CN210160126U - Special cleaning support for atomizer component of semiconductor equipment etching device - Google Patents
Special cleaning support for atomizer component of semiconductor equipment etching device Download PDFInfo
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- CN210160126U CN210160126U CN201920953913.3U CN201920953913U CN210160126U CN 210160126 U CN210160126 U CN 210160126U CN 201920953913 U CN201920953913 U CN 201920953913U CN 210160126 U CN210160126 U CN 210160126U
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Abstract
The utility model provides a special support that washs of semiconductor equipment etching device atomizer part, belongs to etching device and washs the tool field. One side of the supporting plate A is vertically connected with the bottom plate A, the other side of the supporting plate A is provided with a V-shaped groove A, the V-shaped groove A is connected with the positioning groove A, and the two sides of the positioning groove A are respectively provided with a clamping groove A; the bottom plate B is sequentially and vertically provided with a supporting plate B, a supporting plate C and a supporting plate D, one side of the supporting plate B is provided with a V-shaped groove B, a positioning hole is further formed in the supporting plate B, one side of the supporting plate C is provided with the V-shaped groove C, the V-shaped groove C is connected with the positioning groove B, the two sides of the positioning groove B are respectively provided with a clamping groove B, one side of the supporting plate D is provided with the V-shaped groove D, when the support A is connected with the support B, one side of the supporting plate A is attached to one side of the supporting plate C, the. The utility model discloses can improve the stability of supporting the atomizer part, no longer need the manual work to support, easy operation is convenient.
Description
Technical Field
The utility model relates to an etching device washs the tool field, especially relates to a special support that washs of semiconductor equipment etching device atomizer part.
Background
In the prior cleaning regeneration process of the atomizer part of the etching device of the semiconductor equipment, the inside of the atomizer part needs to be washed by acid and alkali, because the atomizer component is in a stainless steel cylinder shape, the whole weight is heavy, and the two ends of the atomizer component are not planes and are not acid-base resistant, therefore, the acid and alkali resistant adhesive tape is required to be used for protection, in the cleaning process, the parts are required to be horizontally placed firstly, the acid washing operation is carried out, after several minutes, the components need to be vertically placed for impact reduction, and in the process, because the components have heavy weight and cylindrical structure, therefore, the operator needs to carry acid and alkali resistant gloves to support the device no matter the device is placed horizontally or vertically, which wastes time and labor, because acid-base washing is carried out, the operation risk is high, and the atomizer parts are easy to be damaged due to inconsistent stability of each support, so that the product is poor.
SUMMERY OF THE UTILITY MODEL
Need the problem that the danger that manual support leads to is big and cause the defective products easily when washing the operation for solving current atomizer part, the utility model provides a special washing support of semiconductor equipment etching device atomizer part.
In order to achieve the above object, the utility model adopts the following technical scheme: a cleaning bracket special for an atomizer component of an etching device of semiconductor equipment comprises a bracket A and a bracket B; the support A comprises a bottom plate A and a support plate A, one side of the support plate A is vertically connected with the bottom plate A, the other side of the support plate A is provided with a V-shaped groove A, the V-shaped groove A is connected with a positioning groove A, and two sides of the positioning groove A are respectively provided with a clamping groove A; the utility model discloses a support, including support B, backup pad C, constant head tank B, draw-in groove B, support B's bottom plate B, backup pad B's bottom plate B sets up backup pad B, backup pad C and backup pad D perpendicularly in proper order, backup pad B one side is equipped with V type groove B, still be equipped with the locating hole on the backup pad B, backup pad C one side is provided with V type groove C, V type groove C links to each other with constant head tank B, constant head tank B both sides set up draw-in groove B respectively, backup pad D one side is equipped with V type groove D, when support A and support B link to each other, backup.
Further, the bottom plate B is provided with mounting grooves for mounting the support plate B, the support plate C and the support plate D, and the support plate B, the support plate C and the support plate D are mounted with the bottom plate B through bolts; the bottom plate A is provided with a mounting groove for mounting the support plate A, and the bottom plate A and the support plate A are mounted through bolts.
Furthermore, the inclined planes of the V-shaped groove C and the V-shaped groove D correspond to each other.
The utility model has the advantages that: the utility model discloses can improve the stability of supporting the atomizer part, no longer need the manual work to support, easy operation is convenient.
Drawings
Fig. 1 is a schematic structural view of a bracket B of the present invention;
fig. 2 is a schematic structural view of a bracket a of the present invention;
FIG. 3 is a schematic structural view of the acid washing operation of the present invention;
FIG. 4 is a top view of the acid washing operation of the present invention;
FIG. 5 is a schematic structural view of the impact reduction operation of the present invention;
fig. 6 is a front view of the present invention during the impact reduction operation.
In the figure, 1, a bottom plate B, 2, a support plate B, 3, a positioning hole, 4, a V-shaped groove B, 5, a support plate C, 6, a clamping groove B, 7, a positioning groove B, 8, a V-shaped groove C, 9, a support plate D, 10, a V-shaped groove D, 11, a bottom plate A, 12, a support plate A, 13, a positioning groove A, 14, a clamping groove A, 15, a V-shaped groove A and 16 are atomizer parts.
