CN208943583U - Photoresist filter - Google Patents
Photoresist filter Download PDFInfo
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- CN208943583U CN208943583U CN201821073829.4U CN201821073829U CN208943583U CN 208943583 U CN208943583 U CN 208943583U CN 201821073829 U CN201821073829 U CN 201821073829U CN 208943583 U CN208943583 U CN 208943583U
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- filter
- photoresist
- filter vat
- groove body
- hole
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Abstract
The utility model discloses a kind of photoresist filters.The photoresist filter includes groove body, slot cover and filter vat.The groove body has holding tank.The top of the groove body is arranged in the slot cover, and seals the receiving trough setting.The filter vat is accommodated in the holding tank.The filter vat connect setting with the groove body and/or the slot cover.The filter vat has cavity.The filter vat is provided with multiple filtering through-holes.The filtering through-hole is connected to the cavity and the holding tank.The photoresist filtration device structure is simplified and strainability is good.
Description
Technical field
The utility model relates to a kind of semiconductor processing equipment, especially a kind of photoresist filter.
Background technique
In semiconductor machining treatment process, the light-sensitive material using such as photoresist is generally required.Photoresist, also known as photoresist
Agent can be applied in many industrial process.After handling semiconductor component, generally require to carry out corresponding photoresist
Removing.Generally, the blocky light that volume is different, can not be dissolved in chemical pretreatment solution can be generated in carrying out photoresist stripping process
Resistance.The accumulation of blocky photoresist is easy to cause circulation line to block.
Utility model content
The purpose of this utility model first is that in order to overcome the shortcomings in the prior art, providing a kind of light that strainability is good
Hinder filter.
In order to achieve the above object, the utility model is achieved through the following technical solutions:
The utility model provides a kind of photoresist filter.The photoresist filter includes groove body, slot cover and filter vat.It is described
Groove body has holding tank.The top of the groove body is arranged in the slot cover, and seals the receiving trough setting.The filter vat
It is accommodated in the holding tank.The filter vat connect setting with the groove body and/or the slot cover.The filter vat, which has, to be held
Chamber.The filter vat is provided with multiple filtering through-holes.The filtering through-hole is connected to the cavity and the holding tank.
Preferably, the photoresist filter further includes the second filter vat.Second filter vat is arranged in the filtering
In the cavity of bucket.Second filter vat connect setting with the groove body and/or the slot cover.Second filter vat has the
Two cavities.The filter vat is provided with multiple second filtering through-holes.The second filtering through-hole is connected to second cavity and institute
State cavity.
Preferably, the density of the second filtering through-hole is greater than the density of the filtering through-hole.
Preferably, the top of second filter vat is removably disposed in the bottom end of slot cover.
Preferably, fluid injection through-hole is provided on the side wall of the groove body.The fluid injection through-hole is connected to the holding tank, with
It can import and mix the treatment fluid for having photoresist.The slot cover is provided with out fluid through-hole.The fluid through-hole out and second cavity connect
It is logical, the treatment fluid for having filtered out photoresist can be exported.
Preferably, discharge through-hole is provided on the bottom wall of the groove body.The discharge through-hole is connected to the holding tank, with
Photoresist can be discharged.
Preferably, the slot cover is provided with relief portion, can reduce the gas pressure intensity in the holding tank.
Preferably, the photoresist filter further includes liquid level sensor.The liquid level sensor is accommodated in the receiving
In slot, the treatment fluid height in the holding tank can be sensed.
Preferably, the top of the filter vat is removably disposed in the bottom end of the slot cover.
Preferably, the photoresist filter further includes the filter gaily decorated basket.The filter gaily decorated basket has accommodating cavity.It is described
The filter gaily decorated basket is arranged in the holding tank.The filter vat is arranged in the accommodating cavity of the filter gaily decorated basket.
Preferably, along the groove body, radially, spacing between the filter gaily decorated basket and the groove body is less than should
Spacing between the filter gaily decorated basket and the filter vat.
Compared with prior art, the utility model photoresist filter.The photoresist filter passes through filter vat and groove body
Cooperation, instead of traditional filter screen, not only overall structure is relatively simple, operate conveniently and strainability is good.Further, exist
The realization of the second filter vat is arranged in the filter vat again to filter again, to further promote strainability.
