CN209638779U - A kind of pipe-line system improving investment raw material accuracy and cleanliness - Google Patents
A kind of pipe-line system improving investment raw material accuracy and cleanliness Download PDFInfo
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- CN209638779U CN209638779U CN201920224490.1U CN201920224490U CN209638779U CN 209638779 U CN209638779 U CN 209638779U CN 201920224490 U CN201920224490 U CN 201920224490U CN 209638779 U CN209638779 U CN 209638779U
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Abstract
The utility model discloses a kind of pipe-line system for improving investment raw material accuracy and cleanliness, including processor, source purge gas, the tank body of raw material to be put into, the feed reservoir to supply raw material, delivery pump, connect the second feed pipe of tank body and delivery pump, and the first feed pipe of connection delivery pump and feed reservoir；First liquid level gauge is equipped in the feed reservoir；First feed pipe is equipped with a return bend, and is equipped with tapping valve in the return bend lowest part；Second feed pipe is equipped with a liquid feed valve, and the source purge gas is connected to, the fluid accumulation in the second feed pipe is blown into tank body with the second feed pipe by purging tracheae, and purging tracheae is equipped with purging air valve；The tapping valve, liquid feed valve, purging air valve are the regulating valve being connected with processor.It solves the problems, such as in prior art that semiconductor high node is high-purity to the high-cleanness of chemicals to require, provides a kind of pipe-line system that can be improved investment raw material accuracy and cleanliness.
Description
Technical field
The utility model relates to a kind of pipe-line systems for improving investment raw material accuracy and cleanliness.
Background technique
Photoetching technique is the key technology in semiconductor chip manufacturing process.Photoetching technique is that photoresist is coated on silicon wafer
Or on glass, the process of required precision graphic is obtained through overexposure, development, is widely used in the microelectronics such as integrated circuit, TFT-LCD
Manufacturing field.The quality of photoetching quality directly influences the performance, yield rate and reliability of device.
Various electronic chemical products are used in photoetching process, have cleaning agent, developer solution, stripper etc., these electron chemistries
Product are very high to degree of purity and the concentration requirement of liquid itself, and metallic particles content requirement reaches tens ppt, and concentration allows wave
Dynamic range reaches the 2/1000 of concentration value.The error of raw material input amount will cause the variation of concentration, needs to repeat to adjust, reduce every
The production efficiency criticized, or even can output rejected product.
By taking developer solution as an example, people using photoresist before exposure after in developer solution dissolubility difference develop,
I.e. photoresist according to exposure or it is unexposed (related with the shape of mask), selective is dissolved in developer solution, forms the figure of needs
Shape.In order to obtain good figure, very high requirement, such as semiconductor factory are proposed to the concentration range of developer solution, impurity content
Widely used 2.380% developer solution of tetramethylammonium hydroxide, safe level fluctuation are ± 0.003%, impurity content ppb
Rank, even up to ppt rank.However, domestic many manufacturers are one when producing the electronic chemical products such as developer solution at present
As working environment under from 1 building with pump or the method that vacuumizes of tank body, by the pipeline from 1 building to 2 at the top of building jar, toward tank
In into raw material, do so obvious: 1, due in pipeline from 1 building to 2 building having retained material, can not precise measurement it is real
Border enters the material quantity of tank body.2, since tank body vacuumizes, there is damage to liner tank body, it is extraneous empty in the case that sealing is bad
Gas enters tank internal pollution raw material, influences the impurity content of product, influences the development of high node developer solution.
Utility model content
The utility model is in order to solve semiconductor high node asking to the high-purity requirement of the high-cleanness of chemicals in prior art
Topic provides a kind of pipe-line system that can be improved investment raw material accuracy and cleanliness.
