CN209676566U - Microwave antenna, which regulates and controls magnetic, enhances linear plasma source generating device - Google Patents
Microwave antenna, which regulates and controls magnetic, enhances linear plasma source generating device Download PDFInfo
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- CN209676566U CN209676566U CN201821746911.9U CN201821746911U CN209676566U CN 209676566 U CN209676566 U CN 209676566U CN 201821746911 U CN201821746911 U CN 201821746911U CN 209676566 U CN209676566 U CN 209676566U
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Abstract
The utility model discloses a kind of microwave antenna regulation magnetic to enhance linear plasma source generating device, including cavity, the cavity upper half is microwave plasma discharge chamber, and lower half is plasma diffusion chamber, magnet assemblies are equipped with outside discharge cavity, diffusion chamber bottom is equipped with vacuum pump set.Wherein discharge cavity is that plasma generates area, equipped with the upper and lower air inlet pipe connecting with gas source and the coaxial circular waveguide being connected with microwave source, is equipped with coaxial microwave antenna in coaxial circular waveguide.The present apparatus passes through magnetic field-enhanced and coaxial microwave antenna, improve plasma density, energy loss and feed-in are to excite working gas to generate the linear microwave plasma source of high density, and form more uniform high-density plasma distribution in diffusion chamber during adjusting microwave transmission.The microwave antenna regulation magnetic of the utility model enhances linear plasma source generating device, and structure is simple, high production efficiency, can be used for thin-film material preparation or for material surface modifying.
Description
Technical field
The utility model relates to plasma source generating device fields, and in particular to a kind of microwave antenna regulation magnetic splicing thread
Shape plasma source generating device.
Background technique
Lower temperature plasma technology can provide low cost, green, the synthesis of efficient substance, conversion and material processing method,
Increasingly important effect is played in modern industry.The most common method for generating plasma is gas discharge regimes, mainly
Have: direct-current discharge, alternating current discharge, radio frequency discharge, laser and microwave discharge.The plasma that gas discharge generates is electrically and thermally
Good conductor, with the characteristics such as the specific heat capacities of hundred times bigger than common gases, chemical property be active.Wherein microwave discharge plasma
It is to switch to microwave energy using microwave source to generate plasma in gas molecule to make gas excitation, ionize, with other
Gas discharge mode is compared, its density of ionization is higher, and electrodeless high-frequency discharge avoids electrode material pollution, region of discharge collection
In, stabilization be the modified a kind of important means of material deposition and surface.One major issue of microwave current plasma application
How to generate the uniform microwave plasma of large area, this be plasma application from laboratory move towards one of industrialization to
Close important condition, and the hot spot of current plasma application study.In recent years, a kind of Linear extended microwave plasma source is drawn
The concern for having played domestic and international expert, not with traditional large area (two-dimensional directional) and large volume (three-dimensional) microwave plasma source
Together, Linear extended microwave plasma source need to only be realized in one-dimensional square and be uniformly distributed, simultaneously using multiple Linear extended microwave plasma sources
The mode of row can produce uniform large-area microwave plasma.This structure greatly reduces high performance plasmas generation and sets
Standby development difficulty, but there are still some problems, such as plasma caused by the generation and evanescent waveguide mode of standing wave is not
Uniformly, and the Linear extended microwave plasma of long range is hardly resulted in.For this purpose, to develop various devices linear micro- to generate by people
Wave plasma, wherein microwave antenna has good regulating and controlling effect to microwave energy, can be adjusted by different opening modes
Save the load point and feed-in amount of microwave energy.The adjustable microwave energy of the introducing of antenna is by antenna aperture feed-in reaction chamber
Body, while working gas being motivated to generate high density linear plasma, realize plasma distribution uniformity.
Utility model content
The utility model aim is overcome the deficiencies in the prior art, by introducing coaxial microwave antenna in a device, mentions
Enhance linear plasma source generating device for a kind of microwave antenna regulation magnetic.
The technical solution adopted in the utility model is:
Microwave antenna, which regulates and controls magnetic, enhances linear plasma source generating device, including cavity, and the cavity upper half is micro-
Wave plasma discharge cavity, lower half are plasma diffusion area, are equipped with magnet assemblies outside discharge cavity, diffusion chamber bottom is equipped with
Vacuum pump set, the discharge cavity are equipped with the upper and lower air inlet pipe connecting with gas source and the coaxial circular waveguide being connected with microwave source,
The coaxial circular waveguide is made of copper inner conductor with the quartz glass tube covered outside copper inner conductor, using copper inner conductor as coaxial circles
The inner conductor of waveguide, using the plasma that is excited by the microwave electric field between quartz glass tube and copper inner conductor as coaxial circles wave
The outer conductor led;Coaxial microwave antenna is equipped between copper inner conductor and quartz glass tube in the coaxial circular waveguide.
