CN209804672U - Grid line structure, screen printing plate and solar cell - Google Patents
Grid line structure, screen printing plate and solar cell Download PDFInfo
- Publication number
- CN209804672U CN209804672U CN201920781367.XU CN201920781367U CN209804672U CN 209804672 U CN209804672 U CN 209804672U CN 201920781367 U CN201920781367 U CN 201920781367U CN 209804672 U CN209804672 U CN 209804672U
- Authority
- CN
- China
- Prior art keywords
- mark
- pattern
- line
- grid line
- gate line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000007650 screen-printing Methods 0.000 title abstract description 16
- 238000007639 printing Methods 0.000 claims description 45
- 239000003550 marker Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 abstract description 16
- 238000004519 manufacturing process Methods 0.000 description 57
- 230000008569 process Effects 0.000 description 9
- 239000003292 glue Substances 0.000 description 4
- 230000000149 penetrating effect Effects 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000012945 sealing adhesive Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 238000013024 troubleshooting Methods 0.000 description 1
Landscapes
- Printing Methods (AREA)
Abstract
the utility model belongs to the technical field of solar cell, a grid line structure, screen printing plate and solar cell are disclosed, wherein, the grid line structure includes a plurality of main grid lines that are arranged at intervals longitudinally, a plurality of auxiliary grid lines that are arranged at intervals transversely and are perpendicular to the main grid lines, characterized in that, the grid line structure also includes a reference structure and a marking structure, the reference structure and the marking structure are both arranged on the main grid lines; or the reference structure and the marking structure are arranged on the auxiliary grid line; or one of the reference structure and the mark structure is arranged on the main grid line, and the other one is arranged on the auxiliary grid line. The grid line structure is marked by setting the reference structure and the marking structure, lines corresponding to the grid line structure can be traced, the problem of screen printing procedures of the lines can be conveniently checked, and the abnormity of the client side of the assembly can be more efficiently, quickly and conveniently processed.
Description
Technical Field
The utility model relates to a solar wafer technical field especially relates to a grid line structure, half tone and solar wafer.
background
In the production and preparation process of the solar cell, a back electrode, a back electric field and a front grid line are formed on the surface of the solar cell by printing through a screen printing process. In the existing screen printing plate, screen printing plates of all lines are the same and have no difference, and are used for printing solar cell products, solar cells adopted by a component client often come from different production lines of different workshops, are difficult to screen one by one in the production process, and the accurate line tracing of a silk screen process cannot be realized from the component client; when the method is used for processing component end customer complaints related to a screen printing process and the dark current/low efficiency of a production line, a specific line cannot be accurately locked, and troubles are brought to troubleshooting.
SUMMERY OF THE UTILITY MODEL
A first object of the utility model is to provide a grid line structure can trace back the line that the grid line structure corresponds and do not, is convenient for investigate the problem that each line does not print the process.
To achieve the purpose, the utility model adopts the following technical proposal:
A grid line structure comprises a plurality of main grid lines arranged at intervals longitudinally, a plurality of auxiliary grid lines arranged at intervals transversely and perpendicular to the main grid lines, a reference structure and a marking structure, wherein the reference structure and the marking structure are both arranged on the main grid lines; or the reference structure and the marking structure are arranged on the auxiliary grid line; or one of the reference structure and the mark structure is arranged on the main grid line, and the other one is arranged on the auxiliary grid line.
preferably, the reference structure and the mark structure are located on the same main grid line; or the reference structure and the mark structure are positioned on different main grid lines.
Preferably, the main grid line is provided with a hollow area and a printing area at intervals along the length direction of the main grid line, and the reference structure and the mark structure are arranged in the hollow area or the printing area.
Preferably, one of the reference structure and the mark structure is disposed in the hollow area, and the other is disposed in the printing area; or
The reference structure and the mark structure are both arranged in the hollow area; or
the reference structure and the marking structure are both arranged in the printing area.
Preferably, the reference structure and the mark structure are at least one group, each group of the reference structure includes at least one reference point, and each group of the mark structure includes at least one mark point.
Preferably, when the number of sets of the reference structure and the mark structure is the same, the number of reference points in each set of the reference structure and the number of mark points in each set of the mark structure are different.
Preferably, the shape of the reference point in the reference structure and the shape of the marker point in the marker structure are different.
Preferably, the reference points and the mark points are each one of a circle, a triangle, and a pentagon.
A second object of the utility model is to provide a half tone can trace back the line that the grid line structure corresponds according to the grid line structure of its printing and do not, is convenient for investigate the problem of each line do not screen printing process.
