CN209418471U - A kind of automation silicon wafer cleaner - Google Patents

Abstract

The utility model relates to wafer cleaning technicals, in particular a kind of automation silicon wafer cleaner, including cleaning case, cored slab, adjusting rod and nut, cored slab is slidably connected on the inside of the cleaning case or so end face, the cored slab other end offers equally distributed spray orifice, the cored slab upper surface is rotatably connected to adjusting rod, fixed plate is equipped with above the cored slab, it is connect on the outside of the adjusting rod with fixed plate spiral, nut is equipped with above the fixed plate, it is connect on the inside of the nut with adjusting rod spiral, described fixed plate one end is fixedly connected with cleaning case, the fixed plate other end slidably connects sliding panel；In the utility model, pass through the cored slab of setting, spray orifice, Storing case and eccentric wheel, this set silicon wafer is hardly damaged, guarantee the quality of silicon wafer, the efficiency of cleaning is substantially increased, saves the plenty of time, and can be cleaned completely to silicon chip surface, with good Practical Benefit, it is worth of widely use.

Description

A kind of automation silicon wafer cleaner

Technical field

The utility model relates to wafer cleaning technical, specially a kind of automation silicon wafer cleaner.

Background technique

Silicon wafer must be cleaned strictly in semiconductor devices production, and micropollution also results in component failure, the purpose of cleaning It is to remove surface contamination impurity, including organic matter and inorganic matter, these impurity some have with state of atom or ionic condition In the form of a film or particle form is present in silicon chip surface, organic contamination include photoresist, organic solvent residual object, synthetic wax and It includes heavy metal gold, copper, iron, chromium etc. that people, which contacts device, tool, vessel bring grease or fiber, inorganic pollution, is seriously affected Minority carrier lifetime and surface conductance；Alkali metal such as sodium etc., with the development of society, Si wafer quality requirement is higher and higher, because This, it is growing to a kind of demand for automating silicon wafer cleaner.

After silicon wafer currently on the market is split away off from resin plate, need for silicon wafer to be put into degumming spray tooling in carry out Silicon wafer stripping sprays cleaning treatment, since in spray, water flow can not be flushed to silicon wafer whole surface, influence the normal of silicon wafer It uses, while silicon wafer is thin, shower water, which presses through height, will lead to scrap of the product, bring huge economic loss, while bringing shower water The problem of wasting of resources, and cleaning efficiency is low, therefore the waste plenty of time proposes a kind of automatic SiClx regarding to the issue above Piece cleaning machine.

Utility model content

The purpose of this utility model is to provide a kind of automation silicon wafer cleaners, to solve to propose in above-mentioned background technique The problem of.

To achieve the above object, the utility model provides the following technical solutions:

A kind of automation silicon wafer cleaner, including cleaning case, cored slab, adjusting rod and nut, described cleaning case or so end Slidably connect cored slab on the inside of face, the cored slab other end offers equally distributed spray orifice, on the cored slab End face is rotatably connected to adjusting rod, and fixed plate, the adjusting rod outside and fixed plate spiral are equipped with above the cored slab Connection is equipped with nut above the fixed plate, connect on the inside of the nut with adjusting rod spiral, described fixed plate one end with clearly Tank-washer is fixedly connected, and the fixed plate other end slidably connects sliding panel, and the sliding panel other end is equipped with Storing case, described Storing case upper surface is equipped with cover board, and silicon wafer is equipped in the Storing case, and top plate, described top plate or so end are equipped with below the silicon wafer Face is slidably connected with Storing case, and seal box is equipped with below the cored slab on right side, is fixedly connected inside the seal box There is a motor, the electric machine main shaft end is fixedly connected with eccentric wheel, filter plate is equipped with below the eccentric wheel, outside the filter plate Side is fixedly connected with cleaning case, and the cleaning case left side slidably connects collecting box, and the cleaning case front end face is fixedly connected There is support plate, the upper end face of support plate is fixedly connected with water pump.

Preferably, the water pump input terminal is connected to cleaning case, and the water pump output end is connected to cored slab.

Preferably, the Storing case is made of the stainless steel wire of hollow out, and the Storing case internal diameter and silicon wafer are of same size.

Preferably, the cored slab quantity is two, and cored slab is about the symmetrical setting in Storing case center, described It is rotatablely connected on the outside of electric machine main shaft with seal box, the seal box right side is fixedly connected with cleaning case.

Preferably, the filter plate is inclined to set, and the filter plate lower end surface and the be in angle of plane are 30 °, described Collecting box is located at the top of filter plate, and the input terminal end of the water pump is located at the lower section of filter plate.

