CN210333649U - Cutting fluid cistern belt cleaning device - Google Patents
Cutting fluid cistern belt cleaning device Download PDFInfo
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- CN210333649U CN210333649U CN201921008195.9U CN201921008195U CN210333649U CN 210333649 U CN210333649 U CN 210333649U CN 201921008195 U CN201921008195 U CN 201921008195U CN 210333649 U CN210333649 U CN 210333649U
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- cutting fluid
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- impurity collecting
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Abstract
The utility model discloses a cutting fluid cistern belt cleaning device, it contains: the device comprises an impurity collecting assembly, a photoelectric catalytic reaction assembly, a liquid storage assembly and a flushing assembly; the impurity collecting assembly comprises: the device comprises an impurity collecting cavity, a suction pipe communicated with the impurity collecting cavity and a filter screen arranged in the impurity collecting cavity; untreated cutting fluid in the fluid groove flows into the impurity collecting cavity through the suction pipe; the photoelectrocatalysis reaction component comprises: the photoelectric catalytic reaction cavity is communicated with the impurity collecting cavity, and the ultraviolet lamp and the photocatalytic film are arranged in the photoelectric catalytic reaction cavity; the stock solution and wash subassembly include: a liquid storage cavity communicated with the photoelectrocatalysis reaction cavity, and a throttling water gun connected with the liquid storage cavity. The utility model discloses wash weak point consuming time, wash thoroughly, have advantages such as need not add cleaner, no secondary pollution, can restore the performance of cutting fluid to a certain extent to green is high-efficient.
Description
Technical Field
The utility model relates to a machining washs technical field, concretely relates to cutting fluid cistern belt cleaning device.
Background
In the metal cutting process, because the impurities attached to the workpiece, dust in the air and metal chips generated by cutting can flow into the cutting liquid tank along with the cutting liquid, thick sludge can be formed at the bottom of the cutting liquid tank, and large-particle impurities can block a liquid tank pipeline of a machine tool, influence the normal operation of a liquid supply system and even cause serious processing accidents. In the machining process, metal chips splash everywhere and can be scattered at the corners of the machine tool which are not easy to clean.
The cutting fluid may deteriorate and lose normal performance during use. Causes of deterioration of the cutting fluid include: (1) the cutting fluid is rotten and deteriorated due to the breeding of bacteria, a large amount of organic acid is generated, and the antirust capacity is reduced; (2) the cutting fluid has local high temperature in the using process, which causes the high-temperature polymerization of the cutting fluid, generates a large amount of macromolecular organic matters and reduces the lubricating property.
At present, the mode of relying on manual cleaning of the liquid tank has the disadvantages of long time consumption, incomplete cleaning, incapability of cleaning corners of the liquid tank, difficulty in cleaning of fine particles, consumption of certain human resources, halt in the cleaning process, time waste and additional economic loss brought to enterprises. Therefore, the processing method which can easily remove the metal scrap mud at the bottom of the tank, realize the solid-liquid quick separation, avoid the waste of labor cost caused by long-time shutdown due to manual cleaning and protect the health of workers is especially important.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to solve the problem that the cutting fluid liquid groove washs inconveniently, inefficiency, consuming time is long, provide a high efficiency, low cost, no secondary pollution's cutting fluid liquid groove belt cleaning device.
In order to achieve the above object, the utility model provides a cutting fluid cistern cleaning device, it contains: the device comprises an impurity collecting assembly, a photoelectric catalytic reaction assembly, a liquid storage assembly and a flushing assembly; the impurity collecting assembly comprises: the device comprises an impurity collecting cavity, a suction pipe communicated with the impurity collecting cavity and a filter screen arranged in the impurity collecting cavity; untreated cutting fluid in the fluid groove flows into the impurity collecting cavity through the suction pipe; the photoelectrocatalysis reaction component comprises: the photoelectric catalytic reaction cavity is communicated with the impurity collecting cavity, and the ultraviolet lamp and the photocatalytic film are arranged in the photoelectric catalytic reaction cavity; the stock solution and wash subassembly include: a liquid storage cavity communicated with the photoelectrocatalysis reaction cavity, and a throttling water gun connected with the liquid storage cavity; in a use state, untreated cutting fluid firstly flows through the impurity collecting cavity and then flows into the liquid storage cavity after passing through the photoelectrocatalysis reaction cavity. The throttling water gun can back flush the liquid tank by using the cutting liquid in the liquid storage cavity.
