CN210692567U - Liquid-carrying roller for etching device and etching device - Google Patents
Liquid-carrying roller for etching device and etching device Download PDFInfo
- Publication number
- CN210692567U CN210692567U CN201922254490.9U CN201922254490U CN210692567U CN 210692567 U CN210692567 U CN 210692567U CN 201922254490 U CN201922254490 U CN 201922254490U CN 210692567 U CN210692567 U CN 210692567U
- Authority
- CN
- China
- Prior art keywords
- roller
- base body
- hole
- liquid
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000005530 etching Methods 0.000 title claims abstract description 97
- 239000007788 liquid Substances 0.000 claims abstract description 31
- 230000002093 peripheral effect Effects 0.000 claims abstract description 5
- 230000006978 adaptation Effects 0.000 claims abstract description 3
- 230000007246 mechanism Effects 0.000 claims description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 48
- 229910052710 silicon Inorganic materials 0.000 abstract description 48
- 239000010703 silicon Substances 0.000 abstract description 48
- 238000000034 method Methods 0.000 abstract description 12
- 238000004519 manufacturing process Methods 0.000 abstract description 8
- 230000009467 reduction Effects 0.000 abstract description 4
- 235000012431 wafers Nutrition 0.000 description 35
- 239000003814 drug Substances 0.000 description 21
- 239000000463 material Substances 0.000 description 12
- 230000008569 process Effects 0.000 description 10
- 230000005540 biological transmission Effects 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010146 3D printing Methods 0.000 description 1
- 229910000967 As alloy Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Weting (AREA)
Abstract
The utility model discloses a liquid-carrying roller for an etching device and the etching device, which belong to the technical field of photovoltaic cell production equipment; this etching device is with taking liquid gyro wheel includes: the roller base body can rotate around the axis of the roller base body, the roller base body is of a hollow structure, a cylindrical accommodating cavity is formed in the roller base body, supporting teeth which are spirally arranged are arranged on the outer peripheral surface of the roller base body, and the top surfaces of the supporting teeth are arc surfaces; the gyro wheel inside lining, the gyro wheel inside lining be with hold the cylindricality structure of chamber looks adaptation, the gyro wheel inside lining is located hold the intracavity and can follow the gyro wheel base member rotates. The etching device is provided with the liquid-carrying roller for the etching device. The utility model discloses can provide stable support, reduction in production cost to the silicon chip at the sculpture in-process for the sculpture of silicon chip is more even, improves the sculpture quality.
Description
Technical Field
The utility model relates to a photovoltaic cell production facility technical field especially relates to an etching device is with taking liquid gyro wheel and etching device.
Background
In the production flow of the photovoltaic cell, the silicon wafer needs to be cleaned, subjected to texturing, diffused, etched, printed, sintered and the like. The etching is used as an important process in the production of the photovoltaic cell, and the main function of the etching is to remove N-type silicon around the diffused silicon wafer and prevent electric leakage.
Generally, the etching process is performed in an etching bath of an etching apparatus. The etching groove is filled with a liquid medicine for etching and is also provided with a roller for transferring the silicon wafer. As shown in fig. 1, the roller structure in the prior art is: the two ends of the roller base body 10 are respectively sleeved with an O-shaped ring 20, the O-shaped rings 20 at the two ends of the roller base body 10 support the silicon wafer 30, so that the silicon wafer 30 is in contact with liquid medicine in an etching groove, and the roller base body 10 rotates around the axis of the roller base body to drive the silicon wafer 30 to move in the horizontal direction, so that the etching operation of the silicon wafer 30 is completed.
In the prior art, because the transverse size of the silicon wafer is large, the silicon wafer is supported only at two ends of the roller, the middle part of the silicon wafer is not supported and is prone to sinking, and the middle part of the silicon wafer is likely to be excessively etched, so that the silicon wafer is prone to being bad, and production efficiency is affected.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide an etching device is with taking liquid gyro wheel and etching device can provide the stable support to the silicon chip at the sculpture in-process for the sculpture of silicon chip is more even, improves the sculpture quality.