Further, the microwave antenna regulation magnetic of the utility model enhances linear plasma source generating device, described
Coaxial microwave antenna in coaxial circular waveguide through entire waveguide is the good conductor materials such as copper, and shape can be opening semicolumn or three
Angle wedge-like opening cylinder.
Further, the microwave antenna regulation magnetic of the utility model enhances linear plasma source generating device, described
Magnet assemblies can combine by different disposing ways and form divergence field Distribution of Magnetic Field, or form class magnetic-mirror field Distribution of Magnetic Field, with full
The different application range of foot.
Further, the microwave antenna regulation magnetic of the utility model enhances linear plasma source generating device, the magnetic
Iron component can be alloy permanent-magnet material or ferrite permanent-magnet materials.
Further, the microwave antenna regulation magnetic of the utility model enhances linear plasma source generating device, the chamber
Body is no magnetic or the vacuum cavity of weak magnetic stainless steel.
Further, the microwave antenna regulation magnetic of the utility model enhances linear plasma source generating device, described
Working gas is the inert gas liquid that perhaps reducibility gas perhaps vaporizes or inert gas and silane or hydrocarbon gas
Mixed gas.
Further, the microwave antenna regulation magnetic of the utility model enhances linear plasma source generating device, described
The built-in chip bench of diffusion chamber.
According to the above aspect of the present invention, the utility model at least has the following advantages:
The utility model uses magnetic field-enhanced microwave discharge mode, improves plasma density；It introduces in systems coaxial
Microwave antenna is located between the copper inner conductor and quartz glass tube of coaxial circular waveguide, makes microwave in communication process from antenna aperture
Place's feed-in reaction cavity is absorbed to excite generation plasma by working gas, and plasma concentration may make to be evenly distributed on
Antenna aperture goes out.It not only reduces microwave energy divergence loss and also adds plasma density uniformity, when improving application
Plasma source controllability.Utility model device structure is simple, high production efficiency, can be used for thin-film material preparation or is used for
Material surface modifying, or for plasma clean or it is used for plasma etching, equipment development difficulty when application is reduced,
It is easily industrialized production.
Detailed description of the invention
Fig. 1 is that microwave antenna regulation magnetic enhances linear plasma source generating device transverse sectional view.
Fig. 2 is microwave antenna regulation magnetic enhancing linear plasma source generating device longitudinal cross-section schematic diagram.
Fig. 3 (a) be microwave antenna regulation magnetic enhance linear plasma source generating device magnetic field component magnetic field fluid it is close
Spend schematic diagram.
Fig. 3 (b) is that microwave antenna regulation magnetic enhances the direction of magnetization of linear plasma source generating device magnetic field component and shows
It is intended to.
Fig. 4 (a) is that microwave antenna regulation magnetic enhances linear plasma source generating device split shed semicolumn coaxial microwave
Antenna main view.
Fig. 4 (b) is that microwave antenna regulation magnetic enhances linear plasma source generating device split shed semicolumn coaxial microwave
Antenna top view.
Fig. 4 (c) is that microwave antenna regulation magnetic enhances linear plasma source generating device split shed semicolumn coaxial microwave
Antenna side view.
Fig. 5 (a) is that the linear plasma source generating device intermediate cam wedge-like opening cylinder of microwave antenna regulation magnetic enhancing is same
Axis microwave antenna main view.
Fig. 5 (b) is that the linear plasma source generating device intermediate cam wedge-like opening cylinder of microwave antenna regulation magnetic enhancing is same
Axis microwave antenna top view.
Fig. 5 (c) is that the linear plasma source generating device intermediate cam wedge-like opening cylinder of microwave antenna regulation magnetic enhancing is same
Axis microwave antenna side view.
Fig. 6 (a) is that microwave antenna structure is that microwave antenna regulates and controls the linear plasma source hair of magnetic enhancing when being open semicolumn
The plasma density distribution analog result figure that generating apparatus generates.
Fig. 6 (b) is that microwave antenna structure is that microwave antenna regulates and controls the linear plasma source hair of magnetic enhancing when being open semicolumn
The data trend figure for the plasma density distribution that generating apparatus generates.
