CN210692498U - Wafer cleaning tank for wet process - Google Patents
Wafer cleaning tank for wet process Download PDFInfo
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- CN210692498U CN210692498U CN201921982298.5U CN201921982298U CN210692498U CN 210692498 U CN210692498 U CN 210692498U CN 201921982298 U CN201921982298 U CN 201921982298U CN 210692498 U CN210692498 U CN 210692498U
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Abstract
The utility model discloses a wafer washing tank for wet process technology, include the cell body and locate the capping of cell body oral area, the capping comprises left side apron and right side apron, is located to be equipped with left turn-beam and right turn-beam outside the left side edge of cell body oral area and the right side edge respectively, the outside edge of left side apron is fixed on the turn-beam of a left side, the outside edge of right side apron is fixed on the turn-beam of the right side, left side apron with the right side apron closes the back, the side edge pressure in the left side apron is in the inward flange of right side apron, left side apron with the right side apron closes and forms the edge pressure all around of capping is in on the edge plane all around the cell body oral area. The utility model discloses a full cover of cell body oral area for the wafer washing tank does not have liquid splash to come out when wasing the wafer, also does not have gaseous loss, and corrosive liquids and gas can not corrode outside mechanism yet.
Description
Technical Field
The utility model belongs to the technical field of semiconductor process equipment, especially, relate to a wafer washing tank for wet process technology.
Background
In batch wafer wet cleaning equipment, a cleaning process area in a specific area is commonly used for carrying out acid cleaning, alkali cleaning, water cleaning and other related wet process steps. In the related process, liquid splashing and harmful gas escape during the reaction of the solution in the process area during the cleaning process of the wafer, which is not good for the health of the operator, and damages the related equipment, so it is necessary to improve the batch type wafer wet cleaning equipment to solve the problems of liquid splashing and gas escape.
SUMMERY OF THE UTILITY MODEL
The utility model aims to solve the technical problem that a wafer cleaning tank for wet process technology that prevents liquid splash and gas loss when wasing the wafer is provided to overcome the not enough of prior art existence.
In order to solve the technical problem, the utility model adopts the following technical scheme:
the utility model provides a wafer washing tank for wet process technology, includes the cell body and locates the capping of cell body oral area which characterized in that: the capping comprises left side apron and right side apron, is located that the left side edge of cell body oral area is equipped with left turn beam and right turn beam respectively outward with the right side edge, the outside edge of left side apron is fixed on the left turn beam, the outside edge of right side apron is fixed on the right turn beam, left side apron with the right side apron closes the back, the side edge pressure in the left side apron is in the inward flange of right side apron, left side apron with the right side apron closes and forms the edge pressure all around of capping is in on the edge plane all around of cell body oral area, the cell body still is equipped with the drive respectively outward left side turning beam pivoted left actuating mechanism and drive right side turning beam pivoted right actuating mechanism.
Adopt above-mentioned technical scheme, the utility model discloses a capping falls into left side apron and right side apron and forms to open-type door plant structure, the capping that forms after closing all presses on the oral area edge plane all around of cell body, and the inboard edge of left side apron also presses on the inboard edge of right side apron, the full cover of cell body oral area has been realized, make the wafer washing tank not have liquid splash to come out when wasing the wafer, also do not have gaseous loss, in addition with a left side, the pivot setting of right side apron is outside the cell body, corrosive liquid and gas can not corrode outside mechanisms such as bull stick in the cell body yet.
In a particular embodiment of the present invention, an inner groove is provided in the groove body, the inner groove and an interlayer is provided between the groove bodies, and the edge of the opening portion of the inner groove is lower than the opening portion of the groove body. By adopting the structure, when the cleaning liquid in the inner tank is full, the cleaning liquid can overflow into the interlayer and then flow out from the water outlet at the bottom, thereby not overflowing out of the tank body and having the advantage of preventing the cleaning liquid from overflowing out of the tank body.
The utility model discloses an among the concrete implementation manner, left side roof beam and right side roof beam constitute by the beam slab that extends along cell body length direction, connect the preceding axial region and the back axial region at beam slab both ends, preceding axial region with the back axial region by the minor axis and with the perpendicular connecting plate of connecting of minor axis constitutes, the connecting plate perpendicular to left side apron with right side apron, the minor axis of preceding axial region is supported by preceding axle bed, the minor axis of back axial region is supported by the back axle bed.
In order to improve the edge strength of the left cover plate and the right cover plate, the beam plate is integrally connected with a reinforcing plate, the reinforcing plate of the left rotating beam is connected to the outer edge upper surface of the left cover plate, and the reinforcing plate of the right rotating beam is connected to the outer edge upper surface of the right cover plate.
