CN209809935U - Waste gas photocatalysis treatment equipment - Google Patents
Waste gas photocatalysis treatment equipment Download PDFInfo
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- CN209809935U CN209809935U CN201920291394.9U CN201920291394U CN209809935U CN 209809935 U CN209809935 U CN 209809935U CN 201920291394 U CN201920291394 U CN 201920291394U CN 209809935 U CN209809935 U CN 209809935U
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Abstract
The embodiment of the utility model discloses exhaust gas photocatalysis treatment facility, exhaust gas photocatalysis treatment facility includes the processing unit, the processing unit includes the process chamber, wherein, install a plurality of UV fluorescent tubes in the process chamber, just at least some of process chamber inner wall is the reflection of light face. The treatment facility is used for solving the problem that the waste gas purification efficiency of the existing photocatalysis facility is lower.
Description
Technical Field
The utility model relates to a waste gas treatment technical field, concretely relates to waste gas photocatalysis treatment equipment.
Background
Waste gas treatment is also called waste gas purification (flow gas purification), and mainly refers to the treatment of industrial waste gas generated in industrial places, such as dust particles, smoke, dust, peculiar smell gas and toxic and harmful gas. Because the waste gas discharged in industrial production often has harmful effects on the environment and human health, the waste gas is treated by adopting purification measures before being discharged into the atmosphere, so that the waste gas meets the requirements of waste gas discharge standards, and the process is called waste gas purification.
Common waste gas purification includes factory smoke waste gas purification, workshop dust waste gas purification, organic waste gas purification, waste gas peculiar smell purification, acid-base waste gas purification, chemical waste gas purification and the like. The waste gas purifying equipment is widely applied to industries of chemical plants, electronic plants, paint spraying plants, automobile plants, coating plants, petrochemical industry, furniture plants, food plants, rubber plants, plastic plants and the like which generate peculiar smell, stink and toxic and harmful gases.
The existing common exhaust gas purification methods include: absorption method, adsorption method, condensation method, combustion method, UV photo-oxygen catalysis method, etc., wherein UV photo-oxygen catalysis represents the new trend of the current waste gas treatment.
The working principle of UV photo-oxygen catalysis is as follows: the high-energy high-ozone UV light beam is utilized to irradiate the waste gas, and industrial waste gas such as: ammonia, trimethylamine, hydrogen sulfide, methylthio hydrogen, methyl mercaptan, methyl sulfide, butyl acetate, ethyl acetate, dimethyl disulfide, carbon disulfide, molecular chain structure of styrene, sulfide H2S, VOCs, benzene, toluene and xylene, so that organic polymer or inorganic malodorous compound molecular chain is degraded and converted into low molecular compound, such as CO, under the irradiation of high-energy ultraviolet light beam2、H2O, and the like. In addition, the high-energy high-ozone UV ultraviolet light beam is used for decomposing oxygen molecules in the air to generate free oxygen, namely active oxygen, and the free oxygen carries out imbalance of positive and negative electrons, so that the free oxygen needs to be combined with the oxygen molecules to further generate ozone: UV + O2 → O- + O (active oxygen); o + O2 → O3 (ozone).
It is known that ozone has strong oxidizing effect on organic matters and has instant effect of removing industrial waste gas and other irritant odor. After the industrial waste gas is input into the purifying equipment by utilizing the exhaust equipment, the purifying equipment carries out synergistic decomposition and oxidation reaction on the industrial waste gas by utilizing high-energy UV light beams and ozone, so that the substances of the industrial waste gas are degraded and converted into low-molecular compounds, water and carbon dioxide, and then the low-molecular compounds, the water and the carbon dioxide are discharged out of a room through an exhaust pipeline.
The existing photocatalysis equipment applying UV is generally made of common stainless steel or carbon steel and the like. The materials only play a role of a common equipment shell, so that the technical content of the equipment is low, and the waste gas purification efficiency is low. In addition, the existing photocatalysis equipment can also use a photocatalyst plate to increase photocatalysis, but most of the existing photocatalysis plates adopt a honeycomb pore plate with the thickness of 1-2cm and are made of aluminum-based materials, and the materials are easy to effloresce and are not durable, so that the existing photocatalysis equipment loses the function.