As the conception, the utility model adopts the technical proposal that:
a liquid-carrying roller for an etching apparatus, comprising:
the roller base body can rotate around the axis of the roller base body, the roller base body is of a hollow structure, a cylindrical accommodating cavity is formed in the roller base body, supporting teeth which are spirally arranged are arranged on the outer peripheral surface of the roller base body, and the top surfaces of the supporting teeth are arc surfaces;
the gyro wheel inside lining, the gyro wheel inside lining be with hold the cylindricality structure of chamber looks adaptation, the gyro wheel inside lining is located hold the intracavity and can follow the gyro wheel base member rotates.
Optionally, the support teeth are provided with avoidance notches on two sides of the spiral line relative to the support teeth, and two adjacent avoidance notches form an inverted trapezoidal groove.
Optionally, the periphery of the roller base body is provided with a plurality of circles of the supporting teeth.
Optionally, the liquid-carrying roller for the etching device further comprises a connecting shaft, and the connecting shaft is connected with the roller base body to drive the roller base body to rotate around the axis of the roller base body.
Optionally, the liquid-carrying roller for the etching device further comprises a roller support, and the connecting shaft is rotatably arranged on the roller support.
Optionally, the liquid-carrying roller for the etching device further comprises a driving mechanism, and the driving mechanism is connected with the connecting shaft to drive the connecting shaft to rotate around the axis of the driving mechanism.
Optionally, the roller lining is provided with a third through hole extending along the radial direction of the roller base body, one end of the third through hole is communicated with the first through hole, and the other end of the third through hole is communicated with the second through hole.
Optionally, the first through hole passes through only the top surface of the support tooth.
Optionally, the first through hole and the second through hole are both tapered holes, and a large end opening of the first through hole and a large end opening of the second through hole are respectively communicated with two ends of the third through hole.
The liquid-carrying roller for the etching device is arranged in the etching device.
The utility model provides an etching device is with taking liquid gyro wheel has following advantage:
(1) the silicon wafer is supported by the spirally arranged supporting teeth arranged on the outer peripheral surface of the roller base body, the supporting teeth can provide multi-point support for the silicon wafer along the axis direction of the roller base body, and the phenomenon of excessive etching after the middle part of the silicon wafer sinks is avoided; the liquid level fluctuation of the etching liquid medicine driven by the spirally arranged supporting teeth in the rotating process of the roller base body is more gradual, which is beneficial to the improvement of the etching quality; the top surfaces of the supporting teeth are arc surfaces, so that the supporting parts of the supporting teeth to the silicon wafer are of smooth structures, and the silicon wafer is prevented from being scratched by the supporting teeth;
(2) the roller base body in direct contact with the etching liquid is expensive in material, so that the roller with the liquid is designed into a split structure, the material of the roller base body and the material of the roller lining can be selected as required, the roller lining can be selected from materials with relatively low price, and the production cost can be controlled while the strength of the roller base body with the hollow structure is enhanced, and stable support and transmission of the silicon wafer are ensured.
Drawings
FIG. 1 is a cross-sectional view of a fluid-carrying roller for an etching apparatus in the prior art;
FIG. 2 is a cross-sectional view of a liquid-carrying roller for an etching apparatus according to a first embodiment of the present invention;
FIG. 3 is a cross-sectional view of a liquid-carrying roller disposed on a roller support for an etching apparatus according to a first embodiment of the present invention;
fig. 4 is a cross-sectional view of a liquid-carrying roller for an etching apparatus according to a second embodiment of the present invention;
fig. 5 is a cross-sectional view of a liquid-carrying roller disposed on a roller support for an etching apparatus according to a third embodiment of the present invention;
fig. 6 is an enlarged view at a in fig. 5.
In fig. 1:
10. a roller base body; 20. an "O" ring; 30. a silicon wafer;
in fig. 2-6:
1. a roller base body; 11. a first through hole; 12. a second through hole;
2. lining of the roller; 21. a third through hole;
3. supporting the teeth; 31. avoiding the notch;
4. a roller bracket; 41. a first part; 42. a second section; 43. a support portion;
5. a drive mechanism;
6. a connecting shaft;
7. and supporting the shaft.
