CN210497420U

CN210497420U - Quartz wafer cleaning device

Info

Publication number: CN210497420U
Application number: CN201921500295.3U
Authority: CN
Inventors: 梁万丰; 肖华; 肖林
Original assignee: Wan'an Kaijing Electronic Technology Co Ltd
Current assignee: Wan'an Kaijing Electronic Technology Co Ltd
Priority date: 2019-09-10
Filing date: 2019-09-10
Publication date: 2020-05-12
Anticipated expiration: 2029-09-10

Abstract

The utility model relates to the technical field of quartz wafer cleaning, and discloses a quartz wafer cleaning device, which solves the problems that the general cleaning device has overlong washing time for the quartz wafer and longer drying time for the quartz wafer in the process of cleaning the quartz wafer, thereby reducing the efficiency; the utility model can accelerate the washing speed of the hot water to the quartz wafer and reduce the washing time by matching the two telescopic cylinders, the two water pumps, the worm and the like; through the cooperation use of carousel, reference column, first motor and steam pipe etc. that set up, can air-dry the processing through steam to the inside quartz wafer of a rotatory sieve section of thick bamboo, handle through the while rotation air-dry direction, can improve the cleaning efficiency to quartz wafer.

Description

Quartz wafer cleaning device

Technical Field

The utility model belongs to the technical field of quartz wafer washs, specifically is a quartz wafer belt cleaning device.

Background

Quartz varies in many ways due to its particle size, color, inclusions, etc.; the colorless and transparent quartz is called crystal, the purple crystal is commonly called amethyst, the crystal with the color of yellow smoke, brown smoke to near black is commonly called tea crystal, tobacco crystal or margarine, and the rose is commonly called hibiscus stone; the kidney-shaped and milky cryptocrystalline quartz is called chalcedony, the crystal glands with different color concentric strip structures are called agates, the agate crystal glands are internally provided with obvious visible liquid inclusions and are called agate water galleries, and the gray to black cryptocrystalline quartz consisting of fine-grained microcrystals is called flint and is called flint; wherein the quartz wafer requires a cleaning device during the production process.

However, in the process of cleaning the quartz wafer, the general cleaning device has an excessively long time for rinsing the quartz wafer and an excessively long time for drying the quartz wafer, which reduces the efficiency.

Disclosure of Invention

To the above situation, for overcoming prior art's defect, the utility model provides a quartz wafer belt cleaning device, the effectual general belt cleaning device of having solved carries out abluent in-process to quartz wafer, to quartz wafer's washing time overlength, and the time of just drying to quartz wafer is longer, has reduced the problem of efficiency.

In order to achieve the above object, the utility model provides a following technical scheme: a quartz wafer cleaning device comprises a box body, wherein two partition plates are fixedly mounted at the bottom of the box body, a second motor is fixedly mounted at the top of one side of the box body, an output shaft of the second motor is fixedly connected with one end of a worm, the other end of the worm is rotatably connected with the inner wall of the box body through a bearing, the middle part of the worm is in threaded connection with a screw hole, the screw hole is formed in the bottom of a moving block, a round hole is formed in the top of the moving block and is in alternate connection with a guide rod, the two ends of the guide rod are fixedly connected with the inner wall of the box body, two telescopic cylinders are fixedly mounted at the bottom end of the moving block, the output ends of the two telescopic cylinders are fixedly connected with the top end of a screen cylinder, lantern rings are mounted at the two sides of the screen cylinder, two liquid spray pipes are fixedly mounted on the inner wall of a cavity at, the two water spray pipes are fixedly communicated through two second connecting pipes.

Preferably, the middle of the cavity on the other side is fixedly provided with a screen plate, the inner wall of the cavity is provided with a sliding groove, the bottom end of the screen plate is provided with a first motor, an output shaft of the first motor is fixedly connected with the bottom end of the turntable, the top end of the turntable is fixedly provided with two positioning columns, and the turntable is in sliding connection with the sliding groove.

Preferably, the outer wall at the middle part of one side of the box body is fixedly provided with a hot air pipe, one end of the hot air pipe is arranged on the inner wall of the box body, and the middle part of the hot air pipe is fixedly provided with a first valve.

Preferably, the bottom end of the cavity positioned on the other side is fixedly provided with a drain pipe, and the middle part of the drain pipe is fixedly provided with a second valve.

Preferably, the outer wall of the bottom end of the box body is fixedly provided with two water pumps, the water inlet ends of the two water pumps are fixedly communicated with the bottoms of the two cavities through guide pipes respectively, and the water outlet ends of the two water pumps are fixedly communicated with one of the liquid spraying pipes and the interior of one of the liquid spraying pipes through guide pipes respectively.

Preferably, two strip-shaped openings are formed in the outer wall of the box body, and one sides of the two strip-shaped openings are hinged with box doors.

