CN209281093U - A kind of project structured light mould group that polarization state is controllable and 3D imaging device - Google Patents
A kind of project structured light mould group that polarization state is controllable and 3D imaging device Download PDFInfo
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- CN209281093U CN209281093U CN201920063561.4U CN201920063561U CN209281093U CN 209281093 U CN209281093 U CN 209281093U CN 201920063561 U CN201920063561 U CN 201920063561U CN 209281093 U CN209281093 U CN 209281093U
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Abstract
The utility model discloses a kind of project structured light mould group that polarization state is controllable and has the project structured light mould group 3D imaging device, wherein project structured light mould group includes: laser vcsel array light source, the light-emitting surface of the laser vcsel array light source has high contrast light grid layer, the emergent light of each luminous point has consistent and controllable polarization state after high contrast grating layer；Diffraction optical element is matched with the polarization state, for replicating the emergent light and spreading outgoing.The utility model utilizes high contrast grating layer, making the emergent light of laser vcsel array light source has consistent and controllable polarization state, it effectively improves the utilization ratio of optical energy of entire 3D imaging device, project the uniformity of pattern, and the zero level brightness of projection pattern is effectively reduced, thus further improve the imaging precision of device.
Description
Technical field
The utility model relates to field of photoelectric technology, and in particular to a kind of project structured light mould group that polarization state is controllable and 3D
Imaging device.
Background technique
Different from traditional 2D imaging device, such as video camera can only obtain the plane 2D information of object, and 3D imaging device is also
The depth information of available object constructs a three-dimensional 3D model, therefore 3D imaging device is widely used in Industrial Measurement
Amount, part modeling, medical diagnosis, safety monitoring, machine vision, bio-identification, augmented reality AR, the fields such as Virtual Reality,
With great application value.
3D imaging device based on structured light technique is a kind of new technique device small in size, imaging precision is high, is had
Great business application potentiality have obtained a degree of application in consumption field of mobile phones at present.Such as publication number
The patent application document of CN206805630U provides a kind of structured light projection mould group based on VCSEL array light source, comprising:
VCSEL array light source, the VCSEL array light source include: that semiconductor substrate and at least two groups VCSEL subarray are arranged in
In semiconductor substrate, the VCSEL subarray is made of VCSEL light source；Diffraction optical element, the diffraction optical element packet
It includes: at least two diffraction optical element subelements；The diffraction optical element subelement respectively with the VCSEL subarray pair
It answers, for being projected outward after replicating the light beam of the light source transmitting of the VCSEL subarray with certain multiple.
VCSEL (vertical cavity surface emitting laser) array light source is since small in size, power is big, beam divergence angle is small, operation
The many advantages such as stable will be at the preferred light source of project structured light mould group.VCSEL light source array can be in an extremely small base
Laser projection, such as the cloth in the semiconductor substrate of 2mm × 2mm are carried out by way of arranging multiple VCSEL light sources on bottom
Set 100 even more VCSEL light sources.
Core in structure light 3 D imaging device is project structured light mould group, and structure light 3 D is imaged on current market
The emergent light of projective module group in device does not have the controllable characteristic of polarization state, therefore, projection low with utilization ratio of optical energy
The disadvantages of uniformity of pattern is poor, zero level is brighter brings a negative impact the accuracy of 3D imaging device.
Utility model content
The utility model provides a kind of project structured light mould group that polarization state is controllable, can effectively improve entire 3D imaging
The utilization ratio of optical energy of device, the uniformity for projecting pattern, and the zero level brightness of projection pattern is effectively reduced, thus
Further improve the imaging precision of device.
The specific technical solution that the utility model uses is as follows:
A kind of project structured light mould group that polarization state is controllable, comprising:
The light-emitting surface top of laser vcsel array light source, the laser vcsel array light source has high contrast grating
(HCG) layer, the emergent light of luminous point have consistent and controllable polarization state after high contrast grating (HCG) layer；
Diffraction optical element is matched with the polarization state of the emergent light, for replicating the emergent light and spreading outgoing.
The luminous point of above-mentioned laser vcsel array light source is to carry out arranged evenly, composition according to certain random pattern rule
Entire luminous point array.The light-emitting surface can be understood as the beam exit face of laser vcsel array light source, high contrast
Sub-wave length grating in grating (HCG) layer covers the luminous point array, a corresponding sub-wavelength above each luminous point
Grating microstructure, each subwavelength grating microstructures are identical consistent.
