CN110595858A - Macrostructure thermal acid etching device - Google Patents
Macrostructure thermal acid etching device Download PDFInfo
- Publication number
- CN110595858A CN110595858A CN201910875216.5A CN201910875216A CN110595858A CN 110595858 A CN110595858 A CN 110595858A CN 201910875216 A CN201910875216 A CN 201910875216A CN 110595858 A CN110595858 A CN 110595858A
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- acid etching
- acid
- tank
- heating
- macrostructure
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- 239000002253 acid Substances 0.000 title claims abstract description 215
- 238000005530 etching Methods 0.000 title claims abstract description 166
- 238000010438 heat treatment Methods 0.000 claims abstract description 74
- 239000007788 liquid Substances 0.000 claims abstract description 65
- 238000004140 cleaning Methods 0.000 claims abstract description 8
- 239000003595 mist Substances 0.000 claims description 25
- 239000002699 waste material Substances 0.000 claims description 13
- 238000009833 condensation Methods 0.000 claims description 11
- 230000005494 condensation Effects 0.000 claims description 11
- 230000001502 supplementing effect Effects 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 8
- 238000011084 recovery Methods 0.000 claims description 7
- 230000003472 neutralizing effect Effects 0.000 claims description 4
- -1 polytetrafluoroethylene Polymers 0.000 claims description 4
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 4
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 4
- 238000007599 discharging Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 238000005265 energy consumption Methods 0.000 abstract description 4
- 230000009467 reduction Effects 0.000 abstract description 4
- 230000000630 rising effect Effects 0.000 abstract description 3
- 239000000243 solution Substances 0.000 description 42
- 229910000831 Steel Inorganic materials 0.000 description 21
- 239000010959 steel Substances 0.000 description 21
- 230000007547 defect Effects 0.000 description 10
- 238000007689 inspection Methods 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 238000006386 neutralization reaction Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 210000005056 cell body Anatomy 0.000 description 3
- 238000005485 electric heating Methods 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 208000028659 discharge Diseases 0.000 description 2
- 230000005674 electromagnetic induction Effects 0.000 description 2
- 238000004880 explosion Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 239000013589 supplement Substances 0.000 description 2
- 238000003723 Smelting Methods 0.000 description 1
- 229910000746 Structural steel Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000004063 acid-resistant material Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000005242 forging Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/32—Polishing; Etching
Abstract
The invention discloses a macrostructure thermal acid etching device which comprises an acid etching tank, a workpiece cleaning pool, an acid etching liquid supply device and a microwave heating device for heating acid etching liquid in the acid etching liquid supply device, wherein the acid etching liquid supply device is communicated with the acid etching tank. The microwave heating mode is adopted, so that the heating device is prevented from directly contacting the acid etching solution, and the aim of safely and reliably heating the acid etching solution is fulfilled; the microwave heating has the advantages of high temperature rising speed, high heating efficiency, great energy consumption saving and production cost reduction; the microwave heating device, the acid etching liquid supply device and the acid etching tank are all independent equipment units, and the charged element and the circuit are not in direct contact with the acid etching liquid and cannot be corroded by the acid etching liquid; the microwave does not directly heat the acid etching solution in the acid etching tank, but flows into the acid etching tank after being heated by the acid etching solution supply device, so that the potential safety hazard that workpieces of the existing equipment are directly contacted with and heat the acid etching solution and can explode is solved, and the safety is high.
Description
Technical Field
The invention relates to the technical field of metal processing, in particular to a macrostructure thermal acid etching device.
Background
In the smelting, casting, forging and heat treatment processes of metal materials, various defects are inevitably generated on the surface or inside of the metal under the influence of technological processes, environmental factors and the like, and further the quality and the service performance of products are influenced. As a common metal material, various common defects of steel, such as shrinkage cavity, hot working crack, looseness, segregation, non-metallic inclusion and the like, can be evaluated through macroscopic structure detection.