To achieve the purpose, the utility model adopts the following technical proposal:
a screen for printing a grid line structure as described above, comprising:
A main gate line pattern corresponding to the main gate line;
A sub-gate line pattern corresponding to the sub-gate line; and
A reference structure pattern and a mark structure pattern corresponding to the reference structure and the mark structure;
The reference structure graph and the mark structure graph are arranged on the main grid line graph; or the reference structure graph and the mark structure graph are both arranged on the auxiliary grid line graph; or one of the reference structure pattern and the mark structure pattern is arranged on the main grid line pattern, and the other is arranged on the auxiliary grid line pattern.
A third object of the utility model is to provide a solar wafer, the line that can trace back production solar wafer is other, is convenient for investigate the problem of the other screen printing process of each line.
To achieve the purpose, the utility model adopts the following technical proposal:
A solar cell piece comprising the grid line structure is provided.
The utility model has the advantages that:
The utility model provides a grid line structure, half tone and solar wafer, the grid line structure includes reference structure and mark structure, reference structure and mark structure all set up on main grid line, or all set up on vice grid line, or one among reference structure and the mark structure sets up on main grid line and vice grid line, mark this grid line structure through setting up reference structure and mark structure, can trace back the line that the grid line structure corresponds other, be convenient for investigate the problem of the other screen printing process of each line, it is more high-efficient, swift, facilitate the processing subassembly customer end's anomaly.
drawings
Fig. 1 is a schematic structural diagram of a gate line structure provided by the present invention;
Fig. 2 is a schematic structural diagram of a grid line pattern structure of the screen printing plate provided by the present invention;
Fig. 3 is a schematic structural view of a gate line structure provided in example 1;
Fig. 4 is a schematic structural view of a gate line structure provided in example 2;
Fig. 5 is a schematic structural view of a gate line structure provided in example 3;
Fig. 6 is a schematic structural view of a gate line structure provided in example 4;
Fig. 7 is a schematic structural view of a gate line structure provided in example 5;
fig. 8 is a schematic structural view of a gate line structure provided in example 6;
Fig. 9 is a schematic structural view of the gate line structure provided in example 7.
In the figure:
1. A main gate line; 11. a hollowed-out area; 12. a printing area; 2. a secondary gate line; 3. a reference structure; 31. a reference point; 4. a marker structure; 41. marking points; 7. a main grid line pattern; 8. a secondary grid line pattern; 9. a reference structure pattern; 10. and marking the structural graph.
Detailed Description
Reference will now be made in detail to the embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the drawings are exemplary and intended to be used for explaining the present invention, and should not be construed as limiting the present invention.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed in a specific orientation, and be operated, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance. Wherein the terms "first position" and "second position" are two different positions.
Unless expressly stated or limited otherwise, the first feature "on" or "under" the second feature may include the first feature being in direct contact with the second feature, or may include the first feature being in direct contact with the second feature but being in contact with the second feature by another feature therebetween. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature.
The technical solution of the present invention is further explained by the following embodiments with reference to the accompanying drawings.
The utility model provides a solar wafer, this solar wafer include the grid line structure, as shown in fig. 1, this grid line structure includes that many main grid lines 1, the horizontal interval that vertical interval set up and a plurality of vice grid lines 2 of perpendicular to main grid line 1. In order to trace the line grade corresponding to the grid line structure and conveniently solve the problem of screen printing process of each line grade, the abnormity of the client side of the assembly is more efficiently, quickly and conveniently processed, the grid line structure further comprises a reference structure 3 and a marking structure 4.
Specifically, the arrangement positions and arrangement forms of the reference structures 3 and the mark structures 4 are very critical to achieve the above traceability object.
Alternatively, the reference structure 3 and the mark structure 4 may be both disposed on the bus bar 1; or the reference structure 3 and the mark structure 4 may be both disposed on the sub-gate line 2; or one of the reference structure 3 and the mark structure 4 is disposed on the main gate line 1, and the other is disposed on the sub-gate line 2, at this time, the reference structure 3 may be disposed on the main gate line 1, and the mark structure 4 may be disposed on the sub-gate line 2, or the mark structure 4 may be disposed on the main gate line 1, and the reference structure 3 may be disposed on the sub-gate line 2.
Alternatively, when the reference structure 3 and the mark structure 4 are both located on the main gate line 1, the reference structure 3 and the mark structure 4 may be located on the same main gate line 1; or the reference structure 3 and the mark structure 4 are located on different bus bars 1.