The utility model discloses an in the preferred embodiment, the left side apron is by left side lid planking with fix the left side lid inner panel of left side lid planking internal surface constitutes, the edge all indents all around of left side lid inner panel inside the edge all around of left side lid planking, the right side apron is by right side lid planking with fix the right side lid inner panel of right side lid planking internal surface constitutes, the inboard edge of right side lid inner panel stretches out the inboard edge of right side lid planking, other three edges of right side lid inner panel all indent inside other three edges of right side lid planking, the left side apron with the right side apron closes the back, the inboard edge pressure of left side lid planking is in on the inboard edge of right side lid inner panel. The structure is not only large in cover plate strength, but also good in sealing effect.
The utility model discloses an in the preferred embodiment, left side actuating mechanism and right actuating mechanism constitute by cylinder and crank, crank one end articulates on the piston rod of cylinder, the other end with stretch out preceding axle bed the minor axis of preceding axial region is connected. By adopting the structure, the left rotary beam and the right rotary beam are driven to rotate by the air cylinder.
Adopt above-mentioned technical scheme, the utility model discloses a wafer washing tank for wet process technology has realized the full cover of cell body oral area, and is sealed effectual for the wafer washing tank does not have liquid splash to come out when wasing the wafer, also does not have gaseous loss, and corrosive liquids and gas can not corrode pivot and actuating mechanism yet.
Drawings
The present invention will be described in detail with reference to the accompanying drawings and specific embodiments:
fig. 1 is a schematic perspective view of the present invention, wherein the dotted line is the state of the left cover plate when it is closed;
fig. 2 is a schematic structural view of the left cover plate of the present invention;
fig. 3 is a schematic structural diagram of the right cover plate of the present invention.
Detailed Description
As shown in fig. 1 to 3, the wafer cleaning tank for wet process of the present invention includes a tank body 100 and a tank cover disposed at the opening of the tank body 100.
Wherein, the slot cover is composed of a left cover plate 210 and a right cover plate 220. A left rotating beam 310 and a right rotating beam 320 are respectively arranged outside the left side edge and the right side edge of the opening of the tank body 100, the outer edge of the left cover plate 200 is fixed on the left rotating beam 310, the outer edge of the right cover plate 220 is fixed on the right rotating beam 320, and in addition, a left driving mechanism 410 for driving the left rotating beam 310 to rotate and a right driving mechanism 420 for driving the right rotating beam 320 to rotate are respectively arranged outside the tank body 100.
An inner tank 110 is arranged in the tank body 100, an interlayer 101 is arranged between the inner tank 110 and the tank body 110, the edge of the opening part of the inner tank 110 is in a sawtooth shape, and the edge of the opening part of the inner tank 110 is lower than the opening part of the tank body 100. By adopting the structure, when the cleaning liquid in the inner tank is full, the cleaning liquid can overflow into the interlayer and then flow out from the water outlet at the bottom, thereby not overflowing out of the tank body and having the advantage of preventing the cleaning liquid from overflowing out of the tank body.
The left cover plate 210 is composed of a left cover outer plate 211 and a left cover inner plate 212 fixed to the inner surface of the left cover outer plate 211, and the peripheral edge of the left cover inner plate 212 is retracted inside the peripheral edge of the left cover outer plate 211. The right cover plate 220 is composed of a right cover outer plate 221 and a right cover inner plate 222 fixed to the inner surface of the right cover outer plate 221, the inner side edge of the right cover inner plate 222 extends out of the inner side edge of the right cover outer plate 221, and the other three edges of the right cover inner plate 222 are all retracted inside the other three edges of the right cover outer plate 221. When the left and right cover plates 210 and 220 are closed, the inner edge of the left cover outer plate 211 presses against the inner edge of the right cover inner plate 222. The structure is not only large in cover plate strength, but also good in sealing effect.
The material of the tank cover is selected depending on the use of the cleaning liquid, and Polytetrafluoroethylene (PTFE) and polyvinylidene fluoride (PVDF) are generally preferable.
The left and right turn beams 310 and 320 are each composed of a beam plate 301 extending in the longitudinal direction of the tank body, a front shaft portion 330 and a rear shaft portion 340 connected to both ends of the beam plate 301, the front shaft portion 330 and the rear shaft portion 340 are each composed of a short shaft 302 and a connecting plate 303 connected perpendicularly to the short shaft 302, and the connecting plate 303 is also perpendicular to the left and right decks 210 and 220.
The material of the left and right steering beams 310 and 320 may be selected according to the use of different cleaning liquids, and Polytetrafluoroethylene (PTFE) and polyvinylidene fluoride (PVDF) are generally preferred.
The short axis of the front axle portion 330 is supported by the front axle housing 350 and extends out of the front axle housing 350, and the short axis of the rear axle portion 340 is supported by the rear axle housing 360. The front axle seat 350 and the rear axle seat 350 are fixed to front and rear support end faces (not shown) outside the tank body 100.
The left drive mechanism 410 and the right drive mechanism 420 are each constituted by a cylinder 401 and a crank 402. The cylinder is fixed on the front supporting end face outside the tank body 100, one end of the crank 402 is hinged on the piston rod of the cylinder 401, and the other end is connected with the short shaft 303 of the front shaft part 330 extending out of the front shaft seat 350. By adopting the structure, the left rotary beam and the right rotary beam are driven to rotate for 0-90 degrees by the air cylinder.