The macroscopic structure inspection of steel is an inspection method for inspecting macroscopic structure and defects of steel by visual inspection or a magnifying glass with the magnification of 10 times or less. The macrostructure is an important content reflecting the quality of the steel, and the uniform and compact macrostructure is a basic guarantee for reducing the internal defects of the steel and improving the service performance of the steel. The common steel macrostructure inspection methods comprise low sulfur imprint inspection, hot acid etching, cold acid etching, dendritic crystal corrosion and the like, wherein the macrostructure hot acid etching inspection is an inspection method which can reflect the internal structure and the defect type, shape and distribution of the steel most.
The macrostructure thermal acid etching inspection of the steel generally adopts GB/T226-2015 'macrostructure and defect acid etching detection method of steel', and according to the national standard, the acid etching of a macrostructure steel sample needs to meet 3 conditions: 1) acid liquor type and concentration: 1:1 industrial hydrochloric acid aqueous solution by volume ratio, 2) acid liquor temperature: 60-80 ℃, 3) acid etching time: the type of the steel and the specific acid etching requirement are related; and comparing the steel sample after the acid etching treatment with a GB/T1979-2001 structural steel macrostructure defect rating chart, thereby realizing the hot acid etching inspection of the macrostructure of the steel.
The common heating modes of the thermal acid etching equipment for the steel macrostructure are electric heating and steam heating. The electric heating generally uses a resistance rod to directly contact and heat the acid liquor or uses an electric furnace to heat an acid container, and has the defects that: 1) the heating speed is slower and uneven, 2) the safety is poor, the heating components and parts directly contact high-temperature and highly corrosive acid etching liquid, on one hand, the heating components and parts are easily corroded and have the risks of electric leakage and short circuit, on the other hand, the acid etching liquid in the acid etching groove is directly heated and easily generates acid mist, when the acid mist reaches a certain concentration, the explosion risk exists, 3) the equipment cost is high, the general material with good heat conduction is not acid-resistant, the heat conduction of the acid-resistant material is poor, although quartz glass can simultaneously meet the requirements of heat conduction and acid resistance, on the one hand, the quartz brittleness is large and the processing and forming performance is poor, and on the other hand, the risk of explosion also exists in the direct electric heating quartz container. In addition, the steam heating mode is generally used as a large production device for low-power thermal acid etching of steel, electrical heating is mostly adopted for experimental equipment, the steam heating has obvious defects, the thermal efficiency is low, the energy consumption is high, the concentration of acid etching liquid can be reduced by steam, the accuracy of the steel macrostructure inspection result is affected, and the production efficiency can be reduced if acid liquor is frequently replaced.
Chinese invention patent, application number: CN201510855271.X discloses a steel macrostructure acid etching groove, includes the acid etching ware of compriseing cell body and capping, still includes electromagnetic induction heating device, electromagnetic induction heating device includes response dish and heating plate, the cell body is arranged in on the response dish, the heating plate is located the bottom of cell body inner chamber. The heating plate is arranged in the inner cavity of the tank body, and is directly contacted with acid liquor in the heating process, so that danger is easy to occur.
Although the existing steel macrostructure thermal acid etching equipment can realize the control of heating temperature and time, the existing steel macrostructure thermal acid etching equipment lacks a monitoring measure for the quality of acid etching liquid, and can not supplement or replace the acid etching liquid in time, thereby influencing the evaluation of the steel macrostructure defects after acid etching.
Disclosure of Invention
The present invention is directed to solving at least one of the problems of the prior art. Therefore, the invention provides a macrostructure thermal acid etching device which can heat acid etching liquid quickly, safely and reliably.
The technical scheme adopted by the invention is as follows: a macrostructure thermal acid etching device comprises an acid etching tank, a workpiece cleaning pool, an acid etching liquid supply device and a microwave heating device for heating acid etching liquid in the acid etching liquid supply device, wherein the acid etching liquid supply device is communicated with the acid etching tank.
Preferably, the acid etching liquid supply device comprises a constant temperature tank and a heating pipe, the heating pipe is arranged in a microwave heating field of the microwave heating device, a liquid inlet and a liquid outlet of the heating pipe are communicated with the constant temperature tank through a first circulation pipeline, and the constant temperature tank is communicated with the acid etching tank through a second circulation pipeline.
