CN209897331U - Narrow-gap plasma discharge device - Google Patents

Narrow-gap plasma discharge device Download PDF

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Publication number
CN209897331U
CN209897331U CN201920288425.5U CN201920288425U CN209897331U CN 209897331 U CN209897331 U CN 209897331U CN 201920288425 U CN201920288425 U CN 201920288425U CN 209897331 U CN209897331 U CN 209897331U
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China
Prior art keywords
voltage electrode
quartz tube
inner high
plasma
electrode
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Expired - Fee Related
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CN201920288425.5U
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Chinese (zh)
Inventor
卢秀圆
王兴权
李星
杨洪宇
温茜
谢应茂
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Gannan Normal University
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Gannan Normal University
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Abstract

The utility model discloses a narrow clearance plasma discharge device, the device includes plasma generator, external power source. The plasma generator is composed of an inner high-voltage electrode, an outer grounding electrode, a quartz tube, a discharge channel, a supporting piece, an air inlet and an air outlet and an exhaust hole on the inner high-voltage electrode, and is mainly characterized in that: the inner high-voltage electrode is positioned at the center of the quartz tube, and a plurality of small holes, namely exhaust holes on the inner high-voltage electrode, are distributed at the position, close to the gas outlet, of the inner high-voltage electrode; the external grounding electrode covers the outer surface of the quartz tube; the inner high-voltage electrode and the outer grounding electrode are respectively led out of the quartz tube to lead out wires to be connected with two poles of the external power supply; the discharge channel is a very narrow, equally spaced gap between the inner high voltage electrode and the quartz tube. The condition that this device produced plasma can be adjusted through power parameter and gaseous velocity of flow to be used for water treatment fields such as waste water degradation.

