CN209663875U - Intelligent chip production cleaning device with air-drying function - Google Patents

Abstract

The utility model relates to intelligent chip manufacturing technology fields, disclose a kind of intelligent chip production cleaning device with air-drying function, including cleaning case, and the web plate for placing wafer is equipped in cleaning case；Further include the gas source being connected to cleaning case, and make the driving mechanism of cleaning case transverse movement, the gas that gas source provides moves upwards below web plate.Driving mechanism makes cleaning case transverse movement, so that the wafer in cleaning case stirs, achievees the purpose that uniformly to clean；Cleaning case transverse movement makes gas irregular movement in cleaning case, with the cleaning solution in stirring and washing case, contacts cleaning solution with crystal column surface more abundant, gas can also air-dry crystal column surface residual liquid after cleaning.This programme can not only it is comprehensive, effectively clean multiple groups crystal column surface, crystal column surface can be also air-dried after cleaning, and also adapt to the crystal column surface cleaning of different size, wide adaptation range.

Description

Intelligent chip production cleaning device with air-drying function

Technical field

The utility model relates to intelligent chip manufacturing technology fields, and in particular to a kind of intelligent chip with air-drying function is raw Production cleaning device.

Background technique

Wafer is carrier used in most common semiconductor material and intelligent chip, since its shape is circle, therefore is claimed For wafer.It is divided into 4 inches, 5 inches, 6 inches, 8 inches of equal-specifications by its diameter, it is bigger develops 12 inches of even research and development recently Specification (14 inches, 15 inches, 16 inches ... 20 inches with first-class).For wafer after the completion of production, about 2um is adhered on surface Al₂O₃With glycerol mixed liquor protective layer (hereinafter referred to as protective layer), wafer is clear firstly the need of carrying out before making intelligent chip It washes.

Wafer production is a kind of for wafer with surface cleaning apparatus, and the protective layer quilt on its surface is made by chemical solution The auxiliary device of dissolution is widely used in wafer production manufacture.General wafer production surface cleaning apparatus, by multiple groups crystalline substance Circle is directly placed on web plate, is caused multiple groups wafer to be placed mixed and disorderly, is mutually stacked, carries out chemical solution clearly to multiple groups wafer During washing, chemical solution and the protective layer haptoreaction on multiple groups crystal column surface are insufficient, cause cleaning effect poor.

To solve the above-mentioned problems, the Chinese utility model of Publication No. CN109285784A (publication date 2019.01.29) Patent discloses a kind of wafer production surface etch chemistry device, and wafer can be rotated during cleaning wafer, makes chemical solution It is come into full contact with the surface of wafer, so that crystal column surface cleaning effect is more preferable.But above scheme is only capable of to a kind of specification Crystal column surface carry out cleaning, poor universality；And it also needs to move to wafer into other drying dress behind cleaning wafer surface Set drying.

Utility model content

In order to overcome above-mentioned defect existing in the prior art, it is raw that the purpose of the utility model is to provide a kind of intelligent chips It produces and uses crystal column surface cleaning device, the surface of different size wafer can be cleaned, and can be air-dried into crystal column surface after cleaning.

In order to achieve the above objectives, the utility model adopts the following technical solution: intelligent chip production is cleaned with crystal column surface Device, including cleaning case, cleaning case are equipped at least one solution input port, the web plate for placing wafer are equipped in cleaning case, Wafer movement is fixed or can be driven to web plate；The cleaning device further includes the gas source being connected to cleaning case and/or keeps cleaning case horizontal To the driving mechanism of movement, the gas that gas source provides is moved from a side of web plate to the other side.

