CN210816624U - Quartz wafer's round edge belt cleaning device - Google Patents
Quartz wafer's round edge belt cleaning device Download PDFInfo
- Publication number
- CN210816624U CN210816624U CN201921707654.2U CN201921707654U CN210816624U CN 210816624 U CN210816624 U CN 210816624U CN 201921707654 U CN201921707654 U CN 201921707654U CN 210816624 U CN210816624 U CN 210816624U
- Authority
- CN
- China
- Prior art keywords
- cylinder
- cleaning
- quartz wafer
- motor
- quartz
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 50
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 47
- 239000010453 quartz Substances 0.000 title claims abstract description 46
- 230000007246 mechanism Effects 0.000 claims abstract description 17
- 235000012431 wafers Nutrition 0.000 claims description 34
- 239000007788 liquid Substances 0.000 claims description 10
- 238000005406 washing Methods 0.000 abstract description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 239000013078 crystal Substances 0.000 description 3
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052592 oxide mineral Inorganic materials 0.000 description 1
- 229910052646 quartz group Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
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- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model provides a quartz wafer's round edge belt cleaning device relates to quartz wafer production and processing equipment field, clean mechanism and clean jar including two symmetry settings, clean mechanism includes first cylinder and locates the brace table of first cylinder top, the lower surface of brace table is connected to the first piston rod of first cylinder, the upper surface of brace table is equipped with the second cylinder, the one end of motor is connected through the connecting piece to the second piston rod of second cylinder, the other end of motor is equipped with the pivot, the motor drive pivot carries out the rotation in the same direction as the pointer direction, the one end of the one end connecting plate of pivot, the other end of splint passes through the connecting plate and connects the sponge board, the centre gripping has quartz wafer between two sponge boards of two clean mechanisms, quartz wafer's below is located to the washing jar, the rotation that the washing jar can hold quartz wafer. The utility model discloses stable in structure washs the position accuracy, convenient to use, and the commonality is strong.
Description
Technical Field
The utility model belongs to quartz wafer production and processing equipment art field, concretely relates to quartz wafer's round edge belt cleaning device.
Background
The chemical composition of the quartz crystal is SiO2The crystal belongs to oxide minerals of trigonal system, namely low-temperature quartz, and is one of the most widely distributed mineral species in quartz group minerals. Quartz in its broadest sense also includes high temperature quartz. In the process of manufacturing a quartz crystal into a quartz wafer, the round edge is poorly cleaned, and therefore, it is generally cleaned using a cleaning apparatus. The existing round edge cleaning device for the quartz wafers is easy to displace in the using process, so that the cleaning part is unstable, and the device is difficult to be applied to the quartz wafers with different specifications, thereby wasting the cost.
Therefore, it is urgently needed to provide a quartz wafer round edge cleaning device which has the advantages of stable structure, accurate cleaning part, convenient use and strong universality.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing a quartz wafer's round edge belt cleaning device to the not enough of current quartz wafer's round edge belt cleaning device.
The utility model provides a following technical scheme:
the utility model provides a quartz wafer's round edge belt cleaning device, includes clean mechanism and the clean jar that two symmetries set up, clean mechanism includes first cylinder and locates the brace table of first cylinder top, the first piston rod of first cylinder is connected the lower surface of brace table, the upper surface of brace table is equipped with the second cylinder, the second piston rod of second cylinder passes through the one end that the motor was connected to the connecting piece, the other end of motor is equipped with the pivot, motor drive the pivot carries out the rotation in the same direction as the pointer direction, splint's one end is connected to the one end of pivot, the other end of splint passes through the connecting plate and connects the sponge board, two the centre gripping has quartz wafer between two sponge boards of clean mechanism, and the washing jar is located quartz wafer's below, the washing jar can hold quartz wafer's rotation.
Preferably, the second cylinder, the second piston rod, the motor, the rotating shaft, the clamping plate, the connecting plate, the sponge plate and the quartz wafer are all on the same straight line in the central axis of the horizontal direction.