SUMMERY OF THE UTILITY MODEL
An object of the embodiment of the utility model is to provide an exhaust gas photocatalysis treatment facility for it is lower to solve current photocatalysis equipment exhaust purification efficiency, and wherein the photocatalyst plate who uses under some circumstances easily morals and manners, not durable scheduling problem.
In order to achieve the above object, an embodiment of the present invention provides an exhaust gas photocatalysis treatment apparatus, the exhaust gas photocatalysis treatment apparatus includes a treatment unit, the treatment unit includes a treatment chamber, wherein, install a plurality of UV fluorescent tubes in the treatment chamber, just at least a part of the inner wall of the treatment chamber is the reflection of light face.
In one embodiment, the treatment chamber is in a square cylinder shape and comprises a first side plate, a second side plate, a top plate and a bottom plate, wherein the first side plate, the second side plate, the top plate and the bottom plate form a rectangular frame, and the plurality of UV lamp tubes are arranged on the top plate; wherein, one of the opposite surfaces of the first side plate and the second side plate is a light reflecting surface.
In one embodiment, the process chamber is cylindrical in shape with a horizontal partition parallel to the axis of the cylinder dividing the cylindrical wall into a first arcuate side plate and a second arcuate side plate; installing the plurality of UV lamps on the horizontal partition plate and in a space formed by the horizontal partition plate and the first arc-shaped side plate; and one part of the inner surface of the first arc-shaped side plate is a light reflecting surface.
The front end and the rear end of the treatment chamber are provided with openings which are respectively a waste gas inlet end and a gas outlet end of the treatment unit, and waste gas to be treated enters from the gas inlet end, passes through the UV lamp tubes and is discharged from the gas outlet end. In the process, the waste gas is irradiated by high-energy UV light beams, and the waste gas to be treated entering the treatment equipment is cracked; in addition, the high-energy UV light beams are utilized to decompose oxygen molecules in the air to generate active oxygen, so that ozone is generated, organic matters in the waste gas are subjected to strong oxidation, gas odor is removed, finally, waste gas substances to be treated are degraded and converted into low molecular compounds, water and carbon dioxide, and the low molecular compounds, the water and the carbon dioxide are discharged out of the treatment equipment through the exhaust end.
Wherein, for prior art, because at least a part of treatment chamber inner wall is established to the reflection of light face, set up the reflection of light face on an opposite face of first curb plate and second curb plate for example, perhaps set up the reflection of light face on a part of first arc curb plate internal surface to make the high energy UV ultraviolet ray that the UV fluorescent tube sent through at least once reflect, even through multiple reflection, and multiple action is in the waste gas and the air in the equipment treatment chamber of flowing through, thereby improved the ultraviolet utilization ratio of UV, improved waste gas purifying effect.
Furthermore, the inner wall of the space for accommodating the UV lamp tube in the processing chamber is a reflecting surface. Through all setting up corresponding inner wall in the processing chamber to the reflection of light face, the internal surface of first curb plate, second curb plate, roof and bottom plate in for example the square tube shape processing chamber all sets up to the reflection of light face, perhaps all sets up first arc curb plate and horizontal baffle towards the internal surface of UV fluorescent tube in the cylinder shape processing chamber to the reflection of light face, further improves the ultraviolet reflection number of times of UV and reflection effect to improve the ultraviolet utilization ratio of UV, improved exhaust purification effect.
All materials capable of reflecting UV ultraviolet rays and improving the reflection effect of the UV ultraviolet rays can be used as the light reflecting surface, such as a mirror surface stainless steel plate, an aluminum foil, a PVC plate and the like.
Further, the reflecting surface is a mirror surface stainless steel plate, preferably a high-brightness mirror surface stainless steel plate.
Further, the mirror surface stainless steel plate is an 8K mirror surface stainless steel plate, a 10K mirror surface stainless steel plate and/or a 12K mirror surface stainless steel plate, and preferably a 12K mirror surface stainless steel plate.
By using the mirror surface stainless steel plate, the reflection efficiency of UV ultraviolet rays can be increased, and the mirror surface stainless steel plate is corrosion resistant compared with the existing material, and is more suitable for the high-corrosion environment of waste gas treatment, so that the service life of the product is prolonged.
Furthermore, at least one part of the inner wall of the treatment chamber is also provided with a photocatalyst surface.
