CN210048844U - Jewelry vacuum noble metal sputtering equipment - Google Patents

Jewelry vacuum noble metal sputtering equipment Download PDF

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Publication number
CN210048844U
CN210048844U CN201920452846.7U CN201920452846U CN210048844U CN 210048844 U CN210048844 U CN 210048844U CN 201920452846 U CN201920452846 U CN 201920452846U CN 210048844 U CN210048844 U CN 210048844U
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rotation
rotating
rod
sputtering
jewelry
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CN201920452846.7U
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Chinese (zh)
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郭礼淳
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Shenzhen Haoyi Jewelry Technology Co Ltd
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Shenzhen Haoyi Jewelry Technology Co Ltd
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Abstract

The utility model discloses an ornament vacuum precious metal sputtering device is provided with the control switch who is used for the controlgear running state on the magnetic control gold box, be provided with vacuum pumping system on the magnetic control gold box, vacuum pumping system passes through the air duct intercommunication with the sputtering chamber, is provided with at least one precious metal magnetron sputtering target in the sputtering chamber, and sputtering chamber upper portion is provided with the heater, and the sputtering chamber bottom is provided with the rotatory actuating mechanism of material, is provided with the material frame that is used for hanging the material on the rotatory actuating mechanism of material. The utility model discloses can make equipment sputter noble metal coating to the jewelry surface, can make jewelry have better anti-soil effect, the coating is even, equipment easy operation simultaneously.