Compared with the prior art, the beneficial effects of the utility model are that:

1) in the work, through the cooperation of the two telescopic cylinders, the two water pumps, the worm and the like, the output ends of the two telescopic cylinders drive the screen cylinder to move downwards so as to be immersed into the cleaning liquid in one cavity, the corresponding water pumps are started simultaneously, the water pumps suck the cleaning liquid at the bottom, then the liquid is sprayed out through the liquid spraying pipe, the washing speed of the cleaning liquid on the quartz wafer is accelerated, the washing time is reduced, after a certain time, the screen cylinder is driven to move upwards through the telescopic cylinders, then the second motor is started, the output shaft of the second motor drives the worm to rotate, the worm drives the moving block to move to the box body in the middle in a threaded mode, then the moving block is immersed into the hot water through the telescopic cylinders, the corresponding water pumps are started simultaneously, the water pumps suck the hot water at the bottom, and then the hot water is sprayed out through the water spraying pipe, thereby accelerating the washing speed of the hot water to the quartz wafer and reducing the washing time;

2) in operation, through the carousel that sets up, the reference column, the cooperation of first motor and steam pipe etc. is used, through inside removing the cavity that is located the opposite side with a sieve section of thick bamboo, open another chamber door, wherein a sieve section of thick bamboo is connected with two telescopic cylinder can dismantle, remove the top of carousel with a sieve section of thick bamboo, the lantern ring that makes sieve section of thick bamboo both sides fixed mounting cup joints with two reference columns respectively, then start first motor, the output shaft of first motor drives the carousel and rotates, open first valve simultaneously, steam passes through the steam pipe blowout, thereby air-dry the processing to the inside quartz wafer of a rotatory sieve section of thick bamboo, it handles to rotate the air-dried direction in limit through the limit, can improve the cleaning efficiency to quartz wafer.

Drawings

The accompanying drawings are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention, and together with the description serve to explain the invention and not to limit the invention. In the drawings:

fig. 1 is a schematic structural view of the present invention;

FIG. 2 is a schematic view of the internal structure of the present invention;

FIG. 3 is a schematic view of the structure of the liquid spraying tube of the present invention;

in the figure: 1. a box body; 2. a partition plate; 3. a guide bar; 4. a worm; 5. a moving block; 6. a telescopic cylinder; 7. a screen cylinder; 8. a liquid spraying pipe; 9. a water spray pipe; 10. a screen plate; 11. a first motor; 12. a turntable; 13. a positioning column; 14. a hot gas pipe; 15. a second motor; 16. a water pump; 17. and (4) a box door.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments; based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

In the first embodiment, as shown in fig. 1-3, the utility model comprises a box body 1, two partition plates 2 are fixedly installed at the bottom of the box body 1, a second motor 15 is fixedly installed at the top of one side of the box body 1 and can drive a moving block 5 to move horizontally, the output shaft of the second motor 15 is fixedly connected with one end of a worm 4, the other end of the worm 4 is rotatably connected with the inner wall of the box body 1 through a bearing, the middle part of the worm 4 is connected with a screw hole through a thread which is arranged at the bottom of the moving block 5, a round hole is arranged at the top of the moving block 5 and is connected with a guide rod 3 in an inserting way, both ends of the guide rod 3 are fixedly connected with the inner wall of the box body 1, two telescopic cylinders 6 are fixedly installed at the bottom of the moving block 5 and can drive a screen cylinder 7 to move vertically, the output ends of the two telescopic, the inner wall fixed mounting that is located the cavity of one side has two spray pipes 8, through the fixed intercommunication of two first connecting pipes between two spray pipes 8, and the inner wall fixed mounting that is located the cavity at middle part has two spray pipes 9, through the fixed intercommunication of two second connecting pipes between two spray pipes 9, can wash quartz wafer.

In the second embodiment, on the basis of the first embodiment, the mesh plate 10 is fixedly installed in the middle of the cavity on the other side, a sliding groove is formed in the inner wall of the mesh plate 10, the first motor 11 is installed at the bottom end of the mesh plate 10, an output shaft of the first motor 11 is fixedly connected with the bottom end of the rotating disc 12, two positioning columns 13 are fixedly installed at the top end of the rotating disc 12, and the rotating disc 12 is slidably connected with the sliding groove and can drive the quartz wafers inside the screen drum 7 to rotate.

Third embodiment, on the basis of the first embodiment, the outer wall of the middle part of one side of the box body 1 is fixedly provided with the hot air pipe 14, one end of the hot air pipe 14 is arranged on the inner wall of the box body 1, and the middle part of the hot air pipe 14 is fixedly provided with the first valve, so that the quartz wafer can be air-dried.

Fourth embodiment, on the basis of first embodiment, the bottom fixed mounting that is located the cavity of opposite side has the drain pipe, and the middle part fixed mounting of drain pipe has the second valve, the drainage of being convenient for.

In the fifth embodiment, on the basis of the first embodiment, two water pumps 16 are fixedly installed on the outer wall of the bottom end of the box body 1, water inlet ends of the two water pumps 16 are fixedly communicated with the bottoms of the two cavities through guide pipes respectively, and water outlet ends of the two water pumps 16 are fixedly communicated with the interiors of one of the water spray pipes 8 and one of the water spray pipes 9 through guide pipes respectively, so that liquid in the two cavities can flow, and the washing rate of the quartz wafers in the sieve cylinder 7 is increased.