For example, by setting the inner surfaces of at least a part of the first side plate, the second side plate, the top plate and the bottom plate in the square cylindrical processing chamber as the photocatalyst surfaces, or setting the inner surfaces of at least a part of the first arc-shaped side plate and the horizontal partition plate facing the UV lamp in the cylindrical processing chamber as the photocatalyst surfaces, the removal efficiency of various organic compounds and a part of inorganic substances having unstable chemical bonds in the exhaust gas can be further increased. The photocatalyst is a general name of a photo-semiconductor material with a photocatalytic function represented by nano-scale titanium dioxide, is coated on the surface of a substrate, and generates a strong catalytic degradation function under the action of ultraviolet light and visible light: can effectively degrade toxic and harmful gases in the air; can effectively kill various bacteria and decompose and harmlessly treat toxins released by bacteria or fungi; meanwhile, the composite material also has the functions of removing formaldehyde, deodorizing, resisting pollution, purifying air and the like.
The photocatalyst surface may be obtained by coating a photocatalyst coating on the corresponding inner surface. The photocatalyst can be made of all materials capable of enhancing the effects of decomposing UV ultraviolet rays and treating waste gas.
Further, the photocatalyst on the photocatalyst surface comprises nano TiO2、ZnO、ZrO2、CdS、WO3、Fe2O3、PbS、SnO2、ZnS、SrTiO3And/or SiO2Etc., preferably nano TiO2ZnO and/or ZrO2。
Nano titanium dioxide (TiO)2) Is a semiconductor, and mainly has Anatase type (Anatase) and Rutile type (Rutile) crystal structures as photocatalyst materials, and the Rutile type crystal has stronger photocatalytic performance, weather resistance and attachment than the Anatase type crystalThe adhesion is also good, and the nano inorganic coating is stable.
The nano zinc oxide (ZnO) has the particle size of 1-100nm and can show a plurality of special properties, such as non-migration property, fluorescence property, piezoelectricity property, ultraviolet ray absorption and scattering ability and the like.
Nano zirconium dioxide (ZrO)2) Is in the form of high-purity white powder, and is odorless and tasteless. The crystal is monoclinic at low temperature and tetragonal at high temperature. Has high refractive index (2.2) and high temperature resistance. Has good thermochemical stability, high-temperature conductivity, high-temperature strength and toughness, and good mechanical, thermal, electrical and optical properties.
Because the embodiment of the utility model provides a photocatalyst coating is on solid plate in the technical scheme, compares in adopting cellular photocatalyst catalysis board framework, and waste gas wind-force does not pass from the photocatalyst board, can improve its life-span greatly to be difficult to the morals and manners, more durable. However, the present invention provides a processing apparatus, into which an existing honeycomb photocatalyst catalytic plate can be inserted.
The combination of the reflecting surface, the photocatalyst surface and the UV lamp tube in the treatment unit can greatly improve the efficiency of the waste gas photocatalytic treatment.
The utility model discloses the UV fluorescent tube that uses among the technical scheme can be for any current UV fluorescent tube that is used for usage such as exhaust-gas treatment, schizolysis, purification among the prior art. The UV lamp tubes are preferably arranged equidistantly along the central line of the treatment chamber along the exhaust gas flow direction, so that the light energy utilization rate of UV ultraviolet rays can be improved as much as possible, and the treatment distance can be prolonged.
In one embodiment, the UV lamps are U-shaped UV lamps that are equally spaced along the centerline of the chamber in the direction of exhaust gas flow. In one embodiment, the U-shaped face of the UV lamp is parallel to the direction of exhaust gas flow, and in another embodiment, the U-shaped face of the UV lamp is perpendicular to the direction of exhaust gas flow. Resistance of the UV lamp tube to airflow can be reduced as much as possible through arrangement, more surfaces of the U-shaped surface face the reflecting surface, and reflectivity and utilization rate of UV rays are improved.
Furthermore, the processing unit further comprises a control chamber, the control chamber and the processing chamber are integrally or separately arranged, and the control chamber is positioned above, below or below the two sides of the processing chamber. For example, for a rectangular barrel-shaped processing chamber, the control chamber is arranged above the top plate, and can also be arranged outside the first side plate, the second side plate or the bottom plate; in addition to the above arrangement, the control chamber may be a space formed by the horizontal partition plate and the second arc-shaped side plate in the cylindrical processing chamber. The control room is used for installing the UV lamp tube and accommodating the circuit for controlling the UV lamp tube, the control component and the like, and is used for protecting the components; the protective device is arranged on the upper surface of the top plate or the horizontal partition plate so as to be convenient for installing various protective devices and heat dissipation devices in the control room, and the protective devices are safe to use.