The acid liquor heating device is characterized by further comprising a control system, wherein the control system comprises a thermocouple, a pH meter, an acid liquor supplementing device and a controller, the thermocouple and the pH meter are arranged in the constant temperature bath, the output ends of the thermocouple and the pH meter are connected with the controller, the acid liquor supplementing device is communicated with the constant temperature bath through an acid corrosion resistant pipeline, and the microwave heating device is electrically connected with the acid liquor supplementing device and the controller.
Further optimize, still include acid mist recovery unit, acid mist recovery unit includes that the acid mist collects cover and condensation purifier, the acid mist is collected the cover and is used for collecting the acid mist that the acid etching groove produced in the top of acid etching groove, the acid mist is collected the cover and is communicated with condensation purifier, condensation purifier communicates with the thermostatic bath.
Further optimizing, still include the waste liquid neutralization pond, be equipped with the waste liquid delivery pipe on the acid etching groove, waste liquid delivery pipe and waste liquid neutralization pond intercommunication.
Further preferably, the acid etching tank, the workpiece cleaning tank, the constant temperature tank and the pipeline are all made of PP materials.
Further preferably, the heating pipe is made of polytetrafluoroethylene materials.
The invention has the beneficial effects that: the microwave field generated by the microwave heating device penetrates through the container wall of the acid etching liquid supply device and then directly acts on the acid etching liquid, the self dielectric loss of the acid etching liquid in the microwave field is self-heated, the heating device is prevented from directly contacting with the acid etching liquid, and therefore the purpose of safely and reliably heating the acid etching liquid is achieved;
the microwave heating has the advantages of high temperature rising speed, high heating efficiency, great energy consumption saving and production cost reduction;
the microwave heating device, the acid etching liquid supply device and the acid etching tank are all independent equipment units, and the charged element and the circuit are not in direct contact with the acid etching liquid and cannot be corroded by the acid etching liquid;
the microwave does not directly heat the acid etching solution in the acid etching tank, but flows into the acid etching tank after being heated by the acid etching solution supply device, so that the potential safety hazard that workpieces of the existing equipment are directly contacted with and heat the acid etching solution and can explode is solved, and the safety is high.
Drawings
The invention is further described with reference to the following figures and embodiments.
Fig. 1 is a schematic structural diagram of an embodiment of the present invention.
Detailed Description
The macrostructure thermal etching apparatus according to the embodiment shown in fig. 1 includes an etching tank 100, a work cleaning tank 200, an etching liquid supply device, and a microwave heating device 400 for heating the etching liquid in the etching liquid supply device, and the etching liquid supply device is communicated with the etching tank 100.
The microwave field generated by the microwave heating device 400 penetrates through the container wall of the acid etching liquid supply device and then directly acts on the acid etching liquid, the self dielectric loss of the acid etching liquid in the microwave field is self-heated, the heating device is prevented from directly contacting with the acid etching liquid, and therefore the purpose of safely and reliably heating the acid etching liquid is achieved.
Heating the acid etching solution in the acid etching solution supply device to 60-80 ℃, then flowing into the acid etching tank 100, putting the workpiece to be subjected to acid etching into the acid etching tank 100, taking out the workpiece after specified acid etching for a certain time, washing away the acid solution remained on the workpiece through the workpiece cleaning pool 200, and then carrying out the next tissue inspection.
The microwave heating has the advantages of high temperature rising speed, high heating efficiency, great energy consumption saving and production cost reduction;
the microwave heating device 400, the acid etching solution supply device and the acid etching tank 100 are all independent equipment units, and the charged elements and circuits in the thermal acid etching device are not directly contacted with the acid etching solution, so that the device is not corroded by the acid etching solution;
the microwave heating device 400 does not directly heat the acid etching solution in the acid etching tank 100, but heats the acid etching solution in the acid etching solution supply device and then flows into the acid etching tank 100, so that the potential safety hazard that the workpiece of the existing equipment is directly contacted with and heats the acid etching solution and can explode is solved, and the safety is high.