Sixth embodiment, on the basis of first embodiment, two bar openings have been seted up to the outer wall of box 1, and two bar openings's one side all articulates there is chamber door 17, the getting of quartz wafer of being convenient for is put.

The working principle is as follows: when the washing machine works, firstly one of the box doors 17 is opened, the quartz wafer is integrally placed inside the screen cylinder 7, then the two telescopic cylinders 6 are started, the output ends of the two telescopic cylinders 6 drive the screen cylinder 7 to move downwards so as to be immersed into the washing liquid inside one of the cavities, meanwhile, the corresponding water pumps 16 are started, the water pumps 16 suck the washing liquid at the bottom, then the liquid is sprayed out through the liquid spraying pipes 8, so that the washing speed of the washing liquid on the quartz wafer is accelerated, the washing time is reduced, after a certain time, the telescopic cylinders 6 drive the screen cylinder 7 to move upwards, then, the second motors 15 are started, the output shafts of the second motors 15 drive the worms 4 to rotate, the worms 4 drive the moving blocks 5 to move to the box body 1 positioned in the middle part in a threaded mode, then the quartz wafer is immersed into hot water through the telescopic cylinders 6, and meanwhile, the corresponding, water pump 16 inhales the hot water of bottom, then spout hot water through spray pipe 9, thereby accelerate hot water to quartz wafer's washing rate, reduce the flushing time, after the definite time, it is inside to move sieve section of thick bamboo 7 to the cavity that is located the opposite side through same mode, open another chamber door 17, wherein sieve section of thick bamboo 7 is detachable with two telescopic cylinder 6 and is connected, it moves the top of carousel 12 to sieve section of thick bamboo 7, the lantern ring that makes sieve section of thick bamboo 7 both sides fixed mounting cup joints with two reference column 13 respectively, then start first motor 11, the output shaft of first motor 11 drives carousel 12 and rotates, open first valve simultaneously, steam passes through the blowout of steam pipe 14, thereby air-dry the inside quartz wafer of a rotatory sieve section of thick bamboo 7, high efficiency.

It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims

1. A quartz wafer cleaning device comprises a box body (1), and is characterized in that: the bottom of the box body (1) is fixedly provided with two partition plates (2), the top of one side of the box body (1) is fixedly provided with a second motor (15), an output shaft of the second motor (15) is fixedly connected with one end of a worm (4), the other end of the worm (4) is rotatably connected with the inner wall of the box body (1) through a bearing, the middle part of the worm (4) is in threaded connection with a screw hole, the screw hole is formed in the bottom of a moving block (5), the top of the moving block (5) is provided with a round hole, the round hole is in alternate connection with a guide rod (3), two ends of the guide rod (3) are fixedly connected with the inner wall of the box body (1), the bottom of the moving block (5) is fixedly provided with two telescopic cylinders (6), output ends of the two telescopic cylinders (6) are fixedly connected with the top end of a screen cylinder (7), two sides of the screen cylinder (7) are provided with lantern rings, the two liquid spraying pipes (8) are fixedly communicated through two first connecting pipes, the inner wall of the cavity positioned in the middle is fixedly provided with two water spraying pipes (9), and the two water spraying pipes (9) are fixedly communicated through two second connecting pipes.

2. A quartz wafer cleaning apparatus according to claim 1, wherein: the middle part of the cavity, which is positioned on the other side, is fixedly provided with a screen plate (10), the inner wall of the cavity is provided with a sliding groove, the bottom end of the screen plate (10) is provided with a first motor (11), the output shaft of the first motor (11) is fixedly connected with the bottom end of a rotating disc (12), the top end of the rotating disc (12) is fixedly provided with two positioning columns (13), and the rotating disc (12) is in sliding connection with the sliding groove.

3. A quartz wafer cleaning apparatus according to claim 1, wherein: the outer wall of box (1) one side middle part is fixed with steam pipe (14), and the inner wall of box (1) is arranged in to steam pipe (14) one end, and the middle part fixed mounting of steam pipe (14) has first valve.

4. A quartz wafer cleaning apparatus according to claim 1, wherein: and the bottom end of the cavity positioned on the other side is fixedly provided with a drain pipe, and the middle part of the drain pipe is fixedly provided with a second valve.

5. A quartz wafer cleaning apparatus according to claim 1, wherein: the outer wall of the bottom end of the box body (1) is fixedly provided with two water pumps (16), the water inlet ends of the two water pumps (16) are fixedly communicated with the bottoms of the two cavities through guide pipes respectively, and the water outlet ends of the two water pumps (16) are fixedly communicated with the interiors of one of the liquid spraying pipes (8) and one of the water spraying pipes (9) through the guide pipes respectively.

6. A quartz wafer cleaning apparatus according to claim 1, wherein: two strip-shaped openings are formed in the outer wall of the box body (1), and a box door (17) is hinged to one side of each strip-shaped opening.