Optionally, the main grid line 1 is provided with a hollow area 11 and a printing area 12 at intervals along the length direction thereof, and the reference structure 3 and the mark structure 4 are provided in the hollow area 11 or the printing area 12. For example, one of the reference structure 3 and the mark structure 4 is arranged in the hollow area 11, and the other is arranged in the printing area 12; or the reference structure 3 and the mark structure 4 are both arranged in the hollow area 11; or both the reference structure 3 and the marking structure 4 are arranged in the printing area 12. When the reference structure 3 and the mark structure 4 are provided in the printing region 12, they may be provided as a hollow structure, and when the reference structure 3 and the mark structure 4 are provided in the hollow region 11, they may be provided as a solid structure.
Optionally, the reference structures 3 and the marker structures 4 are each in at least one group, each group of reference structures 3 comprises at least one reference point 31, and each group of marker structures 4 comprises at least one marker point 41.
Alternatively, when the number of sets of the reference structures 3 and the mark structures 4 is the same, the number of the reference points 31 in each set of the reference structures 3 and the number of the mark points 41 in each set of the mark structures 4 are different. For example, if the reference structure 3 is 1 group, the group of reference structures 3 includes 2 reference points 31, the marking structure 4 is 1 group, and the group of marking structures 4 includes 1 marking point 41, it can be determined that the grid line structure is from the first production line; for another example, if the reference structure 3 is 1 group, the group of reference structures 3 includes 2 reference points 31, the marking structure 4 is 3 groups, and the group of marking structures 4 includes 2 marking points 41, it can be determined that the grid line structure is from a third production line, and so on.
As a further alternative, the shape of the reference points 31 in the reference structure 3 and the shape of the marker points 41 in the marker structure 4 are different. Specifically, the reference point 31 and the mark point 41 are each in one of a circle, a triangle, and a pentagon, for example, the reference point 31 is in a circle, the mark point 41 is in a triangle, and the like.
The reference point 31 and the mark point 41 can be well distinguished through different numbers of the reference point 31 and the mark point 41 and different shapes of the reference point 31 and the mark point 41, and the judgment accuracy is ensured.
Further, the maximum width of the reference structure 3 and the mark structure 4 is 0.3-0.8 times the width of the main grid line 1. For example, the maximum widths of the reference structure 3 and the mark structure 4 are 0.3 times, 0.4 times, 0.5 times, 0.6 times, 0.7 times, and 0.8 times the width of the bus bar 1. Preferably, the maximum width of the reference structure 3 and the mark structure 4 is 0.6 times the width of the bus bar 1, and at the width ratio, both the reference structure 3 and the mark structure 4 can be effectively identified, and the phenomenon of gate breaking is not easily caused.
The maximum width dimensions of the reference points 31 and the mark points 41 may be 0.6 to 1mm, for example, 0.6mm, 0.7mm, 0.8mm, 0.9mm, and 1 mm. Within the above range, the reference points 31 can be effectively recognized.
In order to realize the grid line structure, referring to fig. 2, the utility model also provides a screen plate for printing the grid line structure, which comprises a grid line pattern structure, wherein the grid line pattern structure comprises a main grid line pattern 7 corresponding to the main grid line 1; a sub-gate line pattern 8 corresponding to the sub-gate line 2; and a reference structure pattern 9 and a mark structure pattern 10 corresponding to the reference structure 3 and the mark structure 4. The reference structure pattern 9 corresponds to the reference structure 3, and the mark structure pattern 10 corresponds to the mark structure 4. It will also be understood that the main grid lines 1 are processed through the main grid line pattern 7, the sub-grid lines 2 are processed through the sub-grid line pattern 8, the reference structure 3 is processed through the reference pattern structure 9, and the mark structure 4 is processed through the mark pattern structure 10.
Alternatively, the reference structure pattern 9 and the mark structure pattern 10 may be both disposed on the bus bar pattern 7 corresponding to the reference structure 3 and the mark structure 4 of the above-described gate line structure; or the reference structure pattern 9 and the mark structure pattern 10 may be both disposed on the sub-grid line pattern 8; or one of the reference structure pattern 9 and the mark structure pattern 10 is disposed on the main gate line pattern 7, and the other is disposed on the sub-gate line pattern 8, at this time, the reference structure pattern 9 may be disposed on the main gate line pattern 7, the mark structure pattern 10 may be disposed on the sub-gate line pattern 8, or the mark structure pattern 10 may be disposed on the main gate line pattern 7, and the reference structure pattern 9 may be disposed on the sub-gate line pattern 8.
alternatively, when the reference structure pattern 9 and the mark structure pattern 10 are both located on the bus bar pattern 7, the reference structure pattern 9 and the mark structure pattern 10 may be located on the same bus bar pattern 7; or the reference structure pattern 9 and the marker structure pattern 10 are located on different bus bar patterns 7.
optionally, the main gate line pattern 7 is provided with a hollow pattern area and a printed pattern area at intervals along the length direction thereof, wherein the hollow pattern area and the printed pattern area respectively correspond to the printed area 12 and the hollow area 11 of the main gate line 1; the reference structure pattern 9 and the mark structure pattern 10 are provided in the hollow pattern region or the print pattern region. For example, one of the reference structure pattern 9 and the mark structure pattern 10 is arranged in the hollow pattern area, and the other is arranged in the printing pattern area; or the reference structure pattern 9 and the mark structure pattern 10 are both arranged in the hollow pattern area; or both the reference structure pattern 9 and the mark structure pattern 10 are provided in the print pattern area.
