CN210398389U - Feeding system - Google Patents

Feeding system Download PDF

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Publication number
CN210398389U
CN210398389U CN201920381275.2U CN201920381275U CN210398389U CN 210398389 U CN210398389 U CN 210398389U CN 201920381275 U CN201920381275 U CN 201920381275U CN 210398389 U CN210398389 U CN 210398389U
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China
Prior art keywords
pipeline
gas
feeding
valve body
storage tank
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CN201920381275.2U
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Chinese (zh)
Inventor
王威
宋乐新
赵鹏
任苗苗
隋林超
绳镇
张英杰
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Shandong Himile Chemical Technology Co ltd
Himile Mechanical Manufacturing Co Ltd
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Shandong Himile Chemical Technology Co ltd
Himile Mechanical Manufacturing Co Ltd
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Abstract

The utility model relates to a chemical industry equipment field provides a feeding system. The system comprises a storage tank, and a liquid phase supply pipeline and a gas phase supply pipeline which are respectively communicated with the storage tank, wherein the liquid phase supply pipeline is used for supplying liquid phase raw materials to the storage tank; the gas phase supply pipeline is provided with a first valve group, and the first valve group forms on-off control between the gas inlet end and the gas outlet end of the gas phase supply pipeline and/or between the gas outlet end of the gas phase supply pipeline and the material storage tank; and a first temperature adjusting device is arranged on the material storage tank. By the above, the utility model discloses only through one set of system, alright all form stable gaseous phase material for the supply with making gaseous phase raw materials and liquid phase raw materials.

Description

Feeding system
Technical Field
The utility model relates to a chemical industry equipment field, concretely relates to feeding system.
Background
In the chemical reaction process, a gas feeding device or a feeding device capable of integrating gas and liquid is often used, that is, certain raw materials have different phase states at different temperatures or pressures, and the different phase states are required to be applied according to different application situations.
Similar materials such as chlorine/liquid chlorine, ammonia/liquid ammonia, olefin gas/liquid olefin, alkylene oxide gas/liquid alkylene oxide, and the like.
Meanwhile, the feeding amount of the materials can be accurately controlled in the using process. (the inlet and outlet pressure, the flow range and the use precision of the flowmeter are considered in the use process of the gas phase, and the inlet and outlet pressure, the flow range and the use precision of the feeding pump are considered in the use process of the liquid phase.)
Taking chlorine feeding as an example, in the chlorination reaction process, stable feeding of liquid chlorine and chlorine is a primary process, and the liquid chlorine is a low-pressure liquefying highly toxic substance, is oily and belongs to a high-risk chemical product. There are some factors of instability and insecurity in the conventional use process: the chlorine and sodium hydroxide are prepared by the chlor-alkali industry by using industrial sodium chloride and water, and the ammonium salt contained in the industrial sodium chloride and water can generate NCl in the anode plate area3And the chlorine gas is separated out along with the chlorine gas and is left in the liquid chlorine through the processes of cooling, drying, compressing and liquefying. NCl3At the bottom of the liquid chlorineAfter the liquid chlorine is volatilized to emit light, the liquid chlorine is easy to explode under certain conditions, so that the residual liquid chlorine needs to be discharged in time.
The volatilization of the liquid chlorine is a heat absorption process, and the temperature of the liquid chlorine steel cylinder is gradually reduced along with the volatilization of the liquid chlorine, so that the saturated vapor pressure is reduced. Particularly in winter, the temperature is low, so that the pressure is insufficient, the requirements of production and experiments cannot be met, the direct heating method is often adopted to accelerate vaporization, the pressure can be rapidly increased to cause instability, and some unsafe accidents are easily caused.
In view of at least one of the above problems, there is a need to develop a feeding device capable of realizing gas, or a feeding system capable of integrating gas and liquid.
SUMMERY OF THE UTILITY MODEL
In order to solve the above technical problem or at least partially solve the above technical problem, the utility model provides a feeding system.
The feeding system comprises a storage tank, and a liquid phase feeding pipeline and a gas phase feeding pipeline which are respectively communicated with the storage tank, wherein the liquid phase feeding pipeline is used for providing liquid phase raw materials for the storage tank; the gas phase supply pipeline is provided with a first valve group, and the first valve group forms on-off control between the gas inlet end and the gas outlet end of the gas phase supply pipeline and/or between the gas outlet end of the gas phase supply pipeline and the material storage tank; and a first temperature adjusting device is arranged on the material storage tank.