Description

Narrow-gap plasma discharge device
Technical Field
The utility model relates to a narrow clearance plasma discharge device specifically is for constructing pulse strong ionization dielectric barrier discharge device to be used for water treatment fields such as waste water degradation.
Background
With the rapid development of economy, various pollutants bring great influence on the living environment and physical health condition of human beings. Since the innovation is open, the economic construction of our province obtains huge achievements, and GDP keeps faster acceleration. The economic efficiency is rapidly increased, and the problem of environmental pollution cannot be ignored. Industrial waste water, coal-fired flue gas and automobile exhaust are major sources of pollutants that cause environmental damage. Taking wastewater as an example, industrial wastewater is an important pollution source of water areas and is characterized by large amount, wide range, complex components, high toxicity, difficult purification and difficult treatment.
The conventional water treatment processes used in the prior art cannot fundamentally meet the treatment requirements of short time, low cost and no secondary pollution, and the advanced oxidation technology (AOPs) takes hydroxyl radical (. OH) generation as a mark, so that the conventional water treatment process is gradually researched in the field of drinking water treatment.
At present, Dielectric Barrier Discharge (DBD) of gas under strong ionization condition and its application in water treatment, disinfection and sterilization have received extensive attention and achieved better effect. For example, professor of white-sensitive winter can utilize strong ionizing discharge to produce strong oxidant hydroxyl radical to kill harmful marine organism fast and lower water treating cost greatly. DBD can generate stable low-temperature plasma under atmospheric pressure, is more suitable for large-scale industrial production than other low-temperature plasma generation methods, and has attracted much attention from many researchers in the fields of waste gas treatment, wastewater treatment, flue gas desulfurization, sterilization, material surface modification, organic matter oxidation treatment, thin film deposition, and the like. However, the conventional DBD discharge has a large discharge gap and thus a considerable energy is consumed in ion mobility to cause insufficient ionization of gas, resulting in an increase in the temperature of the reactor. The atmospheric pressure electric field is used for ionization discharge, electrons can be accelerated and have high energy (10eV), and then gas molecules are subjected to physical and chemical processes such as dissociation and recombination, so that the purpose of fully ionizing the gas is achieved.
Usually, the DBD under strong ionization conditions is performed under high frequency ac power supply, and the energy consumption is still high. The pulse DBD has small pulse width and short pulse leading edge rise time, so that the energy of the pulse DBD is basically not consumed in the accelerated migration of ions which are useless for generating free radicals, but acts on free electrons, and the pulse DBD has the energy required for forming high-activity free radicals to obtain more active substances such as the free radicals and the like, thereby improving the discharge efficiency and reducing the cost.
Disclosure of Invention
The strong electric field discharge is realized by dielectric barrier gas discharge with narrow gap, which requires very thin barrier dielectric and very narrow discharge gap, but the requirement for obtaining very narrow discharge gap is higher in the manufacturing process. The utility model aims to utilize a narrow clearance plasma generator that simple structure, power consumption are few to establish pulse strong ionization dielectric barrier discharge system to be used for water treatment fields such as waste water degradation.
In order to achieve the above purpose, the utility model discloses the technical scheme who adopts is: the utility model relates to a narrow gap plasma's discharge device, including plasma generator and external power source. The plasma generator consists of an inner high-voltage electrode, an outer grounding electrode, a quartz tube, a discharge channel, a support piece, an air inlet, and an exhaust hole and an air outlet on the inner high-voltage electrode; the inner high-voltage electrode is a hollow cylindrical metal tube; the external grounding electrode covers the outer surface of the quartz tube; the inner high-voltage electrode and the outer grounding electrode are respectively led out of the quartz tube to lead out wires to be connected with two poles of the external power supply; the gas inlet is led out from the quartz tube; the gas outlet is arranged at the bottom of the quartz tube; the external power supply is a plasma special power supply.
A narrow gap plasma discharge device, characterized by: the plasma generator is of a cylindrical structure made of quartz tube glass; the inner high-voltage electrode is vertically inserted into the quartz tube and clamped by the gas outlet at the bottom of the quartz tube, and meanwhile, the inner high-voltage electrode is fixed with the quartz tube through the support piece, so that the inner high-voltage electrode is positioned at the center of the quartz tube and is fixed, and meanwhile, the inner high-voltage electrode and the inner wall of the quartz tube are ensured to be at equal intervals everywhere; a plurality of small holes, namely exhaust holes on the inner high-voltage electrode, are processed on the inner high-voltage electrode close to the gas outlet, so that plasma generated in the discharge process of the discharge channel can pass through the exhaust holes on the inner high-voltage electrode and then is exhausted from the gas outlet; the discharge channel is a circular ring gap formed by the inner high-voltage electrode and the quartz tube; when a narrow-gap plasma discharge device is explored or used, if external gas needs to be introduced, the gas can be introduced into the discharge channel from the gas inlet.
When the device is connected with the external power supply to work, the discharge channel discharges under the action of the external power supply, so that air in the discharge channel is ionized under the action of a strong electric field to form plasma. The plasma contains a large amount of Reactive Oxygen Species (ROS), the ROS has strong oxidizing property and can be used in many fields of sterilization, disinfection, wastewater treatment and the like, the plasma formed by air ionization is finally exhausted from the air outlet through the air exhaust hole on the inner high-voltage electrode, and the discharge performance of the narrow-gap plasma discharge device can be discussed and analyzed through the exhausted plasma, so that the narrow-gap plasma discharge device is better applied to industrial development.
The narrow-gap plasma discharge device adopts a coaxial structure, the discharge channel adopts a dielectric barrier discharge principle to generate plasma, and the narrow-gap plasma discharge device is designed to have a narrow gap, so that strong ionization discharge can be generated when the narrow-gap plasma discharge device is matched with an external power supply to work, and the discharge is stable. Therefore, the utility model provides a simple structure, it is with low costs, can obtain the strong ionization electric discharge's narrow gap plasma discharge device.
Drawings
Fig. 1 is a schematic view of the overall structure of a narrow gap plasma generator.
Fig. 2 is a left side view of the narrow gap plasma generator.
Detailed Description
As shown in fig. 1. The utility model relates to a narrow gap plasma discharge device, which comprises a plasma generator and an external power supply 1. The plasma generator consists of an inner high-voltage electrode 2, an outer grounding electrode 6, a quartz tube 4, a support piece 3, an exhaust hole 8 on the inner high-voltage electrode, a discharge channel 7, an air inlet 8 and an air outlet 9. The inner high-voltage electrode 2 is a hollow cylindrical copper pipe; the external grounding electrode 6 is covered on the outer surface of the quartz tube 4 by adopting copper foil with the thickness of 1 mm; the inner high-voltage electrode 2 and the outer grounding electrode 6 are respectively led out of the quartz tube 4 to form leads which are connected with two poles of the external power supply 1; the gas inlet 8 is led out from the quartz tube 4; the gas outlet 9 is arranged at the bottom of the quartz tube 4; the external power supply 1 is a plasma dedicated power supply.
A narrow-gap plasma discharge device is characterized in that a cylindrical structure made of quartz tube glass material is adopted by a plasma generator, the cylindrical structure of a quartz tube 4 is 110mm long, the inner diameter is 4.64mm, the outer diameter is 10.1mm, the thickness is 2.73mm, the inner high-voltage electrode 2 is 160mm long, the inner diameter is 3mm, and the outer diameter is 4.06mm, the quartz tube 4 is vertically inserted into the quartz tube and clamped by a gas outlet 9 at the bottom of the quartz tube 4, meanwhile, the inner high-voltage electrode 2 is fixed with the quartz tube 4 through a support piece 3, so that the inner high-voltage electrode 2 is positioned at the center of the quartz tube 4 and fixed, meanwhile, the equal distance between the inner high-voltage electrode 2 and the inner wall of the quartz tube 4 is ensured everywhere, 3 ~ 6 small holes with the diameter of 2.8mm are processed at the position of the inner high-voltage electrode 2 close to the gas outlet 9, namely, the gas outlet 8 on the inner high-voltage electrode 2 is processed, so that plasma generated in the discharge process of the discharge channel 7 can pass through the gas outlet 8mm on the inner high-voltage electrode, the discharge channel 7 is further viewed from the gas outlet 9, the gap discharge channel 7, the discharge channel 7 is a circular discharge channel 7mm, the discharge channel 7, the discharge channel is formed by matching of the quartz tube 7mm, the quartz tube is formed by the quartz tube 7, the high-discharge channel 7, the discharge channel is characterized in that the discharge channel, the discharge channel is formed by the discharge channel 7, the discharge channel is formed by the discharge channel, the discharge channel is formed.
When the device is connected with the external power supply 1 for work, the discharge channel 7 discharges under the action of the external power supply 1, so that air in the discharge channel 7 is ionized under the action of a strong electric field to form plasma. The plasma contains a large amount of Reactive Oxygen Species (ROS), the ROS has strong oxidizing property and can be used in many fields of sterilization, disinfection, wastewater treatment and the like, the plasma formed by air ionization passes through the exhaust hole 8 on the inner high-voltage electrode 2 and is finally exhausted from the air outlet 9, and the discharge performance of the narrow-gap plasma discharge device can be discussed and analyzed through the exhausted plasma, so that the narrow-gap plasma discharge device is better applied to industrial development.
Although the embodiments of the present invention have been described in conjunction with the accompanying drawings, those skilled in the art may make various modifications and variations without departing from the spirit and scope of the invention, and such modifications and variations fall within the scope defined by the appended claims.