In order to improve the edge strength of the left cover plate 210 and the right cover plate 220, a reinforcing plate 304 is integrally connected to the beam plate 301. The reinforcing plate 304 of the left-hand beam 310 is connected to the outer edge upper surface of the left cover plate 210, and the reinforcing plate 304 of the right-hand beam 320 is connected to the outer edge upper surface of the right cover plate 220.
Adopt above-mentioned technical scheme, the utility model discloses a capping falls into left side apron 210 and right side apron 220 and forms to open-type door plant structure, the capping that forms after closing all presses on the oral area edge plane all around of cell body, and the inboard edge of left side apron 210 also presses on the inboard edge of right side apron 220, make the wafer washing tank not have liquid splash when wasing the wafer and come out, also can not have gaseous loss, in addition with a left side, the pivot setting of right side apron is outside the cell body, corrosive liquid and gas can not corrode outsides such as bull stick in the cell body yet, can not cause the harm of equipment.
However, those skilled in the art should realize that the above embodiments are only used for illustrating the present invention and not used as a limitation of the present invention, and that the changes and modifications to the above embodiments are all within the scope of the appended claims as long as they are within the true spirit of the present invention.
Claims (6)
1. The utility model provides a wafer washing tank for wet process technology, includes the cell body and locates the capping of cell body oral area which characterized in that: the capping comprises left side apron and right side apron, is located that the left side edge of cell body oral area is equipped with left turn beam and right turn beam respectively outward with the right side edge, the outside edge of left side apron is fixed on the left turn beam, the outside edge of right side apron is fixed on the right turn beam, left side apron with the right side apron closes the back, the side edge pressure in the left side apron is in the inward flange of right side apron, left side apron with the right side apron closes and forms the edge pressure all around of capping is in on the edge plane all around of cell body oral area, the cell body still is equipped with the drive respectively outward left side turning beam pivoted left actuating mechanism and drive right side turning beam pivoted right actuating mechanism.
2. A wafer cleaning tank for wet processes as claimed in claim 1, wherein: an inner groove is arranged in the groove body, an interlayer is arranged between the inner groove and the groove body, and the edge of the opening of the inner groove is lower than that of the groove body.
3. A wafer cleaning tank for wet processes as claimed in claim 1, wherein: the left turning beam and the right turning beam are respectively composed of a beam plate extending along the length direction of the groove body, a front shaft part and a rear shaft part connected to two ends of the beam plate, the front shaft part and the rear shaft part are respectively composed of a short shaft and a connecting plate vertically connected with the short shaft, the connecting plate is perpendicular to the left cover plate and the right cover plate, the short shaft of the front shaft part is supported by a front shaft seat, and the short shaft of the rear shaft part is supported by a rear shaft seat.
4. A wafer cleaning tank for wet processes as claimed in claim 3, wherein: the beam plate is integrally connected with a reinforcing plate, the reinforcing plate of the left rotating beam is connected to the upper surface of the outer edge of the left cover plate, and the reinforcing plate of the right rotating beam is connected to the upper surface of the outer edge of the right cover plate.
5. A wafer cleaning tank for wet processes as claimed in claim 3, wherein: the left side apron is by left side lid planking with fix the left side of left side lid planking internal surface covers the inner panel and constitutes, the all indents of the all edges all around of left side lid planking are inside all around, the right side apron is by right side lid planking with fix the right side of right side lid planking internal surface covers the inner panel and constitutes, the inboard edge of right side lid inner panel stretches out the inboard edge of right side lid planking, other three edges of right side lid inner panel all indent be in inside other three edges of right side lid planking, the left side apron with the right side apron closes the back, the inboard edge pressure of left side lid planking is in on the inboard edge of right side lid inner panel.
6. A wafer cleaning tank for wet processes as claimed in claim 3, wherein: the left driving mechanism and the right driving mechanism are both composed of an air cylinder and a crank, one end of the crank is hinged to a piston rod of the air cylinder, and the other end of the crank is connected with a short shaft extending out of the front shaft part of the front shaft seat.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921982298.5U CN210692498U (en) | 2019-11-15 | 2019-11-15 | Wafer cleaning tank for wet process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921982298.5U CN210692498U (en) | 2019-11-15 | 2019-11-15 | Wafer cleaning tank for wet process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN210692498U true CN210692498U (en) | 2020-06-05 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201921982298.5U Active CN210692498U (en) | 2019-11-15 | 2019-11-15 | Wafer cleaning tank for wet process |
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| CN (1) | CN210692498U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112845293A (en) * | 2020-12-31 | 2021-05-28 | 上海至纯洁净系统科技股份有限公司 | Automatic change wafer tong and spray abluent washing tank equipment |
-
2019
- 2019-11-15 CN CN201921982298.5U patent/CN210692498U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112845293A (en) * | 2020-12-31 | 2021-05-28 | 上海至纯洁净系统科技股份有限公司 | Automatic change wafer tong and spray abluent washing tank equipment |
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