CN209652475U - A kind of monocrystalline carbon crystal nano-coating reactor - Google Patents
A kind of monocrystalline carbon crystal nano-coating reactor Download PDFInfo
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- CN209652475U CN209652475U CN201920346984.7U CN201920346984U CN209652475U CN 209652475 U CN209652475 U CN 209652475U CN 201920346984 U CN201920346984 U CN 201920346984U CN 209652475 U CN209652475 U CN 209652475U
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- furnace body
- carbon crystal
- crystal nano
- partition
- coating reactor
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Abstract
The utility model discloses a kind of monocrystalline carbon crystal nano-coating reactors, it includes the open furnace body and panel of one side, the panel, which is mounted in the open face of furnace body, is integrally formed closed reactor, partition is provided in the furnace body, partition one end is mounted on furnace body inside wall, the other end is set as tilting upwards and tilt, and two baffles are additionally provided on the partition, form substrate placement region between two baffles；The upper surface of the furnace body is provided with copper post and air inlet, and lower end surface is provided with copper post and gas outlet, is provided with air inlet in the one side wall of furnace body, is provided with laser port on another opposite side wall.The utility model structure is simple and convenient to operate, plated film is high-efficient, has preferable market popularization value and application prospect.
Description
Technical field
The utility model relates to artificial synthesized Nano diamond monocrystalline crystal SP3 structure membrane technology, specifically a kind of monocrystalline
Carbon crystal nano-coating reactor.
Background technique
Single-crystal diamond is a kind of artificial new material, and main ingredient is carbon atom, and existence form is that valence bond is that SP3 is miscellaneous
For the positive tetrahedron structure of change in 0.001-1um different-thickness, characteristic colorless and transparent, with diamond, hardness is diamond
8597%, diamond crystal film be using sedimentation generate.
CVD (the meteorological precipitation method), pressurization are used using the method for production diamond mostly at present.Chemical vapor deposition
It (CVD) is the technology for depositing multiple materials being most widely used in semi-conductor industry, including large-scale insulating materials,
Most metals material and metal alloy compositions.In theory, it is very simple: two or more gaseous state is former
Material is imported into a reaction chamber, and then they chemically react between each other, is formed a kind of new material, is deposited to crystalline substance
On piece surface.Silicon nitride film (Si3N4) is exactly a good example, it is to be reacted to be formed by silane and nitrogen.However,
In fact, the reaction in reaction chamber be it is very complicated, have the factor that much must be taken into consideration, the variation range of deposition parameter is very wide
: react indoor pressure, the temperature of chip, the flow rate of gas, gas by the distance of chip, gas chemistry at
Whether part, a kind of gas phase for the ratio of another gas, the intermediate products role of reaction and need other reactions
Outdoor external energy source accelerates or induces conceivable reaction etc..Additional energy source such as energy of plasma, certainly
A whole set of new parameter can be generated, such as the ratio of ion and neutral gas flow, ion can be with the rf bias etc. on chip.Then, it examines
Consider the parameter in deposition film: as (the latter refers to across figure for the uniformity of thickness and the coverage property on figure in whole chip
The covering of shape step), the stoicheiometry (chemical analysis and distribution) of film crystallizes crystal orientation and defect concentration etc..Certainly, it sinks
Product rate is also an important factor, because it decides the quantum of output of reaction chamber, high deposition rate is often required to and film
High quality compromise consider.The film that reaction generates can be not only deposited on chip, can be also deposited on the other component of reaction chamber,
The number and thorough degree cleaned to reaction chamber is also critically important.
The diamond film orientation of CVD (the meteorological precipitation method) production used in the prior art and structure are chaotic
, monocrystalline crystal can not be stable towards a direction vector, affects the mixing physical attribute of material.
The number of plies of existing plating membrane reactor performance plating monocrystalline in coating process is few simultaneously, therefore there is plating membrane efficiency
The problems such as low.