As an optional embodiment of the present invention, a second valve set is disposed on the liquid-phase feeding pipeline, and the second valve set forms on-off control between the liquid inlet end of the liquid-phase feeding pipeline and the storage tank;
preferably, the second valve group forms on-off control between the liquid outlet end of the liquid phase supply pipeline and the material storage tank;
preferably, the second valve group forms on-off control between the liquid inlet end and the liquid outlet end of the liquid phase feeding pipeline;
preferably, a discharge pump is arranged on the liquid-phase feeding pipeline and between the second valve group and the liquid outlet end of the liquid-phase feeding pipeline;
preferably, a pressurizing pipeline is arranged on the storage tank;
preferably, the pressurizing pipeline is the gas phase supply pipeline;
preferably, the liquid outlet end of the liquid phase feed pipeline is used for feeding the continuous reaction.
As an optional embodiment of the present invention, the first temperature adjusting device includes a temperature control device;
preferably, the feeding system further comprises a jacket arranged outside the storage tank;
preferably, a medium circulates between the temperature control device and the jacket, the temperature control device can heat or cool the medium, and the temperature of the storage tank is adjusted through the medium.
As an optional embodiment of the present invention, the first valve set forms on-off control between the air inlet end and the air outlet end.
As an optional embodiment of the present invention, the gas phase supply pipeline includes an air inlet pipeline, an air outlet pipeline and a bypass pipeline, the air outlet end of the air inlet pipeline is communicated with the storage tank, and the air inlet pipeline is sequentially provided with a first valve body and a second valve body along the air inlet direction; the air inlet end of the air outlet pipeline is communicated with the material storage tank, and the air outlet pipeline is sequentially provided with a fourth valve body and a fifth valve body along the air outlet direction; one end of the bypass pipeline is communicated with the air inlet pipeline and is positioned between the first valve body and the second valve body, and the other end of the bypass pipeline is communicated with the air outlet pipeline and is positioned between the fourth valve body and the fifth valve body; the air inlet end of the air inlet pipeline can be respectively communicated with a gas-phase raw material or a pressure test air source;
preferably, a third valve body is arranged on the bypass pipeline.
As an optional implementation manner of the utility model, gaseous phase supply pipeline includes gaseous phase main line and gaseous phase auxiliary line, the inlet end of gaseous phase main line can communicate with gaseous phase raw materials or pressure testing air supply respectively, the other end of gaseous phase main line does the end of giving vent to anger of main line, gaseous phase main line is equipped with first valve body and second valve body, the one end intercommunication of gaseous phase auxiliary line is in on the gaseous phase main line and be located between first valve body and the second valve body, the other end of gaseous phase auxiliary line with the storage tank intercommunication.
As an optional implementation manner of the utility model, the device further comprises a feeding control pipeline, wherein a feeding end of the feeding control pipeline is communicated with the gas outlet end, a discharging end of the feeding control pipeline is used for feeding, and a flow controller is arranged on the feeding control pipeline;
preferably, the flow controller is a mass flow meter.
As an optional embodiment of the present invention, a cleaning gas pipeline is connected in parallel to the feed end of the feed control pipeline, the cleaning gas pipeline is used for connecting a cleaning gas source, and a valve body is arranged on the cleaning gas pipeline;
preferably, the purge gas is nitrogen.
As an optional embodiment of the present invention, the system further comprises a drying device and a third valve set disposed on the feed control pipeline, wherein the third valve set is used for selectively connecting the drying device to the feed control pipeline;
preferably, the third valve group is connected with a cleaning gas pipeline, the cleaning gas pipeline is used for connecting a cleaning gas source, and the third valve group forms on-off control between the cleaning gas pipeline and the drying device;
preferably, the third valve group is connected with a cleaning gas pipeline, the cleaning gas pipeline is used for connecting a cleaning gas source, and the third valve group is respectively controlled to be on-off between the cleaning gas pipeline and the flow controller.
As an optional embodiment of the present invention, a second temperature adjusting device is disposed on the control pipeline;
preferably, the second temperature regulating device on the control line is disposed downstream of the drying device.
The utility model also provides a liquid chlorine filling method about above-mentioned feed system, this method is: adjusting the temperature of the material storage tank to-30-0 ℃ and the pressure to-0.1-0 MPa, and then conveying liquid chlorine into the material storage tank by using a liquid phase feeding pipeline;
preferably, the temperature in the storage tank is adjusted to-20 ℃;
preferably, the pressure in the material storage tank is regulated to-0.1 MPa;
preferably, before the liquid chlorine is conveyed into the storage tank, the storage tank is vacuumized.
The utility model also provides a chlorine supply method using the feeding system, which utilizes the first temperature adjusting device to adjust the temperature of the liquefied chlorine in the storage tank to 15-30 ℃, and controls the conduction of the storage tank and the gas outlet end of the gas phase feeding pipeline through the first valve bank to supply chlorine;
preferably, the temperature of the storage tank is adjusted to 20 ℃.