After high contrast grating (HCG) layer, polarization state will become the emergent light of the laser vcsel array light source
At controllable and consistent.Since high contrast grating layer has subwavelength grating microstructures, sub-wavelength period type and sub- wave are contained
Long Non-periodic Type two types, after subwavelength grating microstructures, the polarization direction of light will become the emergent light of the luminous point
It obtains consistent with the grid direction of subwavelength grating microstructures.
Preferably, the laser vcsel array light source includes the N electrode layer, substrate layer, N-type DBR set gradually
Layer, active layer, p-type DBR layer, P electrode layer and high contrast grating (HCG) layer, the P electrode layer etching light hole form described
Luminous point.
High contrast grating (HCG) layer is located at the surface of the p-type DBR layer.
Preferably, further including collimation lens, the light beam being emitted by the laser vcsel array light source is received, and quasi-
Directly enter the diffraction optical element for parallel light emergence.
Preferably, the collimation lens is single element lens or the lens group comprising multi-disc lens.
Preferably, the high contrast grating layer includes multiple sub-wavelengths corresponding with the luminous point quantity
Grating, for the emergent light of the luminous point after sub-wave length grating, the polarization direction of light will become grid with sub-wave length grating
Direction is consistent.
The shape of sub-wave length grating and the shape of lightening hole are consistent, such as use circular lightening hole, high contrast grating layer
Also contain the round sub-wave length grating (remarks: being not limited to circle, as long as lightening hole can be covered) of multiple separation, quantity and hair
Luminous point quantity is identical, and size is consistent or slightly larger with the light hole of luminous point, is just covered on the top of each luminous point,
The high contrast grating (HCG) is that the round sub-wave length grating of multiple separation of single layer is constituted, high refractive index
The refractive indices of region and region of low refractive index are very high, reach 2 or more, preferably, high refractive index is 3.59, low refraction
Rate is 1, ratio 3.59.The period of sub-wave length grating between 0~λ, changes, wherein λ is sharp with different system requirements
The emission wavelength of light vcsel array light source.The quantity of round sub-wave length grating is identical as luminous point quantity, size and luminous point
Light hole is consistent or slightly larger, is just covered on the top of each luminous point.
Preferably, the polarization state of the emergent light of the diffraction optical element and the laser vcsel array light source
Match, as using the polarization state of the emergent light of laser vcsel array light source as the parameter for designing the diffraction optical element.
In the utility model, the polarization state of the design of diffraction optical element, incident light is arranged and described laser vcsel gusts
The emergent light of column light source is consistent, therefore the diffraction optical element finally manufactured according to design, compared to the polarization of incident light
State is arranged consistent can not design with the emergent light of vcsel array light source, and uniformity can reduce by 9% or more, zero level
The brightness of pattern can reduce by 0.4% or more, and the efficiency of light energy utilization can be improved 10% or more.
The utility model also provides a kind of 3D imaging device, comprising:
The controllable project structured light mould group of above-mentioned polarization state is used for target projective structure light pattern；
Image receiver module, for obtaining the structured light patterns；
Computing module is handled, calculates depth information according to the structured light patterns.
Compared to the prior art, the utility model utilizes high contrast grating layer, makes the outgoing of laser vcsel array light source
Light has consistent and controllable polarization state, and when used diffraction optical element DOE is designed, the setting of used polarization state with
The outgoing polarization state of laser vcsel array light source is consistent, finally effectively raises the light energy benefit of entire 3D imaging device
With rate, the uniformity of pattern is projected, and effectively reduces the zero level brightness of projection pattern, thus further improves dress
The imaging precision set.
Detailed description of the invention
Fig. 1 is the 3D imaging device schematic diagram based on structured light technique；
Fig. 2 is a kind of optical principle schematic diagram of project structured light mould group that polarization state is controllable；
Fig. 3 is that the Dot array of laser vcsel array light source lists intention；
Fig. 4 is the vertical structure schematic diagram of conventional laser vcsel array light source；
Fig. 5 is the luminous point polarization state schematic diagram of conventional laser vcsel array light source；
Fig. 6 is a kind of vertical structure schematic diagram of laser vcsel array light source that polarization state is controllable；
Fig. 7 is the micro-structure schematic diagram of high contrast grating
Fig. 8 is a kind of luminous point polarization state schematic diagram of laser vcsel array light source that polarization state is controllable；
Fig. 9 is design simulation simulation result comparison table；
Specific embodiment
The utility model is described in detail below with reference to embodiment and attached drawing, but the utility model is not limited to that.