Further, the treatment units may be arranged vertically or horizontally, so that the UV lamps are arranged vertically or horizontally back and forth in the treatment chamber. Namely, the processing unit can be vertically or horizontally arranged according to the objective conditions and the actual requirements of equipment installation.
Further, the exhaust gas photocatalytic treatment device comprises a plurality of treatment units which are transversely connected in parallel and/or connected in series in a front-back mode, so that the exhaust gas treatment flux and/or the exhaust gas treatment effect are increased.
For the square barrel-shaped treatment unit, the first side plate and the second side plate can be connected in parallel in a transverse mode sequentially, and/or the waste gas inlet end and the waste gas outlet end are connected in series in a front-back mode, so that the waste gas parallel treatment flux of equipment is increased, and/or the waste gas treatment length is increased, and the waste gas treatment effect of the equipment is improved. For the cylindrical treatment units, the cylindrical side walls can be transversely arranged in parallel and/or overlapped to be transversely connected in parallel, and the waste gas inlet end and the waste gas outlet end can be connected in series front and back, so that the waste gas treatment flux of the equipment is increased, and/or the waste gas treatment length is increased, and the waste gas treatment effect of the equipment is improved.
In addition, for the square barrel-shaped processing chamber, except the outer side plates of the processing units at two sides, the other side plates are positioned in the processing equipment, so that two connected side plates in the inner side plates can be combined into a partition plate. The two surfaces of the partition boards can be both reflecting surfaces, or both surfaces can be photocatalyst surfaces, or any one surface can be a reflecting surface and the other surface can be a photocatalyst surface.
The embodiment of the utility model provides a have following advantage:
1. the embodiment of the utility model provides a waste gas photocatalysis treatment facility can be used to waste gas treatment, and various gas purification uses such as dust pulverization, ventilation are convenient for maintain convenient to use.
2. The reflective surface is arranged in the treatment chamber, so that the reflection efficiency and the utilization efficiency of the UV rays are improved.
3. Through set up the photocatalyst face in the treatment chamber is inside, and exhaust gas wind-force does not pass from the light touch plate, can improve its life-span greatly.
Drawings
Fig. 1 is a schematic structural diagram of an exhaust gas photocatalytic treatment device provided by an embodiment of the present invention. Wherein the processing device comprises a processing unit.
FIG. 2 is a schematic view of the gas inlet end of FIG. 1, wherein the treatment unit is in the shape of a square cylinder.
Fig. 3 is a schematic side view of fig. 2.
FIG. 4 is a schematic diagram of the configuration of the inlet end of the treatment unit in one embodiment wherein the treatment unit is cylindrical.
Fig. 5 is a schematic structural diagram of an air inlet end of an exhaust gas photocatalytic treatment device according to another embodiment of the present invention. Wherein the processing device comprises three processing units.
Wherein the reference numerals are:
1. a first side plate; 2. a second side plate; 3. a top plate; 4. a base plate; 5. a UV lamp tube; 6. a first arcuate side panel; 61. a horizontal partition plate; 7. a first partition plate; 8. a second partition plate; 100. a processing chamber; 200. and a control room.
Detailed Description
The following description is provided for illustrative purposes, and other advantages and features of the present invention will become apparent to those skilled in the art from the following detailed description.
It should be understood that the structure, ratio, size and the like shown in the drawings attached to the present specification are only used for matching with the content disclosed in the specification, so as to be known and read by those skilled in the art, and are not used for limiting the limit conditions that the present invention can be implemented, so that the present invention has no technical essential meaning, and any structure modification, ratio relationship change or size adjustment should still fall within the scope that the technical content disclosed in the present invention can cover without affecting the function that the present invention can produce and the purpose that the present invention can achieve. Meanwhile, the terms such as "upper", "lower", "left", "right", "middle", and the like used in the present specification are for the sake of clarity only, and are not intended to limit the scope of the present invention, and changes or adjustments of the relative relationship thereof are also considered to be the scope of the present invention without substantial changes in the technical content.