Summary of the invention
For overcome it is above-mentioned there are deficiency, the inventor of the utility model passes through long-term explorations trial and multiple reality
It tests and effort, keeps reforming and innovate, propose a kind of monocrystalline carbon crystal nano-coating reactor, which can disposably plate more
Layer monocrystalline promotes plating membrane efficiency.
To achieve the goals above, specific technical solution used by the utility model is:
A kind of monocrystalline carbon crystal nano-coating reactor comprising open furnace body and panel, the panel are mounted on one side
Closed reactor is integrally formed in the open face of furnace body, partition is provided in the furnace body, partition one end is mounted in furnace body
On side wall, the other end is set as tilting upwards and tilt, and two baffles are additionally provided on the partition, substrate is formed between two baffles and puts
Set region；The upper surface of the furnace body is provided with copper post and air inlet, and lower end surface is provided with copper post and gas outlet, the side of furnace body
It is provided with air inlet on wall, is provided with laser port on another opposite side wall.
A kind of monocrystalline carbon crystal nano-coating reactor, further optimization technique side according to the utility model
Case is: the baffle is red copper baffle.
A kind of monocrystalline carbon crystal nano-coating reactor, further optimization technique side according to the utility model
Case is: the air inlet diameter is 8mm round hole.
A kind of monocrystalline carbon crystal nano-coating reactor, further optimization technique side according to the utility model
Case is: the gas outlet diameter is 8mm round hole.
A kind of monocrystalline carbon crystal nano-coating reactor, further optimization technique side according to the utility model
Case is: being provided with door made of tempered glass on the panel.
A kind of monocrystalline carbon crystal nano-coating reactor, further optimization technique side according to the utility model
Case is: the partition is four, and four partitions are between the upper and lower away from being uniformly mounted in furnace body, and the inclination of two neighboring partition is stuck up
Origin or beginning is contrary.
A kind of monocrystalline carbon crystal nano-coating reactor, further optimization technique side according to the utility model
Case is: air inlet and laser port on the sidewall of the furnace body are all three.
A kind of monocrystalline carbon crystal nano-coating reactor, further optimization technique side according to the utility model
Case is: spacing is 6-12cm between the partition.
A kind of monocrystalline carbon crystal nano-coating reactor, further optimization technique side according to the utility model
Case is: the furnace body size is 800 × 600-1000 × 1200mm.
A kind of monocrystalline carbon crystal nano-coating reactor, further optimization technique side according to the utility model
Case is: the laser frequency of the laser port is greater than 25M Hz.
The intracorporal reaction chamber of furnace is divided into multiple regions by the utility model, forms multiple monocrystalline coating chambers, therefore can
It is disposable to complete multilayer monocrystalline plated film, promote plating membrane efficiency.
It creates through the invention and then produces monocrystalline diamond film in different solid matters (glass, metal, plastics),
Meet different industries to require the difference of diamond film.
It is created through the invention, and film smooth, that extremely close, firm craftsman is solid can be generated on metal, plastics, glass, surface.
Simultaneously the utility model also have many advantages, such as structure be simple and convenient to operate, plated film it is high-efficient, have preferable market
Promotional value and application prospect.
Detailed description of the invention
It, below will be to required in embodiment in order to illustrate more clearly of the technical solution of the utility model embodiment
The attached drawing used is briefly described, it should be understood that the following drawings illustrates only some embodiments of the utility model, therefore not
It should be considered as the restriction to range, for those of ordinary skill in the art, without creative efforts,
It can also be obtained according to these attached drawings other relevant attached drawings.
Fig. 1 is the utility model structure diagram.