Further, the acid etching solution supply device includes a constant temperature tank 310 and a heating pipe 320, the heating pipe 320 is disposed in a microwave heating field of the microwave heating device 400, a liquid inlet and a liquid outlet of the heating pipe 320 are communicated with the constant temperature tank 310 through a first circulation pipeline 910, and the constant temperature tank 310 is communicated with the acid etching tank 100 through a second circulation pipeline 920.
The acid etching solution supply device of the present invention may also adopt other manners, such as directly selecting the constant temperature bath 310, wherein the constant temperature bath 310 is made of a material that is transparent to waves, and the microwaves generated by the microwave heating device 400 directly act on the acid etching solution in the constant temperature bath 310.
When the thermal acid etching device works, the delivery pump device of the first circulation pipeline 910 is started, the acid etching liquid in the thermostatic bath 310 enters the heating pipe 320 along the first circulation pipeline 910, the microwave field generated by the microwave heating device 400 is used for heating the acid etching liquid in the heating pipe 320, and the heated acid etching liquid flows into the thermostatic bath 310 again, the thermostatic bath 310 maintains a relatively sealed environment, so that heat loss is reduced, and the temperature of the acid etching liquid in the thermostatic bath 310 is ensured to be maintained in a relatively stable range.
After the acid etching solution in the constant temperature tank 310 reaches the set temperature (60-80 ℃), the delivery pump of the second circulation pipeline 920 is opened, and the acid etching solution in the constant temperature tank 310 is delivered to the acid etching tank 100. The acid liquor in the acid etching tank 100 and the constant temperature tank 310 is in a continuous circulation and exchange process, so that the condition that the temperature of the acid etching liquor in the acid etching tank 100 is reduced due to heat loss is continuously supplemented; and continuously replenishing the acid solution consumed by the acid etching tank 100 to ensure that the acid solution has sufficient acid solution concentration.
Further, the device comprises a control system, wherein the control system comprises a thermocouple 610, a pH meter 620, an acid liquid supplementing device 630 and a controller, the thermocouple 610 and the pH meter 620 are arranged in the constant temperature bath 310, the output ends of the thermocouple 610 and the pH meter 620 are connected with the controller, the acid liquid supplementing device 630 is communicated with the constant temperature bath 310 through an acid corrosion resistant pipeline, and the microwave heating device 400 and the acid liquid supplementing device 630 are both electrically connected with the controller.
Because the temperature of the acid etching solution is kept at 60-80 ℃, the heat of the acid etching solution in the acid etching tank 100 is greatly absorbed and lost in the acid etching process of the workpiece. Therefore, the temperature of the etching solution in the etching solution tank 100 and the constant temperature tank 310 is continuously decreased. When the thermocouple 610 detects that the temperature in the thermostatic bath 310 is lower than the set temperature, it feeds back to the controller. The controller restarts the microwave heating device 400 and the first circulation line 910 to heat the etching solution again, and stops heating until the etching solution in the constant temperature bath 310 is heated to the set temperature. It should be noted that, since the acid etching tank 100 is of an open design, it is not suitable to provide the thermocouple 610 and the pH meter 620 in the acid etching tank 100.
Meanwhile, as the acid etching process is performed, the acid solution in the acid etching tank 100 is continuously consumed, the concentration of the acid etching solution is continuously reduced, and when the pH meter 620 monitors that the concentration of the acid etching solution is lower than a set concentration threshold, the controller is fed back to control the acid solution supplementing device 630 to supplement the acid solution into the constant temperature tank 310, so that the consumed acid solution in the acid etching solution is supplemented, the concentration of the acid solution is increased, and the acid solution in the acid etching tank is ensured to be kept in a reasonable range.
Further, the acid mist recovery device is further included, the acid mist recovery device comprises an acid mist collection cover 710 and a condensation purification device 720, the acid mist collection cover 710 is arranged above the acid etching tank 100 and is used for collecting acid mist generated by the acid etching tank 100, the acid mist collection cover 710 is communicated with the condensation purification device 720 through an acid etching resistant pipeline, and the condensation purification device 720 is communicated with the constant temperature tank 310.