In above-mentioned technical proposal, the multiple groups wafer of different size can be placed on web plate and be cleaned, driving mechanism makes cleaning case Transverse movement achievees the purpose that uniformly to clean so that the wafer in cleaning case stirs.Gas source is cleaning case while cleaning wafer Interior offer gas, there are three effects for gas: 1) cleaning case transverse movement, so that gas irregular movement in cleaning case, to stir The cleaning solution in cleaning case is mixed, contacts cleaning solution with crystal column surface more abundant；2) gas gives wafer one vertical power, this power Wafer is stirred more acutely with the resultant force of cleaning case transverse movement, so that crystal column surface can come into full contact with everywhere with cleaning solution, Improve the cleaning effect of crystal column surface；3) after completing crystal column surface cleaning, gas enters while cleaning case transverse movement In cleaning case, gas with stir in crystal column surface come into full contact with, thus air-dry crystal column surface.

This programme can not only it is comprehensive, effectively clean multiple groups crystal column surface, crystal column surface can be also air-dried after cleaning, and It can also adapt to the crystal column surface cleaning of different size, wide adaptation range.

It further, further include rack, cleaning case can slide on the rack, and driving mechanism includes the electricity outside cleaning case Machine, the output shaft of motor are connected with the cam to offset with cleaning box outer wall, and the outer wall of cleaning case is connected with one affixed with rack Group elastic component.Motor rotates cam, and cam and elastic component make cleaning case traverse motion, and structure is simple, easy to operate.

Further, gas source includes cylinder block, and piston head is slidably connected in cylinder block, is connected with piston rod on piston head, Connecting rod, the end face eccentric rotation connection of connecting rod one end and cam far from piston rod are rotatably connected on piston rod；Piston Cylinder chamber, the outlet that cylinder chamber is communicated with the air inlet pipe being in communication with the outside and is connected to cleaning case are formed between head and cylinder block Pipe, air inlet pipe are equipped with breather check valve, and escape pipe is equipped with outgassing nonreturn valve.

While cam rotates, cam moves back and forth piston head in cylinder by connecting rod, to make in cylinder chamber Air inlet and outlet, to provide gas into cleaning case.The power source of gas source is also motor, then driving mechanism and gas source use same One power source, power source structure is simple, high reliablity.Breather check valve enter gas can only from the external world in cylinder chamber, Without reverse flow；Outgassing nonreturn valve flow gas can only from cylinder chamber to cleaning case, without reverse flow.

It further, further include pressurized tank, pressurized tank is connected to escape pipe, and pressurized tank is communicated with the gas supply being connected to cleaning case Pipe, air supply pipe is equipped with gas supply check valve and pressure valve, pressurized tank are also communicated with the permeability cell being connected to ambient atmosphere, permeability cell It is equipped with safety valve.The pressure that gas in cylinder chamber is directly entered cleaning case is smaller, after pressurized tank is arranged, into cleaning case Air pressure it is bigger, increase gas to the impact force of cleaning solution and wafer, further increase the cleaning effect of crystal column surface.Work as pressure When gas pressure is excessive in power tank, safety valve is opened, and the gas in pressurized tank is discharged from permeability cell, improves the safety of pressurized tank Property.

It further, further include being located in cleaning case or independent heating member, heating member heat the gas run in cleaning case. After heating member is set, it can not only accelerate the reaction speed of cleaning solution Yu crystal column surface protective layer, shortening scavenging period can be with Accelerate the air-dried speed of crystal column surface.

Further, the lower section of web plate is equipped with partition, the bottom formation cavity of partition and cleaning case, gas source and sky in cleaning case Chamber connection, partition are equipped with several gas vents.Into the gas in cleaning case from the gas vent discharge on partition, aperture, which has, to be increased Gas can be improved to the impact force of cleaning solution and wafer in the effect of pressure.

Further, flabellum is equipped at the portion discharge hole on partition, flabellum is between partition and web plate.Flabellum is set Afterwards, gas rotates flabellum, and the cleaning solution in flabellum stirring and washing case accelerates the movement of cleaning solution, makes cleaning solution and wafer Surface contact is more abundant.

Further, the bottom of cleaning case is equipped with drain pipe, and drain pipe is equipped with tapping valve.After crystal column surface cleans up, It is collected after drain pipe discharge convenient for cleaning solution.

