CN210103835U - High-temperature-resistant release film - Google Patents

High-temperature-resistant release film Download PDF

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Publication number
CN210103835U
CN210103835U CN201822075592.XU CN201822075592U CN210103835U CN 210103835 U CN210103835 U CN 210103835U CN 201822075592 U CN201822075592 U CN 201822075592U CN 210103835 U CN210103835 U CN 210103835U
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CN
China
Prior art keywords
layer
temperature resistant
high temperature
corona
substrate layer
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Expired - Fee Related
Application number
CN201822075592.XU
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Chinese (zh)
Inventor
姜涛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yabei Technology Xiamen Co ltd
Original Assignee
XIAMEN YIYANG ELECTRONIC TECHNOLOGY Co Ltd
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Priority to CN201822075592.XU priority Critical patent/CN210103835U/en
Application granted granted Critical
Publication of CN210103835U publication Critical patent/CN210103835U/en
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Abstract

The utility model provides a high temperature resistant type membrane relates to from type membrane technical field, including the substrate layer, a side of substrate layer forms the corona layer, the surface on corona layer forms organosilicon release layer. The utility model discloses a high temperature resistant is from type membrane, simple structure, rationally, corona treatment is carried out on high temperature resistant substrate layer surface, forms the corona layer, then high temperature resistant organosilicon release agent coats again, the solidification forms organosilicon from type layer, the remaining power of connecing of silicone oil can reach more than 90%, surface silicon content is below every square of 0.2G, effectively reduces the risk that silicon shifted, and specially adapted needs high temperature resistant product, for example, need through the fixed heat conduction double faced adhesive tape of UV etc..

Description

High-temperature-resistant release film
Technical Field
The utility model belongs to the technical field of from type membrane technique and specifically relates to a high temperature resistant is from type membrane.
Background
At present, the PET release film commonly used is a normal-temperature release film, the release film has the highest temperature resistance of 80 ℃, but some special products need to be used under the high-temperature condition, the temperature resistance requirement is 200 ℃, the process can be changed in the face of the market requirement, the temperature resistance problem of the release film cannot be solved, the cost is increased, the requirement of the product is met on the premise of sacrificing the production efficiency, and the high-temperature resistant release film is urgently needed according to the market requirement.
SUMMERY OF THE UTILITY MODEL
In order to solve the technical problem, the utility model provides a high temperature resistant is from type membrane.
The utility model discloses specifically adopt following technical scheme to realize:
the utility model provides a high temperature resistant release film, includes the substrate layer, a side of substrate layer forms the corona layer, the surface of corona layer forms organosilicon release layer.
Preferably, the substrate layer is made of polyethylene terephthalate.
Preferably, the thickness of the base material layer is 50-75 μm, the light transmittance is 92-95%, and the haze is 1.5-2%.
Preferably, the thickness of the corona layer is 2-4 μm, and the power of corona treatment of the corona layer is 12-22 KW.
Preferably, the silicone release layer adopts polydimethylsiloxane.
Preferably, the thickness of the organic silicon release layer is 2-4 mu m, and the release force is 3-100G.
The utility model provides a high temperature resistant is from type membrane, its beneficial effect lies in: simple structure, reasonable, high temperature resistant substrate layer surface is formed with the corona layer, then coats formation high temperature resistant organosilicon and leaves the type layer again, and the remaining adhesion force of silicone oil can reach more than 90%, and surface silicon content is below 0.2G per square, effectively reduces the risk that silicon shifted, and the specially adapted needs high temperature resistant product.
Drawings
Fig. 1 is a schematic sectional view of the high temperature resistant release film of the present invention.
Detailed Description
To further illustrate the embodiments, the present invention provides the accompanying drawings. The accompanying drawings, which are incorporated in and constitute a part of this disclosure, illustrate embodiments of the invention and, together with the description, serve to explain the principles of the embodiments. With these references, one of ordinary skill in the art will appreciate other possible embodiments and advantages of the present invention. Elements in the figures are not drawn to scale and like reference numerals are generally used to indicate like elements.
The present invention will now be further described with reference to the accompanying drawings and detailed description.
As shown in fig. 1, the high temperature resistant release film provided by the present embodiment includes a substrate layer 1, a corona layer 2 is formed on one side of the substrate layer 1, and an organic silicon release layer 3 is formed on the surface of the corona layer 2.
In the embodiment, the substrate layer 1 is made of polyethylene terephthalate to form a high-temperature resistant PET substrate layer, the thickness of the high-temperature resistant PET substrate layer is 50-75 μm, the light transmittance is 92-95%, the haze is 1.5-2%, and the temperature resistance can reach 250 ℃; performing corona treatment on the surface of the base material layer, wherein the treatment power is 12-22 KW, and the thickness of the formed corona layer 2 is 2-4 microns; coating a layer of high-temperature-resistant organic silicon release agent, such as polydimethylsiloxane, on the surface of the corona layer 2, and fixing the mixture in a UV curing mode to form an organic silicon release layer 3, wherein the thickness of the organic silicon release layer is 2-4 mu m, and the release force is 3-100G.
The high temperature resistant of this embodiment is from type membrane, simple structure, it is reasonable, corona treatment is carried out on high temperature resistant substrate layer surface, form the corona layer, then high temperature resistant organosilicon release agent coats, the solidification forms organosilicon release layer, the remaining adhesion force of silicone oil can reach more than 90%, surface silicon content is below 0.2G every square, effectively reduce the risk that silicon shifted, specially adapted needs high temperature resistant product, for example, need through fixed heat conduction double faced adhesive tape of UV etc..
While the invention has been particularly shown and described with reference to a preferred embodiment, it will be understood by those skilled in the art that various changes in form and detail may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.

