CN210444590U - Micro-etching device - Google Patents
Micro-etching device Download PDFInfo
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- CN210444590U CN210444590U CN201921429278.5U CN201921429278U CN210444590U CN 210444590 U CN210444590 U CN 210444590U CN 201921429278 U CN201921429278 U CN 201921429278U CN 210444590 U CN210444590 U CN 210444590U
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Abstract
The utility model discloses a lose device a little, including losing pond, electrolytic bath and allotment pond a little, lose the liquid outlet in pond a little with the inlet intercommunication of electrolytic bath, the liquid outlet of electrolytic bath communicate in the inlet of allotment pond, the liquid outlet of allotment pond with the inlet intercommunication in pond a little. It can be understood that the technical scheme of the utility model can improve the microetching speed of microetching liquid.
Description
Technical Field
The utility model relates to a printing board etching technical field, in particular to lose device a little.
Background
The printed board is put into a microetching pool for microetching treatment before the solder resist process treatment, and in most cases, the printed board is printedMicroetching of plates with Cu2+Micro-etching solution of (2), by Cu2+And oxidizing the copper foil on the surface of the printed board under an acidic buffer condition, thereby realizing the microetching of the printed board. During this redox reaction, Cu is formed+Can be oxidized and converted into Cu by oxygen in the air2 +. Therefore, as the microetching process proceeds, Cu in the microetching solution2+Will be higher and higher. When Cu is in micro-etching liquid2+At a lower concentration of (2), with Cu2+The concentration of the etching solution is increased, and the micro-etching speed is increased; when Cu2+When the concentration increases to near saturation, Cu2+Will settle and thus the microetching speed will be greatly slowed down.
The above is only for the purpose of assisting understanding of the technical solutions of the present application, and does not represent an admission that the above is prior art.
SUMMERY OF THE UTILITY MODEL
The main object of the present invention is to provide a micro-etching device, which is aimed at increasing the micro-etching speed of micro-etching solution.
In order to achieve the above object, the utility model provides a lose device a little, including losing pond, electrolytic bath and allotment pond a little, lose the liquid outlet in pond a little with the inlet intercommunication of electrolytic bath, the liquid outlet of electrolytic bath communicate in the inlet of allotment pond, the liquid outlet of allotment pond with lose the inlet intercommunication in pond a little.
Optionally, the electrolytic cell includes a liquid storage tank and an electrolytic cell, a liquid inlet of the liquid storage tank is communicated with a liquid outlet of the microetching cell, a liquid outlet of the liquid storage tank is communicated with a liquid inlet of the electrolytic cell, and a liquid outlet of the electrolytic cell is communicated with a liquid inlet of the blending cell.
Optionally, the cathode of the electrolytic cell is a copper electrode and the anode of the electrolytic cell is an inert electrode.
Optionally, a first liquid level meter is arranged in the electrolytic cell, the electrolytic cell is communicated with the blending tank through a first pipeline, a first infusion pump is arranged on the first pipeline, and the first infusion pump is electrically connected with the first liquid level meter.
Optionally, a second collecting barrel is arranged on the first pipeline between the blending pool and the first infusion pump.
Optionally, a first collecting barrel is arranged between the liquid storage tank and the micro-etching tank, a liquid outlet of the micro-etching tank is communicated with a liquid inlet of the first collecting barrel, and a liquid outlet of the first collecting barrel is communicated with a liquid inlet of the liquid storage tank.
Optionally, a detection meter is installed in the blending tank, the blending tank is communicated with the microetching tank through a second pipeline, a second infusion pump is arranged on the second pipeline, and the second infusion pump is electrically connected with the detection meter.
Optionally, a third collecting barrel is arranged on the second pipeline between the second infusion pump and the microetching pool.
Optionally, the third collecting vessel with between the microetching pond be equipped with on the second pipeline and add the bucket, be equipped with the second level gauge in the bucket of adding, add the bucket with between the third collecting vessel the second pipeline is equipped with the third transfer pump, the third transfer pump with the second level gauge electricity is connected.
Optionally, the microetching pond with add between the bucket be equipped with the fourth transfer pump on the second pipeline, optical sensor is installed to the entrance in microetching pond, the fourth transfer pump with the optical sensor electricity is connected.
