CN108176108A - Photoresist filter - Google Patents
Photoresist filter Download PDFInfo
- Publication number
- CN108176108A CN108176108A CN201711385436.7A CN201711385436A CN108176108A CN 108176108 A CN108176108 A CN 108176108A CN 201711385436 A CN201711385436 A CN 201711385436A CN 108176108 A CN108176108 A CN 108176108A
- Authority
- CN
- China
- Prior art keywords
- filter
- photoresist
- filter vat
- groove body
- capping
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 58
- 238000001914 filtration Methods 0.000 claims abstract description 32
- 239000012530 fluid Substances 0.000 claims description 25
- 239000007788 liquid Substances 0.000 claims description 11
- 238000002347 injection Methods 0.000 claims description 6
- 239000007924 injection Substances 0.000 claims description 6
- 230000008676 import Effects 0.000 claims description 3
- 239000000126 substance Substances 0.000 description 7
- 239000000243 solution Substances 0.000 description 6
- 238000009826 distribution Methods 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
- B01D29/11—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with bag, cage, hose, tube, sleeve or like filtering elements
- B01D29/31—Self-supporting filtering elements
- B01D29/33—Self-supporting filtering elements arranged for inward flow filtration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
- B01D29/50—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition
- B01D29/56—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition in series connection
- B01D29/58—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition in series connection arranged concentrically or coaxially
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D35/00—Filtering devices having features not specifically covered by groups B01D24/00 - B01D33/00, or for applications not specifically covered by groups B01D24/00 - B01D33/00; Auxiliary devices for filtration; Filter housing constructions
- B01D35/30—Filter housing constructions
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Abstract
The invention discloses a kind of photoresist filters.The photoresist filter includes groove body, capping and filter vat.The groove body has holding tank.The capping is arranged on the top of the groove body, and seals the receiving trough setting.The filter vat is accommodated in the holding tank.The filter vat connect setting with the groove body and/or the capping.The filter vat has cavity volume.The filter vat is provided with multiple filtering through-holes.The filtering through-hole connects the cavity volume and the receiving trough setting.The photoresist filtration device structure is simplified and strainability is good.
Description
Technical field
The present invention relates to a kind of semiconductor processing equipment, particularly a kind of photoresist filter.
Background technology
In semiconductor machining processing procedure, the light-sensitive material using such as photoresist is generally required.Photoresist, also known as photoresist
Agent can be applied in many industrial process.After semiconductor device is handled, generally require to carry out corresponding photoresist
Stripping.Usually, the blocky light that volume differs, can not be dissolved in chemical pretreatment solution can be generated in photoresist stripping process is carried out
Resistance.The accumulation of blocky photoresist is easy to cause circulation line blocking.
Invention content
An object of the present invention is to overcome deficiency of the prior art, provides a kind of strainability good photoresist mistake
Filter.
In order to achieve the above object, the invention is realized by the following technical scheme：
The present invention provides a kind of photoresist filter.The photoresist filter includes groove body, capping and filter vat.The groove body
With holding tank.The capping is arranged on the top of the groove body, and seals the receiving trough setting.The filter vat houses
In the holding tank.The filter vat connect setting with the groove body and/or the capping.The filter vat has cavity volume.
The filter vat is provided with multiple filtering through-holes.The filtering through-hole connects the cavity volume and the receiving trough setting.
Preferably, the photoresist filter further includes the second filter vat.Second filter vat is arranged on the filtering
In the cavity volume of bucket.Second filter vat connect setting with the groove body and/or the capping.Second filter vat has the
Two cavity volumes.The filter vat is provided with multiple second filtering through-holes.The second filtering through-hole connects second cavity volume and institute
It sets with stating cavity volume.
Preferably, the density of the second filtering through-hole is more than the density of the filtering through-hole.
Preferably, the top of second filter vat is removably disposed in the bottom end of capping.
Preferably, it is provided with fluid injection through-hole on the side wall of the groove body.The fluid injection through-hole is connected with the holding tank, with
It can import and mix the treatment fluid for having photoresist.The capping is provided with out fluid through-hole.It is described go out fluid through-hole and second cavity volume connect
It is logical, the treatment fluid for having filtered out photoresist can be exported.