Further, it is connected with sliding rail in rack, the sliding block being slidably connected with sliding rail is connected on cleaning case.Be arranged sliding rail and After sliding block, reduces the frictional force between cleaning case and rack, reduce the output torque of motor.

Further, cam is located at the ipsilateral of cleaning case with elastic component, and elastic component is tension spring.Make more compact structure.

Detailed description of the invention

Fig. 1 is the schematic view of the front view of the embodiment of the present application one.

Fig. 2 is A in Fig. 1 to partial schematic diagram.

Appended drawing reference in Figure of description include: pedestal 1, column 11, sliding rail 12, sliding block 13, cleaning case 2, case lid 21, It is web plate 22, partition 23, gas vent 231, flabellum 232, cavity 24, drain pipe 25, tapping valve 251, gas feed 26, motor 3, convex Wheel 31, cam top 311, elastic component 32, cylinder block 4, cylinder chamber 41, piston head 42, piston rod 43, air inlet pipe 44, air inlet are unidirectional Valve 441, escape pipe 45, outgassing nonreturn valve 451, connecting rod 46, pressurized tank 5, air supply pipe 51, pressure valve 511, permeability cell 52, peace Full valve 521, position of splitter 53, isocon 54, gas supply check valve 541, heating member 6.

Specific embodiment

In the description of the present invention, it should be understood that term " transverse direction ", " vertical ", "upper", "lower", " left side ", The orientation or positional relationship of the instructions such as " right side ", "front", "rear" is to be based on the orientation or positional relationship shown in the drawings, merely to just In description the utility model and simplify description, rather than the device or element of indication or suggestion meaning there must be specific side Position is constructed and operated in a specific orientation, therefore should not be understood as limiting the present invention.

It is specific embodiment of the utility model and in conjunction with attached drawing below, the technical solution of the utility model is made further Description, but the utility model is not limited to these examples.

Embodiment one

The present embodiment intelligent chip production cleaning device with air-drying function as shown in Figure 1: substantially, including cleaning case 2, The gas source being connected to cleaning case 2, and make the driving mechanism of 2 transverse movement of cleaning case.The top opening of cleaning case 2, top are opened Case lid 21 is equipped at mouthful, the left end of case lid 21 and cleaning case 2 are rotatablely connected by hinge.

The lateral web plate 22 for placing wafer is installed, web plate 22 is installed in cleaning case 2, certain web plate in cleaning case 2 22 can also rotate relative to cleaning case 2, and the driving mechanism for rotating web plate 22 is set in the bottom of cleaning case 2, web plate 22 is made to drive crystalline substance Circular motion.The lower section of web plate 22 is equipped with lateral partition 23 in cleaning case 2, and partition 23 is equipped with several gas vents 231；Partition 23 form cavity 24 with the bottom of cleaning case 2, and cavity 24 is connected to gas source, and the gas of gas source offer is through on cavity 24, partition 23 Gas vent 231 after moved upwards from the lower section of web plate 22, finally between cleaning case 2 and case lid 21 gap discharge.Partition The flabellum 232 being fixed on partition 23 is additionally provided at portion discharge hole 231 on 23, flabellum 232 is located at partition 23 and web plate It, can cleaning solution in stirring and washing case 2 when flabellum 232 rotates between 22.The bottom of cleaning case 2 is equipped with drain pipe 25, drain pipe 25 are connected to cavity 24, and drain pipe 25 is equipped with tapping valve 251.

Specifically, driving mechanism and cleaning case 2 are respectively mounted on the rack, as shown in Figure 1, rack includes that pedestal is laterally arranged 1, and the vertically arranged column 11 with the welding of 1 left end of pedestal.Lateral sliding rail 12 is bolted on pedestal 1, clearly The lower end of tank-washer 2 slides laterally the sliding block 13 of connection also by being bolted with sliding rail 12, between sliding block 13 and sliding rail 12 also Ball can be set, the left and right movement on sliding rail 12 of cleaning case 2 is convenient for.

