CN209658131U - A kind of more cathode long-life type ion sources - Google Patents
A kind of more cathode long-life type ion sources Download PDFInfo
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- CN209658131U CN209658131U CN201920316510.8U CN201920316510U CN209658131U CN 209658131 U CN209658131 U CN 209658131U CN 201920316510 U CN201920316510 U CN 201920316510U CN 209658131 U CN209658131 U CN 209658131U
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- cathode
- type ion
- ion sources
- arc chamber
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Abstract
The utility model provides a kind of more cathode long-life type ion sources, in such a way that indirect type heats cathode.Combined by the hot cathode of axially symmetric filament and cathode and constitute twin cathode structure, multiple groups twin cathode structure can free switching emission of ions end and reflection end, improve the service life of ion source, improve ion implanting machine equipment stability and high efficiency.
Description
Technical field
The present invention relates to equipment for making semiconductor device, the in particular to ion source of ion implantation apparatus.
Background technique
Ion implantation apparatus is the key equipment in semiconductor devices manufacturing process, need to inject ion and obtain through ionization, gather
Coke obtains high kinetic energy through electric field acceleration at ion beam, injects in semiconductor crystal wafer, to realize doping.
Typical ion implantation apparatus includes ion source, Ion Extraction device, quality analysis apparatus, beam transmitting device and crystalline substance
Piece treating apparatus.Ion source is the device for injection ion needed for generating, and the service life of ion source determines ion implantation apparatus operating
Stabilization and efficiency, be the key device of ion implantation apparatus.
What existing ion source of ion implanter mostly used has Bai Nasi ion source and indirectly heated cathode (IHC) ion source etc.
Two ways.
Bai Nasi ion source is that filament is directly powered, and emits thermoelectron to ion source arc chamber after filament heating.Filament is because adding
After thermal electron, filament can be consumed until disappearing, therefore the service life of Bai Nasi ion source depends on the service life of filament.
Indirect type adds hot-cathode ion source, by the way that the filament power supply close to cathode internal, filament issues thermoelectron to yin
Pole is heated, and cathode is made to issue thermoelectron into the arc chamber of ion source.Protection due to filament by cathode, burn-out life can
Extend, therefore indirect type adds hot-cathode ion source that can effectively prolong the service life.
In indirect type plus hot-cathode ion source embodiment, cathode is arranged at one end of chamber, with cathode axial direction phase
Pair chamber one end be equipped with repellel.Cathode and repellel add same position bias voltage to generate and reflective electron, thus will
Electron reflection is in as the arc chamber in magnetic field.The problem of such indirectly heated cathode ion source is the limited longevity of single cathode
Life.
Summary of the invention
The present invention is in view of the shortcomings of the prior art, provide a kind of more cathode long-lives in such a way that indirect type heats cathode
Type ion source.
The present invention provides the repellel in a kind of existing embodiment of the hot cathode combination replacement with filament and cathode, is formed double
Cathode construction.Twin cathode structure can realize the free switching of the function of emission of cathode electronics and repellel reflective electron, increase heat
Electron emission time and emission measure increase ion source life；The quantity of two groups or more axially symmetric cathodes, multiple increase from
The component service life.
More cathode long-life type ion sources provided by the invention include:
Arc chamber, electron motion and the cavity for generating the required ion of injection；
Filament imposes electric current and generates thermionic heater strip；
Cathode, the single-ended closed sleeve of concave structure；
Magnetic field covers the magnetic field of ion source arc chamber range.
The filament and the cathode site are relatively fixed, and filament is embedded in cathode slots, contactless insulation,
I.e. hot cathode combines；The hot cathode combination is combined with axially symmetric hot cathode, constitutes twin cathode；The cathode and the arc
Room position is relatively fixed, and cathode closed end is placed in arc chamber cavity, and open end is placed in outside arc chamber, contactless insulation；It is described
Ion source magnetic field magnetic line direction is consistent with the twin cathode axis direction.