Detailed description of the invention
Fig. 1 is the schematic top plan view of photoresist filter provided by the utility model.
Fig. 2 is the three-dimensional cutaway view of the photoresist filter of Fig. 1.
Cross-sectional view of the photoresist filter along E-E line that Fig. 3 is Fig. 1.
Specific embodiment
The utility model is described in detail with reference to the accompanying drawing:
It please refers to Fig.1 to Fig.3, is a kind of photoresist filter 101 provided by the utility model.The photoresist filter
101 include groove body 10 and filter vat 20.The filter vat 20 is accommodated in the groove body 10, and may filter that photoresist.
The groove body 10 is used as containing component, for accommodating the other component of the photoresist filter 101.Specifically, institute
Groove body 10 is stated with holding tank 12.The holding tank 12 is for providing memory space.The concrete shape and ruler of the holding tank 12
As long as very little be capable of providing corresponding memory space.In the present embodiment, in order to promote filter efficiency, convenient assembling, institute
It is barrel-shaped for stating holding tank 12.It that is to say, the groove body 10 is barrel-like structure.Correspondingly, the top of the groove body 10 has and opens
Mouth 14.The groove body 10 can be metal integral piece or integrated through injection molding part.
The filter vat 20 is for the photoresist in filtering both chemical treatment fluid.The filter vat 20 is accommodated in the holding tank 12
It is interior.The filter vat 20 has cavity 22.The filter vat 20 has multiple filtering through-holes 24.The filtering through-hole 24 is connected to
The cavity 22 and the holding tank 12.Correspondingly, the filter vat 20 can be by the receiving by the filtering through-hole 24
The photoresist in chemical pretreatment solution in slot 12 is filtered.Correspondingly, at the chemistry by filtration treatment in the cavity 22
Reason liquid can be utilized.For example, the chemical pretreatment solution in the cavity 22 can be taken using corresponding pumping.In the present embodiment
In, the filter vat 20 is accommodated in the accommodating cavity 42 of following filter gailys decorated basket 40.For further convenient chemical pretreatment solution
Flowing, the filter vat 20 and the bottom interval of the groove body 10 are arranged.The filter vat 20 can be fixed at the slot
On the top 52 of lid 50.In the present embodiment, in order to facilitate that removing photoresist, the filter vat 20 is removable installed in described
Slot cover 50.
It is needed as long as the shape and size of the cavity 22 meet corresponding filtering.In the present embodiment, the appearance
Chamber 22 is cylindrical shape.Correspondingly, the filter vat 20 is drum construction.In order to facilitate that the filter vat 20 is maintained at preset
Position is without movement, and in the present embodiment, the top 25 of the filter vat 20 is arranged on the bottom end 52 of following slot covers 50.
In order to promote filter efficiency, in the present embodiment, the filter vat 20 is coaxially disposed with the groove body 10.It that is to say, the mistake
The center overlapping of axles of the central axis of lauter tub 20 and the groove body 10.
The distribution density of the filtering through-hole 24 selects as needed.In the present embodiment, it is chemically treated in order to balance
The density of the flowing velocity and strainability of liquid, the filtering through-hole 24 is tens of mesh.It that is to say, the filtering through-hole 24 is every
Distribution number on the area of square inch is dozens of
In order to further enhance strainability, the photoresist filter 101 further includes the second filter vat 30.Second mistake
Lauter tub 30 is arranged in the cavity 22 of the filter vat 20, is carried out further with the chemical pretreatment solution entered in the cavity 22
Photoresist filtering.Correspondingly, second filter vat 30 has the second cavity 32.Second filter vat 30 is provided with multiple
Two filtering through-holes 34.The second filtering through-hole 34 is connected to the cavity 22 of second cavity 32 and the filter vat 20.It is described
Second filter vat 30 can have shape and construction identical with the filter vat 20.Correspondingly, second filter vat 30 is
Drum construction.Second cavity 32 is barrel shape.Further, second filter vat 30 and the filter vat 20 are same
Axis setting.Second filter vat 30 can be fixed on the top 52 of the slot cover 50.In the present embodiment, for convenience
In removing photoresist, second filter vat 30 is removable installed in the slot cover 50.