Figure acceptance of the bid note is respectively as follows: 1, furnace body 2, panel
3, partition 4, baffle
5, air inlet 6, copper post
7, gas outlet 8, door made of tempered glass
9, inclination tilts 10, laser port
11, side wall 12, substrate rest area
Specific embodiment
Technical solution is described in detail in conjunction with the accompanying drawings in the utility model embodiment, it is clear that described
Embodiment is a part of embodiment of the utility model, rather than whole embodiments.Based on the reality in the utility model
Mode is applied, every other embodiment obtained by those of ordinary skill in the art without making creative efforts is all
Belong to the range of the utility model protection.Therefore, below the detailed description for providing embodiment in the accompanying drawings is not intended to limit
The range of claimed invention processed, but it is merely representative of the selected embodiment of the utility model.
It should also be noted that similar label and letter indicate similar terms in following attached drawing, therefore, once a certain Xiang Yi
It is defined in a attached drawing, then it further can not be defined and explained in subsequent attached drawing.
As shown in Figure 1
Example 1: this embodiment offers a kind of monocrystalline carbon crystal nano-coating reactors comprising furnace body 1 and panel 2,
Panel 2 is mounted on the open end face of furnace body 1, and a reactor is integrally formed in this way, and whole size is 600X600.Then exist
Identical 3,4 partitions of partition of 4 structures of installation are installed in parallel in furnace body in furnace body, and between the upper and lower away from being mutually all 120mm, every
The structure of plate 3 is to set acclivitous tilting for one end, one end of such partition 3 is just on the basis of slab construction
Be fixedly mounted furnace body inner wall on, then the other end tilt upwards tilting 9 ends and the inner wall of furnace body 1 between there are gaps, then
The direction that the inclination of two neighboring partition 3 tilts end is opposite.It is thus three plating membrane cavities by the inside division of furnace body 1.
Then two baffles 4 are set on the flat portion of partition, the region between baffle 4 is formed substrate rest area 12, baffle 4
Material use red copper baffle.
Then one copper post 6 and an air inlet 5 are set at the top of furnace body 1, are also provided with a copper in the bottom of furnace body 1
Column 6 and a gas outlet 7, wherein copper post 6 is 40mm high, and diameter is the cylindrical body of 20mm, and gas outlet and air inlet are diameter 8mm's
Circular hole.Copper post 6 is used to be arranged on furnace body by the interior weldering mode of depth.
Then three air inlets 5 are set on the side wall 11 of furnace body 1, then each air inlet exists against a plating membrane cavity
In 3 laser ports 10 are arranged on the opposite another side wall of air inlet 5, each laser port is also respectively toward to a plating membrane cavity.Laser
The diameter of mouth and air inlet is both configured to 8mm.
The panel is the thickness of 15mm, 8 edge seal of door made of tempered glass thereon and needs high temperature resistant, the length and width of panel
It is all 600mm.
Example 2: this embodiment offers a kind of monocrystalline carbon crystal nano-coating reactors comprising furnace body 1 and panel 2,
Panel 2 is mounted on the open end face of furnace body 1, and a reactor is integrally formed in this way, and whole size is 340X340.Then exist
Identical 3,4 partitions of partition of 4 structures of installation are installed in parallel in furnace body in furnace body, and between the upper and lower away from being mutually all 68mm, every
The structure of plate 3 is to set acclivitous tilting for one end, one end of such partition 3 is just on the basis of slab construction
Be fixedly mounted furnace body inner wall on, then the other end tilt upwards tilting 9 ends and the inner wall of furnace body 1 between there are gaps, then
The direction that the inclination of two neighboring partition 3 tilts end is opposite.It is thus three plating membrane cavities by the inside division of furnace body 1.
Then two baffles 4 are set on the flat portion of partition, the region between baffle 4 is formed substrate rest area 12, baffle 4
Material use red copper baffle.
Then one copper post 6 and an air inlet 5 are set at the top of furnace body 1, are also provided with a copper in the bottom of furnace body 1
Column 6 and a gas outlet 7, wherein copper post 6 is 40mm high, and diameter is the cylindrical body of 20mm, and gas outlet and air inlet are diameter 8mm's
Circular hole.Copper post 6 is used to be arranged on furnace body by the interior weldering mode of depth.