By the above, the utility model discloses only through one set of system, alright all form stable gaseous phase material for the supply with making gaseous phase raw materials and liquid phase raw materials.
Drawings
FIG. 1 is a schematic view of a feed system according to some embodiments of the present invention;
FIG. 2 is a schematic view of a feed system according to further embodiments of the present invention;
fig. 3 is a schematic view of a storage unit according to an embodiment of the present invention;
fig. 4 is a schematic diagram of a feed control unit according to an embodiment of the present invention.
Reference numerals:
1. a first valve body; 2. a second valve body; 3. a third valve body; 4. a fourth valve body; 5. a fifth valve body; 6. a sixth valve body; 7. a seventh valve body; 8. an eighth valve body; 9. a ninth valve body; 10. A tenth valve body; 11. an eleventh valve body; 12. a twelfth valve body; 13. a thirteenth valve body; 14. A fourteenth valve body; 15. a fifteenth valve body; 16. a sixteenth valve body; 17. a seventeenth valve body; 18. a gas phase feed; 20. a first temperature adjustment device; 21. a material storage tank; 22. an absorption vessel; 23. a source of purge gas; 24. a first check valve; 25. a second one-way valve; 26. a flow controller; 27. an anti-suck-back device; 28. a pressure monitoring device; 29. a jacket; 30. a pressure relief valve; 31. a first valve block; 32. a discharge pump; 33. a second valve block; 34. a primary drying device; 35. a secondary drying device; 36. a second temperature adjustment device; 37. and a third one-way valve.
Detailed Description
In order to make the above objects, features and advantages of the present invention more clearly understood, the present invention will be further described in detail with reference to the accompanying drawings and examples. It is to be understood that the embodiments described are some, but not all embodiments of the invention. The specific embodiments described herein are merely illustrative of the invention and are not intended to be limiting. All other embodiments, which can be derived from the description of the embodiments of the present invention by a person skilled in the art, are within the scope of the present invention.
The embodiment of the utility model provides a pair of feeding system, include the storage unit of constituteing by storage tank, liquid phase feed pipeline and gaseous phase feed pipeline, gaseous phase feed pipeline and liquid phase feed pipeline all can be the assembly of many pipeline sections, and not only indicate single pipe. The liquid inlet end of the liquid phase supply pipeline is used for connecting a liquid phase material source, and the liquid phase supply pipeline is used for conveying liquid phase raw materials to the storage tank; the storage tank is connected with the middle part of the gas phase supply pipeline (during conveying, the storage pipe can be vacuumized as required), the gas inlet end of the gas phase supply pipeline is used for being connected with a gas phase material source, and the gas outlet end of the gas phase supply pipeline can be directly connected with the reactor or connected with a downstream system for further processing materials. The gas phase raw material and the liquid phase raw material may be chlorine gas/liquid chlorine, ammonia gas/liquid ammonia, olefin gas/liquid olefin, alkylene oxide gas/liquid alkylene oxide, etc.
Referring to fig. 1 and 3, a first valve set 1 is disposed on the gas phase supply pipeline, and the first valve set 1 is respectively controlled to be on-off between the gas inlet end and the gas outlet end of the gas phase supply pipeline and between the gas outlet end of the gas phase supply pipeline and the material storage tank. Specifically, first valves can comprise first valve body 1 and fourth valve body 4, and first valve body 1 sets up on the inlet end of gaseous phase feed pipeline and the connecting pipeline between the end of giving vent to anger, and fourth valve body 4 sets up on the connecting pipeline between storage tank and gaseous phase feed pipeline, and wherein, the low reaches at first valve body 1 are connected to fourth valve body 4 place pipeline preferred. When the gas phase feeding device is used, two working modes are provided, wherein one mode is that the fourth valve body 4 is closed, the first valve body 1 is opened, and the gas phase feeding pipeline can directly provide an external gas source for a reactor or a downstream system; the other is that the first valve body 1 is closed, the fourth valve body 4 is opened, the gas outlet end of the gas phase supply pipeline can supply gas phase materials formed by gasification in the material storage tank to a reactor or a downstream system for use, and according to the illustration in fig. 3, the inlet of the pipeline connected to the left side of the first valve body 1 is the gas inlet end of the gas phase supply pipeline; the outlet of the pipeline connected with the right side of the fifth valve body 5 is the air outlet end of the gas phase supply pipeline. This mode requires that the temperature of the material storage tank 21 is adjusted by the first temperature adjustment device 20 disposed on the material storage tank, so that the liquid phase raw material in the material storage tank is gasified to form the gas phase material with the required pressure and stable phase state.
Therefore, the embodiment of the present invention can realize the supply of the gas phase material and/or the liquid phase material in a stable and accurate material phase state respectively only by one set of system.