Preferably, it is provided with discharge through-hole on the bottom wall of the groove body.The discharge through-hole is connected with the holding tank, with
Photoresist can be discharged.
Preferably, the capping is provided with relief portion, can mitigate the gas pressure intensity in the holding tank.
Preferably, the photoresist filter further includes liquid level sensor.The liquid level sensor is accommodated in the receiving
In slot, the treatment fluid height in the holding tank can be sensed.
Preferably, the top of the filter vat is removably disposed in the bottom end of the capping.
Preferably, the photoresist filter further includes the filter gaily decorated basket.The filter gaily decorated basket has accommodating cavity.It is described
The filter gaily decorated basket is arranged in the holding tank.The filter vat is arranged in the accommodating cavity of the filter gaily decorated basket.
Preferably, radially, this is being smaller than between the filter gaily decorated basket and the groove body along the groove body
Spacing between the filter gaily decorated basket and the filter vat.
Compared with prior art, photoresist filter of the present invention.The photoresist filter by the cooperation of filter vat and groove body,
Instead of traditional filter screen, not only overall structure is relatively simple, operation is convenient and strainability is good.Further, described
The realization of the second filter vat is set to filter again in filter vat again, so as to further promote strainability.
Description of the drawings
Fig. 1 is the schematic top plan view of photoresist filter provided by the invention.
Fig. 2 is the three-dimensional cutaway view of the photoresist filter of Fig. 1.
Fig. 3 is sectional view of the photoresist filter of Fig. 1 along E-E lines.
Specific embodiment
The present invention is described in detail below in conjunction with the accompanying drawings：
It please refers to Fig.1 to Fig.3, is a kind of photoresist filter 101 provided by the invention.The photoresist filter 101 wraps
Include groove body 10 and filter vat 20.The filter vat 20 is accommodated in the groove body 10, and may filter that photoresist.
The groove body 10 is used as containing component, for accommodating the other component of the photoresist filter 101.Specifically, institute
Groove body 10 is stated with holding tank 12.The holding tank 12 is used to provide memory space.The concrete shape and ruler of the holding tank 12
As long as very little be capable of providing corresponding memory space.In the present embodiment, in order to promote filter efficiency, convenient assembling, institute
It is barrel-shaped to state holding tank 12.It that is to say, the groove body 10 is barrel-like structure.Correspondingly, the top of the groove body 10 has and opens
Mouth 14.The groove body 10 can be metal integral piece or integrated through injection molding part.
The filter vat 20 is for the photoresist in filtering both chemical treatment fluid.The filter vat 20 is accommodated in the holding tank 12
It is interior.The filter vat 20 has cavity volume 22.The filter vat 20 has multiple filtering through-holes 24.The filtering through-hole 24 connects institute
Cavity volume 22 is stated to set with 12 ground of holding tank.Correspondingly, the filter vat 20 can be by described in by the filtering through-hole 24
The photoresist in chemical pretreatment solution in holding tank 12 is filtered.Correspondingly, the change by filtration treatment in the cavity volume 22
Learning treatment fluid can be utilized.For example, corresponding pumping may be used and take chemical pretreatment solution in the cavity volume 22.In this reality
It applies in example, the filter vat 20 is accommodated in the accommodating cavity 42 of following filter gailys decorated basket 40.At further convenient chemistry
The flowing of liquid is managed, the bottom interval of the filter vat 20 and the groove body 10 is set.The filter vat 20 can be fixed at institute
It states on the top 52 of capping 50.In the present embodiment, in order to facilitate that removing photoresist, the filter vat 20 is removable installed in
The capping 50.
As long as the shape and size of the cavity volume 22 meet corresponding filtering needs.In the present embodiment, the appearance
Chamber 22 is cylindrical shape.Correspondingly, the filter vat 20 is constructed for drum.In order to facilitate that the filter vat 20 is maintained at preset
Position is without movement, and in the present embodiment, the top 25 of the filter vat 20 is arranged on the bottom end 52 of following cappings 50.