In the technical scheme of the utility model, the liquid outlet of declining the pond with the inlet of electrolytic bath communicates, the liquid outlet of electrolytic bath communicate in the inlet of allotment pond, the liquid outlet of allotment pond with the inlet of declining the pond communicates. Thus, when the device is used for microetching the printed board, the microetching liquid with high copper content in the microetching pool flows to the electrolytic tank, the electrolytic tank electrolyzes copper ions in the microetching liquid, so that the copper ions are converted into copper simple substances, the copper ion content in the microetching liquid is reduced, the treatment liquid with low copper content is formed, the treatment liquid with low copper content flows to the blending pool again, and is converted into sub-liquid through blending and flows back to the microetching pool. The daughter liquid is prepared from the treatment liquid with low copper content, so that the copper ion concentration of the daughter liquid is very low, and the daughter liquid with low copper content flows into the microetching pool, thereby reducing the copper ion content of the microetching liquid in the microetching pool, avoiding the copper ion content of the microetching liquid from reaching saturation, and keeping the copper ion content of the microetching liquid at the high-efficiency microetching concentration. It can be understood that the technical scheme of the utility model can improve the microetching speed of microetching liquid.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the structures shown in the drawings without creative efforts.
FIG. 1 is a schematic structural diagram of an embodiment of the microetching device of the present invention;
the reference numbers illustrate:
| reference numerals | Name (R) | Reference numerals | Name (R) |
| 1 | |
410 | |
| 100 | |
420 | Second |
| 110 | |
500 | First |
| 200 | |
600 | |
| 210 | |
610 | |
| 220 | |
620 | |
| 221 | First |
630 | Add |
| 300 | |
631 | Second |
| 310 | |
640 | |
| 400 | |
650 | The fourth infusion pump |
The objects, features and advantages of the present invention will be further described with reference to the accompanying drawings.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts belong to the protection scope of the present invention.
It should be noted that all the directional indicators (such as upper, lower, left, right, front and rear … …) in the embodiment of the present invention are only used to explain the relative position relationship between the components, the motion situation, etc. in a specific posture (as shown in the drawings), and if the specific posture is changed, the directional indicator is changed accordingly.
The utility model provides a micro-etching device 1, aiming at improving the micro-etching speed of micro-etching liquid.
Referring to fig. 1, in an embodiment of the present invention, the microetching device 1 includes a microetching tank 100, an electrolytic cell 200 and a blending tank 300, wherein a liquid outlet of the microetching tank 100 is communicated with a liquid inlet of the electrolytic cell 200, a liquid outlet of the electrolytic cell 200 is communicated with a liquid inlet of the blending tank 300, and a liquid outlet of the blending tank 300 is communicated with a liquid inlet of the microetching tank 100.
In the technical scheme of the utility model, the liquid outlet of declining pond 100 with the inlet of electrolytic bath 200 communicates, the liquid outlet of electrolytic bath 200 communicate in the inlet of allotment pond 300, the liquid outlet of allotment pond 300 with the inlet of declining pond 100 communicates. Thus, when the device is used for microetching the printed board, the microetching liquid with high copper content in the microetching pool 100 flows to the electrolytic pool 200, the electrolytic pool 200 electrolyzes copper ions in the microetching liquid, so that the copper ions are converted into copper simple substances, the copper ion content in the microetching liquid is reduced, the treatment liquid with low copper content is formed, the treatment liquid with low copper content flows to the preparation pool 300, and the treatment liquid with low copper content is converted into sub-liquid through preparation and flows back to the microetching pool 100. Because the sub-liquid is prepared from the treatment liquid with low copper content, the copper ion concentration of the sub-liquid is very low, and the sub-liquid with low copper content flows into the micro-etching pool 100, so that the copper ion content of the micro-etching liquid in the micro-etching pool 100 is reduced, the copper ion content of the micro-etching liquid is prevented from reaching saturation, and the copper ion content of the micro-etching liquid is kept at a high-efficiency micro-etching concentration. It can be understood that the technical scheme of the utility model can improve the microetching speed of microetching liquid.
Furthermore, in the embodiment of the present invention, the high copper concentration micro-etching solution passing through the electrolytic micro-etching tank 100 is converted into the low copper concentration sub-solution for reuse. Compare with handling high copper concentration microetching liquid through acid-base neutralization method, the embodiment of the utility model provides a copper in the microetching liquid not only can be drawed to, the processing liquid of drawing the copper can be reconciled into the seed liquid again, has realized the cyclic utilization of microetching liquid with this, has reduced the running cost of microetching device 1.