Preferably, the cleaning device further comprises: a vacuum pump is created inside the cleaning device at negative pressure.
Preferably, the end of the suction pipe is connected with a detachable suction head.
Preferably, a magnetic bar is arranged in the filter screen. The magnetic bar is used for adsorbing metal fine powder.
Preferably, the impurity collecting assembly further comprises: the throttling orifice plate is arranged in the impurity collecting cavity and below the filter screen.
Preferably, the ultraviolet lamp is in a wavelength range of 240-270 nm.
Preferably, the photocatalytic film is TiO2A nano photocatalytic film.
Preferably, the throttling water gun is connected with a nozzle, and the nozzle is arranged on the outer wall of the suction pipe.
Preferably, the reservoir and flushing assembly further comprises: and the return pipeline is used for returning the cutting fluid in the fluid storage cavity to the fluid tank, and the tail end of the return pipeline is provided with a manual valve.
Compared with the prior art, the utility model, following beneficial effect has:
(1) the utility model discloses a cutting fluid cistern belt cleaning device is efficient, with low costs.
(2) The utility model discloses a cutting fluid cistern belt cleaning device adopts ultraviolet lamp and photocatalysis membrane to carry out germicidal treatment to have and improve cutting fluid lubricating property, improve the effect of pH value, can restore the performance of cutting fluid to a certain extent.
(3) The utility model discloses a cutting fluid cistern belt cleaning device washs weak point consuming time, washs thoroughly, has advantages such as need not add cleaner, no secondary pollution, and green is high-efficient.
Drawings
Fig. 1 is a schematic structural view of the cutting fluid tank cleaning device of the present invention.
Fig. 2 is a plan view of the cutting fluid tank cleaning apparatus shown in fig. 1.
Fig. 3a is a schematic structural diagram of a filter screen.
Fig. 3b is a top view of the filter screen shown in fig. 3 a.
Fig. 4 is a schematic view of the structure of the suction duct.
Detailed Description
The technical solution of the present invention will be further explained with reference to the accompanying drawings and examples.
As shown in fig. 1, the utility model provides a cutting fluid cistern cleaning device contains: the device comprises an impurity collecting assembly 10, a photoelectrocatalysis reaction assembly 20, a liquid storage and flushing assembly 30, a vacuum pump 40, a caster wheel 50 and a control cabinet 60.
The impurity collecting assembly 10 mainly performs separation of particles in the cutting fluid. The impurity collecting unit 10 includes: a foreign matter collecting chamber 11 connected with a suction pipe 70 (see fig. 4), a filter screen 12 and a throttle orifice 13 arranged in the foreign matter collecting chamber 11; the orifice plate 13 is arranged below the filter screen 12. The suction pipe 70 is a pipe for sucking the cutting fluid in the fluid tank. The pipe insertion groove 15 provided outside the impurity collecting chamber 11 is used for placing the suction pipe 70, and prevents residual liquid in the suction pipe 70 from flowing to the working floor.
The cleaning apparatus is provided with a vacuum pump 40 to create a negative pressure inside the apparatus, so that when the vacuum pump 40 is turned on, the cutting fluid is sucked into the impurity collecting chamber 11 through the suction pipe 70. The vacuum pump 40 is arranged above the liquid storage and washing assembly 30, and the cutting fluid flows through the impurity collecting cavity 11, the photoelectrocatalysis reaction cavity 21 and the liquid storage cavity 31 under the action of negative pressure and is finally discharged back to the liquid tank.