Description

Jewelry vacuum noble metal sputtering equipment
[ technical field ] A method for producing a semiconductor device
The invention relates to the technical field of precious metal surface treatment, in particular to the technical field of jewelry vacuum precious metal sputtering equipment.
[ background of the invention ]
With the improvement of living standard of people, noble metal jewelry becomes a necessity in life of people, particularly for young people, although noble metal has better oxidation resistance, the surface gloss is dull after a long time, and meanwhile, the antifouling performance is poorer.
[ summary of the invention ]
The invention aims to solve the problems in the prior art, and provides a vacuum precious metal sputtering device for jewelry, which can be used for sputtering a precious metal coating on the surface of the jewelry, so that the jewelry has a better anti-fouling effect, the coating is uniform, and the operation of the device is simple.
In order to realize the aim, the invention provides a jewelry vacuum noble metal sputtering device, which comprises a magnetic control gold box body, a magnetic control gold box door, a control switch, a vacuum air exhaust system, a noble metal magnetic control sputtering target, a heater, a material rotation executing mechanism and a material rack, a sputtering chamber is arranged in the magnetic control gold box body, a magnetic control gold box door is arranged at the inlet of the sputtering chamber, the magnetic control gold box body is provided with a control switch for controlling the running state of the equipment, the magnetic control gold box body is provided with a vacuum pumping system, the vacuum pumping system is communicated with the sputtering chamber through a gas guide pipe, at least one noble metal magnetron sputtering target is arranged in the sputtering chamber, the upper part of the sputtering chamber is provided with a heater, the bottom of the sputtering chamber is provided with a material rotation executing mechanism, and a material rack for hanging materials is arranged on the material rotation executing mechanism.
Preferably, the material rotation executing mechanism comprises an autorotation gear ring, a tray, a revolution seat, a revolution connecting cylinder, an autorotation rod seat, a autorotation gear, a revolution gear ring, a material rotation power motor, a material rotation driving gear, a material rotation upper limiting plate, a material rotation connecting rod and a main shaft, wherein the autorotation gear ring is fixedly arranged at the bottom of the sputtering chamber, the main shaft is vertically arranged at the bottom of the sputtering chamber in the autorotation gear ring, the upper end of the main shaft is provided with the revolution seat, the tray is arranged on the autorotation gear ring at the lower part of the revolution seat, the revolution connecting cylinder is arranged between the tray and the revolution seat, the revolution seat is internally provided with the revolution gear ring, the bottom of the sputtering chamber is provided with the material rotation power motor, a material rotation driving gear is arranged on a rotation shaft of the material rotation power motor, public swivel mount upper portion is provided with material swivel connecting rod, material swivel connecting rod upper end material rotation upper limit dish, it is provided with rotation pole seat to pass on tray and the public swivel mount, rotation pole seat lower extreme is provided with the self-rotation gear, the meshing is decided to the self-rotation gear and rotation.
Preferably, the material rack comprises a material rotating rod, a material suspension seat, a material suspension rod and a limiting anti-falling nut, the material rotating rod is fixedly provided with the material suspension seat, the material suspension rod is arranged around the material suspension seat, and the limiting anti-falling nut is arranged at the upper end of the material rotating rod.
Preferably, a material rotation sleeve is arranged at the lower end of the material rotation rod, a clamping groove is formed in the side portion of the material rotation sleeve, a limiting cross rod is arranged at the side portion of the upper end of the rotation rod seat, and the limiting cross rod is arranged in the clamping groove.
Preferably, a heating wire is provided in the heater.
Preferably, two noble metal magnetron sputtering targets are arranged in the sputtering chamber.
The invention aims to solve the problems in the prior art, and provides a vacuum precious metal sputtering process for jewelry, which can ensure that the surface of the jewelry is not easily oxidized, and meanwhile, the jewelry has higher wear resistance and better stain resistance.
In order to achieve the purpose, the invention provides a vacuum noble metal sputtering process for jewelry, which comprises the following steps of
A) And (3) purification treatment: cleaning the jewelry;
B) removing static electricity: performing static electricity removal treatment on the jewelry;
C) feeding: hanging the jewelry on a material hanging rod in a sputtering chamber;
D) vacuumizing: carrying out graded vacuumizing on the sputtering chamber;
E) sputtering treatment: argon is filled into the sputtering chamber, a noble metal magnetron sputtering target is adopted, noble metal is deposited on the surface of the jewelry, the sputtering treatment temperature is 260-400 ℃, and the sputtering treatment time is 5-20 minutes.
Preferably, in the step A), the cleaning is carried out for 30 minutes in an ultrasonic device by using alcohol, and stains and fingerprints are removed.
Preferably, in the step B), the vacuum treatment tank is first pumped to below 7pa by a rotary vane pump, and then pumped to 3pa by a molecular pump.
Preferably, in the step E), the temperature of the sputtering process is 310 degrees celsius, and the time of the sputtering process is 10 minutes.
The invention has the beneficial effects that: according to the invention, the noble metal magnetron sputtering target, the heater, the material rotation executing mechanism and the material frame are applied to the metal surface treatment equipment, so that the equipment can sputter a noble metal coating on the surface of the jewelry, the jewelry has a better anti-pollution effect, the coating is uniform, the equipment is simple to operate, the surface of the jewelry is not easy to oxidize by sputtering the jewelry by using noble metal, the wear resistance is higher, and the anti-pollution capability is better.
The features and advantages of the present invention will be described in detail by embodiments in conjunction with the accompanying drawings.
[ description of the drawings ]
FIG. 1 is a front view of a jewelry vacuum noble metal sputtering device of the present invention;
FIG. 2 is a front sectional view of a magnetic gold box;
FIG. 3 is a top sectional view of a jewelry vacuum noble metal sputtering device of the present invention;
FIG. 4 is a partial enlarged view of portion A of FIG. 3;
FIG. 5 is a partial enlarged view of portion B of FIG. 3;
fig. 6 is a partially enlarged view of a portion C in fig. 3.