In order to promote filter efficiency, in the present embodiment, the filter vat 20 is coaxially disposed with the groove body 10.It that is to say, the mistake
The center overlapping of axles of the central shaft of lauter tub 20 and the groove body 10.
The distribution density of the filtering through-hole 24 selects as needed.In the present embodiment, it is chemically treated in order to balance
The flowing velocity and strainability of liquid, the density of the filtering through-hole 24 is tens of mesh.It that is to say, the filtering through-hole 24 is every
Distribution number on the area of square inch is dozens of
In order to further enhance strainability, the photoresist filter 101 further includes the second filter vat 30.Second mistake
Lauter tub 30 is arranged in the cavity volume 22 of the filter vat 20, is carried out further with the chemical pretreatment solution entered in the cavity volume 22
Photoresist filters.Correspondingly, second filter vat 30 has the second cavity volume 32.Second filter vat 30 is provided with multiple second
Filter through-hole 34.The second filtering through-hole 34 connects 22 ground of the cavity volume setting of second cavity volume 32 and the filter vat 20.
Second filter vat 30 can have the shape and construction identical with the filter vat 20.Correspondingly, second filter vat
30 construct for drum.Second cavity volume 32 is barrel shape.Further, second filter vat 30 and the filter vat 20
Coaxial arrangement.Second filter vat 30 can be fixed on the top 52 of the capping 50.In the present embodiment, in order to just
Conducive to photoresist is removed, second filter vat 30 is removable installed in the capping 50.
The distribution density of the second filtering through-hole 34 selects as needed.In order to promote strainability, in this implementation
In example, the density of the second filtering through-hole 34 is more than the density of the filtering through-hole 24 of the filter vat 20.It is more specifically, described
The density of second filtering through-hole 34 is mesh up to a hundred.It that is to say, the second filtering through-hole 34 is on the area of unit square inch
The number of distribution is up to a hundred.
In order to further enhance strainability, the photoresist filter 101 further includes the filter gaily decorated basket 40.The filter
The gaily decorated basket 40 has accommodating cavity 42.The filter gaily decorated basket 40 is arranged in the holding tank 12 of the groove body 10.The filter vat 20
It is arranged in the accommodating cavity 42 of the filter gaily decorated basket 40.The filter gaily decorated basket 40 can carry out mistake first to chemical pretreatment solution
Filter, then passes sequentially through the filter vat 20, second filter vat 30 is filtered chemical pretreatment solution.In order to promote filtering
Performance is smaller than the mistake between the radial direction along the groove body 10, the filter gaily decorated basket 40 and the groove body 10
Spacing between the filter gaily decorated basket 40 and the filter vat 20.It that is to say, the filter gaily decorated basket 40 is remote close to the groove body 10
From the filter vat 20.In order to facilitate that promote the firm performance of the filter gaily decorated basket 40, the filter gaily decorated basket 40 can be with
The top of the groove body 10 is connected to by fastener (not shown).In the radial direction along the groove body 10, part or
All the filter gaily decorated basket 40 can contact setting with the groove body 10.
In order to facilitate dismounting, lift-off seal performance, the photoresist filter 101 further includes capping 50.The capping 50 is set
It puts at the top of the groove body 10, and seals 10 ground of the groove body setting.It that is to say, the capping 50 seals the holding tank 12
In the opening that the top of the groove body 10 is formed.In the present embodiment, the lid of the capping 50 substantially circular plate type.More specifically
Ground, the bottom end 52 of the capping 50 are used to support the filter vat 20 and second filter vat 30.In the present embodiment, it is described
Capping 50 is removably disposed.Correspondingly, the capping 50 can be opened, seal 12 ground of the holding tank setting.The capping
50 can be arranged in any way on the groove body 10, for example hinged, buckle snapping etc..In the present embodiment, in order to enhance
Sealing performance, the capping 50 are fastenedly connected by four wing nuts and the groove body 10.Four wing nuts are each other
It is evenly spaced on.In order to further enhance sealing performance, sealing ring has been arranged between the capping 50 and the groove body 10.
It that is to say, the capping 50 enhances sealing performance with the groove body 10 by the O-ring seals of such as rubber material.