Compared with prior art, the utility model has the beneficial effects that

It 1,, can be by spray orifice to silicon by the cored slab of setting, spray orifice, Storing case and eccentric wheel in the utility model Piece carries out two-sided cleaning simultaneously, and the pressure that silicon wafer two sides is subject to while two-sided cleaning is identical, and such silicon wafer is hardly damaged, and protects The quality of silicon wafer is demonstrate,proved, and this set substantially increases the efficiency of cleaning, saves the plenty of time, and can carry out to silicon chip surface All clear is washed, and has good Practical Benefit；

2, in the utility model, by the filter plate of setting, water pump, collecting box and motor, the rotation of motor can be passed through The rotation of band movable eccentric wheel can move up and down to silicon wafer, and guarantee silicon chip surface in this way can clean completely, and once can be simultaneously Multiple silicon wafers are cleaned, the plenty of time is saved, guarantee cleaning efficiency, save great lot of water resources, this set has huge Economic benefit, be worth of widely use.

Detailed description of the invention

Fig. 1 is the utility model overall structure diagram；

Fig. 2 is the utility model pump attachment structure of water schematic diagram.

In figure: 1- cleaning case, 2- cored slab, 3- adjusting rod, 4- nut, 5- fixed plate, 6- sliding panel, 7- Storing case, 8- Cover board, 9- silicon wafer, 10- top plate, 11- seal box, 12- motor, 13- eccentric wheel, 14- filter plate, 15- collecting box, 16- support Plate, 17- water pump, a- spray orifice.

Specific embodiment

The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work Every other embodiment obtained, fall within the protection scope of the utility model.

The utility model provides a kind of technical solution referring to FIG. 1-2:

A kind of automation silicon wafer cleaner, including cleaning case 1, cored slab 2, adjusting rod 3 and nut 4, the cleaning case 1 are left Cored slab 2 is slidably connected on the inside of right side, 2 other end of cored slab offers equally distributed spray orifice a, the sky 2 upper surface of core is rotatably connected to adjusting rod 3, is equipped with fixed plate 5 above the cored slab 2,3 outside of adjusting rod with 5 spiral of fixed plate connects, and nut 4 is equipped with above the fixed plate 5, and 4 inside of nut is connect with 3 spiral of adjusting rod, institute It states 5 one end of fixed plate to be fixedly connected with cleaning case 1,5 other end of fixed plate slidably connects sliding panel 6, the sliding panel 6 The other end is equipped with Storing case 7, and 7 upper surface of Storing case is equipped with cover board 8, is equipped with silicon wafer 9, the silicon wafer 9 in the Storing case 7 Lower section is equipped with top plate 10, and 10 or so the end face of top plate is slidably connected with Storing case 7, positioned at 2 lower section of the cored slab on right side Equipped with seal box 11, motor 12 is fixedly connected with inside the seal box 11, the 12 main shaft end of motor is fixedly connected with partially Heart wheel 13 is equipped with filter plate 14 below the eccentric wheel 13, and 14 outside of filter plate is fixedly connected with cleaning case 1, it is described clearly 1 left side of tank-washer slidably connects collecting box 15, and 1 front end face of cleaning case is fixedly connected with support plate 16, the support plate 16 upper surfaces are fixedly connected with water pump 17.

17 input terminal of water pump is connected to cleaning case 1, and 17 output end of water pump is connected to cored slab 2, this to set The normal operation for guaranteeing device is set, there is good Practical Benefit, the Storing case 7 is made of the stainless steel wire of hollow out, institute It states 7 internal diameter of Storing case and silicon wafer 9 is of same size, this set guarantees to be overlapped between silicon wafer 9, guarantees the quality of cleaning, institute Stating 2 quantity of cored slab is two, and cored slab 2 is about the symmetrical setting in 7 center of Storing case, 12 main shaft of the motor outside It is rotatablely connected with seal box 11,11 right side of seal box is fixedly connected with cleaning case 1, and this set guarantee silicon wafer 9 can be with It is cleaned comprehensively, greatlys save the time, improve efficiency, the filter plate 14 is inclined to set, 14 lower end surface of filter plate It is 30 ° with the be in angle of plane, the collecting box 15 is located at the top of filter plate 14, and the input terminal end of the water pump 17 is located at The lower section of filter plate 14, this set guarantees that impurity can be cleaned out, and water resource can be recycled, and avoid resource Waste has good Practical Benefit.

The 12 model YS motor of motor, the 17 model IPL50 water pump of water pump.

