CN209829724U - Cleaning and soaking jig for upper end cover of semiconductor titanium nitride vapor deposition device - Google Patents

Abstract

The utility model discloses a cleaning and soaking jig for an upper end cover of a semiconductor titanium nitride vapor deposition device, which comprises a soaking jig body, a circular upright post, a supporting leg, a side wall reinforcing rib plate, a hook, a pin, a top end cover and a drain pipe; the soaking jig body is of a hollow structure, and a circular upright post is arranged in the hollow structure; the periphery of the bottom of the soaking jig body is provided with supporting legs, and the side wall reinforcing rib plates are positioned in the middle of the outer wall of the side plate of the soaking jig body; the soaking jig is characterized in that a hook is arranged on the upper portion of the inner wall of one group of oppositely arranged side plates of the soaking jig body, the hook is connected with a pin in a plug-in mode, the pin is located on the upper portion of the corresponding outer wall of the side plate, the bottom of the soaking jig body is connected with a liquid discharge pipe through a valve, and the top end cover covers the soaking jig body. Due to the use of the jig, a large amount of acid-base solution is saved, the on-site operation is convenient to take, and the production efficiency is greatly increased.

Description

Cleaning and soaking jig for upper end cover of semiconductor titanium nitride vapor deposition device

Technical Field

The utility model relates to a soak the tool, a semiconductor titanium nitride vapor deposition device upper end cover is washed and is soaked the tool specifically says so.

Background

At present, in the process of cleaning and regenerating an upper end cover of a semiconductor titanium nitride vapor deposition device, a layer of chemical film is attached to the surface of a part, and the part needs to be removed in a pickling or alkali mode, and after the part is removed, other treatment of the next procedure is carried out. In the prior art, a square groove is used for soaking the part, the size of the groove is far larger than that of the part, the height of the groove is far larger than that of the part, the part is placed in the groove after the acid-base ratio is prepared in the groove every time, and the part is taken out after all chemical deposition films are removed. Because the size of the soaking tank is large, the part belongs to an annular structure, the required chemical ratio is more, the field production cost is increased, and because the height of the whole tank body is higher, the part is difficult to take, and workers on the field are easy to get acid and alkali, so that industrial injury is caused.

SUMMERY OF THE UTILITY MODEL

For solving prior art and having above-mentioned problem, the application provides a semiconductor titanium nitride vapor deposition device upper end cover cleans and soaks the tool, saves a large amount of acid-base solution, and the site operation is taken conveniently, great increase production efficiency.

In order to achieve the purpose, the technical scheme of the application is as follows: a cleaning and soaking jig for an upper end cover of a semiconductor titanium nitride vapor deposition device comprises a soaking jig body, a circular upright post, supporting legs, side wall reinforcing rib plates, hooks, pins, a top end cover and a liquid discharge pipe; the soaking jig body is of a hollow structure, and a circular upright post is arranged in the hollow structure; the periphery of the bottom of the soaking jig body is provided with supporting legs, and the side wall reinforcing rib plates are positioned in the middle of the outer wall of the side plate of the soaking jig body; the soaking jig is characterized in that a hook is arranged on the upper portion of the inner wall of one group of oppositely arranged side plates of the soaking jig body, the hook is connected with a pin in a plug-in mode, the pin is located on the upper portion of the corresponding outer wall of the side plate, the bottom of the soaking jig body is connected with a liquid discharge pipe through a valve, and the top end cover covers the soaking jig body.

Furthermore, handles are arranged on two sides of the top end cover.

Furthermore, a visual window is arranged on the top end cover.

Furthermore, the soaking jig body is made of a PP material.

Further, soak tool body wherein a set of curb plate inner wall upper portion symmetry that sets up relatively and be equipped with two couples, every couple links to each other with the pin plug-in, and the pin is located corresponding curb plate outer wall upper portion.

Furthermore, the part to be cleaned is suspended in the hollow structure through the circular column.

Furthermore, the volume of the soaking jig body can be designed according to the size of the part to be washed.

The utility model discloses owing to adopt above technical scheme, can gain following technological effect: the jig is made of PP materials, has good heat resistance, wide thermal deformation temperature range, good stress cracking resistance, very high bending fatigue life, light weight, good toughness, good chemical resistance and acid and alkali resistance, and can be repeatedly used after being cleaned. The utility model provides a soak tool size can design according to the size of titanium nitride portion article, can soak a plurality of circular parts simultaneously. A large amount of acid-base solution is saved, the on-site operation is convenient to take, and the production efficiency is greatly improved.

