CN210497413U - Quartz wafer decontamination plant - Google Patents
Quartz wafer decontamination plant Download PDFInfo
- Publication number
- CN210497413U CN210497413U CN201921500294.9U CN201921500294U CN210497413U CN 210497413 U CN210497413 U CN 210497413U CN 201921500294 U CN201921500294 U CN 201921500294U CN 210497413 U CN210497413 U CN 210497413U
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- Prior art keywords
- quartz wafer
- water
- fixedly connected
- control switch
- base
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Abstract
The utility model relates to the technical field of quartz wafers, and discloses a quartz wafer decontamination device, which solves the problems that the prior quartz wafer decontamination device on the market has complicated operation in the decontamination process of the quartz wafer, causes certain trouble for the work of related personnel, and the prior quartz wafer decontamination device has lower decontamination efficiency of the quartz wafer and influences the production benefit of enterprises, and comprises a base, wherein a first mounting groove is arranged in the base, the decontamination efficiency of the quartz wafer by the quartz wafer decontamination device is higher, and the production benefit of enterprises is improved.
Description
Technical Field
The utility model belongs to the technical field of quartz wafer, specifically be a quartz wafer decontamination plant.
Background
Quartz, a geological term generally refers to low temperature quartz (α -quartz), which is a mineral in the broadest distribution of the group of quartz minerals, and quartz in the broad sense also includes high temperature quartz (β -quartz), chrysolite, etc., and its main component is SiO2, which is colorless and transparent, and often contains a small amount of impurity components, but becomes translucent or opaque crystals, and is hard, and after the quartz wafer is manufactured, the surface of the quartz wafer is stained, and the surface of the quartz wafer needs to be decontaminated, so that a quartz wafer decontamination device is needed.
However, the quartz wafer decontamination device in the current market is complex to operate in the decontamination process of the quartz wafer, and causes certain trouble to the work of related personnel, and the existing quartz wafer decontamination device has low decontamination efficiency of the quartz wafer, thereby affecting the production benefit of enterprises.
Disclosure of Invention
To the above situation, for overcoming prior art's defect, the utility model provides a quartz wafer decontamination plant, the effectual quartz wafer decontamination plant of having solved on the existing market, at the decontamination in-process to quartz wafer, the operation is comparatively loaded down with trivial details, has caused certain trouble for relevant personnel's work, and in addition, current quartz wafer decontamination plant is lower to quartz wafer's decontamination efficiency, has influenced the productivity effect's of enterprise problem.
In order to achieve the above object, the utility model provides a following technical scheme: the utility model provides a quartz wafer decontamination plant, the on-line screen storage device comprises a base, first mounting groove has been seted up to the inside of base, the top fixedly connected with U type frame of base, the inside fixed mounting of first mounting groove has the motor, the output shaft of motor is through inlaying the first bearing fixedly connected with dead lever at base top, the top of dead lever is through inlaying second bearing and U type frame swing joint at U type frame top, two fixed plates of fixedly connected with on the dead lever, the top fixedly connected with water tank of U type frame, the top fixed mounting of U type frame has two water pumps, the both sides of water tank all through first water pipe respectively with two water pump fixed connection, the equal fixedly connected with second water pipe in bottom of two water pumps, the equal fixed mounting in bottom of two second water pipes has the shower nozzle.
Preferably, the second mounting groove has all been seted up to the both sides of U type frame, and the equal fixed mounting in inside of second mounting groove has the electric heating net.
Preferably, the clamping grooves are formed in the two sides of the top of the fixing plate, the spring is fixedly connected to one side of each clamping groove, and the fixing frame is fixedly connected to one side of the spring.
Preferably, the top of the water tank is provided with a water inlet, and the top end of the water inlet is in threaded connection with a cover.
Preferably, one side of the water tank is fixedly connected with an observation window, and the observation window is made of plastic materials.
Preferably, the front surface of the base is fixedly provided with a first control switch, a second control switch and a third control switch, and the motor, the two water pumps and the two electric heating nets are respectively electrically connected with an external power supply through the first control switch, the second control switch and the third control switch.