Detailed Description
In order to make the technical problem solved by the present invention, the technical solution adopted by the present invention and the technical effect achieved by the present invention clearer, the technical solution of the present invention will be further explained by combining the drawings and by means of the specific implementation manner. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some but not all of the elements related to the present invention are shown in the drawings.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance. Wherein the terms "first position" and "second position" are two different positions.
In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection or a removable connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.
Example one
Referring to fig. 2 and 3, the embodiment provides a liquid-carrying roller for an etching apparatus, and specifically, the liquid-carrying roller for the etching apparatus is disposed in an etching groove of the etching apparatus, and can stably support and transfer a silicon wafer in an etching process, so that uniform etching is ensured, and the yield of the silicon wafer is improved.
Specifically, the liquid-carrying roller for an etching apparatus includes a roller base 1 and a roller liner 2.
The roller base body 1 can rotate around the axis of the roller base body 1, the roller base body 1 is of a hollow structure, a cylindrical containing cavity is formed inside the roller base body 1, supporting teeth 3 which are arranged spirally are arranged on the outer peripheral surface of the roller base body 1, and the top surfaces of the supporting teeth 3 are arc surfaces. The roller lining 2 is of a cylindrical structure matched with the accommodating cavity, and the roller lining 2 is arranged in the accommodating cavity and can rotate along with the roller base body 1.
In this embodiment, support the silicon chip with spiral arrangement's support tooth 3 to replace locating "O" type circle at gyro wheel base member 10 both ends among the prior art, support tooth 3 along the helix range supports the silicon chip, compares and only provides the support at the silicon chip both ends among the prior art, and it can provide the multiple spot and support, supports more evenly, can avoid the silicon chip middle part to take place the phenomenon of sinking, and then prevents that the silicon chip from taking place excessive etching phenomenon. The top surfaces of the supporting teeth 3 are arc surfaces, so that the contact part of the supporting teeth 3 and the silicon wafer is smooth, and the supporting teeth 3 are prevented from scratching the surface of the silicon wafer in the rotating process to influence the etching quality. Locate the inside gyro wheel inside lining 2 of gyro wheel base member 1 and can strengthen hollow structure's gyro wheel base member 1 intensity, guarantee the stability to the silicon chip transmission.
The roller base body 1 in direct contact with the etching liquid medicine is expensive in material, so that the roller with the liquid is designed into a split structure, the material of the roller base body 1 and the material of the roller lining 2 can be selected as required, the roller lining 2 can be selected from materials with relatively low price, such as alloy or graphite, the strength of the roller base body 1 with the hollow structure is enhanced, stable support and transmission of silicon wafers are guaranteed, and meanwhile, the production cost can be controlled.
Specifically, the roller base body 1 is made of a plastic material capable of keeping its own chemical stability in the etching solution, and the material of the support teeth 3 is the same as that of the roller base body 1. Preferably, the material of roller inside lining 2 is alloy or graphite, and alloy or graphite are cheaper than the material of roller base member 1, and roller inside lining 2 locates and holds the intensity that the intracavity can effectively improve roller base member 1, guarantees that support tooth 3 supports the stability with the transmission to the silicon chip.
When the periphery of the roller base body 1 is provided with a circle of supporting teeth 3, the arrangement form of the circle of supporting teeth 3 is the same as the structure of the single spiral thread; alternatively, in other embodiments, the outer circumference of the roller base body 1 may be provided with a plurality of turns of the supporting teeth 3, for example, when two turns of the supporting teeth 3 are provided, the arrangement of the two turns of the supporting teeth 3 is the same as the structure of the double helical thread. When the silicon wafer is etched in the etching groove, the roller base body 1 rotates along the axis of the roller base body, so that the silicon wafer is conveyed in the horizontal direction; the support teeth 3 which are spirally arranged can form a plurality of gaps for containing etching liquid medicine, the gaps carry the etching liquid medicine to rotate together in the process that the roller base body 1 rotates along the axis of the roller base body, the liquid medicine rotating along with the roller base body 1 can be stained on a silicon wafer, and the silicon wafer is uniformly etched.