It should be noted that, the embodiment of the present invention provides a setting position of the liquid outlet of the microetching pool 100 is higher than a setting position of the liquid inlet of the microetching pool 100, the liquid outlet of the microetching pool 100 is disposed on the upper portion of the microetching pool 100, and the liquid inlet of the microetching pool 100 is disposed at the bottom of the microetching pool 100, so that when the liquid level position of the microetching pool 100 is higher than the setting position of the liquid outlet of the microetching pool 100, the microetching liquid in the microetching pool 100 overflows and flows to the electrolytic bath 200, thereby realizing the automatic transportation of the microetching liquid.
Referring to fig. 1, in an embodiment of the present invention, the electrolytic cell 200 includes a liquid storage tank 210 and an electrolytic cell 220, a liquid inlet of the liquid storage tank 210 is communicated with a liquid outlet of the microetching tank 100, a liquid outlet of the liquid storage tank 210 is communicated with a liquid inlet of the electrolytic cell 220, and a liquid outlet of the electrolytic cell 220 is communicated with a liquid inlet of the blending tank 300. Of course, when the reservoir 210 is separated from the electrolytic bath 220 by a partition, the reservoir 210 may communicate with the electrolytic bath 220 through a communication hole; when the liquid storage tank 210 and the electrolytic tank 220 are two independent structures, the electrolytic tank 220 and the liquid storage tank 210 can be communicated through a communicating pipe, and the communication mode of the two liquid storage tanks 210 and the electrolytic tank 220 is within the protection scope of the invention. In the embodiment, by arranging the liquid storage tank 210, the electrolyte in the microetching pool 100 firstly flows into the liquid storage tank 210, and then flows into the electrolytic tank 220 through the communication hole or the communication pipe between the liquid storage tank 210 and the electrolytic tank 220, so that a large amount of microetching liquid in the microetching pool 100 is prevented from flowing into the electrolytic tank 220, and the electrolytic reaction in the electrolytic tank 200 is ensured to be performed sufficiently and stably.
Referring to fig. 1, in an embodiment of the present invention, the cathode of the electrolytic cell 220 is a copper electrode, and the anode of the electrolytic cell 220 is an inert electrode. In the reaction of the electrolytic cell 200, the cathode is subjected to a reduction reaction, copper ions in the microetching solution are reduced into a copper simple substance, and the generated copper simple substance is deposited on the copper foil or the copper plate, so that the copper content in the microetching solution is reduced; meanwhile, the anode generates oxidation reaction, and water molecules are oxidized into oxygen and hydrogen ions, so that the acidity of the micro-etching solution is enhanced, and the micro-etching effect of the micro-etching solution is improved. Moreover, no toxic gas is generated in the process, and no environmental pollution is caused. Of course, the inert electrode is preferably a mesh titanium electrode to form cathodic protection.
Referring to fig. 1, in an embodiment of the present invention, a first liquid level meter 221 is disposed in the electrolytic cell 220, the electrolytic cell 220 is communicated with the blending tank 300 through a first pipeline 400, the first pipeline 400 is provided with a first infusion pump 410, and the first infusion pump 410 is electrically connected to the first liquid level meter 221. Note that the first infusion pump 410 is used to deliver the electrolyzed processing liquid in the electrolytic cell 200 to the second collection barrel 420. The embodiment of the utility model provides a detect the liquid level of the interior microetching liquid of electrolysis trough 220 through first level gauge 221, first level gauge 221 transmits the liquid level information who detects for first transfer pump 410, and after the liquid level of the microetching liquid reached the appointed height, first transfer pump 410 automatic start carries the treatment fluid after the electrolytic reaction in the electrolysis trough 220 to blending tank 300, and like this, the liquid in the interpolation pond flows electrolysis trough 220 again, and so circulation is relapse, constantly will corrode the microetching liquid electrolysis that 100 transport in the pond a little.
Referring to fig. 1, in an embodiment of the present invention, a second collecting barrel 420 is further disposed on the first pipe 400 between the blending tank 300 and the first infusion pump 410. The embodiment of the utility model provides a through setting up second collecting vessel 420, collect the treatment fluid after the electrolysis through second collecting vessel 420. Thus, after the blending tank 300 finishes blending, the treatment fluid in the second collecting barrel 420 is transferred to the blending tank 300 for blending, thereby ensuring the normal operation of the blending process.