To achieve the above object, the technical solution adopted in the utility model is as follows:
A kind of pipe-line system improving investment raw material accuracy and cleanliness, the tank body including raw material to be put into, supply are former
The feed reservoir of material, delivery pump connect the second feed pipe of tank body and delivery pump, and the first charging of connection delivery pump and feed reservoir
Pipe；Further include processor and source purge gas, first liquid level gauge, the delivery pump and first liquid level gauge point are equipped in the feed reservoir
It is not connected with processor；First feed pipe is equipped with a return bend, and is equipped in the return bend lowest part for inciting somebody to action
The tapping valve of fluid accumulation discharge in first feed pipe；Second feed pipe is equipped with a liquid feed valve, the source purge gas
It is connected to by purging tracheae with the second feed pipe, the fluid accumulation in the second feed pipe is blown into tank body, purging tracheae is equipped with
Purge air valve；The tapping valve, liquid feed valve, purging air valve are the regulating valve being connected with processor.
As a preferred embodiment, the source purge gas is nitrogen gas tank.
It specifically, further include splicing bucket, the liquid that the splicing bucket is arranged in below tapping valve, is discharged for connecing tapping valve
Body；The second liquid level gauge being connected with processor is equipped in splicing bucket.
Specifically, be additionally provided with clean tracheae on the tank body, the cleaning tracheae be connected with clean dry air source or
Inert gas source, clean tracheae are equipped with the clean air valve being connected with processor, and the cleaning air valve is to be connected with processor
Regulating valve；The pressure gauge being connected with processor is equipped in the tank body.
Specifically, one 0.1~0.005 μm of filter is respectively provided on the purging tracheae and clean tracheae.
As a preferred embodiment, the feed reservoir is located in clean environment.
As a preferred embodiment, second feed pipe, the first feed pipe, purging tracheae and clean tracheae are stainless
Steel conduit, and 600 mesh or more mechanical polishing and electrobrightening have been done to inner wall of the pipe.
As another preferred embodiment, second feed pipe, the first feed pipe, the pipeline for purging tracheae and clean tracheae
Inner wall is coated with Teflon liner.
Compared with prior art, the utility model has the following beneficial effects:
(1) the utility model has made some improvements prior art, and improved pipe-line system can be to avoid surrounding air
Pollution to raw material in tank body is entered, can also enter the material quantity inside tank body with accurate measurement, and then improve the member of its production
Performance, yield rate and the reliability of device.
(2) the utility model is by the return bend on the first feed pipe, and the position of its setting can finish charging
The fluid accumulation in the first feed pipe all discharges afterwards, is then picked up again by splicing bucket, the original measured finally by liquidometer
The variation of material pond liquid level and the variation of splicing bucket liquid level, the raw material for accurately passing through delivery pump can be obtained using simple mathematical computations
Amount, and the fluid accumulation in the second feed pipe can be purged completely by nitrogen and enter in tank body, therefore, by the material quantity of delivery pump
The material quantity for as eventually entering into tank body can not only make to accumulate in the first, second feed pipe without raw material, no by this kind of mode
The measurement for influencing inlet amount next time, can also accurately be calculated this inlet amount.
(3) it is additionally provided with clean tracheae on the utility model tank body, in fill process, at any time according to the pressure tune of pressure gauge
The aperture of clean and tidy net air valve, clean dry air or inert gas etc. are passed through into tank body does not influence the gas of material purity, makes
Micro-positive pressure is kept in tank body, is influenced to avoid the intracorporal raw material of tank by environment, village damages in tank body.
(4) it is (net using air that the gas pipeline of the utility model is equipped with filter, feed reservoir is also disposed in clean environment
Change the processed air conditions such as device) under, it can avoid air and generate pollution to it.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the utility model.
Wherein, the corresponding title of appended drawing reference are as follows:
1- tank body, 2- feed reservoir, 3- delivery pump, the second feed pipe of 4-, the first feed pipe of 5-, 6-U shape elbow, 7- drain
Valve, 8- liquid feed valve, 9- purge tracheae, 10- source purge gas, and 11- purges air valve, 12- splicing bucket, 13- first liquid level gauge, 14- the
Two liquidometers, 15- cleaning tracheae, 16- cleaning air valve, 17- pressure gauge.