The distribution density of the second filtering through-hole 34 selects as needed.In order to promote strainability, in this implementation
In example, the density of the second filtering through-hole 34 is greater than the density of the filtering through-hole 24 of the filter vat 20.More specifically, described
The density of second filtering through-hole 34 is mesh up to a hundred.It that is to say, the second filtering through-hole 34 is on the area of unit square inch
The number of distribution is up to a hundred.
In order to further enhance strainability, the photoresist filter 101 further includes the filter gaily decorated basket 40.The filter
The gaily decorated basket 40 has accommodating cavity 42.The filter gaily decorated basket 40 is arranged in the holding tank 12 of the groove body 10.The filter vat 20
It is arranged in the accommodating cavity 42 of the filter gaily decorated basket 40.The filter gaily decorated basket 40 can carry out mistake first to chemical pretreatment solution
Filter, then passes sequentially through the filter vat 20, second filter vat 30 is filtered chemical pretreatment solution.In order to promote filtering
Performance, the spacing between the radial direction along the groove body 10, the filter gaily decorated basket 40 and the groove body 10 are less than the mistake
Spacing between the filter gaily decorated basket 40 and the filter vat 20.That is to say, the filter gaily decorated basket 40 close to the groove body 10 and
Far from the filter vat 20.In order to facilitate that promoting the firm performance of the filter gaily decorated basket 40, the filter gaily decorated basket 40 can
To be connected to the top of the groove body 10 by fastener (not shown).In the radial direction along the groove body 10, part
Or all the filter gaily decorated basket 40 can contact setting with the groove body 10.
In order to facilitate dismounting, lift-off seal performance, the photoresist filter 101 further includes slot cover 50.The slot cover 50 is set
It sets at the top of the groove body 10, and seals 10 ground of the groove body setting.It that is to say, the slot cover 50 seals the holding tank 12
In the opening that the top of the groove body 10 is formed.In the present embodiment, the lid of the slot cover 50 substantially circular plate type.More specifically
Ground, the bottom end 52 of the slot cover 50 are used to support the filter vat 20 and second filter vat 30.In the present embodiment, described
Slot cover 50 is removably disposed.Correspondingly, the slot cover 50 can be opened, seal 12 ground of the holding tank setting.The slot cover
50 can be arranged in any way on the groove body 10, for example hingedly, buckle snapping etc..In the present embodiment, in order to enhance
Sealing performance, the slot cover 50 are fastenedly connected by four wing nuts with the groove body 10.Four wing nuts are each other
It is evenly spaced on.In order to further enhance sealing performance, setting is having sealing between the slot cover 50 and the groove body 10
Circle.It that is to say, the slot cover 50 enhances sealing performance by the O-ring seals of such as rubber material with the groove body 10.
Fluid injection through-hole 61 is provided on the side wall 11 of the groove body 10.The fluid injection through-hole 61 connects with the holding tank 12
It is logical, the treatment fluid for having photoresist is mixed can import.The slot cover 50 is provided with out fluid through-hole 63.It is described go out fluid through-hole 63 with it is described
Second cavity 32 connection, the treatment fluid for having filtered out photoresist can be exported.Correspondingly, mixing has the treatment fluid of photoresist can be around
10 11 inner surface of side wall circulation, and sequentially enter the filter vat 20, second filter vat 30 is filtered, then may be used
To be discharged in the second cavity 32 of the second filter vat 30 by external pump by the fluid through-hole 63 that goes out of the slot cover 50
The treatment fluid of photoresist is filtered out.
Further, discharge through-hole 65 is provided on the bottom wall 13 of the groove body 10.The discharge through-hole 65 and the appearance
Slot 12 of receiving connection, the photoresist being filtered can be discharged.
Further, relief portion is provided in the slot cover 50.The relief portion is for being discharged in the holding tank 12
Gas avoids the 10 internal gas pressure of groove body excessive from while guaranteeing the gas tightness of the groove body 10.It is described
Relief portion can be with safety-valve.