In the figure: 1-a magnetic control gold box body, 2-a magnetic control gold box door, 3-a control switch, 4-a vacuum air pumping system, 5-a noble metal magnetic control sputtering target, 6-a heater, 7-a material rotation executing mechanism, 71-a self-rotation fixed gear ring, 72-a tray, 73-a male rotation seat, 74-a male rotation connecting column, 75-a self-rotation rod seat and 76-a self-rotation gear, 77-male rotation gear ring, 78-material rotation power motor, 79-material rotation driving gear, 80-material rotation upper limit disc, 801-material rotation connecting rod, 802-main shaft, 8-material frame, 81-material rotation rod, 82-material rotation sleeve, 83-material suspension seat, 84-material suspension rod and 85-limit anti-drop nut.
[ detailed description ] embodiments
Referring to fig. 1-6, the jewelry vacuum noble metal sputtering device of the invention comprises a magnetron gold box body 1, a magnetron gold box door 2, a control switch 3, a vacuum pumping system 4, a noble metal magnetron sputtering target 5, a heater 6, a material rotation executing mechanism 7 and a material rack 8, a sputtering chamber is arranged in the magnetic control gold box body 1, a magnetic control gold box door 2 is arranged at the inlet of the sputtering chamber, the magnetic control gold box body 1 is provided with a control switch 3 for controlling the running state of the equipment, the magnetic control gold box body 1 is provided with a vacuum pumping system 4, the vacuum pumping system 4 is communicated with the sputtering chamber through a gas guide pipe, at least one noble metal magnetron sputtering target 5 is arranged in the sputtering chamber, the heating device is characterized in that a heater 6 is arranged on the upper portion of the sputtering chamber, a material rotating executing mechanism 7 is arranged at the bottom of the sputtering chamber, and a material rack 8 for hanging materials is arranged on the material rotating executing mechanism 7. The material rotation executing mechanism 7 comprises a rotation fixed gear ring 71, a tray 72, a rotation seat 73, a rotation connecting cylinder 74, a rotation rod seat 75, a rotation gear 76, a rotation moving gear ring 77, a material rotation power motor 78, a material rotation driving gear 79, a material rotation upper limiting disc 80, a material rotation connecting rod 801 and a spindle 802, wherein the rotation fixed gear ring 71 is fixedly arranged at the bottom of a sputtering chamber, the spindle 802 is vertically arranged at the bottom of the sputtering chamber in the rotation fixed gear ring 71, a male rotation seat 73 is arranged at the upper end of the spindle 802, the tray 72 is arranged on the rotation fixed gear ring 71 at the lower part of the male rotation seat 73, the rotation connecting cylinder 74 is arranged between the tray 72 and the rotation seat 73, the male rotation gear ring 77 is arranged in the male rotation seat 73, the material rotation power motor 78 is arranged at the bottom of the sputtering chamber, the material rotation driving gear 79 is arranged on the rotation shaft of the, the material rotation driving gear 79 is meshed with the revolution moving gear ring 77, the upper portion of the revolution seat 73 is provided with a material rotation connecting rod 801, the material rotation upper limiting disc 80 is arranged at the upper end of the material rotation connecting rod 801, the tray 72 and the revolution seat 73 are provided with a rotation rod seat 75 in a penetrating mode, the lower end of the rotation rod seat 75 is provided with a self-rotation gear 76, and the self-rotation gear 76 is meshed with the rotation fixed gear ring 71. The material frame 8 comprises a material self-rotating rod 81, a material suspension seat 83, a material suspension rod 84 and a limiting anti-falling nut 85, the material suspension seat 83 is fixedly arranged on the material self-rotating rod 81, the material suspension rod 84 is arranged around the material suspension seat 83, and the limiting anti-falling nut 85 is arranged at the upper end of the material self-rotating rod 81. The material rotation rod 81 lower extreme is provided with material rotation sleeve 82, material rotation sleeve 82 lateral part is provided with the draw-in groove, 75 upper end lateral parts of rotation rod seat are provided with spacing horizontal pole, spacing horizontal pole sets up at the draw-in groove. And an electric heating wire is arranged in the heater 6. Two noble metal magnetron sputtering targets 5 are arranged in the sputtering chamber.
The working process of the invention is as follows:
during the working process of the jewelry vacuum precious metal sputtering equipment, firstly, jewelry is hung on a material suspension rod 84, a material rotating driving gear 79 is driven to rotate by a material rotating power motor 78, a male rotating gear ring 77 is driven to rotate by the material rotating driving gear 79, a self-rotating rod seat 75 and a material rack 8 are driven to rotate by a male rotating seat 73, a self-rotating gear 76 at the lower end of the self-rotating rod seat 75 is matched with a self-rotating gear ring 71 to drive the self-rotating rod seat 75 to rotate in the rotating process of the self-rotating rod seat 75, a sputtering chamber is vacuumized by a vacuum pumping system 4, and the sputtering chamber is heated by a heater 6.
The invention relates to a vacuum precious metal sputtering process for jewelry, which comprises the following steps of A) purification treatment: cleaning the jewelry; B) removing static electricity: performing static electricity removal treatment on the jewelry; C) feeding: hanging the jewelry on a material hanging rod in a sputtering chamber; D) vacuumizing: carrying out graded vacuumizing on the sputtering chamber; E) sputtering treatment: argon is filled into the sputtering chamber, a noble metal magnetron sputtering target is adopted, noble metal is deposited on the surface of the jewelry, the sputtering treatment temperature is 260-400 ℃, and the sputtering treatment time is 5-20 minutes. And in the step A, cleaning for 30 minutes in ultrasonic equipment by adopting alcohol to remove stains and fingerprints. In the step B, firstly, the vacuum treatment box body is pumped to below 7pa by adopting a rotary vane pump, and then the vacuum treatment box body is pumped to 3pa by a molecular pump. In the step E, the temperature of the sputtering process is 310 ℃, and the time of the sputtering process is 10 minutes.
According to the vacuum precious metal sputtering equipment for the jewelry, disclosed by the invention, the precious metal magnetron sputtering target 5, the heater 6, the material rotation executing mechanism 7 and the material frame 8 are applied to the metal surface treatment equipment, so that the equipment can sputter a precious metal coating on the surface of the jewelry, the jewelry has a better anti-pollution effect, the coating is uniform, the equipment is simple to operate, the precious metal is utilized for sputtering the jewelry, the surface of the jewelry is not easy to oxidize, the wear resistance is higher, and the anti-pollution capability is better.
The above embodiments are illustrative of the present invention, and are not intended to limit the present invention, and any simple modifications of the present invention are within the scope of the present invention.