The acid etching solution generally adopts 1:1 industrial hydrochloric acid aqueous solution, and hydrochloric acid is easy to generate acid mist in the using process, particularly after being heated, and can cause environmental pollution if directly discharged without treatment. This application is through setting up acid mist recovery unit, during production, starts fan 730, and the acid mist that acid etching groove 100 produced is collected cover 710 by the acid mist and is absorbed, and through the condensation purifier 720 condensation effect becomes liquid and retrieves to thermostatic bath 310, can not only solve prior art acid mist and discharge the drawback of polluted environment, can also reduce the raw materials extravagant and reduction in production cost.
Further, the acid etching device further comprises a waste liquid neutralizing pool 800, wherein a waste liquid discharging pipe is arranged on the acid etching tank 100 and is communicated with the waste liquid neutralizing pool 800.
After the acid etching solution is used for a long time, the acid etching solution in the acid etching tank 100 needs to be completely discharged, a brand new acid etching solution is replaced, the waste acid solution is discharged into the neutralization tank 800 for neutralization, a pH meter can be arranged in the neutralization tank 800 to monitor whether the waste acid solution is completely neutralized, and further discharge treatment is performed after the neutralization is completely neutralized.
Further, the acid etching tank 100, the workpiece cleaning tank 200, the constant temperature tank 310, and the piping in the apparatus are made of PP material. The PP still has good acid resistance, alkali resistance, salt solution resistance and various organic solvents at the temperature of 80 ℃, and is not easy to deform, thereby prolonging the service life of equipment.
Further, the heating pipe 320 is made of polytetrafluoroethylene material, and the polytetrafluoroethylene has excellent chemical stability and corrosion resistance, so that the service life of the equipment is prolonged.
The present invention is not limited to the above-described embodiments, and those skilled in the art can make equivalent modifications or substitutions without departing from the spirit of the present invention, and such equivalent modifications or substitutions are included in the scope defined by the claims of the present application.
Claims (7)
1. A macrostructure thermal acid etching device is characterized in that: the device comprises an acid etching tank (100), a workpiece cleaning pool (200), an acid etching liquid supply device and a microwave heating device (400) for heating the acid etching liquid in the acid etching liquid supply device, wherein the acid etching liquid supply device is communicated with the acid etching tank (100).
2. The macrostructure thermal acid etching apparatus according to claim 1, wherein: the acid etching liquid supply device comprises a constant temperature tank (310) and a heating pipe (320), the heating pipe (320) is arranged in a microwave heating field of the microwave heating device (400), a liquid inlet and a liquid outlet of the heating pipe (320) are communicated with the constant temperature tank (310) through a first circulating pipeline (910), and the constant temperature tank (310) is communicated with the acid etching tank (100) through a second circulating pipeline (920).
3. The macrostructure thermal acid etching apparatus according to claim 2, wherein: the acid liquor heating device is characterized by further comprising a control system, wherein the control system comprises a thermocouple (610), a pH meter (620), an acid liquor supplementing device (630) and a controller, the thermocouple (610) and the pH meter (620) are arranged in the constant temperature bath (310), the output ends of the thermocouple (610) and the pH meter (620) are connected with the controller, the acid liquor supplementing device (630) is communicated with the constant temperature bath (310), and the microwave heating device (400) and the acid liquor supplementing device (630) are both electrically connected with the controller.
4. The macrostructure thermal acid etching apparatus according to claim 3, wherein: still include acid mist recovery unit, acid mist recovery unit includes that acid mist collects cover (710) and condensation purifier (720), acid mist collection cover (710) is established and is used for collecting the acid mist that acid etching groove (100) produced in the top of acid etching groove (100), acid mist collection cover (710) and condensation purifier (720) intercommunication, condensation purifier (720) and constant temperature tank (310) intercommunication.
5. The macrostructure thermal acid etching apparatus according to any one of claims 1 to 4, wherein: the acid etching device is characterized by further comprising a waste liquid neutralizing pool (800), wherein a waste liquid discharging pipe is arranged on the acid etching groove (100), and the waste liquid discharging pipe is communicated with the waste liquid neutralizing pool (800).
