CN210104074U

CN210104074U - Atomic layer deposition coating apparatus

Info

Publication number: CN210104074U
Application number: CN201920595578.4U
Authority: CN
Inventors: 廖世文
Original assignee: Ways Technical Corp Ltd
Current assignee: Ways Technical Corp Ltd
Priority date: 2019-04-28
Filing date: 2019-04-28
Publication date: 2020-02-21
Anticipated expiration: 2029-04-28

Abstract

The utility model discloses an atomic layer deposition coating device, which mainly comprises a fixed frame, at least one gas supply module, a transfer module, a plurality of heating and air extracting boxes and a control module; therefore, the utility model discloses an atomic layer deposition coating equipment is mainly by moving the hardware design that carries module and heating exhaust box, but coating operation zone heating, effectively provides atomic layer deposition's soft base plate's good positioning control and the environmental temperature management of optimization to do benefit to the high temperature operation of the chemical deposition reaction of soft base plate, maintain the base plate characteristic not rotten really, promote the stationarity and the precision of conveying the base plate, and provide main advantages such as the regional heating operation of reaction of good zone type.

Description

Atomic layer deposition coating apparatus

Technical Field

The present invention relates to an atomic layer deposition coating apparatus, and more particularly to an atomic layer deposition coating apparatus capable of heating a substrate in different regions and improving the stability and accuracy of a coating operation.

Background

Atomic Layer Deposition (ALD) is a thin film Deposition method in which the Atomic Layer is deposited in a thickness of 10 Atomic layers^-10m) to nm (10)^-9m) scale thin film, generally atomic layer deposition methods are commonThe method comprises the following steps of using more than two gas precursors, and applying the gas precursors to a substrate alternately and repeatedly to react, wherein the process mainly comprises the steps of exposing one surface of the substrate to the gas precursors to carry out deposition cycles, and each deposition cycle generates a monolayer film or a part of the monolayer film; in atomic layer deposition, the film formation is carried out interlayer accumulation through chemical reaction, gas precursor molecules can be bonded on the surface of the substrate in a mode of forming a chemical bond, and when all the surface positions of the substrate which can be used for carrying out chemical bond with the gas precursor are covered, chemical adsorption is naturally stopped; the substrate is then exposed to the second gas precursor to chemically react the second gas precursor with the chemisorbed first gas precursor to form a solid film until all of the first gas precursor is reacted, and the substrate is coated with a layer of chemisorbed second gas precursor in a self-limiting manner, such that atomic layer deposition can be self-limited layer-by-layer deposition, providing a highly conformal coating and excellent thickness control, which makes it a interesting method for semiconductor, photovoltaic cell or organic light emitting diode applications, such as device packaging, for example organic light emitting diode or photovoltaic cell, for depositing aluminum oxide (Al) and the like₂O₃) The thin film is used for encapsulation and blocking oxygen or moisture, and the thickness of the thin film can be 1-10nm, and currently, with the increase of the requirements of related devices, the demand for improving the mass production capability of the ald coating equipment is increasing.

In view of the trend of mass production of Organic Light Emitting Diodes (OLEDs) or photovoltaic cells, there is a trend of thinning the OLED or photovoltaic cells to maintain the thickness and flexibility of the devices, for the related ald transmission, the substrate or the web is directly driven and delivered by a plurality of rollers to form a fixed position, and the rollers directly support and pull the substrate to generate stress on the substrate or the web, and the substrate or the web and the rollers cannot be effectively fixed and attached to each other, so the substrate or the web is easily moved or lifted by external force during the transferring process, even deformed, and further, the heating operation is not performed; in addition, in order to further improve the stability and accuracy of the coating operation, the substrate is currently attached to a worktable, and the stable and smooth distance between the substrate and the gas spraying mechanism is kept, so that the transfer or the spraying operation of the related gas precursor materials is facilitated, the related operation is limited, and the mass production is limited; moreover, the traditional working table is prepared from granite, and the heating control operation of the mechanism platform is difficult to directly carry out; in addition, conventionally, the substrate or the web is placed on a conveyor belt, and the conveyor belt directly drives the conveyor belt with rollers to deliver the substrate or the web; however, since there is no corresponding support under the conveyor belt, the substrate cannot be positioned on the conveyor belt effectively, and the substrate cannot be conveyed smoothly during processing, which results in poor processing quality of the substrate; therefore, developers and researchers in the related industries such as ald coating are continuously trying to overcome and solve the problem of providing a smooth and stable working temperature requirement for the substrate during the transfer process by innovative hardware design.