In some embodiments, a second valve set 33 is provided on the liquid phase feed line, and the second valve set 33 is controlled to open and close between the liquid inlet end of the liquid phase feed line and the storage tank. Specifically, as shown in fig. 2, the liquid phase supply pipeline includes a liquid inlet pipeline for communicating the liquid phase source with the liquid storage tank, and one end of the liquid inlet pipeline connected with the liquid phase source is a liquid inlet end of the liquid phase supply pipeline; the second valve set 33 comprises a seventh valve body 7, and the seventh valve body 7 is arranged on the liquid inlet pipeline and used for controlling the connection and disconnection of the supply of the liquid phase raw material to the material storage tank.
In a further embodiment, the second valve set 33 is on/off controlled between the outlet end of the liquid phase feed line and the accumulator tank. Specifically, the liquid phase supply pipeline further comprises a liquid outlet pipeline communicated with the storage tank, the liquid outlet end of the liquid outlet pipeline is the liquid outlet end of the liquid phase supply pipeline, and the liquid outlet end of the liquid outlet pipeline is communicated with the reactor or a downstream system so as to supply the liquid phase material in the storage tank to the reactor or the downstream system; the second valve set 33 further comprises an eighth valve body 8 disposed on the liquid outlet pipe, and the eighth valve body 8 is used for controlling the connection and disconnection of the liquid-phase material to the reactor or the downstream system. The reactors connected in fig. 1 and 2 are only schematic, and may be connected non-simultaneously or may be the same or different reactors, and may be arranged as necessary.
In a further embodiment, the second valve group 33 is also on-off controlled between the inlet and outlet ends of the liquid phase feed line. Specifically, as shown in fig. 2, a communicating pipe may be communicated between the liquid inlet pipe and the liquid outlet pipe, one end of the communicating pipe is connected to the upstream of the seventh valve body 7, the other end of the communicating pipe is connected to the downstream of the eighth valve body 8, and the second valve group 33 further includes a sixth valve body 6 disposed on the communicating pipe, so that when the seventh valve body 7 and the eighth valve body 8 are closed and the sixth valve body 6 is communicated, the liquid-phase raw material may be further directly supplied to the reactor or the downstream system.
It should be noted that, the liquid inlet pipeline and the liquid outlet pipeline can be implemented by other pipeline/valve body arrangement manners besides the above-mentioned embodiments that are respectively connected to different liquid phase interfaces of the storage tank, as long as any two of the liquid inlet end, the liquid outlet end and the storage tank of the liquid phase supply pipeline can be independently conducted, for example, the liquid inlet pipeline and the liquid outlet pipeline can be further communicated with the storage tank through a common liquid pipeline, as shown in fig. 3, that is, the liquid inlet pipeline and the liquid outlet pipeline are communicated with one end of the common liquid pipeline through a three-way joint, and the other end of the common liquid pipeline is communicated with the storage tank, in this embodiment, a communicating pipe is not required to be provided, but a sixth valve body 6 in a second valve group 33 is required to be provided on the communicating pipe, and the opening and closing of the sixth valve body 6, a seventh valve body 7 and an eighth valve body 8 are controlled in a matching manner, can realize independent conduction of any two of the liquid inlet end of the storage tank, the liquid phase supply pipeline and the liquid outlet end of the liquid phase supply pipeline.
In some embodiments, a discharge pump 32 is disposed on the liquid outlet pipeline, the discharge pump 32 may be a tetrafluoro plunger pump, a back pressure valve may be disposed at a discharge port of the discharge pump 32, and the back pressure of the back pressure valve may be a certain pressure at a set temperature, preferably, the pressure is greater than or equal to its saturated vapor pressure, so as to ensure that the liquid phase material is not vaporized during the transportation process, thereby performing back pressure on a discharge port of the reactor, and ensuring that the material is kept in a liquid state during the reaction process. In other embodiments, the discharge pump 32 may not be disposed on the liquid outlet pipe, but instead, a pressurizing pipeline is connected to the storage tank 21, that is, when the storage tank 21 is used to provide the liquid-phase material, inert gas such as nitrogen gas and the like may be filled into the storage tank 21 through the pressurizing pipeline, so as to increase the discharge pressure of the liquid-phase material, thereby ensuring that the liquid-phase material has a supply amount meeting the set requirement. In a further preferred embodiment, a gas phase supply pipeline is used as the pressurizing pipeline, that is, a gas inlet end of the gas phase supply pipeline can be selectively connected with a pressurizing gas source, when a liquid phase material is provided by the storage tank 21, the gas inlet end of the gas phase supply pipeline is controlled to be communicated with the liquid storage tank 21 through the first valve set 31, and the pressurizing gas source fills inert gas such as nitrogen into the storage tank 21 through the gas phase supply pipeline, so as to provide power for the supply of the liquid phase material, and in this way, the pressurizing pipeline does not need to be separately arranged on the storage tank 21, thereby simplifying the structure.