3D imaging device as shown in Figure 1, including project structured light mould group 100, image receiver module 200, processing operation
Module 300.Project structured light mould group 100 is used for target projective structure light pattern, image receiver module 200 (such as camera)
For obtaining the structured light patterns projected away, processing computing module 300 calculates depth information according to the structured light patterns of acquisition.
Work as actual object, such as when face is in 20cm-120cm range in front of the device, 3D imaging device starts to start work, finally
The 3D depth information of available front face.Wherein, project structured light mould group 100 includes laser vcsel array light source 10, standard
Straight lens 20 and diffraction optical element DOE 30.
The controllable project structured light mould group 100 of polarization state as shown in Figure 2 mainly includes laser vcsel array light source
10b, collimation lens 20,30 3 parts diffraction optical element DOE are spatially successively arranged according to sequence from left to right.
Wherein the luminous point array 1001 of the laser vcsel array light source 10b is come according to certain random pattern rule
Arranged evenly, the entire luminous point array 1001 of composition is referred to as pattern, as shown in the top view of Fig. 3.Such as Fig. 4, tradition
The vertical structure of laser vcsel array light source 10a be successively N electrode layer 101, substrate layer 102, N-type DBR layer from bottom to top
103, active layer 104, p-type DBR layer 105 and P electrode layer 106, wherein P electrode layer 106 will use lithographic technique etch it is multiple
Isolated hole constitutes above-mentioned luminous point array 1001.As shown in figure 5, the luminous point of such laser vcsel array light source 10a
The polarization state of array 1001, shoot laser is uncontrollable, i.e., the polarization direction of the emergent light of each luminous point is inconsistent, figure
Middle arrow represents polarization state.As shown in fig. 6, laser vcsel array light source 10b used in the present embodiment is more in vertical structure
One layer, referred to as high contrast grating (HCG) layer 107, positioned at the top of P electrode layer 106, this layer contains multiple isolated circles
Sub-wave length grating 1071, as shown in fig. 7, quantity is identical as luminous point quantity, size is consistent with the light hole of luminous point or slightly
Greatly, just it is covered on the top of each luminous point.The emergent light of each luminous point 1001 passes through the micro- knot of corresponding sub-wave length grating
After structure 1071, the polarization direction of light will become consistent with the grid direction of subwavelength grating microstructures 1071, therefore all outgoing
The polarization state of light will identify, and can become controllable with the design difference of subwavelength grating microstructures 1071.Such as Fig. 8
Shown is the polarization state schematic diagram for eventually passing through the emergent light of high contrast grating (HCG) layer 107, and arrow represents polarization in figure
State.
The high-refractive-index regions of sub-wave length grating 1071 and the refractive indices of region of low refractive index are very high, reach 2 or more,
Preferably, high refractive index is 3.59, and low-refraction 1, ratio 3.59.The period of sub-wave length grating between 0~λ,
Change with different system requirements, wherein λ is the emission wavelength of laser vcsel array light source.Laser vcsel array light source
For the emission wavelength of 10b in infrared band, the utility model is preferably 940nm wavelength, is invisible infrared light.Sub-wave length grating
Micro-structure 1071 contains sub-wavelength period type and sub-wavelength Non-periodic Type two types, and the utility model is preferably sub-wavelength week
Phase type.
The emergent light of laser vcsel array light source 10b is received by subsequent collimation lens 20, is converged to it, together
When make parallel light emergence, which does not change the polarization state of light.Collimation lens 20 can be a piece of lens, can also be with
It is the lens group comprising multi-disc lens.
The outgoing beam continuation of collimation lens 20 is propagated forward, by diffraction optical element DOE 30, the diffraction optics
The polarization state setting of the design of element, incident light is consistent with the emergent light of the laser vcsel array light source, therefore finally presses
The diffraction optical element manufactured according to design, compared to the emergent light of the polarization state setting and vcsel array light source of incident light
It consistent can not design, uniformity can reduce by 9% or more, and the brightness of zero level pattern can reduce by 0.4% or more, light
Energy utilization rate can be improved 10% or more.Incident beam is copied into multi beam pattern light beam by diffraction optical element DOE 30, so
Diffusion outgoing afterwards forms the multilevel pattern of space structure light, and light beam pattern is got on objects in front, to object shape
At the effect of structure light space encoding.Project structured light mould group 100 in ordinary construction light 3D imaging device, because of its laser
The polarization state of the emergent light of each luminous point of vcsel array light source 10a is unknown and inconsistent, therefore diffraction optical element DOE
30 in design, and the polarization state setting of incident light and the emergent light of vcsel array light source can not be consistent, i.e., can not be with laser
The outgoing polarization state of each luminous point of vcsel array light source 10a matches, cause utilization ratio of optical energy it is low, projection
The uniformity of pattern light beam is poor, the brightness of zero level pattern light beam is higher, finally hinders the 3D imaging of whole device
It can be promoted.