Fig. 6 (c) is microwave antenna structure when being triangular wedge open cylinders, and microwave antenna regulates and controls magnetic enhances linear plasma
The plasma density distribution analog result figure that body source generating device generates.
Fig. 6 (d) is microwave antenna structure when being triangular wedge open cylinders, and microwave antenna regulates and controls magnetic enhances linear plasma
The data trend figure for the plasma density distribution that body source generating device generates.
Specific embodiment
With reference to the accompanying drawings and examples, the concrete application embodiment of the utility model is described in further detail.
The following examples illustrate the utility model, but is not limited to the application range of the utility model.
Regulating and controlling magnetic as shown in Figure 1 for the microwave antenna of the utility model enhances linear plasma source generating device transverse cutting
Face schematic diagram, includes the upper lower inlet duct 1 and 4 being connected with gas source, the coaxial circular waveguide 2 being connected with coaxial microwave source,
Shape is the coaxial microwave antenna 3 of semicircle column tube, magnetism-free stainless steel discharge cavity 5 and diffusion chamber 6 in coaxial circular waveguide, in diffusion chamber
Set removable chip bench 7, Mechanical molecular pumping vacuum pump set 8.Fig. 2 is above system longitdinal cross-section diagram.Fig. 3 is three block permanent magnets
The magnet assemblies and magnetic field configuration figure of 9 compositions.Microwave antenna regulation magnetic described in the utility model enhances linear plasma source hair
Generating apparatus is vacuumized using mechanical pump vacuum pump set 8, and working gas is entered in vacuum chamber by upper lower inlet duct 1 and 4, wherein
By air inlet pipe 1, reactive precursor gases enter plasma downstream area by air inlet pipe 4 for inert gas and reducibility gas
Domain, such gas circuit design help to reduce the pollution in deposition process to reaction cavity.Coaxial 2 both ends of circular waveguide are respectively and together
Axis microwave source is connected, to reduce using single microwave source because of plasma nonuniformity caused by microwave decaying in the waveguide
Property, microwave source from waveguide both ends enter under the action of coaxial microwave antenna 3, microwave energy feed-in cavity from antenna aperture,
Working gas is excited, so that the plasma that working gas ionization generates can uniformly branch and be served as in discharge cavity downstream area
The propagation forward that outer conductor and microwave interactive keep the microwave energy come in from both ends continual and steady.Three pieces of permanent magnets 9
The magnetic field configuration of formation is for improving plasma density.The effect of coaxial microwave antenna reduces the damage of part microwave energy
Consumption, which will be measured, concentrates on discharge cavity downstream area, is evenly distributed on diffusion cavity region and acts on chip bench.The position of chip bench 7
It can be adjusted according to different application demand to obtain optimum deposition condition.
As shown in figure 3, magnet assemblies are made of permanent magnet multiple groups magnet steel, their magnetic field fluid density and the direction of magnetization
As shown in the simulation of figure (a) and (b).
Coaxial microwave antenna can be opening semicolumn or triangular wedge open cylinders.As shown in Fig. 4 (a) and (b), (c), point
Wei not be open the three-view diagram of semicolumn coaxial microwave antenna, the microwave energy that opening semicolumn microwave antenna can will enter from both ends
In opening feed-in working gas to generate uniform high density microwave linear plasma in discharge cavity downstream；As Fig. 5 (a),
(b), (c) is shown, respectively the three-view diagram of triangular wedge open cylinders coaxial microwave antenna, triangular wedge open cylinders microwave day
Line can control the feed-in amount of microwave energy to gradually increase, and reach maximum at center position, and such design can control both ends
Microwave energy feed-in amount and maximum load point, the high power microwave at both ends are constrained, and microwave feed-in amount reaches peak value in center,
To generate high-density plasma in axis.
As shown in fig. 6, being simulated using software to Linear extended microwave plasma Density Distribution caused by this system.Figure
(a) generated axial plasma density distribution figure and number when and figure (b) is respectively microwave antenna structure for opening semicolumn
According to tendency chart.Figure (c) and figure (d) are respectively microwave antenna structure generated axial plasma when being triangular wedge open cylinders
Volume density distribution map and data trend figure.Under the coaxial microwave antenna effect that can intuitively see opening semicolumn in figure,
Linear plasma evenly and with high density can be generated in waveguide lower zone.And when microwave antenna is triangular wedge open circles
When column, high-density plasma integrated distribution region in axis, this is because microwave energy feed-in amount under the regulation of antenna by
Both ends, which are gradually incremented by axis, reaches peak value, and the plasma density accordingly excited also obtains maximum in axis.Pass through simulation
It calculates, it can be seen that microwave antenna plays effective regulating and controlling effect to microwave energy, we can design different according to demand
Microwave antenna structure regulates and controls microwave energy and plasma density.