Preferably, the both ends lateral wall of first cylinder all is equipped with fixed establishment, fixed establishment includes first horizontal pole, second horizontal pole and montant, the one end of first horizontal pole is connected the lateral wall of first cylinder, the other end is connected the top lateral wall of montant, the bottom lateral wall of montant is connected the one end of second horizontal pole, the second horizontal pole is equipped with the screw hole in vertical direction, and the bolt passes through the screw hole carries out threaded connection with table surface.
Preferably, the cleaning cylinder is hollow cuboid, grooves are formed in the top of the side walls at the two ends of the cleaning cylinder in a concave mode towards the bottom of the side walls, and the grooves can accommodate the rotating shaft to move up and down.
Preferably, a cleaning liquid is arranged in the cleaning cylinder, and the liquid level of the cleaning liquid is lower than the bottom of the groove.
Preferably, the outer side wall of the support table is provided with a power supply, and the first cylinder, the second cylinder and the motor are electrically connected with the power supply.
The utility model has the advantages that: the fixing mechanism connected with the first air cylinder and the second air cylinder is fixed with the workbench through bolts, the structure is stable, and the cleaning part is accurate; the size of the quartz wafer is not limited, the quartz wafer can be cleaned by clamping through the clamping plate, and the universality is high; the round edge of the quartz wafer can be cleaned through the driving of the first cylinder, the second cylinder and the motor, and the use is convenient.
Drawings
The accompanying drawings are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention, and together with the description serve to explain the invention and not to limit the invention. In the drawings:
fig. 1 is a schematic structural diagram of the present invention;
fig. 2 is a schematic structural view of the cleaning cylinder of the present invention.
Labeled as: 1. cleaning the cylinder; 2. a first cylinder; 3. a support table; 4. a first piston rod; 5. a second cylinder; 6. a second piston rod; 7. a connecting member; 8. a motor; 9. a rotating shaft; 10. a splint; 11. a connecting plate; 12. a sponge plate; 13. a quartz wafer; 14. a first cross bar; 15. a second cross bar; 16. a vertical rod; 17. a bolt; 18. a groove; 19. And (5) cleaning the liquid.
Detailed Description
As shown in fig. 1 to 2, a device for cleaning a round edge of a quartz wafer comprises two cleaning mechanisms and two cleaning cylinders 1, wherein the cleaning mechanisms are symmetrically arranged, each cleaning mechanism comprises a first cylinder 2 and a support table 3 arranged above the first cylinder 2, a first piston rod 4 of the first cylinder 2 is connected with the lower surface of the support table 3, the upper surface of the support table 3 is provided with a second cylinder 5, a second piston rod 6 of the second cylinder 5 is connected with one end of a motor 8 through a connecting piece 7, the other end of the motor 8 is provided with a rotating shaft 9, the motor 8 drives the rotating shaft 9 to rotate along the direction of a pointer, one end of the rotating shaft 9 is connected with one end of a clamping plate 10, the other end of the clamping plate 10 is connected with a sponge plate 12 through a connecting plate 11, the quartz wafer 13 is clamped between two sponge plates 12 of the two cleaning mechanisms, and the cleaning cylinders are arranged below the quartz.
The second cylinder 5, the second piston rod 6, the motor 8, the rotating shaft 9, the clamping plate 10, the connecting plate 11, the sponge plate 12 and the quartz wafer 13 are all on the same straight line in the central axis of the horizontal direction. The both ends lateral wall of first cylinder 2 all is equipped with fixed establishment, and fixed establishment includes first horizontal pole 14, second horizontal pole 15 and montant 16, and the lateral wall of first cylinder 2 is connected to the one end of first horizontal pole 14, and the top lateral wall of montant 16 is connected to the other end, and the one end of second horizontal pole 15 is connected to the bottom lateral wall of montant 16, and second horizontal pole 15 is equipped with the screw hole in vertical direction, and bolt 17 carries out threaded connection through screw hole and table surface. The cleaning cylinder is hollow cuboid, the top of the side walls at two ends of the cleaning cylinder is sunken to the bottom of the side walls to be provided with a groove 18, and the groove 18 can accommodate the rotating shaft 9 to move up and down. Cleaning liquid 19 is arranged in the cleaning cylinder, and the liquid level of the cleaning liquid 19 is lower than the bottom of the groove 18. The lateral wall of the supporting table 3 is provided with a power supply, and the first cylinder 2, the second cylinder 5 and the motor 8 are electrically connected with the power supply.