Specific embodiment
The utility model is described in further detail with embodiment for explanation with reference to the accompanying drawing, and the mode of the utility model includes
But it is not limited only to following embodiment.
The purpose of the present embodiment is to provide for a kind of pipe-line system for improving investment raw material accuracy and cleanliness, mesh
Before, the feed system of existing electronic chemical product such as cleaning agent, developer solution, stripper etc. generally includes the tank body of raw material to be put into
1, the feed reservoir 2 to supply raw material, delivery pump 3 connects the second feed pipe 4 of tank body and delivery pump, and connection delivery pump and raw material
First feed pipe 5 in pond；The present embodiment is the further improvement done on this basis, referring specifically to Fig. 1.
The present embodiment further includes processor and splicing bucket 12, and the processor can directly select 51 single-chip microcontrollers, specific
Working principle is same as the prior art, therefore repeats no more.Be equipped with first liquid level gauge 13 in the feed reservoir, the delivery pump and
First liquid level gauge is connected with processor respectively, can measure the liquid level variation in feed reservoir, then pass through feed reservoir inner bottom surface product
Change multiplied by liquid level, the material quantity extracted out from feed reservoir can be obtained；First feed pipe 5 is equipped with a return bend
6, and the tapping valve 7 for the fluid accumulation in the first feed pipe to be discharged is equipped in the return bend lowest part；The splicing bucket is
It is arranged in below tapping valve 7, the liquid for connecing tapping valve discharge, installation site can select according to field condition, with can
Subject to fluid accumulation in first feed pipe can be completely exhausted out；The second liquid level gauge being connected with processor is equipped in splicing bucket
14, the material quantity in splicing bucket then can be calculated according to method identical with feed reservoir, the two asks poor, as by defeated
Send the material quantity of pump.
For convenience of control charging, second feed pipe 4 is equipped with a liquid feed valve 8, and in order to avoid the second feed pipe 4
Also there is fluid accumulation, influence the calculating of next time charging and this inlet amount, therefore, the present embodiment is also provided with nitrogen gas tank as purging
Gas source 8, the nitrogen gas tank are connected to, the fluid accumulation in the second feed pipe is blown into tank with the second feed pipe by purging tracheae 9
Body 1, purging tracheae are equipped with purging air valve 11；The tapping valve 7, liquid feed valve 8, purging air valve 11 are to be connected with processor
Regulating valve, in order to control valve aperture, control passes through uninterrupted.
In addition, being additionally provided with clean tracheae 15 on the tank body 1, the cleaning tracheae is connected with clean dry air source or lazy
Property gas source, clean tracheae is equipped with the clean air valve 16 that is connected with processor, and the clean air valve is to be connected with processor
Regulating valve；It is equipped with the pressure gauge 17 being connected with processor in the tank body 1, is passed through gas when breaking raw material in tank body, holding is micro- just
Pressure, in order to avoid there is the damage of inner tank wall.It is each on the purging tracheae 9 and clean tracheae 15 in order to guarantee the cleanliness of raw material
It is placed in clean environment equipped with one 0.1~0.005 μm of filter, and by the feed reservoir 2.
Second feed pipe 4, the first feed pipe 5, purging tracheae 9 and clean tracheae 15 may be configured as stainless steel tube
Road, and 600 mesh or more mechanical polishing and electrobrightening have been done to inner wall of the pipe；Alternatively, can also be in the second feed pipe 4, first
The inner wall of the pipe of feed pipe 5, purging tracheae 9 and clean tracheae 15 is coated with Teflon liner, makes pipeline in transferring raw material liquid
During the problem of damage of internal lining etc. will not occur, influence its service life and bring impurity to material liquid.
