CN208879177U

CN208879177U - Cleaning device after QPQ production line

Info

Publication number: CN208879177U
Application number: CN201820817124.2U
Authority: CN
Inventors: 侯永松
Original assignee: CHENGDU SHENGXIANG TECHNOLOGY Co Ltd
Current assignee: CHENGDU SHENGXIANG TECHNOLOGY Co Ltd
Priority date: 2018-05-29
Filing date: 2018-05-29
Publication date: 2019-05-21
Anticipated expiration: 2028-05-29

Abstract

The utility model provides cleaning device after QPQ production line, including producing the cooling bath and potcher that carry out being sequentially arranged on direction in technique, wherein, the cooling bath and potcher are structure as a whole, the cooling bath and potcher are that a groove body is formed by the way that partition is arranged, and the divider height is not higher than the height of the groove body.A kind of rear cleaning device is also provided, at cooling bath back, exhausting system is set, or spray system is respectively provided in the cooling bath and potcher, sink is left into before next sink in product, spray prerinse is carried out to product, the sewage of a rinse bath can be effectively reduced as product enters next rinse bath.Excess flow is big between each rinse bath of the rear cleaning device, working environment effectively can be discharged in the vapor generated in cooling bath, avoid impacting production, and can effectively reduce the sewage of a rinse bath as product enters next rinse bath.

Description

Cleaning device after QPQ production line

Technical field

The utility model belongs to cleaning equipment field, and specifically, the utility model relates to dress is cleaned after QPQ production line It sets.

Background technique

QPQ(Quench-Polish-Quench) the technique beginning of the nineties in last century enters China, till now whole nation estimation There are thousands of QPQ production lines.Since the technology investment is at low cost, technical threshold is relatively low, before some places The improvement of environmental protection is required also without strict implement, therefore the production waste water treatment of domestic many QPQ techniques is to be in not administer Or improvement is not scientific, discharges state not up to standard.As the Environmental Protection Situation in China is more and more severeer, we are to QPQ technique Production discharge of wastewater administer the stage of necessary improvement of having arrived.

QPQ technology is substantially a kind of salt bath nitrocarburizing technique, is a kind of metal surface treatment technology, origin Hypertoxic " cyaniding " technique that has in Soviet Union's period can be traced, later technological development improvement eliminates the hypertoxic cyanide in technique, Till now, strictly by process execute QPQ technique without severe toxicity cyanide discharge, have in environmental protection it is huge into Step.But QPQ technique, as a kind of salt bath metal surface treatment technology, preceding cleaning and rear cleaning are its essential technique rings Section, therefore, the processing and discharge for cleaning waste water are the unavoidable the difficult problem of environmental protection of QPQ technique, and QPQ industry is badly in need of solution at present Certainly the problem of.

In QPQ technique, the major pollutants of preceding cleaning waste water have: metal cleaning oil dirt, metal cleaner residue and mud Sand material, the rear major pollutants for cleaning waste water have: various Nacls: carbonate, Nitrates, the greening eye of kalium ion and natrium ion Tear etc., ferriferous oxide, iron-nitride, silt substance and vapor.

As it can be seen that the front and back cleaning in QPQ production process is the main source for producing waste water, the main pollution in waste water at Part is natrium potassium salt class (carbonate, chlorate, nitrate), iron-nitride ferriferous oxide and drift etc..These natrium potassium salt classes Composition is completely soluble in water, i.e., cannot precipitate, and can not also filter, and dense, and commonsense method is difficult to divide it from water From, therefore it is according to traditional scheme (such as film filtering) that QPQ production waste water environmental protection treatment is up to standard, cost is very high.

The cleaning process of coming out of the stove of QPQ technique carries out in rear cleaning device.Currently, rear cleaning device is that independent groove body is spelled It picks up and, and overflow hole is set between groove body, overflow is realized by pipeline.Using overflow hole, excess flow is small, is easy to make slot Cleaning solution in body spills into working environment.

On the other hand, current rear cleaning device, since product enters cooling bath after high-temperature heating, in cooling bath meeting A large amount of vapor are generated, although vapor itself, to harmless, for QPQ technique, vapor is unfavorable for producing.

On the other hand, current rear cleaning device, the sewage in previous rinse bath are easy to enter next slot with product, The cleaning solution of next slot is polluted, cleaning effect may be will affect.

Utility model content

Firstly, this is practical in order to solve the problems, such as that excess flow is small between each rinse bath of rear cleaning device in the prior art A kind of novel cleaning device after providing QPQ production line, the rear cleaning device, excess flow is big between each rinse bath.

In order to reach the goals above, the utility model adopts the following technical solution: cleaning device after QPQ production line, The cooling bath and potcher that are sequentially arranged on direction are carried out including producing in technique, wherein the cooling bath and potcher are one Body structure, the cooling bath and potcher are that a groove body is formed by the way that partition is arranged, and the divider height is not higher than the slot The height of body.

Preferably, overflow launder is set on the outside of cooling bath, and setting height is identical in cooling bath water level line.

Any of the above-described scheme is preferably, the setting of overflow launder height be lower than the cooling bath and the potcher it The minimum constructive height of spacing board.

Any of the above-described scheme is preferably, and exhausting system is arranged at the cooling bath back.

Any of the above-described scheme is preferably, and the exhausting system includes suction opening, air draft pipe and exhaust fan, the exhausting Mouth is arranged above cooling bath water level line, and described air draft pipe one end connects the suction opening, and the other end connects exhaust fan, exhausting Machine setting is connected on plant gas discharge outlet, and production environment is discharged in vapor.