In order to prevent the slurry at the reference structure pattern 9 and the mark structure pattern 10 from penetrating, the reference structure pattern 9 and the mark structure pattern 10 are coated with a screen sealing adhesive. The screen glue is a glue which is not easily corroded by the slurry and can prevent the slurry from penetrating after drying, such as latex. The mode of coating the screen sealing glue is simple and convenient, and after the plurality of screen printing plates are manufactured in the same batch, the screen sealing glue at different positions is coated on the plurality of screen printing plates respectively, so that the operation is simple and convenient.
In other embodiments, the paste may be prevented from penetrating, for example, by attaching a film to the reference structure pattern 9 and the mark structure pattern 10, or by preventing the positions of the reference structure pattern 9 and the mark structure pattern 10 from being hollowed out when the image area of the screen is developed. By the mode, the unprinted hollow dots can be formed on the main grid line 1 of the grid line structure, so that the grid line structure can be conveniently identified, the line produced by the grid line structure can be traced, and problems in the production process can be conveniently eliminated.
Optionally, the reference structure pattern 9 and the mark structure pattern 10 are at least one group, each group of the reference structure pattern 9 includes at least one reference dot pattern, and each group of the mark structure pattern 10 includes at least one mark dot pattern.
As an alternative, when the number of sets of the reference structure patterns 9 and the mark structure patterns 10 is the same, the number of reference point patterns in each set of the reference structure patterns 9 and the number of mark point patterns in each set of the mark structure patterns 10 are different. For example, the reference structure pattern 9 is 1 group, the group of reference structure patterns 9 includes 2 reference point patterns, the mark structure pattern 10 is 1 group, and the group of mark mechanism 4 includes 1 mark point pattern, at this time, it can be determined that the screen is used for the first production line; for another example, the reference structure pattern 9 is 1 group, the group of reference structure patterns 9 includes 2 reference point patterns, the mark structure pattern 10 is 3 groups, and the group of mark structures 4 includes 2 mark point patterns, and then it can be determined that the screen is used for a third production line, and so on.
As a further alternative, the shape of the reference dot pattern in the reference structure pattern 9 and the shape of the marking dot pattern in the marking structure pattern 10 are different. Specifically, the shape of the reference dot pattern and the marking dot pattern are each one of a circle, a triangle, and a pentagon, for example, the shape of the reference dot pattern is a circle, the shape of the marking dot pattern is a triangle, and the like.
Therefore, the utility model discloses a grid line graphic structure of half tone with the utility model discloses a grid line structure of solar wafer is the one-to-one relation.
on the basis of the structure, the utility model provides a traceing back method for solar wafer, the aim at of this traceing back method knows rapidly which production line or which workshop solar wafer comes from, just so can confirm the quality of every production line production solar wafer well.
specifically, the utility model discloses a trace back the method and trace back the line that this grid line structure corresponds other through the mark structure 4 relative reference structure 3's of the grid line structure of solar wafer position.
More specifically, the utility model discloses a tracing method includes following step:
By the utility model, the main grid line 1, the auxiliary grid line 2, the marking structure 4 and the reference structure 3 are synchronously printed by the screen printing plate;
acquiring information of the reference structure 3 and the mark structure 4;
The line type corresponding to the grid line structure is traced back by marking the position of the structure 4 relative to the reference structure 3.
Through synchronous printing main grid line 1, vice grid line 2, mark structure 4 and reference structure 3 for can mark solar wafer printing in proper order, save the loaded down with trivial details step of setting up the mark in addition after having printed main grid line 1 and vice grid line 2, the printing process is simple and convenient, and is efficient.
In order to distinguish reference structure 3 well, in the utility model discloses in, reference structure 3 sets up in the one corner of solar wafer, and mark structure 4 sets up in other positions that are different from reference structure 3. And the mark structure 4 and the reference structure 3 are arranged asymmetrically on the solar cell. At this moment, the reference structure 3 can be rapidly distinguished, the reference structure 3 can be rapidly found out after the product is rotated by 180 degrees, and the problem of disordered identification or incapability of identification is avoided.