SUMMERY OF THE UTILITY MODEL

Accordingly, the present invention provides an atomic layer deposition coating apparatus, which is improved by the aid of abundant professional knowledge and years of practical experience, and solves the technical problem of providing an atomic layer deposition coating apparatus capable of heating a substrate in different regions and improving the stability and precision of a coating operation.

The technical means adopted by the utility model are as follows.

According to the objective of the present invention, an atomic layer deposition coating apparatus is provided, which at least comprises a fixed frame, at least one gas supply module, a transfer module, a plurality of heating and pumping boxes, and a control module; at least one gas supply module is arranged on the fixed frame, and the gas supply module comprises a plurality of support frames, a plurality of screws correspondingly assembled on the support frames, and a gas coating assembly correspondingly arranged on the screws, wherein the gas coating assembly comprises a plurality of first gas supply pipes, a plurality of second gas supply pipes and a recycling exhaust pipe; the shifting module is arranged between the fixed frame and the gas supply module and comprises a conveying belt with a plurality of through holes and a driving component connected with the conveying belt; the plurality of heating and air extracting boxes are arranged on the other side, opposite to the gas supply module, of the conveying belt, each heating and air extracting box comprises a box body with an accommodating space inside and a plurality of heating pipe assemblies arranged in the accommodating space, and a plurality of through holes corresponding to the through holes are formed in one surface, opposite to the conveying belt, of the box body; the control module is electrically connected with the gas coating component, the driving component and the heating pipe component respectively.

In one embodiment of the present invention, the gas coating module may further include a plurality of third gas supply pipes.

In an embodiment of the present invention, the through hole is a slit or a circular hole.

In one embodiment of the present invention, the driving assembly includes two roller assemblies respectively disposed at two ends of the conveying belt, and a power assembly disposed at one end of the roller assemblies.

In one embodiment of the present invention, the two side portions of the heating and pumping box are provided with a plurality of supports for supporting the heating and pumping box.

In one embodiment of the present invention, the heating and pumping box may be further connected to a vacuum pumping device.

In one embodiment of the present invention, a portion of the heating exhaust box is disposed below the gas supply module, so that a reaction zone is formed in a region corresponding to the conveyer belt, and a preheating zone is formed in a region corresponding to the other side of the heating exhaust box.

In an embodiment of the present invention, the through hole and the through hole are one of a slit or a circular hole.

In an embodiment of the present invention, the arrangement direction of the through holes is opposite to the perforation direction.

In an embodiment of the present invention, the control module may further be electrically connected to an input unit 16, wherein the input unit 16 is one of a mouse, a keyboard, and a touch display.

The utility model discloses produced beneficial effect as follows.

Therefore, the utility model discloses an atomic layer deposition coating equipment mainly by moving the hardware design that carries module and heating exhaust box, effectively provides atomic layer deposition's soft base plate's good positioning control and the environmental temperature management of optimization to do benefit to the high temperature operation of the chemical deposition reaction of soft base plate, maintain the base plate characteristic not rotten really, promote the stability and the precision of coating operation, and provide main advantages such as the regional heating operation of reaction of good segmentation.

Drawings

FIG. 1: the utility model discloses atomic layer deposition coating equipment's the overall structure perspective of one of them preferred embodiment.

FIG. 2: the utility model discloses atomic layer deposition coating equipment one of which preferred embodiment's overall structure cross-sectional view.

FIG. 3: the utility model discloses atomic layer deposition coating equipment one of which is preferred embodiment's base plate setting sketch map.

FIG. 4: the utility model discloses atomic layer deposition coating equipment one of which preferred embodiment's gas supply module sets up the sketch map.

FIG. 5: the present invention provides a gas supply module of an exemplary embodiment of an atomic layer deposition coating apparatus.

FIG. 6: the utility model discloses atomic layer deposition coating equipment one of which preferred embodiment's gaseous coating subassembly sets up the sketch map.

