged in a microwave heating field of the microwave heating device (400), a liquid inlet and a liquid outlet of the heating pipe (320) are communicated with the constant temperature tank (310) through a first circulating pipeline (910), and the constant temperature tank (310) is communicated with the acid etching tank (100) through a second circulating pipeline (920).
3. The macrostructure thermal acid etching apparatus according to claim 2, wherein: the acid liquor heating device is characterized by further comprising a control system, wherein the control system comprises a thermocouple (610), a pH meter (620), an acid liquor supplementing device (630) and a controller, the thermocouple (610) and the pH meter (620) are arranged in the constant temperature bath (310), the output ends of the thermocouple (610) and the pH meter (620) are connected with the controller, the acid liquor supplementing device (630) is communicated with the constant temperature bath (310), and the microwave heating device (400) and the acid liquor supplementing device (630) are both electrically connected with the controller.
4. The macrostructure thermal acid etching apparatus according to claim 3, wherein: still include acid mist recovery unit, acid mist recovery unit includes that acid mist collects cover (710) and condensation purifier (720), acid mist collection cover (710) is established and is used for collecting the acid mist that acid etching groove (100) produced in the top of acid etching groove (100), acid mist collection cover (710) and condensation purifier (720) intercommunication, condensation purifier (720) and constant temperature tank (310) intercommunication.
5. The macrostructure thermal acid etching apparatus according to any one of claims 1 to 4, wherein: the acid etching device is characterized by further comprising a waste liquid neutralizing pool (800), wherein a waste liquid discharging pipe is arranged on the acid etching groove (100), and the waste liquid discharging pipe is communicated with the waste liquid neutralizing pool (800).
6. The macrostructure thermal acid etching apparatus according to any one of claims 2 to 4, wherein: the acid etching tank (100), the workpiece cleaning pool (200) and the constant temperature tank (310) are all made of PP materials.
7. The macrostructure thermal acid etching apparatus according to any one of claims 2 to 4, wherein: the heating tube (320) is made of a polytetrafluoroethylene material.
CN201921546083.9U 2019-09-17 2019-09-17 Macrostructure thermal acid etching device Active CN211013752U (en)

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Application Number Priority Date Filing Date Title
CN201921546083.9U CN211013752U (en) 2019-09-17 2019-09-17 Macrostructure thermal acid etching device

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Application Number Priority Date Filing Date Title
CN201921546083.9U CN211013752U (en) 2019-09-17 2019-09-17 Macrostructure thermal acid etching device

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CN211013752U true CN211013752U (en) 2020-07-14

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110595858A (en) * 2019-09-17 2019-12-20 湖南华冶微波科技有限公司 Macrostructure thermal acid etching device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110595858A (en) * 2019-09-17 2019-12-20 湖南华冶微波科技有限公司 Macrostructure thermal acid etching device

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