Design and simulation comparing result based on the present embodiment is as shown in Figure 9, it can be seen that the design 2 based on the present embodiment exists
Performance in terms of uniformity, zero level brightness, the efficiency of light energy utilization is obviously due to the design of traditional scheme 1.The wherein calculating of uniformity
Formula is as follows:
Wherein, MAX represents highest luminous intensity in all level pattern, and MIN represents minimum in all level pattern
Luminous intensity；
The foregoing is merely the preferable implementation examples of the utility model, are not intended to limit the utility model, all in this reality
Within novel spirit and principle, any modification, equivalent replacement, improvement and so on should be included in the guarantor of the utility model
Within the scope of shield.
Claims (7)
1. a kind of project structured light mould group that polarization state is controllable characterized by comprising
The light-emitting surface top of laser vcsel array light source, the laser vcsel array light source has high contrast grating layer, often
The emergent light of a luminous point has consistent and controllable polarization state after high contrast grating layer；
Diffraction optical element is matched with the polarization state of the emergent light, and the diffraction optical element is for replicating the emergent light
And spread outgoing.
2. the controllable project structured light mould group of polarization state as described in claim 1, which is characterized in that the laser vcsel
Array light source includes the N electrode layer set gradually, substrate layer, N-type DBR layer, active layer, p-type DBR layer, P electrode layer and high comparison
Grating layer is spent, the P electrode layer etching light hole forms the luminous point；
The high contrast grating layer is located at the surface of the p-type DBR layer.
3. the controllable project structured light mould group of polarization state as described in claim 1, which is characterized in that it further include collimation lens,
The light beam being emitted by the laser vcsel array light source is received, and collimating is that parallel light emergence enters the diffraction optics member
Part.
4. the controllable project structured light mould group of polarization state as claimed in claim 3, which is characterized in that the collimation lens is
Single element lens or lens group comprising multi-disc lens.
5. the controllable project structured light mould group of polarization state as described in claim 1, which is characterized in that the high contrast light
Grid layer includes multiple sub-wave length gratings corresponding with the luminous point quantity, and the emergent light of the luminous point passes through sub-wavelength light
After grid, the polarization direction of light will become consistent with the grid direction of sub-wave length grating.
6. the controllable project structured light mould group of polarization state as described in claim 1, which is characterized in that the matching refer to
The polarization state of laser vcsel array light source emergent light is as the parameter for designing the diffraction optical element.
7. a kind of 3D imaging device characterized by comprising
The controllable project structured light mould group of polarization state described in any one of claim 1~6 is used for target projective structure
Light pattern；
Image receiver module, for obtaining the structured light patterns；
Computing module is handled, calculates depth information according to the structured light patterns.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109541817A (en) * | 2019-01-15 | 2019-03-29 | 深圳市安思疆科技有限公司 | A kind of project structured light mould group that polarization state is controllable and 3D imaging device |
| CN117369197A (en) * | 2023-12-06 | 2024-01-09 | 深圳市安思疆科技有限公司 | 3D structure optical module, imaging system and method for obtaining depth map of target object |
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2019
- 2019-01-15 CN CN201920063561.4U patent/CN209281093U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109541817A (en) * | 2019-01-15 | 2019-03-29 | 深圳市安思疆科技有限公司 | A kind of project structured light mould group that polarization state is controllable and 3D imaging device |
| CN117369197A (en) * | 2023-12-06 | 2024-01-09 | 深圳市安思疆科技有限公司 | 3D structure optical module, imaging system and method for obtaining depth map of target object |
| CN117369197B (en) * | 2023-12-06 | 2024-05-07 | 深圳市安思疆科技有限公司 | 3D structure optical module, imaging system and method for obtaining depth map of target object |
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