The supporting teeth 3 are arranged in a spiral line, and the fluctuation of the liquid level of the etching liquid medicine in the gap is smaller in the rotating process of the roller base body 1.
Preferably, the roller base body 1 and the supporting teeth 3 are of an integrally formed structure.
In order to realize the rotation of the roller base body 1, in this embodiment, the liquid-carrying roller for the etching device further includes a roller support 4 and a driving mechanism 5, and a connecting shaft 6 is rotatably disposed on the roller support 4. The connecting shaft 6 is connected with one end of the roller base body 1 to drive the roller base body 1 to rotate around the axis of the roller base body. The driving mechanism 5 is connected with the connecting shaft 6 to drive the connecting shaft 6 to rotate around the axis of the connecting shaft. Optionally, the driving mechanism 5 includes a driving motor and a reduction gear box, an output end of the driving motor is connected with an input end of the reduction gear box, and an output end of the reduction gear box is connected with the connecting shaft 6.
Specifically, the roller bracket 4 is shaped like "Contraband" with an upward opening, the two ends of the roller bracket 4 are respectively a first portion 41 and a second portion 42, the connecting shaft 6 is rotatably disposed on the first portion 41, and the second portion 42 is further provided with a supporting portion 43. In order to ensure that the roller base body 1 extends along the horizontal direction, the other end of the roller base body 1 is provided with a supporting shaft 7, one end of the supporting shaft 7 is fixedly connected with the roller base body 1, and the other end is rotatably arranged on the supporting part 43.
The working process of the roller base body 1 is as follows: the driving motor rotates to drive the connecting shaft 6 to rotate, the connecting shaft 6 drives the roller base body 1 and the supporting shaft 7 to rotate simultaneously, in the rotating process, the etching liquid medicine is carried in the gap between every two adjacent supporting teeth 3 to rotate together, the etching liquid medicine can be stained on a silicon wafer along with the rotating liquid medicine of the roller base body 1, and the silicon wafer is etched uniformly.
Example two
Referring to fig. 4, the present embodiment provides a liquid-carrying roller for an etching apparatus, which is different from the liquid-carrying roller for an etching apparatus in the first embodiment in that: be equipped with on gyro wheel base member 1 along the radial of gyro wheel base member 1 with the first through-hole 11 and the second through-hole 12 that hold the chamber intercommunication of gyro wheel base member 1, be equipped with on the gyro wheel inside lining 2 along its self radially extended third through-hole 21, the one end and the first through-hole 11 intercommunication of third through-hole 21, the other end and second through-hole 12 intercommunication.
As seen from the cross-sectional view of the liquid-carrying roller for the etching apparatus in fig. 4, the first through hole 11, the third through hole 21 and the second through hole 12 are communicated to form a large through hole, which is described with reference to the current position of the liquid-carrying roller for the etching apparatus in fig. 4, at this time, the second through hole 12 is located below and can be fully contacted with the etching solution, that is, the second through hole 12 is filled with the etching solution, the lower portion of the third through hole 21 is also filled with the etching solution, that is, the lower portion of the large through hole is filled with the etching solution; when the roller base body 1 rotates, part of the etching liquid medicine at the lower part of the large through hole flows to the first through hole 11 in the rotating process, the other part of the etching liquid medicine flows out from the second through hole 12 under the action of inertia, along with the rotation of the roller base body 1, the second through hole 12 rotates to be positioned above the position opposite to the position shown in the figure 4, the etching liquid medicine flowing out from the second through hole 12 can be supplemented to the part of the etching liquid medicine contacting with the silicon wafer, and the sufficient contact between the silicon wafer and the etching liquid medicine is ensured.
Optionally, a plurality of first through holes 11 are provided at intervals along the axial direction of the roller base body 1, and each first through hole 11 is provided with a second through hole 12 and a third through hole 21. Preferably, the first through hole 11 only penetrates through the top surfaces of the support teeth 3, so that the interval between the two support teeth 3 at two sides of the first through hole 11 is not too large, the silicon wafer is prevented from sinking partially to cause poor etching, and the etching liquid medicine flowing out of the large through hole can be supplemented into two adjacent gaps.