A first liquid inlet 14 is arranged above the impurity collecting cavity 11, and a movable joint device is arranged on the first liquid inlet 14 and can freely rotate for 360 degrees. The articulating mechanism is coupled to the suction tube 70 such that the suction tube 70 may be extended in a variety of directions. The end of the suction tube 70 may be connected to suction heads of different shapes to facilitate cleaning of different parts of the fluid bath. For example, the flat suction head can clean garbage in corners and gaps, and the large suction head can clean a plane part with a large area in the liquid tank, so that the cleaning device is very convenient and fast. There are also used floor brush tips, round brush tips and the like. The cutting fluid and the impurities deposited on the bottom of the cutting fluid are sucked into the impurity collecting chamber 11 through the suction head by the suction pipe 70.
The impurity collecting cavity 11 is a cylindrical hollow structure, and a circular arc-shaped fixing strip is arranged at a position 3-6cm away from the lower part of the cavity opening on the inner wall of the cavity and used for fixing the filter screen 12. The bottom of the impurity collecting cavity 11 is provided with a first liquid outlet 111.
The filter screen 12 is a cylindrical basket structure and is provided with an arc-shaped handle, so that the filter screen 12 can be conveniently taken out or put into the cavity of the impurity collecting cavity 11. The filter screen 12 can block mud in the cutting fluid in a basket, so as to realize solid-liquid separation. The middle of the filter screen 12 is provided with a magnetic bar. The metal fine particles in the cutting fluid are easy to block the filter screen 12, and the magnetic rod can adsorb the metal fine particles, so that the metal fine particles are prevented from blocking the filter screen 12.
The structure of the filter screen 12 is as shown in fig. 3a and 3b, the bottom structure of the filter screen is a circular truncated cone structure, and a plurality of cylindrical magnetic rods 121 are arranged in the middle. The inner wall of the filter screen 12 is provided with symmetrical clamping grooves for mounting the magnetic rods 121, and the magnetic rods 121 are arranged in a triangular prism shape. The magnetic rod 121 can adsorb metal fine powder to prevent the metal fine powder from blocking the filter screen 12. The components of the sludge which are not adsorbed by the magnetic rods 121 stay at the bottom of the circular truncated cone. The separated metal fine dust or sludge can be removed by taking out the filter screen 12 periodically and cleaning the filter screen.
The orifice plate 13 that sets up under filter screen 12 can further prevent on the one hand that impurity gets into the stock solution chamber, and on the other hand makes the cutting fluid can the even cavity bottom that flows to impurity collection chamber 11. The orifice plate 13 is a circular sheet of metal having a circular opening.
With continued reference to FIG. 1, the photoelectrocatalytic reaction component 20 primarily accomplishes the killing of microorganisms and the associated performance remediation of the cutting fluid. The photoelectrocatalysis reaction component 20 comprises: the device comprises a photoelectrocatalysis reaction cavity 21 communicated with the impurity collecting cavity 11, and an ultraviolet lamp and a photocatalysis film which are arranged in the photoelectrocatalysis reaction cavity 21.
The photoelectrocatalysis reaction cavity 21 is provided with a second liquid inlet 211 communicated with the first liquid outlet 111. The cutting fluid is filtered and flows into the photoelectrocatalysis reaction cavity 21. The photoelectrocatalysis reaction cavity 21 is a hollow structure, and a gap of 2-4cm is formed between the inner wall of the cavity and the ultraviolet lamp and the photocatalysis film so as to thin the thickness of the cutting fluid flowing through the cavity and enhance the penetrating power of the ultraviolet light. The ultraviolet lamp is in a wavelength range of 240-270nm, and the main way of performance recovery is that the ultraviolet ray and the photocatalytic film cooperatively generate OH with strong oxidizing capability, so that organic acid generated by microbial metabolism can be degraded, the pH value of the cutting waste liquid is improved, meanwhile, macromolecular organic matters generated by high-temperature degradation polymerization are depolymerized into micromolecular organic matters, and the lubricating performance of the cutting waste liquid is improved; and the cutting fluid has the effect of killing microorganisms and degrading acid gas generated by the microorganisms, so that the problem that the cutting fluid is black and smelly is solved. In the cavity of the photoelectrocatalysis reaction cavity 21, the power of the ultraviolet lamp is 20-30W, the length of the lamp tube is 36-45cm, and the output intensity of the ultraviolet light is 240-2. The power of the ultraviolet lamp and the length of the lamp tube can be increased appropriately according to the treatment efficiency, but the output intensity of the ultraviolet light is ensured to be at least 130mw/cm2. Considering the light transmission of the cutting fluid and the treatment efficiency, the distance between the ultraviolet lamp and the photocatalytic film is 3-5cm, and the photocatalytic film is selected to have super-resistance to lossActive TiO2A nano photocatalytic film. The top of the photoelectrocatalysis reaction cavity 21 is provided with a second liquid outlet 212.