Referring to fig. 1, in an embodiment of the present invention, a first collecting barrel 500 is disposed between the liquid storage tank 210 and the microetching pool 100, a liquid outlet of the microetching pool 100 is communicated with a liquid inlet of the first collecting barrel 500, and a liquid outlet of the first collecting barrel 500 is communicated with a liquid inlet of the liquid storage tank 210. In a similar way, in order to guarantee the normal operation of electrolytic reaction in the electrolytic cell 200, the embodiment of the utility model provides a set up first collecting vessel 500, after the microetching liquid in the electrolytic cell 200 fully electrolyzes, carry the microetching liquid of collecting in the first collecting vessel 500 to the electrolytic cell 200 again to this has guaranteed the abundant of electrolytic process and has gone on. Of course, in order to guarantee the speed that the microetching liquid carried to the reservoir 210 in the first collecting vessel 500, can set up the driving pump on the pipeline between first collecting vessel 500 and the reservoir 210, the utility model discloses not be limited to this, above mode all is in the utility model discloses an within the scope.
Referring to fig. 1, in an embodiment of the present invention, a detection meter 310 is installed in the blending tank 300, the blending tank 300 is communicated with the microetching tank 100 through a second pipeline 600, the second pipeline 600 is provided with a second infusion pump 610, and the second infusion pump 610 is electrically connected with the detection meter 310. It should be noted that the second infusion pump 610 is used for delivering the prepared sub-solution in the preparation tank 300 to the third collection barrel 620. The embodiment of the utility model provides a level gauge can be pH detection sensor, also can be chloride ion detection sensor, like this, after chloride ion concentration or hydrogen ion concentration that detect the treatment fluid in allotment pond 300 reach the requirement of closing check liquid, the sub-liquid of second delivery pump automatic start in with allotment pond 300 is carried and is corroded pond 100 a little to reduce the copper ion concentration of corroding the liquid a little in the pond 100 a little, avoid the too big little rate that loses that leads to of concentration of copper ion to reduce.
Referring to fig. 1, in an embodiment of the present invention, a third collecting barrel 620 is disposed in the second pipe 600 between the second infusion pump 610 and the microetching pool 100. Under most circumstances, in order to guarantee that the seed solution in time supplies to the microetching pond 100, need allocate sufficient seed solution in advance, like this, the embodiment of the utility model provides a set up third collecting vessel 620 on second transfer pump 610 and the second pipeline 600 between the microetching pond 100, sufficient seed solution can be collected to third collecting vessel 620 to this in time supply of guaranteeing the seed solution.
Referring to fig. 1, in an embodiment of the present invention, an adding barrel 630 is disposed on the second pipeline 600 between the third collecting barrel 620 and the micro-etching pool 100, a second level gauge 631 is disposed in the adding barrel 630, the adding barrel 630 and the third collecting barrel 620 are disposed between the second pipeline 600 and the third infusion pump 640, and the third infusion pump 640 is electrically connected to the second level gauge 631. It should be noted that the third infusion pump 640 is used for delivering the sub-fluid of the third collection barrel 620 to the addition barrel 630. The embodiment of the utility model provides an in, detect the liquid level that adds the interior subplant of bucket 630 through second level gauge 631, when the liquid level that adds the interior subplant of bucket 630 is lower, third transfer pump 640 can be according to the liquid level information automatic start that second level gauge 631 detected to make the automatic replenishment of subplant to adding bucket 630, thereby guarantee that the subplant in time supplies to the microetching pond 100.
Referring to fig. 1, in an embodiment of the present invention, a fourth infusion pump 650 is disposed on the second pipeline 600 between the micro-etching pool 100 and the adding barrel 630, an optical sensor 110 is installed at an inlet of the micro-etching pool 100, and the fourth infusion pump 650 is electrically connected to the optical sensor 110. Note that the fourth infusion pump 650 is used to transfer the sub-fluid added to the tank 630 to the microetching solution 100. The embodiment of the utility model provides an in, the printing board is put into to declining through the entry that declines the pond 100 and is corroded the pond 100 a little, the embodiment of the utility model provides a set up optical sensor 110 through the entry that loses pond 100 a little, like this, lose pond 100 a little and pass through the number of times that the response printing board was put into from the entry, just can make statistics of the quantity that the printing board was put into to transmit this response signal for fourth transfer pump 650, with the transport capacity through fourth transfer pump 650 regulation daughter liquid, fully lose a little with the printing board of guaranteeing to put into. Of course, optical sensor 110 may be an infrared sensor, and may also be a laser sensor, the embodiment of the present invention is not limited thereto, and two kinds of optical sensors 110 are all within the protection scope of the embodiment of the present invention.