The utility model discloses a use-way does: the fixing mechanism connecting the first cylinder 2 and the second cylinder 5 is fixed with the workbench through a bolt 17, a power supply is started, the two second cylinders 5 drive the second piston rods 6 to move towards the middle, the second piston rods 6 drive the motor 8, the rotating shafts 9, the clamping plates 10, the connecting plate 11 and the sponge plates 12 to move, the quartz wafer 13 is placed between the two sponge plates 12 until being clamped and fixed by the two sponge plates 12, the edge part of the quartz wafer 13 is uniformly arranged outside the sponge plates 12, the first cylinder 2 starts the first piston rod 4 to drive the supporting table 3 and components on the supporting table 3 to simultaneously move downwards, the two rotating shafts 9 can pass through the groove 18 of the cleaning cylinder, the quartz wafer 13 is arranged inside the cleaning cylinder, and the edge of the quartz wafer 13 is immersed in a cleaning solution 19, at this time, the motor 8 is started, and the rotating shaft 9 drives the quartz wafer 13 to rotate, so that the round edge of the quartz wafer 13 can be sufficiently cleaned.
Although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications may be made to the embodiments described in the foregoing embodiments, or equivalents may be substituted for elements thereof. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (6)
1. A round edge cleaning device for quartz wafers comprises two cleaning mechanisms and cleaning cylinders which are symmetrically arranged, it is characterized in that the cleaning mechanism comprises a first air cylinder and a supporting platform arranged above the first air cylinder, a first piston rod of the first cylinder is connected with the lower surface of the supporting platform, a second cylinder is arranged on the upper surface of the supporting platform, a second piston rod of the second cylinder is connected with one end of a motor through a connecting piece, the other end of the motor is provided with a rotating shaft, the motor drives the rotating shaft to rotate along the direction of the pointer, one end of the rotating shaft is connected with one end of the clamping plate, the other end of the clamping plate is connected with the sponge plate through the connecting plate, a quartz wafer is clamped between the two sponge plates of the cleaning mechanism, the cleaning cylinder is arranged below the quartz wafer, and the cleaning cylinder can accommodate the rotation of the quartz wafer.
2. The apparatus according to claim 1, wherein the second cylinder, the second piston rod, the motor, the shaft, the clamp plate, the connecting plate, the sponge plate, and the quartz wafer are all aligned with each other along a horizontal central axis.
3. The apparatus according to claim 2, wherein the outer side walls of the two ends of the first cylinder are provided with fixing mechanisms, each fixing mechanism comprises a first cross rod, a second cross rod and a vertical rod, one end of the first cross rod is connected with the outer side wall of the first cylinder, the other end of the first cross rod is connected with the top side wall of the vertical rod, the bottom side wall of the vertical rod is connected with one end of the second cross rod, the second cross rod is provided with a threaded hole in the vertical direction, and a bolt is in threaded connection with the working table through the threaded hole.
4. A cleaning device for round edges of quartz wafers as claimed in claim 3, wherein said cleaning cylinder is hollow and rectangular, the top of the side walls at both ends of said cleaning cylinder is recessed toward the bottom of the side walls to form a groove, said groove can accommodate said shaft to move up and down.
5. A quartz wafer round edge cleaning device as set forth in claim 4, characterized in that a cleaning liquid is provided in the cleaning cylinder, and the liquid level of the cleaning liquid is lower than the bottom of the groove.
6. The apparatus as claimed in claim 5, wherein the outer sidewall of the support table is provided with a power supply, and the first cylinder, the second cylinder and the motor are electrically connected to the power supply.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921707654.2U CN210816624U (en) | 2019-10-12 | 2019-10-12 | Quartz wafer's round edge belt cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921707654.2U CN210816624U (en) | 2019-10-12 | 2019-10-12 | Quartz wafer's round edge belt cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN210816624U true CN210816624U (en) | 2020-06-23 |
Family
ID=71273198
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201921707654.2U Expired - Fee Related CN210816624U (en) | 2019-10-12 | 2019-10-12 | Quartz wafer's round edge belt cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN210816624U (en) |
-
2019
- 2019-10-12 CN CN201921707654.2U patent/CN210816624U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20200623 |