FIG. 7: the utility model discloses atomic layer deposition coating equipment one of which is preferred embodiment move and carry module and heating exhaust box setting sketch map.

FIG. 8: the utility model discloses it sets up the schematic diagram to move the mould group and heat the exhaust box to move of its two preferred embodiments of atomic layer deposition coating equipment.

FIG. 9: the utility model discloses atomic layer deposition coating equipment's an overall structure block diagram of one of its preferred embodiment.

Description of the figure numbers:

1 atomic layer deposition coating apparatus

11 fixed frame

111 plane

112 support column

12 gas supply module

121 supporting frame

122 screw

123 gas coating assembly

1231 first gas supply pipe

1232 second gas supply pipe

1233 recovery exhaust pipe

1234 third gas supply pipe

13 move and carry module

131 conveying belt

1311 perforation

132 drive assembly

1321 roller assembly

1322 Power Member

14 heating and air extracting box

141 case body

1411 accommodating space

1412 through hole

142 heating tube assembly

143 support

144 vacuum pumping device

15 control module

16 input unit

2 base plate

3 reaction zone

4 a preheating zone.

Detailed Description

First, please refer to fig. 1 to 3 together, wherein the atomic layer deposition coating apparatus 1 of the present invention deposits at least one atomic layer on a substrate 2, and the atomic layer deposition coating apparatus 1 at least includes a fixed frame 11, at least one set of gas supply module 12, a transfer module 13, a plurality of heating and pumping boxes 14, and a control module 15; the substrate 2 is a plastic substrate, a wafer, glass, silicon, or the like.

The fixing frame 11 is used to support the ald coating apparatus 1, wherein the fixing frame 11 is a table-shaped form, and the fixing frame 11 has a plane 111 and four supporting pillars 112 supporting the plane 111.

The gas supply module 12 is disposed on the fixed frame 11, the gas supply module 12 includes a plurality of support frames 121, a plurality of screws 122 correspondingly assembled on the support frames 121, and a gas coating assembly 123 correspondingly disposed on the screws 122, wherein the gas coating assembly 123 includes a plurality of first gas supply pipes 1231, a plurality of second gas supply pipes 1232, and a recycling gas pipe 1233; in addition, the gas application assembly 123 includes a plurality of third gas supply pipes 1234; referring to fig. 4 to 7, the gas supply module 12 is disposed above the fixed frame 11, and the gas supply module 12 is composed of a plurality of support frames 121, four screws 122 correspondingly assembled at four corners of the plurality of support frames 121, and the gas coating assembly 123 correspondingly disposed on the plurality of support frames 121, wherein the plurality of support frames 121 are in a square shape, the screws 122 are correspondingly assembled at four corners of the support frames 121, the gas coating assembly 123 is assembled on the support frame 121 below, and the support frame 121 can drive the gas coating assembly 123 to reciprocate up and down; in addition, the gas distribution assembly 123 includes a plurality of first gas supply pipes 1231, a plurality of second gas supply pipes 1232, a plurality of third gas supply pipes 1234, and a recovery gas extraction pipe 1233,wherein the first gas supply tubes 1231 supply a first precursor, such as, but not limited to, water vapor (H)₂O), the second gas supply tubes 1232 supply a second precursor, such as, but not limited to, Trimethylamine (TMA), the third gas supply tubes 1234 supply a nitrogen gas that reacts on the substrate 2 to form at least one atomic layer, and the purge gas tube 1233 recovers excess gas to provide a stable spray cycle and reaction of the first and second precursors.

The transferring module 13 is disposed between the fixed frame 11 and the gas supply module 12, the transferring module 13 includes a conveyor belt 131 having a plurality of through holes 1311, and a driving assembly 132 disposed below the conveyor belt 131 for driving the conveyor belt 131; in addition, the conveyor 131 may be a horizontal plane or an annular track, the through hole 1311 is a slit, and the conveyor 131 is made of one of glass fiber cloth, teflon cloth or stainless steel, and the like, and the driving assembly 132 includes two roller assemblies 1321 respectively disposed at two ends of the conveyor 131 and covered by the conveyor 131, and a power assembly 1322 disposed at one end of the roller assembly 1321, wherein the power assembly 1322, which is in a motor configuration, drives the roller assemblies 1321 to rotate, and further drives the conveyor 131 to rotate, and since the substrate 2 is disposed on the conveyor 131, when the conveyor 131 rotates, the substrate 2 is driven to perform reciprocating back-and-forth movement or continuous circulation operation.