In other embodiments, on the basis of the discharge pump 32 disposed on the liquid outlet pipe, in order to ensure that the liquid material in the liquid storage tank has sufficient pressure, inert gas such as nitrogen can be filled into the material storage tank 21 through the pressurization pipe, so as to increase the discharge pressure of the liquid material and enable the liquid material to be kept in a liquid state at a set temperature. In a further preferred embodiment, a gas phase supply pipeline is used as the pressurizing pipeline, that is, a gas inlet end of the gas phase supply pipeline can be selectively connected with a pressurizing gas source, when a liquid phase material is provided by the storage tank 21, the gas inlet end of the gas phase supply pipeline is controlled to be communicated with the liquid storage tank 21 through the first valve set 31, and the pressurizing gas source fills inert gas such as nitrogen into the storage tank 21 through the gas phase supply pipeline, so that the structure is simplified without separately providing a pressurizing pipeline on the storage tank 21.
Through the preferable liquid phase material supply mode, the system liquid can perform more stable and accurate feeding on continuous reaction.
In some embodiments, the first temperature adjusting device 20 includes a temperature control device, which can control the temperature adjustment, so that different temperature control schemes can be set according to different feeding condition requirements; the temperature control device can specifically adopt a low-temperature thermostatic bath or a cold-hot integrated machine, the low-temperature thermostatic bath is a high-precision thermostatic source with refrigeration and heating, and can provide a field source with controlled cold and hot and uniform and constant temperature; the cold and hot all-in-one machine can automatically and accurately control the temperature, can quickly reach the set temperature, and respectively displays the set value and the actual value, thereby being convenient to use.
In a further embodiment, the first temperature regulating device further comprises a jacket 29 arranged outside the storage tank, and as the jacket 29 is in a sleeve shape, a larger area of heat exchange can be formed for the storage tank 21, so that the heat exchange efficiency is improved.
In a further embodiment, a medium circulates between the temperature control device and the jacket 29, and the temperature control device can heat or cool the medium and regulate the temperature of the storage tank through the medium, thereby further improving the heat exchange efficiency.
In some embodiments, the first valve set is further used to control the connection and disconnection between the gas inlet end and the gas outlet end, that is, any two of the gas inlet end, the gas outlet end and the storage tank 21 of the gas phase supply pipeline can be separately communicated. Specifically, as shown in fig. 1, the gas phase supply pipeline may include an air inlet pipeline, an air outlet pipeline and a bypass pipeline, the air outlet end of the air inlet pipeline is communicated with the storage tank 21, and the air inlet pipeline is sequentially provided with a first valve body 1 and a second valve body 2 along the air inlet direction; the air inlet end of the air outlet pipeline is communicated with the material storage tank 21, and the air outlet pipeline is sequentially provided with a fourth valve body 4 and a fifth valve body 5 along the air outlet direction; one end of a bypass pipeline is communicated with the air inlet pipeline and is positioned between the first valve body 1 and the second valve body 2, and the other end of the bypass pipeline is communicated with the air outlet pipeline and is positioned between the fourth valve body 4 and the fifth valve body 5; the air inlet end of the air inlet pipeline can be respectively communicated with the gas-phase raw material 18 or a pressure test air source.
When the feeding system is reused every time, especially when the feeding system is restarted after being used for a long time, the storage tank 21 and pipelines and containers at the downstream of the storage tank 21 need to be subjected to pressure testing through inert gas such as nitrogen. To the first valve group 31 of the above composition mode, the pressure testing process is as follows:
first, open first valve body 1 and second valve body 2 and/or fourth valve body 4, close fifth valve body 5, can carry out the pressure testing to storage tank 21, and the pressure variation in storage tank 21 is looked over to the mode that specific accessible set up the manometer on storage tank 21, judges whether storage tank 21 takes place to leak according to pressure variation. Then, the fifth valve body 5 is opened, and the pressure change of the downstream pipeline or container of the storage tank 21 can be checked in the same way by arranging a pressure gauge, so as to judge whether leakage occurs.
Preferably, the bypass pipeline is provided with a third valve body 3, and if leakage occurs during pressure testing of the material storage tank 21, the third valve body 3 can be further controlled to open and close to clearly determine whether leakage occurs on the material storage tank 21 or on the air inlet pipeline or the air outlet pipeline.