Drawings

FIG. 1 is a schematic structural view of a soaking jig body;

FIG. 2 is a schematic structural diagram of the present application;

FIG. 3 is a top view of the present application;

FIG. 4 is a cross-sectional view of the present application;

the sequence numbers in the figures illustrate: 1. the jig comprises a top end cover, 11, a handle, 12, a visual window, 2, a side wall reinforcing rib plate, 3, supporting legs, 4, a liquid discharge pipe, 5, pins, 6, hooks, 7, a circular upright post and 8, and a soaking jig body.

Detailed Description

The invention will be described in further detail with reference to the following figures and specific embodiments: the present application is further described by taking this as an example.

As shown in fig. 1-4, the present embodiment provides a cleaning and soaking jig for an upper end cover of a semiconductor titanium nitride vapor deposition apparatus, which includes a soaking jig body, a circular column, a leg, a side wall reinforcing plate, a hook, a pin, a top end cover and a drain pipe; the soaking jig body is of a hollow structure, and a circular upright post is arranged in the hollow structure; the periphery of the bottom of the soaking jig body is provided with supporting legs, and the side wall reinforcing rib plates are positioned in the middle of the outer wall of the side plate of the soaking jig body; the soaking jig is characterized in that a hook is arranged on the upper portion of the inner wall of one group of oppositely arranged side plates of the soaking jig body, the hook is connected with a pin in a plug-in mode, the pin is located on the upper portion of the corresponding outer wall of the side plate, the bottom of the soaking jig body is connected with a liquid discharge pipe through a valve, and the top end cover covers the soaking jig body. And handles and visual windows are arranged on two sides of the top end cover.

Can place 3 soaking tool bodies simultaneously at female inslot, bottom landing leg and female inslot closely laminate this moment, pour into corresponding soaking tool this internal back respectively with the acid-base solution that will prepare, place upper end cover and other circular parts and soak this internal, circular stand just in time passes the hole of upper end cover and circular part, because the upper end cover can not with soak tool body bottom direct contact, the event adopts the rope to hang the upper end cover on the couple, treat that the whole deposit membranes of upper end cover remove the back, fish out the part, open the bottom valve and release acid-base solution, after the tool is washd to the water, can continue to use. The visual window on the top end cover can observe the condition of residual acid-base solution inside.

The above, only for the utility model discloses create the concrete implementation way of preferred, nevertheless the utility model discloses the protection scope of creation is not limited to this, and any person skilled in this technical field is in the utility model discloses create the technical scope of disclosure, according to the utility model discloses the technical scheme of creation and utility model design equivalence replacement or change all should be covered in the protection scope of creation of the utility model.

Claims (6)

1. A cleaning and soaking jig for an upper end cover of a semiconductor titanium nitride vapor deposition device is characterized by comprising a soaking jig body, a circular upright post, supporting legs, side wall reinforcing rib plates, hooks, pins, a top end cover and a liquid discharge pipe; the soaking jig body is of a hollow structure, and a circular upright post is arranged in the hollow structure; the periphery of the bottom of the soaking jig body is provided with supporting legs, and the side wall reinforcing rib plates are positioned in the middle of the outer wall of the side plate of the soaking jig body; the soaking jig is characterized in that a hook is arranged on the upper portion of the inner wall of one group of oppositely arranged side plates of the soaking jig body, the hook is connected with a pin in a plug-in mode, the pin is located on the upper portion of the corresponding outer wall of the side plate, the bottom of the soaking jig body is connected with a liquid discharge pipe through a valve, and the top end cover covers the soaking jig body.

2. The apparatus as claimed in claim 1, wherein handles are provided on both sides of the top cover.

3. The apparatus for cleaning and immersing an upper end cap of a semiconductor titanium nitride vapor deposition device according to claim 1 or 2, wherein a visual window is provided on the top end cap.

4. The apparatus of claim 1, wherein the immersion jig is made of PP.

5. The semiconductor titanium nitride vapor deposition apparatus upper end cap washing and immersing jig of claim 1, wherein the immersing jig body is provided with two hooks symmetrically on the upper portion of the inner wall of one set of the side plates oppositely disposed, each hook is connected with a corresponding pin in a plug-in manner, and the pin is located on the upper portion of the outer wall of the corresponding side plate.

6. The apparatus as claimed in claim 1, wherein the part to be cleaned is suspended in the hollow structure through the circular column.