It is worth mentioning here that the symmetrical center line of the solar cell is parallel to the minor grid line and intersects the middle point of the major grid line, therefore, the mark structure 4 and the reference structure 3 are asymmetrically arranged with respect to the symmetrical center line, so as to better identify the reference structure and the mark structure.
Therefore, in the actual production, a reference structure, a marking structure and the form of the reference structure and the marking structure are preset for each production line in the mode, so that the identification in the actual operation is facilitated.
Below, it is right the utility model discloses a grid line structure, solar wafer and trace back the method, the utility model discloses carry out the illustration.
example 1
As shown in fig. 3, in this example, the reference structure 3 and the mark structure 4 are both disposed on the bus bar 1. The reference structure 3 is 1 group, and the reference structure 3 comprises 1 reference point 31; the mark structure 4 is 1 group, and the mark structure includes 2 mark points 41, wherein the reference point 31 and the mark points 41 have the same shape. The reference points 31 of the set of reference structures are arranged in the printing region 12 at the lower left corner of the first main grid line 1 from the left as shown in fig. 1; the 2 marking points 41 of the set of marking structures 4 are arranged next to one another in the same printing area 12.
if the mark point 41 of the mark structure 4 and the reference point 31 are located on the same main grid line 1, and the mark point 41 is located in the other printing area 12 different from the reference point 31, but the mark point 41 and the reference point 31 are asymmetrically arranged, it is determined that the grid line structure comes from the first production line.
If the mark point 41 of the mark structure 4 is located in the printing area 12 or the hollow area 11 of the second main gate line 1 from the left in fig. 1, it is determined that the gate line structure is from the second production line.
if the mark point 41 of the mark structure 4 is located in the printing region 12 or the hollow-out region 11 of the third main gate line 1 from the left in fig. 1, it is determined that the gate line structure is from the third production line.
If the mark point 41 of the mark structure 4 is located in the printing area 12 or the hollow area 11 of the fourth main gate line 1 from the left in fig. 1, it is determined that the gate line structure is from the fourth production line.
If the mark point 41 of the mark structure 4 is located in the printing region 12 or the hollow-out region 11 of the fifth major gate line 1 from the left in fig. 1, it is determined that the gate line structure is from the fifth production line.
By analogy, the generation production line of each solar cell can be rapidly identified.
example 2
As shown in fig. 4, in this example, the reference structure 3 and the mark structure 4 are both disposed on the bus bar 1. The reference structure 3 is 1 group, and the reference structure 3 comprises 2 reference points 31; the marking structure 4 is 1 group, and the marking structure includes 1 marking point 41. The reference point 31 and the mark point 41 have the same shape. The reference points 31 of the set of reference structures 3 are arranged next to each other and located in the printing region 12 at the lower left corner of the first bus bar 1 from the left as shown in fig. 1; the set of 1 marking point 41 of the marking structure 4 is disposed in a printing area 12.
If the mark point 41 of the mark structure 4 and the reference point 31 are located on the same main grid line 1, and the mark point 41 is located in the other printing area 12 different from the reference point 31, but the mark point 41 and the reference point 31 are asymmetrically arranged, it is determined that the grid line structure comes from the first production line.
If the mark point 41 of the mark structure 4 is located in the printing area 12 or the hollow area 11 of the second main gate line 1 from the left in fig. 1, it is determined that the gate line structure is from the second production line.
If the mark point 41 of the mark structure 4 is located in the printing region 12 or the hollow-out region 11 of the third main gate line 1 from the left in fig. 1, it is determined that the gate line structure is from the third production line.
If the mark point 41 of the mark structure 4 is located in the printing area 12 or the hollow area 11 of the fourth main gate line 1 from the left in fig. 1, it is determined that the gate line structure is from the fourth production line.
If the mark point 41 of the mark structure 4 is located in the printing region 12 or the hollow-out region 11 of the fifth major gate line 1 from the left in fig. 1, it is determined that the gate line structure is from the fifth production line.
By analogy, the generation production line of each solar cell can be rapidly identified.
Example 3
as shown in fig. 5, in this example, the reference structure 3 and the mark structure 4 are both disposed on the bus bar 1. The reference structures 3 are 2 groups, each group of reference structures 3 comprising 1 reference point 31; the marking structure 4 is 1 group, and the marking structure includes 2 marking points 41. The reference point 31 and the mark point 41 have the same shape. 2 groups of reference structures 3 are respectively arranged on a first main grid line 1 and a second main grid line 1 from the left in the figure 1; the 2 mark points 41 of 1 group of mark structures 4 are disposed in the same printing area 12 or the same hollow area 11.