Above-described embodiment is only one of preferred embodiments of the present invention, should not be taken to limit the utility model
Protection scope, as long as the utility model body design thought and mentally make have no the change of essential meaning or profit
Color, it is solved the technical issues of it is still consistent with the utility model, the protection scope of the utility model should all be included in
Within.
Claims (8)
1. a kind of pipe-line system for improving investment raw material accuracy and cleanliness, the tank body (1) including raw material to be put into, supply are former
The feed reservoir (2) of material, delivery pump (3) connect the second feed pipe (4) of tank body and delivery pump, and connection delivery pump and feed reservoir
The first feed pipe (5)；It is characterized in that, further including processor and source purge gas (10), the first liquid is equipped in the feed reservoir
Position meter (13), the delivery pump and first liquid level gauge are connected with processor respectively；First feed pipe (5) is equipped with a U
Shape elbow (6), and the tapping valve (7) for the fluid accumulation in the first feed pipe to be discharged is equipped in the return bend lowest part；Institute
The second feed pipe (4) are stated equipped with a liquid feed valve (8), the source purge gas is connected by purging tracheae (9) and the second feed pipe
Lead to, the fluid accumulation in the second feed pipe to be blown into tank body (1), purging tracheae is equipped with purging air valve (11)；The tapping valve
(7), liquid feed valve (8), purging air valve (11) are the regulating valve being connected with processor.
2. a kind of pipe-line system for improving investment raw material accuracy and cleanliness according to claim 1, which is characterized in that
The source purge gas (10) is nitrogen gas tank.
3. a kind of pipe-line system for improving investment raw material accuracy and cleanliness according to claim 2, which is characterized in that
It further include splicing bucket (12), liquid of the splicing bucket setting below tapping valve (7), for connecing tapping valve discharge；Splicing bucket
It is interior equipped with the second liquid level gauge (14) being connected with processor.
4. a kind of pipe-line system for improving investment raw material accuracy and cleanliness according to claim 3, which is characterized in that
It being additionally provided with clean tracheae (15) on the tank body (1), the cleaning tracheae is connected with clean dry air source or inert gas source,
Clean tracheae is equipped with the clean air valve (16) being connected with processor, and the cleaning air valve is the regulating valve being connected with processor；
The pressure gauge (17) being connected with processor is equipped in the tank body (1).
5. a kind of pipe-line system for improving investment raw material accuracy and cleanliness according to claim 4, which is characterized in that
One 0.1~0.005 μm of filter is respectively provided on purging tracheae (9) and clean tracheae (15).
6. a kind of pipe-line system for improving investment raw material accuracy and cleanliness according to claim 5, which is characterized in that
The feed reservoir (2) is located in clean environment.
7. a kind of pipe-line system for improving investment raw material accuracy and cleanliness according to claim 6, which is characterized in that
Second feed pipe (4), the first feed pipe (5), purging tracheae (9) and clean tracheae (15) are stainless steel pipes.
8. a kind of pipe-line system for improving investment raw material accuracy and cleanliness according to claim 7, which is characterized in that
Second feed pipe (4), the first feed pipe (5), purging tracheae (9) and cleaning tracheae (15) inner wall of the pipe be coated with spy
Fluorine dragon liner.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920224490.1U CN209638779U (en) | 2019-02-22 | 2019-02-22 | A kind of pipe-line system improving investment raw material accuracy and cleanliness |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920224490.1U CN209638779U (en) | 2019-02-22 | 2019-02-22 | A kind of pipe-line system improving investment raw material accuracy and cleanliness |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209638779U true CN209638779U (en) | 2019-11-15 |
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ID=68494151
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920224490.1U Active CN209638779U (en) | 2019-02-22 | 2019-02-22 | A kind of pipe-line system improving investment raw material accuracy and cleanliness |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN209638779U (en) |
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2019
- 2019-02-22 CN CN201920224490.1U patent/CN209638779U/en active Active
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