Claims (6)
1. microwave antenna, which regulates and controls magnetic, enhances linear plasma source generating device, including cavity, it is characterised in that: on the cavity
Half portion is microwave plasma discharge chamber, and lower half is plasma diffusion chamber, is equipped with magnet assemblies, diffusion chamber outside discharge cavity
Bottom is equipped with vacuum pump set, and the discharge cavity is equipped with the upper and lower air inlet pipe connecting with gas source and is connected with microwave source same
Axis circular waveguide, the coaxial circular waveguide is made of copper inner conductor with the quartz glass tube covered outside copper inner conductor, with copper inner conductor
As the inner conductor of coaxial circular waveguide, made with the plasma excited by the microwave electric field between quartz glass tube and copper inner conductor
For the outer conductor of coaxial circular waveguide；Coaxial microwave day is equipped between copper inner conductor and quartz glass tube in the coaxial circular waveguide
Line.
2. microwave antenna regulation magnetic according to claim 1 enhances linear plasma source generating device, it is characterised in that:
Through the coaxial microwave antenna of entire waveguide be good conductor material in the coaxial circular waveguide, shape can for opening semicolumn or
Triangular wedge open cylinders.
3. microwave antenna regulation magnetic according to claim 1 enhances linear plasma source generating device, it is characterised in that:
The magnet assemblies can combine by different disposing ways and form divergence field Distribution of Magnetic Field, or form class magnetic-mirror field magnetic field point
Cloth, to meet different application ranges.
4. microwave antenna regulation magnetic according to claim 1 enhances linear plasma source generating device, it is characterised in that:
The magnet assemblies can be alloy permanent-magnet material or ferrite permanent-magnet materials.
5. microwave antenna regulation magnetic according to claim 1 enhances linear plasma source generating device, it is characterised in that:
The cavity is no magnetic or the vacuum cavity of weak magnetic stainless steel.
6. microwave antenna regulation magnetic according to claim 1 enhances linear plasma source generating device, it is characterised in that:
The built-in chip bench of the diffusion chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821746911.9U CN209676566U (en) | 2018-10-26 | 2018-10-26 | Microwave antenna, which regulates and controls magnetic, enhances linear plasma source generating device |
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| CN201821746911.9U CN209676566U (en) | 2018-10-26 | 2018-10-26 | Microwave antenna, which regulates and controls magnetic, enhances linear plasma source generating device |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111690913A (en) * | 2020-07-22 | 2020-09-22 | 中南大学 | Microwave shielding pipe and magnetic field enhanced flat PECVD (plasma enhanced chemical vapor deposition) equipment |
| CN113186517A (en) * | 2021-04-19 | 2021-07-30 | 上海征世科技股份有限公司 | Deposition chamber for improving gas distribution and MPCVD device |
| CN115589660A (en) * | 2022-10-19 | 2023-01-10 | 国网安徽省电力有限公司马鞍山供电公司 | Insulating material surface treatment device and method of microwave fluorocarbon plasma jet |
-
2018
- 2018-10-26 CN CN201821746911.9U patent/CN209676566U/en active Active
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111690913A (en) * | 2020-07-22 | 2020-09-22 | 中南大学 | Microwave shielding pipe and magnetic field enhanced flat PECVD (plasma enhanced chemical vapor deposition) equipment |
| CN111690913B (en) * | 2020-07-22 | 2023-06-23 | 中南大学 | Microwave shielding tube and magnetic field enhanced flat PECVD (plasma enhanced chemical vapor deposition) equipment |
| CN113186517A (en) * | 2021-04-19 | 2021-07-30 | 上海征世科技股份有限公司 | Deposition chamber for improving gas distribution and MPCVD device |
| CN113186517B (en) * | 2021-04-19 | 2022-03-08 | 上海征世科技股份有限公司 | Deposition chamber for improving gas distribution and MPCVD device |
| CN115589660A (en) * | 2022-10-19 | 2023-01-10 | 国网安徽省电力有限公司马鞍山供电公司 | Insulating material surface treatment device and method of microwave fluorocarbon plasma jet |
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