If the mark point 41 of the mark structure 4 is located on the first main grid line 1 from the left in fig. 1, and the mark point 41 is located in the other printing area 12 different from the reference point 31, but the mark point 41 and the reference point 31 are asymmetrically arranged, it is determined that the grid line structure is from the first production line.
If the mark point 41 of the mark structure 4 is located in the printing area 12 of the second main grid line 1 from the left in fig. 1, and the mark point 41 is located in the other printing area 12 different from the reference point 3, but the mark point 41 and the reference point 31 are asymmetrically arranged, it is determined that the grid line structure is from the second production line.
If the mark point 41 of the mark structure 4 is located in the printing region 12 or the hollow-out region 11 of the third main gate line 1 from the left in fig. 1, it is determined that the gate line structure is from the third production line.
If the mark point 41 of the mark structure 4 is located in the printing area 12 or the hollow area 11 of the fourth main gate line 1 from the left in fig. 1, it is determined that the gate line structure is from the fourth production line.
If the mark point 41 of the mark structure 4 is located in the printing region 12 or the hollow-out region 11 of the fifth major gate line 1 from the left in fig. 1, it is determined that the gate line structure is from the fifth production line.
By analogy, the generation production line of each solar cell can be rapidly identified.
Example 4
As shown in fig. 6, in this example, the reference structure 3 and the mark structure 4 are both disposed on the bus bar 1. The reference structures 3 are 1 group, each group of reference structures 3 comprises 1 reference point 31, and the reference points 31 are triangular; the marking structures 4 are 2 groups, each group of marking structures comprises 1 marking point 41, and the marking points 41 are circular in shape. Wherein, the reference structure 3 is disposed on a first main gate line 1 from the left in fig. 1; the 2 groups of mark structures 4 are located on the same main grid line 1, but the 2 groups of mark structures 4 are located in different areas.
If the mark point 41 of the mark structure 4 is located on the first main gate line 1 from the left in fig. 1, it is determined that the gate line structure is from the first production line.
If the mark point 41 of the mark structure 4 is located on the second main gate line 1 from the left in fig. 1, it is determined that the gate line structure is from the second production line.
If the mark point 41 of the mark structure 4 is located on the third main gate line 1 from the left in fig. 1, it is determined that the gate line structure is from the third production line.
If the mark point 41 of the mark structure 4 is located on the fourth main gate line 1 from the left in fig. 1, it is determined that the gate line structure is from the fourth production line.
if the mark point 41 of the mark structure 4 is located on the fifth main grid line 1 from the left in fig. 1, it is determined that the grid line structure is from the fifth production line.
by analogy, the generation production line of each solar cell can be rapidly identified.
Example 5
As shown in fig. 7, in this example, the reference structure 3 and the mark structure 4 are both disposed on the bus bar 1. The reference structure 3 is 1 group, and the reference structure 3 comprises 2 reference points 31; the marking structure 4 is 1 group, and the marking structure includes 1 marking point 41. The reference point 31 is disposed at the printing region 12 of the main gate line 1, and the mark point 41 is disposed at the hollow region 11 of the main gate line 1. The reference points 31 of the set of reference structures 3 are located at the printing region 12 at the lower left corner of the first bus bar 1 from the left as shown in fig. 1; the set of 1 mark point 41 of the mark structure 4 is disposed in a hollow area 11.
if the mark point 41 of the mark structure 4 and the reference point 31 are located on the same main grid line 1, it is determined that the grid line structure is from the first production line.
If the mark point 41 of the mark structure 4 is located on the second main gate line 1 from the left in fig. 1, it is determined that the gate line structure is from the second production line.
If the mark point 41 of the mark structure 4 is located on the third main gate line 1 from the left in fig. 1, it is determined that the gate line structure is from the third production line.
if the mark point 41 of the mark structure 4 is located on the fourth main gate line 1 from the left in fig. 1, it is determined that the gate line structure is from the fourth production line.
If the mark point 41 of the mark structure 4 is located on the fifth main grid line 1 from the left in fig. 1, it is determined that the grid line structure is from the fifth production line.
By analogy, the generation production line of each solar cell can be rapidly identified.
Example 6
As shown in fig. 8, in this example, the reference structure 3 is disposed on the main gate line 1, and the mark structure 4 is disposed on the sub-gate line 2. The reference structure 3 is 1 group, and the reference structure 3 comprises 2 reference points 31; the marking structure 4 is 1 group, and the marking structure includes 1 marking point 41. The reference points 31 are disposed at the printing regions 12 of the main gate lines 1, and the mark points 41 are disposed on the sub-gate lines 2 and close to the left main gate line 1. The reference points 31 of the set of reference structures 3 are located at the printed area 12 at the lower left corner of the first busbar line 1 from the left as shown in fig. 1.