Claims (6)

1. A jewelry vacuum noble metal sputtering device is characterized in that: the device comprises a magnetron gold box body (1), a magnetron gold box door (2), a control switch (3), a vacuum pumping system (4), a noble metal magnetron sputtering target (5), a heater (6), a material rotation executing mechanism (7) and a material rack (8), wherein a sputtering chamber is arranged in the magnetron gold box body (1), the magnetron gold box door (2) is arranged at the inlet of the sputtering chamber, the control switch (3) for controlling the running state of equipment is arranged on the magnetron gold box body (1), the vacuum pumping system (4) is communicated with the sputtering chamber through an air duct, at least one noble metal magnetron sputtering target (5) is arranged in the sputtering chamber, the heater (6) is arranged at the upper part of the sputtering chamber, the material rotation executing mechanism (7) is arranged at the bottom of the sputtering chamber, and a material rack (8) for hanging materials is arranged on the material rotation executing mechanism (7).
2. The jewelry vacuum precious metal sputtering device of claim 1, wherein: the material rotation executing mechanism (7) comprises a rotation fixed gear ring (71), a tray (72), a revolution seat (73), a revolution connecting cylinder (74), a rotation rod seat (75), a rotation gear (76), a revolution moving gear ring (77), a material rotation power motor (78), a material rotation driving gear (79), a material rotation upper limiting disc (80), a material rotation connecting rod (801) and a spindle (802), wherein the rotation fixed gear ring (71) is fixedly arranged at the bottom of a sputtering chamber, the bottom of the sputtering chamber in the rotation fixed gear ring (71) is vertically provided with the spindle (802), the upper end of the spindle (802) is provided with the revolution seat (73), the tray (72) is arranged on the rotation fixed gear ring (71) at the lower part of the revolution seat (73), the revolution connecting cylinder (74) is arranged between the tray (72) and the revolution seat (73), and the revolution rotating gear ring (77) is arranged in the revolution seat (73), the material rotating power motor (78) is arranged at the bottom of the sputtering chamber, a material rotating driving gear (79) is arranged on a rotating shaft of the material rotating power motor (78), the material rotating driving gear (79) is meshed with a revolving moving gear ring (77), a material rotating connecting rod (801) is arranged on the upper portion of a revolving base (73), a material rotating upper limiting disc (80) is arranged on the upper end of the material rotating connecting rod (801) in a rotating mode, a rotating rod base (75) penetrates through the upper portion of a tray (72) and the upper portion of the revolving base (73), a self-rotating gear (76) is arranged at the lower end of the rotating rod base (75), and the self-rotating gear (76) is meshed with the rotating fixing gear ring (71).
3. The jewelry vacuum precious metal sputtering device of claim 2, wherein: the material rack (8) comprises a material self-rotating rod (81), a material suspension seat (83), a material suspension rod (84) and a limiting anti-falling nut (85), the material suspension seat (83) is fixedly arranged on the material self-rotating rod (81), the material suspension rod (84) is arranged around the material suspension seat (83), and the limiting anti-falling nut (85) is arranged at the upper end of the material self-rotating rod (81).
4. The jewelry vacuum precious metal sputtering device of claim 3, wherein: the material rotation rod is characterized in that a material rotation sleeve (82) is arranged at the lower end of the material rotation rod (81), a clamping groove is formed in the side portion of the material rotation sleeve (82), a limiting cross rod is arranged at the side portion of the upper end of the rotation rod seat (75), and the limiting cross rod is arranged in the clamping groove.
5. The jewelry vacuum precious metal sputtering device of claim 1, wherein: and an electric heating wire is arranged in the heater (6).
6. The jewelry vacuum precious metal sputtering device of claim 1, wherein: two noble metal magnetron sputtering targets (5) are arranged in the sputtering chamber.
CN201920452846.7U 2018-08-23 2019-04-04 Jewelry vacuum noble metal sputtering equipment Active CN210048844U (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201821361338 2018-08-23
CN201821361338X 2018-08-23

Publications (1)

Publication Number Publication Date
CN210048844U true CN210048844U (en) 2020-02-11

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Application Number Title Priority Date Filing Date
CN201920452846.7U Active CN210048844U (en) 2018-08-23 2019-04-04 Jewelry vacuum noble metal sputtering equipment

Country Status (1)

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CN (1) CN210048844U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109825799A (en) * 2018-08-23 2019-05-31 深圳市昊翀珠宝科技有限公司 A kind of jewelry vacuum noble metal sputtering equipment and technique

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109825799A (en) * 2018-08-23 2019-05-31 深圳市昊翀珠宝科技有限公司 A kind of jewelry vacuum noble metal sputtering equipment and technique

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