Compared with the prior art, the beneficial effects of the utility model are that:
1) during work, the quartz wafer decontamination device is convenient to operate and convenient for relevant personnel to work in the decontamination process of the quartz wafer by arranging the fixing plate, the clamping groove, the spring and the fixing frame, and the quartz wafer is convenient for the personnel to fix and take down the quartz wafer by the arranged spring and the fixing frame;
2) the utility model discloses a quartz wafer decontamination device, including a quartz wafer decontamination device, a water tank, a water pump, first water pipe, the second water pipe, shower nozzle and fixed plate, make this quartz wafer decontamination device higher to quartz wafer's decontamination efficiency, the productivity effect of enterprise has been improved, through two fixed plates that set up, can once rinse four quartz wafer simultaneously, through the motor that sets up, be convenient for drive quartz wafer and rotate, thereby to quartz wafer abluent more complete, through water tank and the water pump that sets up, also to a certain extent, the washing to quartz wafer has been made things convenient for.
Drawings
The accompanying drawings are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention, and together with the description serve to explain the invention and not to limit the invention. In the drawings:
FIG. 1 is a subjective view of the present invention;
fig. 2 is a cross-sectional view of the present invention;
FIG. 3 is an enlarged view of the point A in FIG. 2 according to the present invention;
in the figure: 1. a base; 2. a U-shaped frame; 3. a motor; 4. fixing the rod; 5. a fixing plate; 6. a water tank; 7. a water pump; 8. a first water pipe; 9. a second water pipe; 10. an electrical heating grid; 11. a spring; 12. a fixed mount; 13. an observation window; 14. a first mounting groove; 15. a spray head; 16. and a second mounting groove.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments; based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
In the first embodiment, as shown in fig. 1 and 2, the present invention comprises a base 1, a first mounting groove 14 is formed inside the base 1, a U-shaped frame 2 is fixedly connected to the top of the base 1, a motor 3 is fixedly mounted inside the first mounting groove 14, so as to drive a quartz wafer to rotate, thereby cleaning the quartz wafer more completely, a fixing rod 4 is fixedly connected to an output shaft of the motor 3 through a first bearing embedded in the top of the base 1, the top end of the fixing rod 4 is movably connected to the U-shaped frame 2 through a second bearing embedded in the top of the U-shaped frame 2, two fixing plates 5 are fixedly connected to the fixing rod 4, a water tank 6 is fixedly connected to the top of the U-shaped frame 2, two water pumps 7 are fixedly mounted on the top of the U-shaped frame 2, so as to clean the quartz wafer conveniently, two sides of the water tank 6 are respectively and fixedly connected to the two water, the bottom ends of the two water pumps 7 are fixedly connected with the second water pipes 9, the bottom ends of the two second water pipes 9 are fixedly provided with the spray heads 15, and quartz wafers are cleaned more cleanly and thoroughly
In the second embodiment, on the basis of the first embodiment, as shown in fig. 1 and fig. 2, the two sides of the U-shaped frame 2 are both provided with second mounting grooves 16, and the electric heating net 10 is fixedly mounted inside the second mounting grooves 16, so that the cleaned quartz wafers can be dried conveniently.
In the third embodiment, on the basis of the first embodiment, as shown in fig. 3, the two sides of the top of the fixing plate 5 are both provided with a clamping groove, one side of the clamping groove is fixedly connected with a spring 11, and one side of the spring 11 is fixedly connected with a fixing frame 12, so that a worker can fix the quartz wafer on the fixing plate 5 conveniently.
Fourth embodiment, on the basis of first embodiment, given by fig. 1, the water inlet has been seted up at the top of water tank 6, and the top threaded connection of water inlet has the lid, and the relevant personnel of being convenient for add water to water tank 6.
In the fifth embodiment, based on the first embodiment, as shown in fig. 1, an observation window 13 is fixedly connected to one side of the water tank 6, and the observation window 13 is made of a plastic material, so that a worker can conveniently observe the amount of water in the water tank 6.