Claims (5)

1. The utility model provides a high temperature resistant is from type membrane, its characterized in that, includes the substrate layer, a side of substrate layer forms corona layer, the surface of corona layer forms organosilicon release layer, organosilicon is less than 0.2 g/square meter from the silicon content on type layer surface, corona layer's thickness is 2 ~ 4 mu m, corona layer carries out corona treatment's power and is 12 ~ 22 KW.
2. The high temperature resistant release film according to claim 1, wherein: the substrate layer adopts the polyethylene terephthalate material.
3. The high temperature resistant release film according to claim 2, wherein: the thickness of the substrate layer is 50-75 mu m, the light transmittance is 92-95%, and the haze is 1.5-2%.
4. The high temperature resistant release film according to claim 1, wherein: the organic silicon release layer adopts polydimethylsiloxane.
5. The high temperature resistant release film according to claim 4, wherein: the thickness of the organic silicon release layer is 2-4 mu m, and the release force is 3-100G.
CN201822075592.XU 2018-12-11 2018-12-11 High-temperature-resistant release film Expired - Fee Related CN210103835U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201822075592.XU CN210103835U (en) 2018-12-11 2018-12-11 High-temperature-resistant release film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201822075592.XU CN210103835U (en) 2018-12-11 2018-12-11 High-temperature-resistant release film

Publications (1)

Publication Number Publication Date
CN210103835U true CN210103835U (en) 2020-02-21

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201822075592.XU Expired - Fee Related CN210103835U (en) 2018-12-11 2018-12-11 High-temperature-resistant release film

Country Status (1)

Country Link
CN (1) CN210103835U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114874712A (en) * 2022-05-31 2022-08-09 广东东立新材料科技股份有限公司 Easily-stripped anti-aging protective film and preparation method and application thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114874712A (en) * 2022-05-31 2022-08-09 广东东立新材料科技股份有限公司 Easily-stripped anti-aging protective film and preparation method and application thereof

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Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant
TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20200729

Address after: 361101 3rd floor, no.858, Xiangnan Road, Xiting village, Maxiang Town, Xiang'an District, Xiamen City, Fujian Province

Patentee after: Yabei Technology (Xiamen) Co.,Ltd.

Address before: 361000 unit 03, 8 / F, building D, Xiamen international shipping center, No.97 Xiangyu Road, Xiamen area (bonded area), China (Fujian) free trade zone, Xiamen City, Fujian Province

Patentee before: XIAMEN YIYANG ELECTRONIC TECHNOLOGY Co.,Ltd.

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20200221

Termination date: 20211211