Then three air inlets 5 are set on the side wall 11 of furnace body 1, then each air inlet exists against a plating membrane cavity
In 3 laser ports 10 are arranged on the opposite another side wall of air inlet 5, each laser port is also respectively toward to a plating membrane cavity.Laser
The diameter of mouth and air inlet is both configured to 8mm.Laser frequency is set as 27M Hz.
The panel is the thickness of 30mm, 8 edge seal of door made of tempered glass thereon and needs high temperature resistant, the length and width of panel
It is all 340mm.
Example 3: this embodiment offers a kind of monocrystalline carbon crystal nano-coating reactors comprising furnace body 1 and panel 2,
Panel 2 is mounted on the open end face of furnace body 1, and a reactor is integrally formed in this way, and whole size is 800X800.
Then the identical partition 3 of 4 structures is installed in furnace body, four partitions are installed in parallel in furnace body, and between the upper and lower
Away from being mutually all 80mm, the structure of partition 3 is to set acclivitous tilting for one end on the basis of slab construction, this
One end of sample partition 3 is just fixedly mounted on the inner wall of furnace body, then the other end tilt upwards tilt 9 ends and furnace body 1 inner wall it
Between there are gap, the direction that then inclination of two neighboring partition 3 tilts end is opposite.Thus by the inner part of furnace body 1
It is segmented into three plating membrane cavities.
Then two baffles 4 are set on the flat portion of partition, the region between baffle 4 is formed substrate rest area
12, the material of baffle 4 uses red copper baffle.
Then one copper post 6 and an air inlet 5 are set at the top of furnace body 1, are also provided with a copper in the bottom of furnace body 1
Column 6 and a gas outlet 7, wherein copper post 6 is 40mm high, and diameter is the cylindrical body of 20mm, and gas outlet and air inlet are diameter 8mm's
Circular hole.Copper post 6 is used to be arranged on furnace body by the interior weldering mode of depth.
Then three air inlets 5 are set on the side wall 11 of furnace body 1, then each air inlet exists against a plating membrane cavity
In 3 laser ports 10 are arranged on the opposite another side wall of air inlet 5, each laser port is also respectively toward to a plating membrane cavity.Laser
The diameter of mouth and air inlet is both configured to 8mm.Laser frequency is set as 42M Hz.
The panel is the thickness of 30mm, 8 edge seal of door made of tempered glass thereon and needs high temperature resistant, the length and width of panel
It is all 800mm.Smooth glass door 8 is round door, and the center of panel is arranged in, and is convenient for observation in this way and opens and close
It closes, surrounding carries out sealing and high temperature resistant.
The various embodiments described above have done different adjustment to product specification, so that the product coating effects of each embodiment obtain not
Same embodiment.Those skilled in the art can also make according to foregoing description and correspondingly adjust, so that effect obtains further
It is promoted.
The tilt angle that the inclination of partition in the utility model tilts is 30-60 °, tilts the top height of warping part
It is identical as the height of baffle.
There are three plating membrane cavities that partition is divided into the utility model, and the substrate rest area that enough baffles are constituted all is phase
Logical.
When use: external vacuum reaction system controls the vacuum degree of the furnace body, then in external Laser emission controller, control
Then the laser frequency of laser port processed is injected in carbonaceous material source in furnace body, and the external air charging system at air inlet, realization pair
The control of carbonaceous material source.The copper post of electrode and upper and lower ends is connected, substrate is packed into reaction chamber, then vacuumizes, then presses
Tranmitting frequency emits 1440 times, reacts 0.5-2 hours, production diamond single crystal, mixing polycrystalline crystal film.Entirety requires system true
It is empty :≤2.4 × 10-2Pa, power supply: 10KW, temperature :≤25 DEG C.