Specifically, as shown in Figure 1, driving mechanism includes being connect with pedestal 1 by bolt positioned at 2 left side of cleaning case The output shaft of motor 3, motor 3 is vertically arranged, is connected with the cam 31 being laterally arranged to offset with the left outside wall of cleaning case 2 thereon, One group of elastic component being laterally arranged 32 is connected on the left outside wall of cleaning case 2, the left end of elastic component 32 and column 11 are affixed.This implementation In example, elastic component 32 and cam 31 are each provided at the left side of cleaning case 2, and elastic component 32 is tension spring；Certain cam 31 and elastic component 32 The two sides of cleaning case 2 can also be respectively provided at, then elastic component 32 is pressure spring.

Specifically, as shown in Figure 1, gas source includes by bracket and the affixed cylinder block 4 of column 11, as shown in Fig. 2, gas Longitudinal sliding motion is connected with piston head 42 in cylinder body 4, and piston rod 43 is connected on piston head 42, is rotated on piston rod 43 by pin shaft It is connected with connecting rod 46, the one end of connecting rod 46 far from piston rod 43 is rotatablely connected also by the upper surface of pin shaft and cam 31, The tie point of connecting rod 46 and cam 31 deviates the centre of gyration of cam 31；Cam 31, connecting rod 46 and piston rod 43 form song Handle slide block mechanism.Cylinder chamber 41 is formed between piston head 42 and cylinder block 4, cylinder chamber 41 is communicated with air inlet pipe 44 and escape pipe 45；Air inlet pipe 44 is connected to ambient atmosphere, and air inlet pipe 44 is equipped with breather check valve 441, and it is unidirectional that escape pipe 45 is equipped with outlet Valve 451.

The right side of cylinder block 4 is equipped with pressurized tank 5, and the cylinder chamber 41 of cylinder block 4 is connected to by escape pipe 45 with pressurized tank 5. Pressurized tank 5 is communicated with air supply pipe 51 and permeability cell 52；Permeability cell 52 is equipped with safety valve 521, when pressure is excessive in pressurized tank 5 When, safety valve 521 is opened, and extra gas is discharged from permeability cell 52, to reduce the pressure in pressurized tank 5, guarantees pressurized tank 5 Safety.As shown in Figure 1, the side wall row of cavity 24 is equipped with gas access 26, air supply pipe 51 passes through in gas access 26 and cleaning case 2 Cavity 24 be connected to, air supply pipe 51 be equipped with pressure valve 511 and gas supply check valve 541, supply check valve 541 close to cleaning case 2 Setting.

In order to make gas be more evenly distributed in cleaning case 2, preferably the quantity of gas access 26 is multiple and circumferential uniform It is distributed on the side wall of cavity 24；As shown in Fig. 2, being connected with position of splitter 53 on air supply pipe 51, position of splitter is connected with several shuntings Pipe 541, gas supply check valve 541 are located on isocon 541, and several isocons 541 are connected to gas access 26 respectively.Such point The structure for flowing part is similar to tee tube, four-way pipe, is the prior art, will herein be described in detail.

Preferably, heating member 6 is additionally provided on air supply pipe 51, heating member 6 is heater, and heating member 6 is located at pressure valve 511 Between gas supply check valve 541, certain heating member 6 may be alternatively provided at other positions, for example be located on the inner wall of pressurized tank 5, at this time Heating member 6 can be the heater strip being wrapped on 5 inner wall of pressurized tank；It is for another example located on cleaning case 2, it at this time can be by cleaning case 2 Heating member 6, such as heater strip are located at the hollow interior of 2 side wall of cleaning case by the hollow setting of lower sides.The specific knot of heating member 6 Structure and setting position the utility model are not particularly limited.