As shown in fig. 2, in other embodiments, the gas phase supply pipeline includes a gas phase main pipeline and a gas phase auxiliary pipeline, the gas inlet end of the gas phase main pipeline can be respectively communicated with the gas phase raw material 18 or the pressure test gas source, the gas phase main pipeline is provided with a first valve body 1 and a second valve body 2, one end of the gas phase auxiliary pipeline is communicated with the gas phase main pipeline and is located between the first valve body 1 and the second valve body 2, and the other end of the gas phase auxiliary pipeline is communicated with the storage tank 21. When the pressure of the air storage tank is tested, the first valve body 1 and the second valve body 2 can be opened, and the third valve body 3 can be closed; when the pressure test is performed on the downstream of the accumulator tank 21, the first valve body 1 and the third valve body 3 are opened, and the second valve body 2 is closed.
In some embodiments, a pressure relief pipeline may be further connected to the storage tank 21, a pressure relief valve 30 and a ninth valve body 9 are provided on the pressure relief pipeline, and the ninth valve body 9 may be a normally open valve, so that when the pressure of the storage tank 21 is too high, automatic pressure relief protection is realized through the pressure relief pipeline. In a further embodiment, a pressure relief pipeline is preferably inserted in the absorption container 22, so as to absorb and recover the discharged materials.
The main working process of the material storage unit part of the feeding system comprises the following steps:
in the process that the gas-phase raw material enters the storage tank from the air inlet pipe, the first temperature regulating device 20 reduces the temperature of the storage tank, and the entered gas-phase raw material is stable in pressure or liquefied into a liquid phase state for storage; and in the process that the liquid phase raw materials enter the storage tank from the liquid inlet pipe, the first temperature regulating device controls the storage tank to be in a low-temperature state, so that the liquid phase raw materials are kept in a stable liquid phase state. When gas phase materials need to be supplied, if the gas phase materials are externally connected with constant-pressure stable gas phase raw materials, the constant-pressure stable gas phase raw materials can be directly supplied to a reactor or a downstream system through the control of the first valve bank 31; if the liquid phase material stored in the storage tank 21 is supplied as a raw material, the first temperature adjusting device 20 can be used to control the temperature of the storage tank to rise, so that the gas phase or liquid phase material in the storage tank 21 is converted into a stable gas phase material under a preset pressure to be supplied to a reactor or a downstream system; when liquid phase materials need to be supplied, if the liquid phase materials meeting the use requirements are externally connected, the liquid phase materials can be directly supplied to the reactor or a downstream system by controlling a liquid phase feeding pipeline through the second valve bank 33; if the liquid phase material stored in the material storage tank 21 is supplied as a raw material, the liquid phase material can be adjusted to a stable liquid phase state satisfying the use requirement by the first temperature adjusting device 20 for supply.
With reference to fig. 1 and 4, on the basis of any of the above embodiments, the system further includes a feeding control unit, the feeding control unit includes a feeding control pipeline, a feeding end of the feeding control pipeline is communicated with an air outlet end of the gas phase feeding pipeline, an eleventh valve body 11 for controlling on-off of total feeding can be further disposed in the communicated portion, a discharging end of the feeding control pipeline is used for feeding, a flow controller 26 is disposed on the feeding control pipeline, the flow controller 26 is used for metering feeding, stability of feeding is maintained, the flow controller 26 is preferably a mass flow meter, the mass flow meter is not affected by volume change of the gas phase material, and feeding can be more accurate.
In some embodiments, the feed end of the feed control line is connected in parallel with a purge gas line for connecting to a purge gas source 23, and the purge gas source 23 may be an inert gas such as nitrogen or argon for introducing a purge gas into the feed control line to prevent corrosion of the lines and the flow controller 26 due to long-term contact with the gas-phase material. The cleaning gas pipeline is provided with a tenth valve body 10, and the tenth valve body 10 is used for accessing cleaning gas when needed, such as two supply intervals of gas-phase materials or after the supply is finished.
In some embodiments, the system further includes a drying device and a third valve set disposed on the feed control pipeline, the third valve set is used for selectively connecting the drying device to the feed control pipeline, that is, the branch where the drying device is located and a part of the feed control pipeline are in a parallel relationship, specifically, a twelfth valve body 12 may be disposed on at least the branch where the drying device is located, the valve body is preferably disposed upstream of the drying device, and a thirteenth valve body 13 is disposed on a part of the feed control pipeline parallel to the drying device, so as to form the third valve set, and the on-off control of the two branches is realized through the open-close cooperation of the two valve bodies. The drying device is used for filtering moisture in gas-phase materials, acidic or neutral materials can be dried through concentrated sulfuric acid, calcium chloride and the like, alkaline materials can be dried through quick lime and the like, and the drying device can be specifically selected according to actual conditions.