Further, the photoresist filter 101 further includes liquid level sensor 70.The liquid level sensor 70 is accommodated in
In the holding tank 12.Specifically, the liquid level sensor 70 is arranged on the inner surface of the side wall 11 of the groove body 10.More
Body, two liquid level sensors 70 are separately positioned on 11 bottom and top of the side wall of the groove body 10, to be promoted at sensing
Manage the accuracy of liquid.
It should be noted that as without particularly pointing out, occur in the present invention " upper and lower ", " left and right ", " push up,
Bottom ", " axial, radial " are relative concept.Wherein, " axial direction " is the depth direction of the holding tank 12 of the groove body 10；" diameter
To " it is the direction vertical with " axial direction ".Correspondingly, up and down direction is the up and down direction shown in Fig. 3.
The above is only the utility model preferred embodiments, are not used to the limitation protection scope of the utility model, any
Modification, equivalent replacement or improvement within the spirit of the present invention etc. are all covered in the scope of the claims of the utility model.
Claims (11)
1. a kind of photoresist filter characterized by comprising
Groove body, the groove body have holding tank；
The top of the groove body is arranged in slot cover, the slot cover, and seals the receiving trough setting；And
Filter vat, the filter vat are accommodated in the holding tank；The filter vat is connect with the groove body and/or the slot cover
Setting；
The filter vat has cavity；The filter vat is provided with multiple filtering through-holes；The filtering through-hole is connected to the cavity
With the holding tank.
2. photoresist filter according to claim 1, which is characterized in that further include:
Second filter vat, second filter vat are arranged in the cavity of the filter vat；Second filter vat and the slot
Body and/or slot cover connection setting；
Second filter vat has the second cavity；The filter vat is provided with multiple second filtering through-holes；
The second filtering through-hole is connected to second cavity and the cavity.
3. photoresist filter according to claim 2, it is characterised in that:
The density of the second filtering through-hole is greater than the density of the filtering through-hole.
4. photoresist filter according to claim 2, it is characterised in that:
The top of second filter vat is removably disposed in the bottom end of slot cover.
5. photoresist filter according to claim 2, it is characterised in that:
Fluid injection through-hole is provided on the side wall of the groove body；The fluid injection through-hole is connected to the holding tank, is mixed with that can import
There is the treatment fluid of photoresist；
The slot cover is provided with out fluid through-hole；The fluid through-hole out is connected to second cavity, has filtered out photoresist can export
Treatment fluid.
6. photoresist filter according to claim 1, it is characterised in that:
Discharge through-hole is provided on the bottom wall of the groove body；The discharge through-hole is connected to the holding tank, photoresist can be discharged.
7. photoresist filter according to claim 1, it is characterised in that:
The slot cover is provided with relief portion, can reduce the gas pressure intensity in the holding tank.
8. photoresist filter according to claim 1, which is characterized in that further include:
Liquid level sensor, the liquid level sensor are accommodated in the holding tank, can sense the treatment fluid in the holding tank
Highly.
9. photoresist filter according to claim 1, it is characterised in that:
The top of the filter vat is removably disposed in the bottom end of the slot cover.
10. photoresist filter according to claim 1, which is characterized in that further include:
The filter gaily decorated basket, the filter gaily decorated basket have accommodating cavity；
The filter gaily decorated basket is arranged in the holding tank；
The filter vat is arranged in the accommodating cavity of the filter gaily decorated basket.
11. photoresist filter according to claim 10, it is characterised in that:
Along the groove body radially, spacing between the filter gaily decorated basket and the groove body be less than the filter gaily decorated basket with
Spacing between the filter vat.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2017217964075 | 2017-12-20 | ||
| CN201721796407 | 2017-12-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208943583U true CN208943583U (en) | 2019-06-07 |
Family
ID=66731746
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821073829.4U Active CN208943583U (en) | 2017-12-20 | 2018-07-06 | Photoresist filter |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN208943583U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108704355A (en) * | 2017-12-20 | 2018-10-26 | 新阳硅密（上海）半导体技术有限公司 | Photoresist filter |
-
2018
- 2018-07-06 CN CN201821073829.4U patent/CN208943583U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108704355A (en) * | 2017-12-20 | 2018-10-26 | 新阳硅密（上海）半导体技术有限公司 | Photoresist filter |
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