6. The macrostructure thermal acid etching apparatus according to any one of claims 2 to 4, wherein: the acid etching tank (100), the workpiece cleaning pool (200) and the constant temperature tank (310) are all made of PP materials.
7. The macrostructure thermal acid etching apparatus according to any one of claims 2 to 4, wherein: the heating tube (320) is made of a polytetrafluoroethylene material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910875216.5A CN110595858A (en) | 2019-09-17 | 2019-09-17 | Macrostructure thermal acid etching device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910875216.5A CN110595858A (en) | 2019-09-17 | 2019-09-17 | Macrostructure thermal acid etching device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110595858A true CN110595858A (en) | 2019-12-20 |
Family
ID=68860348
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910875216.5A Pending CN110595858A (en) | 2019-09-17 | 2019-09-17 | Macrostructure thermal acid etching device |
Country Status (1)
| Country | Link |
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| CN (1) | CN110595858A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114635134A (en) * | 2022-03-01 | 2022-06-17 | 中国原子能科学研究院 | Acid etching system |
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|---|---|---|---|---|
| JPH11168081A (en) * | 1997-12-03 | 1999-06-22 | Hitachi Ltd | Wet etching method and equipment |
| CN101914778A (en) * | 2010-08-11 | 2010-12-15 | 昆明理工大学 | Microwave heating device for heating cold-rolling pickling process medium |
| CN101935845A (en) * | 2010-08-19 | 2011-01-05 | 昆明理工大学 | Method for heating titanium strip cleaning acid liquor by using microwave heater |
| CN202849545U (en) * | 2012-09-25 | 2013-04-03 | 广州中国科学院先进技术研究所 | Acid etching system device |
| CN203148748U (en) * | 2013-02-01 | 2013-08-21 | 耐博检测技术(上海)有限公司 | Macrostructure and defect acid etching system of steel |
| CN105334155A (en) * | 2015-11-30 | 2016-02-17 | 襄阳丰正汽车配件制造有限公司 | Rolled steel macrostructure hot acid etching device |
| CN205826385U (en) * | 2016-03-07 | 2016-12-21 | 晋西工业集团有限责任公司 | A kind of steel Macroscopic tissue heat acid attack device |
| CN107377551A (en) * | 2017-08-02 | 2017-11-24 | 贾振国 | A kind of microwave heating atomization washer |
| CN211013752U (en) * | 2019-09-17 | 2020-07-14 | 湖南华冶微波科技有限公司 | Macrostructure thermal acid etching device |
-
2019
- 2019-09-17 CN CN201910875216.5A patent/CN110595858A/en active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11168081A (en) * | 1997-12-03 | 1999-06-22 | Hitachi Ltd | Wet etching method and equipment |
| CN101914778A (en) * | 2010-08-11 | 2010-12-15 | 昆明理工大学 | Microwave heating device for heating cold-rolling pickling process medium |
| CN101935845A (en) * | 2010-08-19 | 2011-01-05 | 昆明理工大学 | Method for heating titanium strip cleaning acid liquor by using microwave heater |
| CN202849545U (en) * | 2012-09-25 | 2013-04-03 | 广州中国科学院先进技术研究所 | Acid etching system device |
| CN203148748U (en) * | 2013-02-01 | 2013-08-21 | 耐博检测技术(上海)有限公司 | Macrostructure and defect acid etching system of steel |
| CN105334155A (en) * | 2015-11-30 | 2016-02-17 | 襄阳丰正汽车配件制造有限公司 | Rolled steel macrostructure hot acid etching device |
| CN205826385U (en) * | 2016-03-07 | 2016-12-21 | 晋西工业集团有限责任公司 | A kind of steel Macroscopic tissue heat acid attack device |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114635134A (en) * | 2022-03-01 | 2022-06-17 | 中国原子能科学研究院 | Acid etching system |
| CN114635134B (en) * | 2022-03-01 | 2023-10-27 | 中国原子能科学研究院 | Acid etching system |
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