In a further embodiment, the drying means may be arranged in multiple stages, such as in a chlorine feed, with concentrated sulfuric acid being used for the primary drying means 34 and calcium chloride being used for the secondary drying means 35, thereby increasing the drying effect. In addition, a first check valve 24 can be arranged at the upstream of the branch where the drying device is located, and a second check valve 25 can be arranged between every two adjacent stages of drying devices to prevent backflow.
Further, the bottom of the primary drying device 34 and the secondary drying device 35 are respectively provided with a fourteenth valve body 14 and a fifteenth valve body 15, so as to facilitate the removal and replacement of the drying material.
In some embodiments, the supply control circuit is provided with a second temperature adjustment device 36, the second temperature adjustment device 36 may be a heating coil heated by a medium, an electric heating jacket, or the like, and a temperature sensor may be provided thereon, and the heating temperature control may be performed to vaporize the material, for example, the same heating temperature as that of the material in the storage tank 21 may be set.
Second temperature regulation apparatus 36 is preferred to be close to the discharge end setting of feed control pipeline, because gaseous phase material discharges the back from storage tank 21, has flowed through longer one section tube side such as drying device again, and the temperature can decline to some extent, so set up second temperature regulation apparatus 36 near discharge end department, can prevent that gaseous phase material from taking place the liquefaction, guarantee the stability of gaseous phase material.
The flow controller 26 is preferably arranged downstream of the second thermostat 36, so that the metering is more accurate. In addition, a sixteenth valve body 16 can be arranged between the secondary drying device 35 and the second temperature regulating device 36, and a third one-way valve 37 for preventing backflow, a seventeenth valve body 17 for emergently controlling the starting and stopping of the discharging material, an anti-backflow device 27 for preventing the material from being sucked back and the like can be sequentially arranged between the flow controller 26 and the reactor.
In the above embodiment, after the feeding is completed or when the feeding is intermittently used, the feeding control line, the drying device, and particularly the flow controller 26 are subjected to replacement cleaning to form the inert gas protection. At this time, two replacement cleaning modes can be selected, one is to connect the nitrogen gas cylinder to the feed control pipeline, then open the tenth valve body 10, the twelfth valve body 12, the sixteenth valve body 16 and the seventeenth valve body 17 in sequence, then open the flow controller 26, and perform systematic and integral nitrogen gas replacement cleaning on the drying device, the flow controller 26 and the connecting pipeline thereof. The other is that only the tenth valve body 10, the thirteenth valve body 13, the seventeenth valve body 17 and the flow controller 26 are opened, and only the flow controller 26 is quickly replaced and cleaned.
Additionally, in some embodiments, the system further comprises a pressure monitoring device 28, wherein the pressure monitoring device 28 comprises a main machine, a first pressure detector for detecting the pressure in the storage tank 21, a second pressure detector for detecting the pressure in the primary drying device 34, a third pressure detector for detecting the pressure in the secondary drying device 35, and a fourth pressure detector for detecting the pressure at the outlet of the flow controller 26. The main unit of the pressure monitoring device 28 is connected in communication with the first temperature adjustment device 20 and the second temperature adjustment device 36 for controlling the first temperature adjustment device 20 and the second temperature adjustment device 36 in accordance with the pressure information of the respective detection positions.
The embodiment of the utility model provides a still provide a liquid chlorine filling method about above-mentioned feeding system, this method is:
firstly, all valve bodies on the storage tank 21 are closed, the liquid inlet end of the liquid phase supply pipeline is connected to a liquid chlorine steel cylinder, the storage unit is vacuumized, the temperature of the storage tank 21 is adjusted to-30-0 ℃, preferably-20 ℃, the pressure is adjusted to-0.1-0 MPa, preferably-0.1 MPa, and then liquid chlorine is conveyed into the storage tank 21 by using the liquid phase supply pipeline.
The embodiment of the utility model provides a chlorine feeding method of using above-mentioned feeding system still is provided, and this method is:
the temperature of the material storage tank 21 is adjusted to 15-30 ℃ by the first temperature adjusting device 20, the preferable temperature is 20 ℃, then the fourth valve body 4, the fifth valve body 5, the eleventh valve body 11, the twelfth valve body 12, the sixteenth valve body 16 and the seventeenth valve body 17 are opened in sequence, the flow controller 26 is opened for metering and feeding, and after the use is finished, the flow controller 26 and all the valve bodies are closed.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it should be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; such modifications and substitutions do not depart from the spirit and scope of the present invention in its corresponding aspects.