Sixth embodiment, on the basis of the first embodiment, as shown in fig. 1 and 2, a first control switch, a second control switch and a third control switch are fixedly installed on the front surface of the base 1, and the motor 3, the two water pumps 7 and the two electric heating networks 10 are electrically connected with an external power supply through the first control switch, the second control switch and the third control switch respectively, so that a worker can control the working states of the motor 3, the two water pumps 7 and the two electric heating networks 10 conveniently.
In this embodiment: the motor 3 is a YH802-2 type motor.
The working principle is as follows: the during operation, at first fix the quartz wafer who treats the decontamination on fixed plate 5 through spring 11 and mount 12, press first control switch, motor 3 drives fixed plate 5 and quartz wafer and rotates, press second control switch, two water pumps 7 begin to work, pass through the blowout of second water pipe 9 with the water of water tank 6, shower nozzle 15's setting, make this device more clean thorough to quartz wafer abluent, after the washing is accomplished, press third control switch, two electric heating net 10 begin to work, dry quartz wafer, the staff packs up quartz wafer after the stoving.
It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (6)
1. A quartz wafer decontamination device comprises a base (1), and is characterized in that: the water pump water heater is characterized in that a first mounting groove (14) is formed in the base (1), the top of the base (1) is fixedly connected with a U-shaped frame (2), a motor (3) is fixedly mounted in the first mounting groove (14), an output shaft of the motor (3) is fixedly connected with a fixed rod (4) through a first bearing embedded in the top of the base (1), the top end of the fixed rod (4) is movably connected with the U-shaped frame (2) through a second bearing embedded in the top of the U-shaped frame (2), the fixed rod (4) is fixedly connected with two fixed plates (5), the top of the U-shaped frame (2) is fixedly connected with a water tank (6), the top of the U-shaped frame (2) is fixedly mounted with two water pumps (7), two sides of the water tank (6) are respectively and fixedly connected with the two water pumps (7) through first water pipes (8), the bottom ends of the two water pumps (7, the bottom ends of the two second water pipes (9) are fixedly provided with spray heads (15).
2. The quartz wafer desmear device of claim 1, wherein: second mounting groove (16) have all been seted up to the both sides of U type frame (2), and the equal fixed mounting in inside of second mounting groove (16) has electric heating net (10).
3. The quartz wafer desmear device of claim 1, wherein: the clamping grooves are formed in the two sides of the top of the fixing plate (5), one side of each clamping groove is fixedly connected with a spring (11), and one side of each spring (11) is fixedly connected with a fixing frame (12).
4. The quartz wafer desmear device of claim 1, wherein: the top of the water tank (6) is provided with a water inlet, and the top end of the water inlet is in threaded connection with a cover.
5. The quartz wafer desmear device of claim 1, wherein: one side of the water tank (6) is fixedly connected with an observation window (13), and the observation window (13) is made of plastic materials.
6. The quartz wafer desmear device of claim 1, wherein: the front fixed mounting of base (1) has first control switch, second control switch and third control switch, and motor (3), two water pump (7) and two electric heating net (10) are respectively through first control switch, second control switch and third control switch and external power source electric connection.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201921500294.9U CN210497413U (en) | 2019-09-10 | 2019-09-10 | Quartz wafer decontamination plant |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201921500294.9U CN210497413U (en) | 2019-09-10 | 2019-09-10 | Quartz wafer decontamination plant |
Publications (1)
Publication Number | Publication Date |
---|---|
CN210497413U true CN210497413U (en) | 2020-05-12 |
Family
ID=70569000
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201921500294.9U Expired - Fee Related CN210497413U (en) | 2019-09-10 | 2019-09-10 | Quartz wafer decontamination plant |
Country Status (1)
Country | Link |
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CN (1) | CN210497413U (en) |
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2019
- 2019-09-10 CN CN201921500294.9U patent/CN210497413U/en not_active Expired - Fee Related
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20200512 Termination date: 20200910 |
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CF01 | Termination of patent right due to non-payment of annual fee |