It is pointed out very much, first delivery pump, second transfer pump, third transfer pump and fourth transfer pump all can adopt the magnetic drive pump, of course, also can adopt force pump etc. the utility model discloses not limited to this, in addition, in order to guarantee the transport speed of liquid, also can suitably add the driving pump, above mode is all in the utility model discloses a within the protection scope.
The above is only the preferred embodiment of the present invention, not so limiting the patent scope of the present invention, all of which are in the utility model discloses a conceive, utilize the equivalent structure transform that the content of the specification and the attached drawings did, or directly/indirectly use all to include in other relevant technical fields the patent protection scope of the present invention.
Claims (10)
1. A microetching device is characterized by comprising a microetching pool, an electrolytic pool and a blending pool, wherein a liquid outlet of the microetching pool is communicated with a liquid inlet of the electrolytic pool, a liquid outlet of the electrolytic pool is communicated with a liquid inlet of the blending pool, and a liquid outlet of the blending pool is communicated with a liquid inlet of the microetching pool.
2. A microetching device according to claim 1, wherein the electrolytic bath comprises a liquid storage tank and an electrolytic bath, a liquid inlet of the liquid storage tank is communicated with a liquid outlet of the microetching tank, a liquid outlet of the liquid storage tank is communicated with a liquid inlet of the electrolytic bath, and a liquid outlet of the electrolytic bath is communicated with a liquid inlet of the mixing tank.
3. A microetching device according to claim 2, wherein the cathode of the electrolytic cell is a copper electrode and the anode of the electrolytic cell is an inert electrode.
4. The microetching device according to claim 2, wherein a first liquid level meter is provided in the electrolytic bath, the electrolytic bath and the preparation tank are communicated through a first pipeline, the first pipeline is provided with a first liquid delivery pump, and the first liquid delivery pump is electrically connected with the first liquid level meter.
5. The microetching device of claim 4, wherein a second collection barrel is disposed on the first tubing between the blending tank and the first infusion pump.
6. A microetching device according to claim 2, wherein a first collecting barrel is provided between the liquid storage tank and the microetching pool, the liquid outlet of the microetching pool is communicated with the liquid inlet of the first collecting barrel, and the liquid outlet of the first collecting barrel is communicated with the liquid inlet of the liquid storage tank.
7. The microetching device according to any one of claims 1 to 6, wherein a detection meter is installed in the mixing tank, the mixing tank and the microetching tank are communicated through a second pipeline, the second pipeline is provided with a second infusion pump, and the second infusion pump is electrically connected with the detection meter.
8. A microetching device according to claim 7, wherein the second conduit between the second infusion pump and the microetching basin is provided with a third collection barrel.
9. A microetching device according to claim 8, wherein an adding barrel is arranged on the second pipeline between the third collecting barrel and the microetching pool, a second liquid level meter is arranged in the adding barrel, a third infusion pump is arranged on the second pipeline between the adding barrel and the third collecting barrel, and the third infusion pump is electrically connected with the second liquid level meter.
10. A microetching device according to claim 9, wherein a fourth liquid delivery pump is provided on the second pipe between the microetching pool and the addition tank, an optical sensor is installed at an inlet of the microetching pool, and the fourth liquid delivery pump is electrically connected to the optical sensor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921429278.5U CN210444590U (en) | 2019-08-29 | 2019-08-29 | Micro-etching device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921429278.5U CN210444590U (en) | 2019-08-29 | 2019-08-29 | Micro-etching device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN210444590U true CN210444590U (en) | 2020-05-01 |
Family
ID=70409942
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201921429278.5U Active CN210444590U (en) | 2019-08-29 | 2019-08-29 | Micro-etching device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN210444590U (en) |
-
2019
- 2019-08-29 CN CN201921429278.5U patent/CN210444590U/en active Active
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20210111 Address after: 518125 201, building 10, Fuhua Industrial Zone, Nanbo Avenue, Tangwei community, Fuhai street, Bao'an District, Shenzhen City, Guangdong Province Patentee after: Shenzhen Qixin Environmental Protection Technology Co.,Ltd. Address before: 518125 Room 101, building 10, Fuhua Industrial Zone, Nanbo Avenue, Tangwei community, Fuhai street, Bao'an District, Shenzhen City, Guangdong Province Patentee before: SHENZHEN QIXIN TIANZHENG ENVIRONMENTAL PROTECTION TECHNOLOGY Co.,Ltd. |
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| TR01 | Transfer of patent right |