When initial, cam top 311 offsets with cleaning case 2, and elastic component 32 is stretched.Need the protective layer on cleaning wafer surface When, as depicted in figs. 1 and 2, case lid 21 is opened, multiple groups wafer is placed on web plate 22, is then manually poured into cleaning case 2 The cleaning solution of cleaning wafer sealer, after cleaning solution all submerges wafer, cleaning solution is poured into stopping, and by case lid 21 It closes and locks.Then motor 3 is manually made to work, motor 3 rotates counterclockwise cam 31, and cam top 311 is to far from cleaning case 2 Direction movement, the elastic component 32 that is stretched at this time restores deformation, and elastic component 32 moves downward cleaning case 2.Cam 31 continues It rotates counterclockwise, cam top 311 is moved to the direction close to cleaning case 2, and cam 31 moves right cleaning case 2, while elasticity Part 32 is stretched.And so on, the left and right movement on sliding rail 12 of cleaning case 2 reaches equal so that the wafer in cleaning case 2 stirs The purpose of even cleaning.

While motor 3 rotates cam 31, cam 31 moves connecting rod 46, and connecting rod 46 is driven by piston rod 43 The longitudinally reciprocating motion in cylinder block 4 of piston head 42.When piston head 42 travels forward, the volume of cylinder chamber 41 increases, extraneous gas Body enters in cylinder chamber 41 through air inlet pipe 44；The volume of cylinder chamber 41 reduces when piston head 42 moves backward, the gas in plunger shaft Body enters in pressurized tank 5 through escape pipe 45.When the gas pressure in pressurized tank 5 reaches the setting value of pressure valve 511, such as 0.8MPa, pressure valve 511 are opened, and gas is divided into the cavity that multichannel enters cleaning case 2 after the position of splitter 53 on air supply pipe 51 In 24.Gas in cavity 24 is discharged from the gas vent 231 on partition 23, and the gas that portion discharge hole 231 is discharged makes flabellum 232 Rotation, the cleaning solution in 232 stirring and washing case 2 of flabellum, to accelerate movement of the cleaning solution in cleaning case 2, make cleaning solution with The surface contact of wafer is more abundant；The gas that another part gas vent 231 is discharged gives wafer one upward power, this power and cleaning The resultant force of the left and right movement of case 2 makes wafer stir more violent, so that crystal column surface can come into full contact with everywhere with cleaning solution, mentions The cleaning effect of high crystal column surface.

During cleaning wafer, heating member 6 can also be made to work, the gas entered in cleaning case 2 at this time is hot gas, Hot gas increases the temperature of cleaning solution, can accelerate the reaction speed of cleaning solution Yu crystal column surface protective layer, when shortening cleaning Between；If heating can not accelerate the reaction speed of cleaning solution Yu crystal column surface protective layer, the not work of heating member 6 when cleaning wafer surface Make.

After crystal column surface cleans up, motor 3 is made to stop working, tapping valve 251 is opened manually, cleaning solution passes through drain Pipe 25 flows out, and is then manually collected to it, after cleaning solution is discharged, is then switched off tapping valve 251, then open case lid 21, It is artificial that deionized water is added in cleaning case 2, for removing the remaining cleaning solution of crystal column surface, when deionized water is whole by wafer After submergence, deionized water is poured into stopping, and case lid 21 is closed.Then motor 3 is made to work, motor 3 makes the left and right fortune of cleaning case It is dynamic, wafer is stirred, comes into full contact with deionized water with the remaining cleaning solution of crystal column surface, this process and cleaning wafer surface are protected Sheath is identical, and details are not described herein.

Deionized water receives deionized water for after the remaining cleaning solution removal completely of crystal column surface after drain pipe discharge Collection, then motor 3 and heating member 6 is made to work, motor 3 makes the left and right movement of cleaning case 2, stirs wafer, keep crystal column surface remaining Liquid is discharged after dropping to the bottom of cleaning case 2 from drain pipe 25；6 heat gas of heating member, hot gas enter cleaning case 2 simultaneously It is interior, hot gas with stir in crystal column surface come into full contact with, thus air-dry crystal column surface.

After crystal column surface air-dries, motor 3 and heating member 6 is manually set to stop working, while manually closing tapping valve 251 It closes, then opens case lid 21, the wafer on web plate 22 is taken out, is then cleaned out web plate 22, then case lid 21 is closed.