Claims (24)

1. A feeding system is characterized by comprising a storage tank, a liquid phase feeding pipeline and a gas phase feeding pipeline, wherein the liquid phase feeding pipeline and the gas phase feeding pipeline are respectively communicated with the storage tank; the gas phase supply pipeline is provided with a first valve group, and the first valve group forms on-off control between the gas inlet end and the gas outlet end of the gas phase supply pipeline and/or between the gas outlet end of the gas phase supply pipeline and the material storage tank; and a first temperature adjusting device is arranged on the material storage tank.
2. The feeding system of claim 1, wherein a second valve set is provided on the liquid phase feeding pipeline, and the second valve set is controlled to be on-off between the liquid inlet end of the liquid phase feeding pipeline and the storage tank.
3. The feed system of claim 2, wherein said second valve set provides on-off control between the outlet end of said liquid phase feed line and said accumulator tank.
4. The feed system of claim 2, wherein said second valve set is on-off controlled between an inlet end and an outlet end of said liquid phase feed line.
5. The feed system of claim 2 wherein a discharge pump is provided on said liquid phase feed line between said second valve set and the liquid outlet end of said liquid phase feed line.
6. The feeding system of claim 2, wherein the storage tank is provided with a charging line.
7. The feed system of claim 6, wherein the pressurization line is the gas phase feed line.
8. The feed system of claim 2, wherein the liquid outlet end of the liquid phase feed line is used to feed a continuous reaction.
9. The feed system of claim 1 wherein said first temperature regulating device comprises a temperature control device.
10. The feed system of claim 9 further comprising a jacket disposed outside said holding tank.
11. The feed system of claim 10, wherein a medium is circulated between the temperature control device and the jacket, and the temperature control device can heat or cool the medium and regulate the temperature of the storage tank through the medium.
12. The feed system of claim 1, wherein the first valve set forms an on-off control between the inlet end and the outlet end.
13. The feeding system of claim 1, wherein the gas phase feeding pipeline comprises an air inlet pipeline, an air outlet pipeline and a bypass pipeline, the air outlet end of the air inlet pipeline is communicated with the storage tank, and the air inlet pipeline is sequentially provided with a first valve body and a second valve body along the air inlet direction of the air inlet pipeline; the air inlet end of the air outlet pipeline is communicated with the material storage tank, and the air outlet pipeline is sequentially provided with a fourth valve body and a fifth valve body along the air outlet direction; one end of the bypass pipeline is communicated with the air inlet pipeline and is positioned between the first valve body and the second valve body, and the other end of the bypass pipeline is communicated with the air outlet pipeline and is positioned between the fourth valve body and the fifth valve body; and the air inlet end of the air inlet pipeline can be respectively communicated with a gas-phase raw material or a pressure test air source.
14. The feed system of claim 13 wherein a third valve body is provided on said bypass line.
15. The feeding system of claim 1, wherein the gas phase feeding pipeline comprises a gas phase main pipeline and a gas phase auxiliary pipeline, a gas inlet end of the gas phase main pipeline can be respectively communicated with a gas phase raw material or a pressure test gas source, the other end of the gas phase main pipeline is a gas outlet end of the main pipeline, the gas phase main pipeline is provided with a first valve body and a second valve body, one end of the gas phase auxiliary pipeline is communicated with the gas phase main pipeline and is positioned between the first valve body and the second valve body, and the other end of the gas phase auxiliary pipeline is communicated with the storage tank.
16. The feeding system of any one of claims 1 to 15, further comprising a feeding control pipeline, wherein a feeding end of the feeding control pipeline is communicated with the gas outlet end, a discharging end of the feeding control pipeline is used for feeding, and a flow controller is arranged on the feeding control pipeline.
17. The feed system of claim 16 wherein said flow controller is a mass flow meter.
18. The feeding system of claim 16, wherein the feeding end of the feeding control pipeline is connected in parallel with a cleaning gas pipeline, the cleaning gas pipeline is used for connecting a cleaning gas source, and a valve body is arranged on the cleaning gas pipeline.
19. The feed system of claim 18 wherein the purge gas is nitrogen.
20. The feed system of claim 16 further comprising a drying device and a third valve block disposed on said feed control line for selectively connecting said feed control line to said drying device.
21. The feed system of claim 20, wherein a purge gas line is connected to the third valve block, the purge gas line being adapted to be connected to a purge gas source, the third valve block providing on-off control between the purge gas line and the drying device.
22. The feed system of claim 20, wherein a purge gas line is connected to the third valve set, the purge gas line being adapted to be connected to a purge gas source, the third valve set providing on-off control between the purge gas line and the flow controller, respectively.
23. The feed system of claim 20 wherein said control line is provided with a second thermostat.
24. The feed system of claim 23 wherein a second thermostat on said control line is disposed downstream of said drying device.
CN201920381275.2U 2019-03-24 2019-03-24 Feeding system Active CN210398389U (en)

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Application Number Priority Date Filing Date Title
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