The reservoir and flush assembly 30 includes: a liquid storage cavity 31 communicated with the photoelectrocatalysis reaction cavity 21, and a throttling water gun 32 (refer to fig. 2) connected with the liquid storage cavity 31 and used for flushing a liquid tank.
With continued reference to fig. 1, the reservoir 31 primarily stores the cutting fluid. The reservoir chamber 31 is provided with a third inlet 311 communicating with the second outlet 212. The cutting fluid flows into the fluid storage cavity 31 after passing through the photoelectrocatalysis reaction cavity 21. The liquid storage cavity 31 is provided with a liquid level window 312 for observing the liquid depth in the liquid storage cavity 31 by naked eyes, and the device passes through the liquid level control relay, utilizes the conductivity of the liquid, and when the liquid level reaches a certain height, the relay can automatically cut off the power supply. The liquid level will stop automatically when reaching the set height, preventing the cutting liquid in the liquid storage chamber 31 from being overfilled.
The cutting fluid that flows into in the stock solution chamber 31 after handling can be used to wash harder thicker mud bits in the cistern for mud is not hard up, and other unprocessed cutting fluid and impurity more enter into impurity through suction tube 70 and collect the chamber 11 in, through straining and the bacterial treatment back, clean cutting fluid gets into in the stock solution chamber 31 again. After the liquid tank is cleaned, the cutting fluid is discharged back to the liquid tank.
Referring to fig. 2, when the cutting fluid is used to wash the hard and thick mud in the fluid reservoir, the cutting fluid in the fluid reservoir 31 is pumped into the throttle water gun 32 by the washing pump 33, and the mud is scattered by the throttle water gun 32. The throttle squirt gun 32 can adjust the flow rate.
Referring to fig. 4, in some embodiments, the throttling water gun 32 is mounted on the suction pipe 70 to suck the cutting fluid and filter and sterilize while realizing the flushing fluid tank, thereby saving the time for cleaning the fluid tank. In the specific implementation process, the throttling water gun 32 can be connected with a pipeline fixed on the clamping groove 701, and the clamping groove 701 is arranged outside the suction pipe 70. The pipeline branches into 4-6 shunt pipelines, and the tail ends of the shunt pipelines are provided with nozzles 702. The cutting fluid is easy to splash due to the high pressure at the nozzle 702, and the liquid baffle 703 is arranged at the position 9-16cm away from the nozzle 70 of the suction pipe 70 to prevent the cutting fluid from splashing on the body of a cleaning person. The throttling water gun 32 is assembled on the suction pipe 70 to realize simultaneous washing, so that the time for washing the liquid tank is saved.
In some embodiments, the throttle gun 32 may be separated and used independently.
Referring to fig. 2, after the fluid tank is cleaned, the cutting fluid is pumped from the fluid storage chamber 31 into the return pipe 35 by the return pump 34, and the cutting fluid is discharged back to the fluid tank, so that the cutting fluid is recycled. The reflux pump 34 is connected with a reflux pipeline 35, the reflux pipeline 35 is long, a manual valve 36 is arranged at an outlet, the manual valve 36 is opened, and cutting fluid is conveniently discharged back to a fluid tank. When the return pump 34 is turned off, a small amount of cutting fluid which is not completely discharged exists in the return pipeline 35, and the manual valve 36 is turned off to prevent the cutting fluid from flowing out, so that the pollution to the working environment is prevented.