Fluid injection through-hole 61 is provided on the side wall 11 of the groove body 10.The fluid injection through-hole 61 connects with the holding tank 12
It is logical, mix the treatment fluid for having photoresist can import.The capping 50 is provided with out fluid through-hole 63.It is described go out fluid through-hole 63 with it is described
Second cavity volume 32 connects, can export the treatment fluid for having filtered out photoresist.Correspondingly, the treatment fluid that mixing has photoresist can be surround
10 11 inner surface of side wall circulation, and sequentially enter the filter vat 20, second filter vat 30 is filtered, Ran Houke
To be discharged in the second cavity volume 32 of the second filter vat 30 by the fluid through-hole 63 that goes out of the capping 50 by external pump
The treatment fluid of photoresist is filtered out.
Further, it is provided with discharge through-hole 65 on the bottom wall 13 of the groove body 10.The discharge through-hole 65 and the appearance
Slot 12 of receiving connects, can discharge the photoresist being filtered.
Further, it is provided with relief portion in the capping 50.The relief portion is used to discharge in the holding tank 12
Gas avoids the 10 internal gas pressure of groove body excessive from while the gas tightness for ensureing the groove body 10.It is described
Relief portion can be with safety-valve.
Further, the photoresist filter 101 further includes liquid level sensor 70.The liquid level sensor 70 is accommodated in institute
It states in holding tank 12.Specifically, the liquid level sensor 70 is arranged on the inner surface of the side wall 11 of the groove body 10.More specifically
Ground, two liquid level sensors 70 are separately positioned on 11 bottom and top of the side wall of the groove body 10, to promote sense process
The accuracy of liquid.
It should be noted that as without particularly pointing out, " upper and lower ", " left and right ", " top, bottom ", " axis that occur in the present invention
To, radially " be relative concept.Wherein, the depth direction of " axial direction " for the holding tank 12 of the groove body 10；" radial direction " be with
" axial direction " vertical direction.Correspondingly, upper and lower directions is the upper and lower directions shown in Fig. 3.
It these are only preferred embodiments of the present invention, be not used to limitation protection scope of the present invention, it is any in the present invention
Modification, equivalent replacement or improvement in spirit etc., all cover in scope of the presently claimed invention.
Claims (11)
1. a kind of photoresist filter, which is characterized in that including：
Groove body, the groove body have holding tank；
Capping, the capping are arranged on the top of the groove body, and seal the receiving trough setting；And
Filter vat, the filter vat are accommodated in the holding tank；The filter vat is connect with the groove body and/or the capping
Setting；
The filter vat has cavity volume；The filter vat is provided with multiple filtering through-holes；The filtering through-hole connects the cavity volume
With the receiving trough setting.
2. photoresist filter according to claim 1, which is characterized in that further include：
Second filter vat, second filter vat are arranged in the cavity volume of the filter vat；Second filter vat and the slot
Body and/or capping connection setting；
Second filter vat has the second cavity volume；The filter vat is provided with multiple second filtering through-holes；
The second filtering through-hole connects second cavity volume and is set with the cavity volume.
3. photoresist filter according to claim 2, it is characterised in that：
The density of the second filtering through-hole is more than the density of the filtering through-hole.
4. photoresist filter according to claim 2, it is characterised in that：
The top of second filter vat is removably disposed in the bottom end of capping.
5. photoresist filter according to claim 2, it is characterised in that：
Fluid injection through-hole is provided on the side wall of the groove body；The fluid injection through-hole is connected with the holding tank, is mixed with that can import
There is the treatment fluid of photoresist；
The capping is provided with out fluid through-hole；It is described go out fluid through-hole connected with second cavity volume, filtered out photoresist can export
Treatment fluid.
6. photoresist filter according to claim 1, it is characterised in that：
Discharge through-hole is provided on the bottom wall of the groove body；The discharge through-hole is connected with the holding tank, can discharge photoresist.
7. photoresist filter according to claim 1, it is characterised in that：
The capping is provided with relief portion, can mitigate the gas pressure intensity in the holding tank.
8. photoresist filter according to claim 1, which is characterized in that further include：
Liquid level sensor, the liquid level sensor are accommodated in the holding tank, can sense the treatment fluid in the holding tank
Highly.