Preferably, the first through hole 11 and the second through hole 12 are both tapered holes, and the large end opening of the first through hole 11 and the large end opening of the second through hole 12 are respectively communicated with both ends of the third through hole 21. Preferably, the cross section of the third through hole 21 is in a trapezoid shape with two lower bottom surfaces connected, so that the capacity of the large through hole formed by communicating the first through hole 11, the third through hole 21 and the second through hole 12 is larger, and the openings at the two ends are smaller, thereby preventing the etching liquid medicine in the large through hole from being excessively lost when the roller base body 1 rotates, and enabling the solution in the large through hole to supplement the etching liquid medicine in the gap more oppositely.
Specifically, in the present embodiment, the roller base 1, the roller lining 2 and the supporting teeth 3 may be integrally formed by 3D printing.
The other features of the liquid-carrying roller for the etching apparatus in this embodiment are the same as those of the first embodiment, and are not described herein again.
EXAMPLE III
Referring to fig. 5 and 6, the present embodiment provides a liquid-carrying roller for an etching apparatus, which is different from the first embodiment in that the support teeth 3 are provided with avoidance notches 31 on both sides of their own spiral lines, and two adjacent avoidance notches 31 form an inverted trapezoidal groove. The setting in the trapezoidal groove of falling for the area of contact in clearance between two adjacent support teeth 3 and etching liquid medicine is bigger, and the volume in clearance between two adjacent support teeth 3 is also bigger, makes this clearance can carry more etching liquid medicines, makes the etching effect of silicon chip better. The avoidance notch 31 is arranged on the side part of the support tooth 3, so that the damage of the support tooth 3 to the support position of the silicon wafer, namely the vertex position of the support tooth 3, caused by the avoidance notch 31 is avoided, and the stability of the support tooth 3 to the silicon wafer support is ensured.
The other features of the liquid-carrying roller for the etching apparatus in this embodiment are the same as those of the first embodiment, and are not described herein again.
Example four
The embodiment provides an etching device, and the liquid-carrying roller for the etching device in any one of the embodiments is arranged in the etching device. Specifically, the liquid-carrying roller for the etching device is arranged in an etching groove of the etching device.
The above embodiments have been described only the basic principles and features of the present invention, and the present invention is not limited by the above embodiments, and is not departing from the spirit and scope of the present invention. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (10)
1. The utility model provides an etching device is with taking liquid gyro wheel which characterized in that includes:
the roller wheel base body (1) can rotate around the axis of the roller wheel base body, the roller wheel base body (1) is of a hollow structure, a cylindrical accommodating cavity is formed in the roller wheel base body (1), supporting teeth (3) which are spirally arranged are arranged on the outer peripheral surface of the roller wheel base body (1), and the top surfaces of the supporting teeth (3) are arc surfaces;
the roller lining (2), the roller lining (2) be with hold the cylindricality structure of chamber looks adaptation, roller lining (2) are located hold the intracavity and can follow the gyro wheel base member (1) rotates.
2. The liquid-carrying roller for the etching device according to claim 1, wherein the support teeth (3) are provided with avoidance notches (31) at both sides of the spiral line relative to the support teeth, and two adjacent avoidance notches (31) form an inverted trapezoidal groove.
3. The liquid-carrying roller for an etching apparatus according to claim 1, wherein the outer periphery of the roller base body (1) is provided with a plurality of turns of the support teeth (3).
4. The liquid-carrying roller for the etching device according to claim 1, further comprising a connecting shaft (6), wherein the connecting shaft (6) is connected with the roller base body (1) to drive the roller base body (1) to rotate around its axis.
5. The liquid-carrying roller for the etching device according to claim 4, further comprising a roller support (4), wherein the connecting shaft (6) is rotatably disposed on the roller support (4).
6. The liquid-carrying roller for the etching device according to claim 4, further comprising a driving mechanism (5), wherein the driving mechanism (5) is connected with the connecting shaft (6) to drive the connecting shaft (6) to rotate around its axis.