Claims (2)

1. A narrow gap plasma discharge device is composed of a plasma generator and an external power supply, and is characterized in that: the plasma generator consists of an inner high-voltage electrode, an outer grounding electrode, a quartz tube, a discharge channel, a support piece, an air inlet, and an exhaust hole and an air outlet on the inner high-voltage electrode; the inner high-voltage electrode is a hollow cylindrical metal tube; the external grounding electrode covers the outer surface of the quartz tube; the inner high-voltage electrode and the outer grounding electrode are respectively led out of the quartz tube to lead out wires to be connected with two poles of the external power supply; the gas inlet is led out from the quartz tube; the gas outlet is arranged at the bottom of the quartz tube; the external power supply is a plasma special power supply.
2. A narrow gap plasma discharge apparatus as claimed in claim 1, wherein: the plasma generator is of a cylindrical structure made of quartz tube glass; the inner high-voltage electrode is vertically inserted into the quartz tube and clamped by the gas outlet at the bottom of the quartz tube, and meanwhile, the inner high-voltage electrode is fixed with the quartz tube through the support piece, so that the inner high-voltage electrode is positioned at the center of the quartz tube and is fixed, and meanwhile, the inner high-voltage electrode and the inner wall of the quartz tube are ensured to be at equal intervals everywhere; a plurality of small holes, namely exhaust holes on the inner high-voltage electrode, are processed on the inner high-voltage electrode close to the gas outlet, so that plasma generated in the discharge process of the discharge channel can pass through the exhaust holes on the inner high-voltage electrode and then is exhausted from the gas outlet; the discharge channel is a circular ring gap formed by the inner high-voltage electrode and the quartz tube; when a narrow-gap plasma discharge device is explored or used, if external gas needs to be introduced, the gas can be introduced into the discharge channel from the gas inlet.
CN201920288425.5U 2019-03-07 2019-03-07 Narrow-gap plasma discharge device Expired - Fee Related CN209897331U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201920288425.5U CN209897331U (en) 2019-03-07 2019-03-07 Narrow-gap plasma discharge device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201920288425.5U CN209897331U (en) 2019-03-07 2019-03-07 Narrow-gap plasma discharge device

Publications (1)

Publication Number Publication Date
CN209897331U true CN209897331U (en) 2020-01-03

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201920288425.5U Expired - Fee Related CN209897331U (en) 2019-03-07 2019-03-07 Narrow-gap plasma discharge device

Country Status (1)

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CN (1) CN209897331U (en)

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