Example 1
As shown in fig. 1-3, a schematic structural diagram of an exhaust photocatalytic treatment device according to an embodiment of the present invention is shown, wherein the treatment device includes a treatment unit, the treatment unit includes a square barrel-shaped treatment chamber 100, and a control chamber 200 is further disposed on the upper portion of the treatment chamber 100.
The process chamber 100 includes a first side plate 1, a second side plate 2, a top plate 3, and a bottom plate 4 and constitutes a rectangular frame. Install 7U type UV fluorescent tubes 5 (the fluorescent tube quantity of actual installation is confirmed as required) on roof 3, these UV fluorescent tubes 5 hold in processing chamber 100, and wherein, first curb plate 1 and second curb plate 2 are dull and stereotyped and U type UV fluorescent tube 5's both sides set up relatively, and the inboard opposite face of first curb plate 1 is the reflection of light face, and the inboard opposite face of second curb plate 2 is the photocatalyst face. The photocatalyst surface is formed by coating nano TiO on the inner opposite surface of the second side plate 22Photocatalyst coating is obtained. The reflecting surface is a 12K mirror surface stainless steel plate. Further, the opposite inner surfaces of the top plate 3 and the bottom plate 4 are both 10K mirror surface stainless steel plates.
All the U-shaped UV lamp tubes 5 are arranged at equal intervals along the central line of the top plate 3 along the exhaust gas flow direction, and the U-shaped surface of each UV lamp tube 5 is perpendicular to the exhaust gas flow direction. A control chamber 200 is arranged on the top plate 3, and the control chamber 200 covers the upper surface of the top plate 3 and is used for installing the UV lamp tube 5 in an operating mode and accommodating circuits and control components for controlling the UV lamp tube and the like so as to protect the components; the upper surface of the top plate 3 is covered so as to be convenient for installing various protective devices and heat dissipation devices on the upper surface of the top plate, and the protective devices are safe to use.
Example 2
Referring to fig. 4, a schematic diagram of the inlet end of the process unit in one embodiment is shown, wherein the process chamber of the process unit is cylindrical. The structure of the treatment unit is similar to that of the treatment unit of embodiment 1 except that the housing is changed from a square cylindrical shape to a cylindrical shape to accommodate some types of mounting locations.
The housing is cylindrical and is divided by a horizontal partition 61 into a lower process chamber 100 and an upper control chamber 200. The processing chamber 100 comprises a first arc-shaped side plate 6 and a horizontal partition plate 61, wherein the first arc-shaped side plate 6 is a part of a cylindrical shell divided by the horizontal partition plate 61, and the plurality of U-shaped UV lamps 5 are arranged on the horizontal partition plate 61; wherein the left side 1/4 of the inner surface of the first curved side panel 6 is a reflective surface (not shown).
Example 3
As shown in fig. 5, a schematic structural diagram of an air inlet end of an exhaust gas photocatalytic treatment device according to another embodiment of the present invention is shown. Wherein the treatment apparatus comprises three square barrel treatment units. The processing units are connected in parallel through a first side plate 1 and a second side plate 2 in sequence.
At this time, the top panels 3 of each unit are sequentially connected to form a total top panel, and the control room 200 covers the total top panel. In addition, the first side plate of the middle processing unit and the second side plate of the left processing unit are combined into a first partition plate 7 except the outer side plates of the two side processing units; the second side plate of the middle processing unit and the first side plate of the right processing unit are combined into a second partition plate 8. One surface of the first partition plate 7 and the second partition plate 8 is a light reflecting surface, and the other surface is a photocatalyst surface.
Example 4
In this embodiment, the processing unit is further arranged in the horizontal direction in addition to embodiment 1. At this time, the first side plate 1 and the second side plate 2 are arranged in parallel up and down, and the UV lamps 5 are arranged in the rectangular frame space of the processing unit in the front and back direction.
The embodiment of the utility model provides an above-mentioned waste gas photocatalysis treatment facility is convenient for maintain convenient to use. Through set up dull and stereotyped reflection of light face and photocatalyst face in processing unit is inside, improved UV ultraviolet's reflection efficiency and utilization efficiency to equipment life has been prolonged.