If the mark point 41 of the mark structure 4 is located between the first and second main gate lines 1, it is determined that the gate line structure is from the first production line.
If the mark point 41 of the mark structure 4 is located between the second and third main gate lines 1, it is determined that the gate line structure is from the second production line.
If the mark point 41 of the mark structure 4 is located between the third and fourth main gate lines 1, it is determined that the gate line structure is from the third production line.
If the mark point 41 of the mark structure 4 is located between the fourth and fifth main gate lines 1, it is determined that the gate line structure is from the fourth production line.
if the mark point 41 of the mark structure 4 is located on the right side of the fifth main gate line 1, it is determined that the gate line structure is from the fifth production line.
By analogy, the generation production line of each solar cell can be rapidly identified.
Example 7
As shown in fig. 9, in this example, the reference structure 3 and the mark structure 4 are both provided on the finger line 2. The reference structure 3 is 1 group, and the reference structure 3 comprises 2 reference points 31; the marking structure 4 is 1 group, and the marking structure includes 1 marking point 41. The mark points 41 are disposed on the sub-gate lines 2 and close to the left main gate line 1. The reference points 31 of the set of reference structures 3 are located on the right side of the first bus bar 1 from the left as shown in fig. 1.
If the mark point 41 of the mark structure 4 is located between the first and second main gate lines 1, it is determined that the gate line structure is from the first production line.
If the mark point 41 of the mark structure 4 is located between the second and third main gate lines 1, it is determined that the gate line structure is from the second production line.
If the mark point 41 of the mark structure 4 is located between the third and fourth main gate lines 1, it is determined that the gate line structure is from the third production line.
If the mark point 41 of the mark structure 4 is located between the fourth and fifth main gate lines 1, it is determined that the gate line structure is from the fourth production line.
If the mark point 41 of the mark structure 4 is located on the right side of the fifth main gate line 1, it is determined that the gate line structure is from the fifth production line.
By analogy, the generation production line of each solar cell can be rapidly identified.
The utility model discloses a grid line structure, the number through datum point 31 in every group reference structure 3 and the number of mark point 41 in every group mark structure 4 are different to and datum point 31 and mark point 41's shape difference etc. can be convenient for distinguish datum structure 3 and mark structure 4, avoid being difficult to discern or discern the condition such as mistake because of grid line structure rotation 180 back, guarantee that the discernment is accurate. In addition, by increasing the number of the reference points 31 and the number of the marking points 41, the classification of the grid line structures can be increased, and the marking and tracking of the grid line structures corresponding to more lines can be facilitated.
It is obvious that the above embodiments of the present invention are only examples for clearly illustrating the present invention, and are not intended to limit the embodiments of the present invention. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. Any modification, equivalent replacement, and improvement made within the spirit and principle of the present invention should be included in the protection scope of the claims of the present invention.
Claims (10)
1. A grid line structure comprises a plurality of main grid lines (1) arranged at intervals longitudinally, and a plurality of auxiliary grid lines (2) arranged at intervals transversely and perpendicular to the main grid lines (1), and is characterized by further comprising a reference structure (3) and a marking structure (4), wherein the reference structure (3) and the marking structure (4) are both arranged on the main grid lines (1); or the reference structure (3) and the mark structure (4) are both arranged on the secondary grid line (2); or one of the reference structure (3) and the mark structure (4) is arranged on the main grid line (1), and the other one is arranged on the auxiliary grid line (2).
2. The gate line structure according to claim 1, characterized in that the reference structure (3) and the mark structure (4) are located on the same main gate line (1); or the reference structure (3) and the mark structure (4) are located on different main grid lines (1).
3. the gate line structure according to claim 1, wherein the main gate line (1) is provided with a hollowed area (11) and a printed area (12) at intervals along a length direction thereof, and the reference structure (3) and the mark structure (4) are provided in the hollowed area (11) or the printed area (12).
4. A gate line structure as claimed in claim 3, characterized in that one of the reference structure (3) and the marking structure (4) is provided in the hollowed-out area (11) and the other is provided in the printed area (12); or
The reference structure (3) and the marking structure (4) are both arranged in the hollowed-out area (11); or
The reference structure (3) and the marking structure (4) are both arranged in the printing area (12).
5. The gate line structure according to claim 1, characterized in that the reference structures (3) and the mark structures (4) are each in at least one group, each group of reference structures (3) comprising at least one reference point (31), each group of mark structures (4) comprising at least one mark point.