In the present invention unless specifically defined or limited otherwise, term " installation ", " connected ", " connection ", " Gu
It is fixed " etc. terms shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integral；It can be
Mechanical connection, is also possible to be electrically connected；It can be directly connected, two can also be can be indirectly connected through an intermediary
The interaction relationship of connection or two elements inside element.It for the ordinary skill in the art, can basis
Concrete condition understands the concrete meaning of above-mentioned term in the present invention.
Above are merely preferred embodiments of the utility model, it is noted that above-mentioned preferred embodiment should not regard
For limitations of the present invention, the protection scope of the utility model should be defined by the scope defined by the claims..For
For those skilled in the art, without departing from the spirit and scope of the utility model, it can also make several
Improvements and modifications, these improvements and modifications also should be regarded as the protection scope of the utility model.
Claims (10)
1. a kind of monocrystalline carbon crystal nano-coating reactor, it is characterised in that including the furnace body and panel that one side is open, the panel
It is mounted in the open face of furnace body and closed reactor is integrally formed, partition is provided in the furnace body, partition one end is mounted on
On furnace body inside wall, the other end is set as tilting upwards and tilt, and is additionally provided with two baffles on the partition, is formed between two baffles
Substrate placement region；The upper surface of the furnace body is provided with copper post and air inlet, and lower end surface is provided with copper post and gas outlet, furnace body
One side wall on be provided with air inlet, be provided with laser port on another opposite side wall.
2. a kind of monocrystalline carbon crystal nano-coating reactor according to claim 1, which is characterized in that baffle is red copper gear
Plate.
3. a kind of monocrystalline carbon crystal nano-coating reactor according to claim 2, which is characterized in that the air inlet diameter
For 8mm round hole.
4. a kind of monocrystalline carbon crystal nano-coating reactor according to claim 3, which is characterized in that the gas outlet diameter
For 8mm round hole.
5. a kind of monocrystalline carbon crystal nano-coating reactor according to claim 4, which is characterized in that be arranged on the panel
There is door made of tempered glass.
6. a kind of monocrystalline carbon crystal nano-coating reactor according to claim 1-5, which is characterized in that it is described every
Plate is four, and four partitions are between the upper and lower away from being uniformly mounted in furnace body, and the inclination of two neighboring partition tilts extreme direction phase
Instead.
7. a kind of monocrystalline carbon crystal nano-coating reactor according to claim 6, it is characterised in that: on the sidewall of the furnace body
Air inlet and laser port be all three.
8. a kind of monocrystalline carbon crystal nano-coating reactor according to claim 7, it is characterised in that: between the partition
Away from for 6-12cm.
9. a kind of monocrystalline carbon crystal nano-coating reactor according to claim 8, it is characterised in that: the furnace body size is
800×600—1000×1200mm。
10. a kind of monocrystalline carbon crystal nano-coating reactor according to claim 9, it is characterised in that: the laser port
Laser frequency is greater than 25M Hz.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920346984.7U CN209652475U (en) | 2019-03-19 | 2019-03-19 | A kind of monocrystalline carbon crystal nano-coating reactor |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920346984.7U CN209652475U (en) | 2019-03-19 | 2019-03-19 | A kind of monocrystalline carbon crystal nano-coating reactor |
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| Publication Number | Publication Date |
|---|---|
| CN209652475U true CN209652475U (en) | 2019-11-19 |
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| CN201920346984.7U Expired - Fee Related CN209652475U (en) | 2019-03-19 | 2019-03-19 | A kind of monocrystalline carbon crystal nano-coating reactor |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109763168A (en) * | 2019-03-19 | 2019-05-17 | 苏州彩生新材料有限公司 | A kind of monocrystalline carbon crystal nano-coating method and reactor |
-
2019
- 2019-03-19 CN CN201920346984.7U patent/CN209652475U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109763168A (en) * | 2019-03-19 | 2019-05-17 | 苏州彩生新材料有限公司 | A kind of monocrystalline carbon crystal nano-coating method and reactor |
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| GR01 | Patent grant | ||
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20191119 |