Although the invention has been described in detail with respect to the general description and the specific embodiments, it will be apparent to those skilled in the art that modifications and improvements can be made based on the invention. Therefore, such modifications and improvements are intended to be within the scope of the invention as claimed.
Claims (10)
1. The utility model provides an exhaust gas photocatalysis treatment facility which characterized in that, exhaust gas photocatalysis treatment facility includes the processing unit, the processing unit includes the process chamber, wherein, install a plurality of UV fluorescent tubes in the process chamber, just at least a part of process chamber inner wall is the reflection of light face.
2. The exhaust gas photocatalytic treatment apparatus according to claim 1, characterized in that the treatment chamber has a square cylindrical shape, and includes a first side plate, a second side plate, a top plate, and a bottom plate, the first side plate, the second side plate, the top plate, and the bottom plate constitute a rectangular frame, and the plurality of UV lamps are mounted on the top plate; wherein, one of the opposite surfaces of the first side plate and the second side plate is a light reflecting surface.
3. The exhaust gas photocatalytic treatment apparatus according to claim 1, characterized in that the treatment chamber has a cylindrical shape in which a horizontal partition plate parallel to the cylindrical axis is provided to divide the cylindrical wall into a first arc-shaped side plate and a second arc-shaped side plate; installing the plurality of UV lamps on the horizontal partition plate and in a space formed by the horizontal partition plate and the first arc-shaped side plate; and one part of the inner surface of the first arc-shaped side plate is a light reflecting surface.
4. The exhaust gas photocatalytic treatment apparatus according to any one of claims 1 to 3, characterized in that the inner walls of the space in the treatment chamber that accommodates the UV lamp tube are all light-reflecting surfaces.
5. The exhaust gas photocatalytic treatment apparatus according to claim 1, characterized in that the light reflecting surface is a mirror surface stainless steel plate, including an 8K mirror surface stainless steel plate, a 10K mirror surface stainless steel plate, and/or a 12K mirror surface stainless steel plate.
6. The exhaust gas photocatalytic treatment apparatus according to claim 1, characterized in that at least a part of the inner wall of the treatment chamber is further provided with a photocatalyst surface.
7. The exhaust gas photocatalytic treatment apparatus according to claim 1, characterized in that the treatment unit is disposed vertically or horizontally so that the UV lamp tubes are arranged vertically or horizontally back and forth in the treatment chamber.
8. The exhaust gas photocatalytic treatment apparatus according to claim 1, characterized in that the treatment unit further includes a control chamber that is provided integrally with or separately from the treatment chamber and that is located above, on both sides of, or below the treatment chamber.
9. The exhaust gas photocatalytic treatment apparatus according to claim 2 or 3, characterized in that the exhaust gas photocatalytic treatment apparatus includes a plurality of the treatment units that are laterally connected in parallel and/or connected in series in tandem to increase an exhaust gas treatment flux and/or an exhaust gas treatment effect.
10. The exhaust gas photocatalytic treatment apparatus according to claim 9, characterized in that, for the square cylindrical treatment chamber, two side plates connected among the inner side plates except the outer side plates of the two-side treatment units are combined into one partition plate; the two surfaces of the partition boards are both reflecting surfaces, or both surfaces are photocatalyst surfaces, or any one surface is a reflecting surface and the other surface is a photocatalyst surface.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201920291394.9U CN209809935U (en) | 2019-03-07 | 2019-03-07 | Waste gas photocatalysis treatment equipment |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201920291394.9U CN209809935U (en) | 2019-03-07 | 2019-03-07 | Waste gas photocatalysis treatment equipment |
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| CN209809935U true CN209809935U (en) | 2019-12-20 |
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| CN201920291394.9U Expired - Fee Related CN209809935U (en) | 2019-03-07 | 2019-03-07 | Waste gas photocatalysis treatment equipment |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109731471A (en) * | 2019-03-07 | 2019-05-10 | 华蓝达废气治理湖北有限公司 | A kind of exhaust gas photocatalysis treatment equipment |
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2019
- 2019-03-07 CN CN201920291394.9U patent/CN209809935U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109731471A (en) * | 2019-03-07 | 2019-05-10 | 华蓝达废气治理湖北有限公司 | A kind of exhaust gas photocatalysis treatment equipment |
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Granted publication date: 20191220 |