6. The gate line structure according to claim 5, characterized in that when the number of groups of reference structures (3) and mark structures (4) is the same, the number of reference points (31) in each group of reference structures (3) and the number of mark points in each group of mark structures (4) are different.
7. Gate line structure according to claim 5, characterized in that the shape of the reference points (31) in the reference structure (3) and the shape of the marker points in the marker structure (4) are different.
8. The gate line structure of claim 7, wherein the fiducial point (31) and the marker point are each one of circular, triangular, and pentagonal in shape.
9. a screen for printing the grid line structure of any one of claims 1 to 8, comprising:
A main gate line pattern (7) corresponding to the main gate line (1);
A sub-gate line pattern (8) corresponding to the sub-gate line (2); and
A reference structure pattern (9) and a mark structure pattern (10) corresponding to the reference structure (3) and the mark structure (4);
The reference structure pattern (9) and the mark structure pattern (10) are both arranged on the main grid line pattern (7); or the reference structure pattern (9) and the mark structure pattern (10) are both arranged on the auxiliary grid line pattern (8); or one of the reference structure pattern (9) and the mark structure pattern (10) is arranged on the main grid line pattern (7), and the other is arranged on the auxiliary grid line pattern (8).
10. A solar cell sheet comprising the grid line structure of any one of claims 1 to 8.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920781367.XU CN209804672U (en) | 2019-05-28 | 2019-05-28 | Grid line structure, screen printing plate and solar cell |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920781367.XU CN209804672U (en) | 2019-05-28 | 2019-05-28 | Grid line structure, screen printing plate and solar cell |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209804672U true CN209804672U (en) | 2019-12-17 |
Family
ID=68833080
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920781367.XU Active CN209804672U (en) | 2019-05-28 | 2019-05-28 | Grid line structure, screen printing plate and solar cell |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN209804672U (en) |
-
2019
- 2019-05-28 CN CN201920781367.XU patent/CN209804672U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8807026B2 (en) | Method for printing a conductor in two superimposed layers by screen-printing | |
| CN209804672U (en) | Grid line structure, screen printing plate and solar cell | |
| CN105091755A (en) | Detection method for secondary printing precision of screen printing machine | |
| CN112018192A (en) | Grid line structure, screen printing plate, solar cell and tracing method | |
| CN106206008A (en) | Quickly printing screen plate, MLCC and the detection method thereof of detecting electrode displacement | |
| KR101787948B1 (en) | Mesh member for screen printing and screen printing plate | |
| CN105015145A (en) | Apparatus and method for printing printed patterns | |
| CN110446329A (en) | A kind of circuit board and circuit board manufacturing method | |
| CN210926035U (en) | Solar cell and photovoltaic module | |
| CN108205215B (en) | Method for connecting display panel and circuit board | |
| CN210364731U (en) | Positioning tool for large data processing machine case face frame label | |
| CN207491325U (en) | A kind of PCB jigsaw for being suitable for full-automatic production | |
| CN206963181U (en) | A kind of FPC for being used to examine silk-screen off normal | |
| CN106041667A (en) | Base plate and edging detection method, alignment method and device thereof | |
| CN106793487A (en) | Display device and its flexible PCB | |
| CN215008220U (en) | Mask sheet and circuit structure | |
| CN205692700U (en) | The printing screen plate of quick detecting electrode displacement and MLCC | |
| CN216761239U (en) | Glass glaze ceramic substrate with recognition mark | |
| CN214705941U (en) | Screen printing plate graph structure | |
| CN217064118U (en) | Substrate layer offset alignment structure | |
| CN219572935U (en) | Battery grid line position detection device, offset detection system and calibration device | |
| TWM567701U (en) | Variable letterpress number overprint planographic printing alignment guide device | |
| CN212542450U (en) | Solar cell and front surface slotting structure thereof | |
| CN213278087U (en) | Solar cell | |
| CN218567829U (en) | RGB light shield and color filter |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: No.66 Lijiang Road, Yancheng Economic and Technological Development Zone, Suzhou City, Jiangsu Province 224000 Patentee after: YANCHENG ARTES SUNSHINE ENERGY TECHNOLOGY Co.,Ltd. Patentee after: Atlas sunshine Power Group Co.,Ltd. Address before: No.66 Lijiang Road, Yancheng Economic and Technological Development Zone, Suzhou City, Jiangsu Province 224000 Patentee before: YANCHENG ARTES SUNSHINE ENERGY TECHNOLOGY Co.,Ltd. Patentee before: CSI SOLAR POWER GROUP Co.,Ltd. |
|
| CP01 | Change in the name or title of a patent holder |