The utility model discloses a four truckles 50 are equipped with to cutting fluid cistern cleaning device's bottom, and one of them a pair of truckle 50 is fixed, and another a pair of truckle 50 is the universal, and aim at makes things convenient for the mobile device, and easy controlling means's moving direction.
The utility model discloses a cutting fluid cistern belt cleaning device controls through switch board 60. The control cabinet 60 may control the activation of the vacuum pump 40, the rinse pump 33, the return pump 34, and the like.
To sum up, the utility model discloses a cutting fluid liquid groove belt cleaning device has many advantages such as safe, reliable, high-efficient, low-cost, need not add cleaner, no secondary pollution. The problems of long time consumption and incomplete cleaning of the cutting fluid tank in the machining industry are solved, the performance of the cutting fluid can be repaired to a certain degree, and the method is green, environment-friendly and efficient.
While the present invention has been described in detail with reference to the preferred embodiments thereof, it should be understood that the above description should not be taken as limiting the present invention. Numerous modifications and alterations to the present invention will become apparent to those skilled in the art upon reading the foregoing description. Accordingly, the scope of the invention should be limited only by the attached claims.
Claims (9)
1. A cutting fluid tank cleaning device, comprising: the device comprises an impurity collecting assembly, a photoelectric catalytic reaction assembly, a liquid storage assembly and a flushing assembly;
the impurity collecting assembly comprises: the device comprises an impurity collecting cavity, a suction pipe communicated with the impurity collecting cavity and a filter screen arranged in the impurity collecting cavity; untreated cutting fluid in the fluid groove flows into the impurity collecting cavity through the suction pipe;
the photoelectrocatalysis reaction component comprises: the photoelectric catalytic reaction cavity is communicated with the impurity collecting cavity, and the ultraviolet lamp and the photocatalytic film are arranged in the photoelectric catalytic reaction cavity;
the stock solution and wash subassembly include: a liquid storage cavity communicated with the photoelectrocatalysis reaction cavity, and a throttling water gun connected with the liquid storage cavity;
in a use state, untreated cutting fluid firstly flows through the impurity collecting cavity and then flows into the liquid storage cavity after passing through the photoelectrocatalysis reaction cavity.
2. A cutting fluid bath cleaning apparatus according to claim 1, further comprising: a vacuum pump is created inside the cleaning device at negative pressure.
3. The cutting fluid bath cleaning device according to claim 1, wherein a detachable suction head is attached to a distal end of the suction pipe.
4. The cutting fluid tank cleaning device according to claim 1, wherein a magnetic bar is provided in the filter screen.
5. The cutting fluid bath cleaning apparatus of claim 1, wherein said contaminant collection assembly further comprises: the throttling orifice plate is arranged in the impurity collecting cavity and below the filter screen.
6. The device for cleaning a cutting fluid slot as claimed in claim 1, wherein the ultraviolet lamp is in the wavelength range of 240-270 nm.
7. A cutting fluid bath cleaning apparatus as claimed in claim 1, wherein the photocatalytic film is TiO2A nano photocatalytic film.
8. The cutting fluid tank cleaning device according to claim 1, wherein a nozzle is connected to the throttling water gun, and the nozzle is arranged on the outer wall of the suction pipe.
9. The cutting fluid bath cleaning apparatus of claim 1, wherein said reservoir and rinse assembly further comprises: and the return pipeline is used for returning the cutting fluid in the fluid storage cavity to the fluid tank, and the tail end of the return pipeline is provided with a manual valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921008195.9U CN210333649U (en) | 2019-07-01 | 2019-07-01 | Cutting fluid cistern belt cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921008195.9U CN210333649U (en) | 2019-07-01 | 2019-07-01 | Cutting fluid cistern belt cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN210333649U true CN210333649U (en) | 2020-04-17 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201921008195.9U Active CN210333649U (en) | 2019-07-01 | 2019-07-01 | Cutting fluid cistern belt cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN210333649U (en) |
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2019
- 2019-07-01 CN CN201921008195.9U patent/CN210333649U/en active Active
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