Workflow: powering on when use, to cleaning case 1 fill the water, so that 1 water surface of cleaning case is located at filter plate 14 hereinafter, Whole silicon wafers 9 are placed in Storing case 7 first, are not in 9 weight of silicon wafer because 9 thickness of silicon wafer is identical as 7 internal diameter of Storing case Storing case 7 is placed on sliding panel 6 then by sliding sliding panel 6, then covers cover board 8 in Storing case 7 by folded phenomenon On, prevent external dust from polluting to silicon wafer 9 in this way, by the starting of motor 12 and water pump 17, motor 12 is with movable eccentric wheel 13 rotations, eccentric wheel 13 drive top plate 10 to move up and down, and top plate 10 drives silicon wafer 9 to move up and down, and water pump 17 takes out cleaning solution It is sprayed out through cored slab 2 from spray orifice a, so that silicon wafer 9 is cleaned, and Storing case 7 is hollow out setting, it is ensured that cleaning solution 9 surface of silicon wafer is cleaned, and moving up and down by silicon wafer 9, so that it is sufficiently clear to guarantee that each position of silicon wafer 9 can obtain It washes, when silicon wafer 9 is of different sizes, cored slab 2 can be driven to move up and down by rotation adjusting rod 3, guarantee silicon wafer 9 in this way is each Position is all cleared up, and then impurity is filtered out through filter plate 14, and into collecting box 15, this set can be such that water resource obtains To making full use of, avoid the waste of resource, when in collecting box 15 impurities accumulation to a certain degree when, can pass through sliding collecting box 15 Dross spot to be managed, guarantee 9 surface of silicon wafer in this way can be cleaned completely, and can once clean simultaneously to multiple silicon wafers 9, The plenty of time is saved, guarantees cleaning efficiency, saves great lot of water resources, this set has huge economic benefit, is worthy to be popularized It uses.

While there has been shown and described that the embodiments of the present invention, for the ordinary skill in the art, It is understood that these embodiments can be carried out with a variety of variations in the case where not departing from the principles of the present invention and spirit, repaired Change, replacement and variant, the scope of the utility model is defined by the appended claims and the equivalents thereof.

Claims (5)

1. a kind of automation silicon wafer cleaner, including cleaning case (1), cored slab (2), adjusting rod (3) and nut (4), feature It is: is slidably connected cored slab (2) on the inside of cleaning case (1) the left and right end face, cored slab (2) other end opens up There is equally distributed spray orifice (a), cored slab (2) upper surface is rotatably connected to adjusting rod (3), on the cored slab (2) Side is equipped with fixed plate (5), is connect on the outside of the adjusting rod (3) with fixed plate (5) spiral, is all provided with above the fixed plate (5) Have nut (4), connect on the inside of the nut (4) with adjusting rod (3) spiral, described fixed plate (5) one end and cleaning case (1) are fixed Connection, fixed plate (5) other end slidably connect sliding panel (6), and sliding panel (6) other end is equipped with Storing case (7), Storing case (7) upper surface is equipped with cover board (8), is equipped with silicon wafer (9) in the Storing case (7), is equipped with below the silicon wafer (9) Top plate (10), top plate (10) the left and right end face are slidably connected with Storing case (7), below the cored slab (2) on right side Equipped with seal box (11), it is fixedly connected with motor (12) inside the seal box (11), motor (12) the main shaft end is fixed It is connected with eccentric wheel (13), is equipped with filter plate (14) below the eccentric wheel (13), filter plate (14) outside and cleaning case (1) it is fixedly connected, cleaning case (1) left side slidably connects collecting box (15), and cleaning case (1) front end face is fixed to be connected It is connected to support plate (16), support plate (16) upper surface is fixedly connected with water pump (17).

2. a kind of automation silicon wafer cleaner according to claim 1, it is characterised in that: water pump (17) input terminal with Cleaning case (1) connection, water pump (17) output end are connected to cored slab (2).

3. a kind of automation silicon wafer cleaner according to claim 1, it is characterised in that: the Storing case (7) is by engraving Empty stainless steel wire is constituted, and Storing case (7) internal diameter and silicon wafer (9) are of same size.

4. a kind of automation silicon wafer cleaner according to claim 1, it is characterised in that: cored slab (2) quantity is Two, and cored slab (2) is about the symmetrical setting in Storing case (7) center, motor (12) the main shaft outside and seal box (11) it is rotatablely connected, seal box (11) right side is fixedly connected with cleaning case (1).

5. a kind of automation silicon wafer cleaner according to claim 1, it is characterised in that: the filter plate (14) is inclined Setting, filter plate (14) lower end surface and the be in angle of plane are 30 °, and the collecting box (15) is located at the upper of filter plate (14) Side, the input terminal end of the water pump (17) is located at the lower section of filter plate (14).