Detailed Description
A cleaning bracket special for an atomizer component of an etching device of semiconductor equipment comprises a bracket A and a bracket B; the support A comprises a bottom plate A11 and a support plate A12, one side of the support plate A12 is vertically connected with the bottom plate A11, a V-shaped groove A15 is formed in the other side of the support plate A12, the V-shaped groove A15 is connected with a positioning groove A13, and clamping grooves A14 are formed in two sides of the positioning groove A13 respectively; support plate B2 is set up perpendicularly in proper order on support B's the bottom plate B1, support plate C5 and support plate D9, support plate B2 one side is equipped with V type groove B4, still be equipped with locating hole 3 on the support plate B2, support plate C5 one side is provided with V type groove C8, V type groove C8 links to each other with constant head tank B7, constant head tank B7 both sides set up draw-in groove B6 respectively, support plate D9 one side is equipped with V type groove D10, when support A links to each other with support B, one side of support plate A12 is laminated with support plate C5, constant head tank A13 and constant head tank B7 communicate with each other, draw-in groove B6 and the draw-.
The bottom plate B1 is provided with mounting grooves for mounting a support plate B2, a support plate C5 and a support plate D9, and the support plate B2, the support plate C5 and the support plate D9 are mounted with the bottom plate B1 through bolts; the bottom plate A11 is provided with a mounting groove for mounting the support plate A12, and the bottom plate A11 and the support plate A12 are mounted through bolts.
The positions of the inclined surfaces of the V-shaped groove C8 and the V-shaped groove D10 correspond.
When the acid washing machine works, firstly, the bracket B is independently used for carrying out acid washing operation, the bottom plate B1 is horizontally placed, and then the atomizer part 16 is placed on the V-shaped groove C8 and the V-shaped groove D10 for carrying out acid washing operation; then stretch into locating hole 3 with 16 one end of atomizer part, constant head tank B7 is put into to the other end of 16V type of atomizer part, then laminate the backup pad A12 one side and backup pad C5 one side of support A, make the other end of 16V type of atomizer part be located constant head tank A13 simultaneously, later pass through the key-type connection with draw-in groove B6 and corresponding draw-in groove A14, make the vertical state of atomizer part 16 place, carry out the reduction operation.
The above description is only the specific implementation manner of the preferred embodiment of the present invention, but the protection scope of the present invention is not limited thereto, and any person skilled in the art can substitute or change the technical solution of the present invention and the design of the present invention within the technical scope of the present invention.
Claims (3)
1. A special cleaning bracket for an atomizer component of an etching device of semiconductor equipment is characterized by comprising a bracket A and a bracket B; the support A comprises a bottom plate A (11) and a support plate A (12), one side of the support plate A (12) is vertically connected with the bottom plate A (11), a V-shaped groove A (15) is formed in the other side of the support plate A (12), the V-shaped groove A (15) is connected with a positioning groove A (13), and clamping grooves A (14) are formed in two sides of the positioning groove A (13) respectively; the utility model discloses a support B, including support B's bottom plate B (1), backup pad C (5) and backup pad D (9), backup pad B (2) one side is equipped with V type groove B (4), still be equipped with locating hole (3) on backup pad B (2), backup pad C (5) one side is provided with V type groove C (8), V type groove C (8) link to each other with constant head tank B (7), constant head tank B (7) both sides set up draw-in groove B (6) respectively, backup pad D (9) one side is equipped with V type groove D (10), when support A and support B link to each other, backup pad A (12) one side and backup pad C (5) one side laminating, constant head tank A (13) and constant head tank B (7) communicate with each other, draw-in groove B (6) and the draw-in groove A (14) that.
2. The special cleaning bracket for the atomizer component of the etching device for semiconductor equipment as claimed in claim 1, wherein the bottom plate B (1) is provided with mounting grooves for mounting the support plate B (2), the support plate C (5) and the support plate D (9), and the support plate B (2), the support plate C (5) and the support plate D (9) are mounted on the bottom plate B (1) by bolts; the bottom plate A (11) is provided with a mounting groove for mounting the support plate A (12), and the bottom plate A (11) and the support plate A (12) are mounted through bolts.
3. The special cleaning bracket for the atomizer component of the etching device for semiconductor equipment as claimed in claim 1, wherein the inclined surfaces of the V-shaped groove C (8) and the V-shaped groove D (10) correspond in position.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920953913.3U CN210160126U (en) | 2019-06-24 | 2019-06-24 | Special cleaning support for atomizer component of semiconductor equipment etching device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920953913.3U CN210160126U (en) | 2019-06-24 | 2019-06-24 | Special cleaning support for atomizer component of semiconductor equipment etching device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN210160126U true CN210160126U (en) | 2020-03-20 |
Family
ID=70171170
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920953913.3U Active CN210160126U (en) | 2019-06-24 | 2019-06-24 | Special cleaning support for atomizer component of semiconductor equipment etching device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN210160126U (en) |
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2019
- 2019-06-24 CN CN201920953913.3U patent/CN210160126U/en active Active
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