The heating and air-extracting boxes 14 are disposed on the other side of the conveyor 131 opposite to the gas supply module 12, each heating and air-extracting box 14 includes a box 141 having an accommodating space 1411 therein, and a plurality of heating tube assemblies 142 disposed in the accommodating space 1411, wherein a surface of the box 141 opposite to the conveyor 131 is provided with a plurality of through holes 1412 corresponding to the through holes 1311; in addition, a plurality of supports 143 for supporting the heating and pumping chamber 14 are disposed at both sides of the heating and pumping chamber 14; furthermore, the through hole 1412 is in a slit shape as the through hole 1311, the arrangement direction of the through hole 1412 is opposite to the through hole 1311, and the width of the through hole 1412 is between 0.5 mm and 2 mm; in addition, a part of the heating and pumping box 14 is disposed below the gas supply module 12 to form a reaction zone 3 in a region corresponding to the conveyer 131, and a preheating zone 4 is formed in a region of the conveyer 131 corresponding to the other side of the reaction zone 3 of the heating and pumping box 14; wherein the heating and pumping boxes 14 are disposed between the roller assembly 1321 and the conveyor belt 131, the accommodating space 1411 of the box 141 is provided with the heating tube assembly 142 to provide a heat source for the gas reaction and to control the temperature, the through hole 1412 in a slit shape provided on the surface of the box 141 corresponds to the through hole 1311 in a slit shape to transfer the controllable temperature of the heating tube assembly 142 to the substrate 2 through the through hole 1412 and the through hole 1311, and the heating and pumping boxes 14 can also provide an effect of supporting the conveyor belt 131 to increase the smoothness of the substrate 2; in addition, the heating and pumping box 14 is connected to a vacuum pumping device 144, the vacuum pumping device 144 is disposed under the fixed frame 11, the vacuum pumping device 144 is used for generating negative pressure, and provides suction force to the substrate 2 carried on the conveyor belt 131 through the through hole 1412 and the through hole 1311, so that the substrate 2 can be attached to the conveyor belt 131 for conveying, the relative conveying position of the substrate 2 and the conveyor belt 131 is stably fixed without moving, and the operation between the substrate 2 and the gas supply module 12 can maintain a stable and smooth distance, thereby improving the stability and accuracy of the coating operation.

Referring also to FIG. 8, where the bore 1311 and the bore 1412 are similarly circular holes, the controlled temperature of the heater tube assembly 142 may transfer heat to the substrate 2 through the bore 1412 and the bore 1311 in circular holes.

Referring to fig. 9, the control module 15 is disposed below the heating and pumping box 14, and the control module 15 is electrically connected to the gas coating module 123, the driving module 132, and the heating pipe module 142; the control module 15 is disposed below the fixed frame 11 to control the gas supply flow rate and the recycling exhaust flow rate of the gas supply modules 12, and control the rotation mechanism, the reciprocating frequency, and the transfer rate of the roller assembly 1321, and also control the pressure adjustment of the vacuum exhaust device 144 and the heating temperature control of the heating pipe assemblies 142; in addition, the control module 15 is electrically connected to an input unit 16, and the input unit 16 is one of a mouse, a keyboard, a touch display, and the like, wherein the input unit 16 can provide display data and input of various operation states for the user to refer to.