9. photoresist filter according to claim 1, it is characterised in that：
The top of the filter vat is removably disposed in the bottom end of the capping.
10. photoresist filter according to claim 1, which is characterized in that further include：
The filter gaily decorated basket, the filter gaily decorated basket have accommodating cavity；
The filter gaily decorated basket is arranged in the holding tank；
The filter vat is arranged in the accommodating cavity of the filter gaily decorated basket.
11. photoresist filter according to claim 10, it is characterised in that：
Along the groove body radially, between the filter gaily decorated basket and the groove body be smaller than the filter gaily decorated basket with
Spacing between the filter vat.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711385436.7A CN108176108A (en) | 2017-12-20 | 2017-12-20 | Photoresist filter |
| CN201810737390.9A CN108704355A (en) | 2017-12-20 | 2018-07-06 | Photoresist filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711385436.7A CN108176108A (en) | 2017-12-20 | 2017-12-20 | Photoresist filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108176108A true CN108176108A (en) | 2018-06-19 |
Family
ID=62546594
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711385436.7A Withdrawn CN108176108A (en) | 2017-12-20 | 2017-12-20 | Photoresist filter |
| CN201810737390.9A Pending CN108704355A (en) | 2017-12-20 | 2018-07-06 | Photoresist filter |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810737390.9A Pending CN108704355A (en) | 2017-12-20 | 2018-07-06 | Photoresist filter |
Country Status (1)
| Country | Link |
|---|---|
| CN (2) | CN108176108A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114716082A (en) * | 2022-05-10 | 2022-07-08 | 易俐特自动化技术股份有限公司 | Low-energy-consumption rapid-sterilization ship ballast water treatment equipment |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT8846845A0 (en) * | 1988-05-10 | 1988-05-10 | Universal Filter Spa | DISPOSABLE FILTERING UNIT FOR TRIPLE FILTRATION OIL |
| US8034237B2 (en) * | 2007-12-17 | 2011-10-11 | Dolores J. Happel, legal representative | Backwashing filter basket |
| CN201164756Y (en) * | 2008-02-04 | 2008-12-17 | 杨太希 | Filtering bottle |
| TWI432306B (en) * | 2008-07-08 | 2014-04-01 | Gala Inc | Method and apparatus to achieve formulation and reactive polymerization utilizing a thermally and atmospherically controlled feeding system for thermoplastic materials |
| US20120312759A1 (en) * | 2011-06-13 | 2012-12-13 | Caterpillar, Inc. | System and Method for Pre-Cleaning Fuel |
| CN202569777U (en) * | 2012-05-04 | 2012-12-05 | 林有腾 | Fluid filtering device |
| JP6311956B2 (en) * | 2013-07-17 | 2018-04-18 | パナソニックＩｐマネジメント株式会社 | Cleaning liquid, cleaning device and cleaning method for resist stripping filter |
| CN204219870U (en) * | 2014-10-27 | 2015-03-25 | 宿迁太合生态园林发展有限公司 | A kind of natural pond liquid filter vat |
| CN204865238U (en) * | 2015-07-08 | 2015-12-16 | 汇胜集团股份有限公司 | Filter water pitcher |
| CN206355672U (en) * | 2016-09-26 | 2017-07-28 | 山东瑞生药用辅料有限公司 | A kind of bag filter for producing esters medicine auxiliary material |
| CN208943583U (en) * | 2017-12-20 | 2019-06-07 | 新阳硅密（上海）半导体技术有限公司 | Photoresist filter |
-
2017
- 2017-12-20 CN CN201711385436.7A patent/CN108176108A/en not_active Withdrawn
-
2018
- 2018-07-06 CN CN201810737390.9A patent/CN108704355A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114716082A (en) * | 2022-05-10 | 2022-07-08 | 易俐特自动化技术股份有限公司 | Low-energy-consumption rapid-sterilization ship ballast water treatment equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108704355A (en) | 2018-10-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WW01 | Invention patent application withdrawn after publication |
Application publication date: 20180619 |
|
| WW01 | Invention patent application withdrawn after publication |