7. The liquid-carrying roller for the etching device according to claim 1, wherein a first through hole (11) and a second through hole (12) communicating with the containing cavity are provided in the roller base body (1) in the radial direction of the roller base body (1), a third through hole (21) extending in the radial direction of the roller liner (2) is provided in the roller liner, one end of the third through hole (21) communicates with the first through hole (11), and the other end communicates with the second through hole (12).
8. The fluid-carrying roller for etching apparatus according to claim 7, wherein the first through hole (11) penetrates only through the top surface of the support tooth (3).
9. The liquid-carrying roller for an etching apparatus according to claim 8, wherein the first through hole (11) and the second through hole (12) are both tapered holes, and a large-end opening of the first through hole (11) and a large-end opening of the second through hole (12) communicate with both ends of the third through hole (21), respectively.
10. An etching apparatus, characterized in that the etching apparatus is provided with the liquid-carrying roller for an etching apparatus according to any one of claims 1 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922254490.9U CN210692567U (en) | 2019-12-16 | 2019-12-16 | Liquid-carrying roller for etching device and etching device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922254490.9U CN210692567U (en) | 2019-12-16 | 2019-12-16 | Liquid-carrying roller for etching device and etching device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN210692567U true CN210692567U (en) | 2020-06-05 |
Family
ID=70902122
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201922254490.9U Active CN210692567U (en) | 2019-12-16 | 2019-12-16 | Liquid-carrying roller for etching device and etching device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN210692567U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112309913A (en) * | 2020-09-28 | 2021-02-02 | 晶澳（扬州）太阳能科技有限公司 | Liquid-carrying roller for wet etching and wet etching method |
-
2019
- 2019-12-16 CN CN201922254490.9U patent/CN210692567U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112309913A (en) * | 2020-09-28 | 2021-02-02 | 晶澳（扬州）太阳能科技有限公司 | Liquid-carrying roller for wet etching and wet etching method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN210692567U (en) | Liquid-carrying roller for etching device and etching device | |
| CN206121606U (en) | Stirrer | |
| CN110335841B (en) | Bearing device, wafer basket of flowers and wafer cleaning equipment | |
| CN1576400B (en) | Electroplating apparatus and method for electronic parts,and the same electronic parts | |
| KR101510042B1 (en) | Rotational metal bar electropolishing device | |
| CN208762121U (en) | Filling transfer assembly and filling apparatus | |
| CN210303424U (en) | Movable constant temperature type agitating unit | |
| WO2023060725A1 (en) | Electroplating rack and electroplating machine | |
| CN210461096U (en) | Peripheral pump for phytosterol | |
| CN102085637B (en) | BGA (ball grid array) solder ball surface finish processing method and device | |
| CN205550149U (en) | A stirring preparation facilities for improving aryl piperazine class drug activity | |
| CN211160245U (en) | Vitamin is centrifuge for manufacturing | |
| JP2010031336A (en) | Surface treatment apparatus | |
| CN202059027U (en) | Plug | |
| CN215878522U (en) | Local prevention of seepage coating device of axle excircle | |
| CN218251957U (en) | Be used for abluent rotary device of quartz capsule | |
| CN217732934U (en) | Filter cloth deviation adjusting carrier roller assembly and filter cloth deviation adjusting device | |
| CN213795935U (en) | Lithium tantalate crystal grinder | |
| CN211537523U (en) | Efficient dual-vibration stirring dispersion machine | |
| CN217476382U (en) | A mould fixing base for automizing oil spout machine | |
| CN114635925B (en) | Magnetic liquid sealing device based on surface texture | |
| JP2015062581A (en) | Washing machine | |
| CN116372786B (en) | Wafer polishing equipment | |
| CN209923507U (en) | Storage device with guide ring convenient to replace | |
| CN218690991U (en) | Machine part immersion oil groove |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: No. 199, deer mountain road, Suzhou high tech Zone, Jiangsu Province Patentee after: CSI Cells Co.,Ltd. Patentee after: Atlas sunshine Power Group Co.,Ltd. Address before: No. 199, deer mountain road, Suzhou high tech Zone, Jiangsu Province Patentee before: CSI Cells Co.,Ltd. Patentee before: CSI SOLAR POWER GROUP Co.,Ltd. |
|
| CP01 | Change in the name or title of a patent holder |