That is, the atomic layer deposition coating apparatus 1 of the present invention can be applied to cooperate with the substrate 2 with a width of 500 mm to perform a deposition operation of surface alumina, and can perform a packaging operation of a semi-finished product such as an organic solar cell (OPV), mainly adsorb the substrate 2 of the semi-finished product to the preheating zone 4, wherein the heating and pumping box 14 under the preheating zone 4 provides a preheating temperature of about 80 ℃ to 90 ℃ on the substrate surface through the built-in heating pipe assembly 142, and the substrate is transported to the reaction zone 3 through the transfer module 13, so that the substrate 2 can be stably fixed to the reaction zone 3 by the heating and pumping box 14 under the conveyor belt 131 for performing a gas reaction deposition operation, wherein the heating pipe assembly 142 of the heating and pumping box 14 under the reaction zone 3 provides a temperature of about 180 ℃ to 200 ℃ on the substrate surface, so that the gas provided by the gas supply module 12 can be deposited and reacted on the substrate 2, wherein a specific height of about 0.5 cm (cm) to 2 cm (cm) is maintained between the gas supply module 12 and the substrate 2 to control the gases to be uniformly distributed on the surface of the substrate 2; in addition, the transfer module 13 can move the substrate 2 in a reciprocating manner by the conveyor belt 131, so that the surface of the substrate 2 can be stacked with multiple layers of alumina, and the conveyor belt 131 can also operate in a continuous manner, thereby achieving the effect of stacking multiple layers of alumina.

As can be seen from the above description, the present invention has the following advantages compared with the prior art and the product.

The utility model discloses an atomic layer deposition coating equipment is mainly by carrying the hardware design that moves module and heating exhaust box, effectively provides atomic layer deposition's soft base plate's good positioning control and the environmental temperature management of optimization to do benefit to the high temperature operation of the chemical deposition reaction of soft base plate, maintain the base plate characteristic really not rotten, promote the stationarity and the precision of coating operation, and provide main advantages such as the reaction zone section formula heating operation.

Claims

1. An atomic layer deposition coating apparatus, comprising at least:

a fixed frame (11);

at least one group of gas supply modules (12) arranged on the fixed frame (11), wherein the gas supply modules (12) comprise a plurality of support frames (121), a plurality of screws (122) correspondingly assembled on the support frames (121), and a gas coating assembly (123) correspondingly arranged on the screws (122), wherein the gas coating assembly (123) comprises a plurality of first gas supply pipes (1231), a plurality of second gas supply pipes (1232), and a recycling exhaust pipe (1233);

a transfer module (13) disposed between the fixed frame (11) and the gas supply module (12), the transfer module (13) including a conveyor belt (131) having a plurality of perforations (1311), and a driving assembly (132) connected to the conveyor belt (131);

a plurality of heating and air-extracting boxes (14) arranged at the other side of the conveying belt (131) corresponding to the gas supply module (12), wherein each heating and air-extracting box (14) comprises a box body (141) with an accommodating space (1411) inside and a plurality of heating pipe components (142) arranged in the accommodating space (1411), and a plurality of through holes (1412) corresponding to the through holes (1311) are formed in one surface of the box body (141) corresponding to the conveying belt (131); and

a control module (15) electrically connected to the gas coating module (123), the driving module (132), and the heating tube module (142), respectively.

2. The atomic layer deposition coating apparatus according to claim 1, wherein the gas application assembly (123) comprises a plurality of third gas supply tubes (1234).

3. The atomic layer deposition coating apparatus according to claim 1, wherein the perforation (1311) is one of a slit or a circular hole.

4. The ald coating apparatus of claim 1, wherein the driving assembly (132) includes two roller assemblies (1321) respectively disposed at two ends of the conveyor belt (131), and a power assembly (1322) disposed at one end of the roller assembly (1321).

5. The atomic layer deposition coating apparatus according to claim 1, wherein two sides of the heating chamber (14) are provided with a plurality of supports (143) for supporting the heating chamber (14).

6. The atomic layer deposition coating apparatus according to claim 1, wherein the heated pumping chamber (14) is connected to a vacuum pumping device (144).

7. The ALD coating apparatus of claim 1, wherein a portion of the heating plenum (14) is disposed below the gas supply module (12) to form a reaction zone (3) in a region corresponding to the conveyor belt (131), and a preheating zone (4) is formed in a region of the conveyor belt (131) corresponding to the other side of the heating plenum (14).

8. The ALD coating apparatus of claim 1, wherein the via (1412) and the via (1311) are one of a slit or a circular hole.

9. The ALD coating apparatus of claim 8, wherein the through hole (1412) is disposed in a direction opposite to a direction of the through hole (1311).

10. The ALD coating apparatus of claim 1, wherein the control module (15) is electrically connected to an input unit (16), wherein the input unit (16) is one of a mouse, a keyboard, or a touch display.