Embodiment two

Embodiment one and embodiment two the difference is that: case lid 21 is equipped at least one solution input port, solution Input port is communicated with liquid feeding hose (being not shown in Fig. 1 and Fig. 2), then cleaning solution and deionized water can be added clear by liquid feeding hose In tank-washer 2, thus when deionized water is added without opening case lid 21.When solution input port is one, cleaning solution and deionization Water is added from a solution input port；When solution input port is two, cleaning solution and deionized water are inputted from two solution respectively Mouth is added.

Embodiment three

The present embodiment and embodiment one and embodiment two the difference is that: the cleaning device further includes turnover mechanism (being not shown in Fig. 1 and Fig. 2), turnover mechanism is connect with pedestal 1, and turnover mechanism can make cleaning case 2 overturn 180 ° by pedestal 1. When air-drying crystal column surface, turnover mechanism makes cleaning case 2 overturn 180 °, and hot gas is blown from the top down at this time, by crystal column surface wind It is dry.

The above is only the preferred embodiment of the utility model, it is noted that comes for those skilled in the art It says, without departing from the concept of the premise utility, can also make several modifications and improvements, it is practical new that these also should be regarded as this The protection scope of type, these all will not influence the effect and patent practicability of the utility model implementation.The utility model is saved Technology, shape, the construction portion slightly described is well-known technique.

Claims (10)

1. the intelligent chip production cleaning device with air-drying function, including cleaning case, cleaning case is equipped at least one solution Input port is equipped with the web plate for placing wafer in cleaning case；It is characterized in that, the web plate is fixed or wafer can be driven to transport Dynamic, which further includes the gas source being connected to cleaning case and/or the driving mechanism for making cleaning case transverse movement, the gas source The gas of offer is moved from a side of web plate to the other side.

2. cleaning device according to claim 1, which is characterized in that further include rack, cleaning case can be slided on the rack Dynamic, the driving mechanism includes the motor outside the cleaning case, and the output shaft of motor is connected with to offset with cleaning box outer wall Cam, the outer wall of cleaning case is connected with the one group elastic component affixed with the rack.

3. cleaning device according to claim 2, which is characterized in that the gas source includes cylinder block, sliding in cylinder block It is connected with piston head, piston rod is connected on piston head, connecting rod is rotatably connected on piston rod, connecting rod is far from piston rod The end face eccentric of one end and the cam is rotatablely connected；Form cylinder chamber between piston head and cylinder block, cylinder chamber be communicated with The air inlet pipe of external world's connection and the escape pipe being connected to cleaning case, air inlet pipe are equipped with breather check valve, and escape pipe is equipped with Gas check valve.

4. cleaning device according to claim 3, which is characterized in that further include pressurized tank, pressurized tank and the escape pipe Connection, pressurized tank are communicated with the air supply pipe being connected to the cleaning case, and air supply pipe is equipped with gas supply check valve and pressure valve；It is described Pressurized tank is also communicated with the permeability cell being connected to ambient atmosphere, and permeability cell is equipped with safety valve.

5. cleaning device according to claim 1, which is characterized in that further include be located at the cleaning case in or it is independent plus Warmware, the interior gas run of heating member heating cleaning case.

6. cleaning device described according to claim 1~any one of 5, which is characterized in that web plate in the cleaning case Lower section is equipped with partition, the bottom formation cavity of partition and cleaning case, and the gas source is connected to cavity, and the partition is equipped with several Gas vent.

7. cleaning device according to claim 6, which is characterized in that be equipped with fan at the portion discharge hole on the partition Leaf, flabellum is between partition and the web plate.

8. cleaning device described according to claim 1~any one of 5, which is characterized in that the bottom of the cleaning case is set There is drain pipe, the drain pipe is equipped with tapping valve.

9. the cleaning device according to any one of claim 2~4, which is characterized in that be connected with cunning in the rack Rail is connected with the sliding block being slidably connected with the sliding rail on the cleaning case.

10. the cleaning device according to any one of claim 2~4, which is characterized in that the cam and elastic component position In the ipsilateral of cleaning case, the elastic component is tension spring.