Detailed description of the invention
Fig. 1 is the more cathode long-life type ion source schematic diagrams of present example；
Fig. 2 is the more cathode long-life type ion source structure figures of present example；
Specific embodiment
Such as 2 case study on implementation of attached drawing, filament 101~104 is relatively fixed with the difference of cathode 201~204 position respectively, and filament is equal
It is non-contacting to be embedded in cathode slots, form hot cathode combination；The combination of the hot cathode of filament 101 and cathode 201 and filament 103
And the hot cathode combination of cathode 203 is axially and symmetrically, i.e. A group twin cathode；The combination of the hot cathode of filament 102 and cathode 202 and filament
104 and cathode 204 hot cathode combination axially and symmetrically, i.e. B group twin cathode.
3 cavity of arc chamber includes end tab 301, side wall 302 and bottom plate 303；End tab 301, bottom plate 303 and the side wall
302 top and bottom pass through insertion or pin guiding connection；The component group of the symmetrical aperture in one side or more than one piece all or part aperture
At.Symmetric polygonal or circle may be selected in arc chamber 3.
Cathode 201~204 is installed in arc chamber by 302 through-hole of side wall, and cathode closed end is placed in arc chamber cavity, is opened
End is put to be placed in outside arc chamber；Filament 101~104, cathode 201~204 and end tab 301, side wall 302 and bottom plate 303 are non-contact
Formula insulation.
Selection applies same bias voltage to two cathodes in A group or B group twin cathode, and the filament of a hot cathode is applied
With electric current, the cathode heated in a combination thereof generates thermoelectron；The filament of another hot cathode is cut off the power, and cathode, which does repellel, to be made
With, according to the service life state of practical heating cathode, two groups of hot cathode filament power switches, the i.e. work of switching hot cathode in switch groups
State.Magnetic field magnetic is done according to the working condition of cathode in twin cathode to be switched, and magnetic line of force direction is consistent with twin cathode axial direction, and
It is done and is switched according to the working condition of cathode.At the end of to this twin cathode working life state, another group of twin cathode work is opened, is reached
Increase ion source life to multiple, improves the stabilization and efficiency of ion implantation apparatus operating.
Claims (8)
1. a kind of more cathode long-life type ion sources, it is characterized in that being made of multiple groups filament and cathode, arc chamber and magnetic field:
Filament (2), U-shaped structure, U-shaped bottom closed end are installed in the groove of cathode aperture end；
Cathode (1), U-shaped structure, the U-shaped opening end are placed in outside arc chamber, and closed end passes through inside arc chamber；
Arc chamber (3), the cavity that plasma generates；
Magnetic field is surrounded on arc chamber, generates the magnetic line of force.
2. a kind of more cathode long-life type ion sources according to claim 1, it is characterized in that between filament, cathode and arc chamber
Contactless insulation.
3. a kind of more cathode long-life type ion sources according to claim 1, it is characterized in that by axially symmetric filament with
The hot cathode of cathode combines the twin cathode structure to be formed.
4. a kind of more cathode long-life type ion sources according to claim 1, it is characterized in that by two groups or more of jack to jack adapter
Pole structure composition.
5. a kind of more cathode long-life type ion sources according to claim 1, it is characterized in that arc chamber is optional symmetrical polygon
Shape or circular configuration are made of end tab, side wall and bottom plate.
6. a kind of more cathode long-life type ion sources according to claim 5, it is characterized in that end tab is that extraction is opened at center
The symmetric polygonal or circular configuration in hole.
7. a kind of more cathode long-life type ion sources according to claim 5, it is characterized in that side wall is by a side pair
Claim the component of aperture or more than one piece all or part aperture composition.
8. a kind of more cathode long-life type ion sources according to claim 5, it is characterized in that bottom plate is provided with injection well
Symmetric polygonal or circular configuration.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920316510.8U CN209658131U (en) | 2019-03-13 | 2019-03-13 | A kind of more cathode long-life type ion sources |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201920316510.8U CN209658131U (en) | 2019-03-13 | 2019-03-13 | A kind of more cathode long-life type ion sources |
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| CN209658131U true CN209658131U (en) | 2019-11-19 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109786199A (en) * | 2019-03-13 | 2019-05-21 | 无锡诚承电子科技有限公司 | A kind of more cathode long-life type ion sources |
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2019
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109786199A (en) * | 2019-03-13 | 2019-05-21 | 无锡诚承电子科技有限公司 | A kind of more cathode long-life type ion sources |
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