Any of the above-described scheme is preferably, the suction opening be it is horn-like, be less than far from cooling bath one end diameter close to cold But the diameter of slot one end.

Any of the above-described scheme is preferably, and further includes vapor baffle, with the cooling bath backboard, the cooling bath and institute State the spacing board of potcher, the groove body be provided with overflow launder side panel top connection, formed vapor condensation region, so as to Preferably the vapor generated in cooling bath can be discharged in the exhausting system, avoid impacting production.

Any of the above-described scheme is preferably, the vapor baffle and the cooling bath backboard, the cooling bath with it is described The interval of the spacing board of potcher, the top cooling bath backboard of groove body Left-Hand Panel, the cooling bath and the potcher The top movable connection of plate, groove body Left-Hand Panel.

Any of the above-described scheme is preferably, the vapor baffle and the cooling bath backboard, the cooling bath with it is described The interval of the spacing board of potcher, the top cooling bath backboard of groove body Left-Hand Panel, the cooling bath and the potcher Plate, groove body Left-Hand Panel top movable connection is manually implemented or automatic realization.

Any of the above-described scheme is preferably, the vapor baffle and the cooling bath backboard, the cooling bath with it is described The interval of the spacing board of potcher, the top cooling bath backboard of groove body Left-Hand Panel, the cooling bath and the potcher It is fixedly connected at the top of plate, groove body Left-Hand Panel.

Any of the above-described scheme is preferably, and the vapor baffle is one flat plate, and the side close to cooling bath front is set There is recess, enables part hanging apparatus normal activity.

Any of the above-described scheme is preferably, and the vapor baffle is U-shaped, three sides of U-shaped vapor baffle and institute Spacing board, the groove body for stating cooling bath backboard, the cooling bath and the potcher are provided with the top of overflow launder side panel Portion's connection.

Any of the above-described scheme is preferably, and the U-shaped vapor baffle further includes top cover, and the top cover is close to cooling bath The side of front is equipped with recess, enables part hanging apparatus normal activity.

Any of the above-described scheme is preferably, and sustained height is at the top of the cooling bath and the potcher, and the water steams It is higher than the potcher at the top of vapour condensation region.

Any of the above-described scheme is preferably, and is in sustained height with the potcher at the top of the vapor condensation region, cold It but is L-type at the top of the partition between slot and potcher, i.e. first partition first half height is less than latter half, and such case can To be less than potcher by the way that cooling groove height itself is arranged, directly cooling bath backboard can also be installed as exhausting system and kept off Plate.

Any of the above-described scheme is preferably, and the big a part of the divider height between the cooling bath and potcher accounts for beam overall The 1/4-1/2 of degree.

Any of the above-described scheme is preferably, and the cooling bath and potcher are respectively provided with spray system, leaves sink in product Into before next sink, spray prerinse is carried out to product, the sewage of a rinse bath can be effectively reduced as product enters Next rinse bath.

Any of the above-described scheme is preferably, and the spray port of spray system is arranged in the cooling bath and potcher back.

Any of the above-described scheme is preferably, and the spray port and tap water water inlet pipe are in fluid communication.

Any of the above-described scheme is preferably, and all spray ports and the same tap water water inlet pipe are in fluid communication.

Any of the above-described scheme is preferably, and the rinsing of rear cleaning device technique end is arranged in the tap water water inlet pipe Slot.

Any of the above-described scheme is preferably, and rear cleaning device technique end potcher is arranged in the tap water water inlet pipe Top.

Any of the above-described scheme is preferably, the spray port of each cooling bath and each potcher respectively with individual tap water Water inlet pipe.

Any of the above-described scheme is preferably, and the spray port setting height is higher than the rinse bath water surface.

Any of the above-described scheme is preferably, and in order to reinforce cleaning effect, the cooling bath and/or potcher include that ventilation is stirred Device is mixed, the aeration mixing device is compressed air snorkel, is bubbled and stirs using compressed air.

Any of the above-described scheme is preferably, and the compressed air snorkel is Z-type, and one end is arranged at the top of potcher, with Compressed air source connection, the other end are introduced directly among rinsing trench bottom as gas outlet.

Any of the above-described scheme is preferably, and the potcher includes the first potcher and the second potcher, two potchers Between second partition is set.

Any of the above-described scheme is preferably, and the height of the first partition and second partition is that technique production carries out direction It is successively reduced on opposite direction.

Any of the above-described scheme is preferably, and the groove body is rectangle.

On the other hand, a large amount of vapor can be generated in order to solve cooling bath in the prior art, the technology for being unfavorable for production is asked Topic, the utility model provide cleaning device after a kind of QPQ line of production technology, including cooling bath and potcher, wherein described cold But exhausting system is arranged in slot back.

Preferably, the exhausting system includes suction opening, air draft pipe and exhaust fan, and the suction opening is arranged in cooling Above slot water level line, described air draft pipe one end connects the suction opening, and the other end connects exhaust fan, and exhaust fan setting is connected to On plant gas discharge outlet, production environment is discharged in vapor.

Any of the above-described scheme is preferably, and further includes vapor baffle, with the cooling bath backboard, the cooling bath and institute Between the top of the spacing board, groove body Left-Hand Panel of the stating potcher cooling bath backboard, the cooling bath and the potcher The top connection of partition, groove body Left-Hand Panel, forms vapor condensation region, in order to which the exhausting system will can be cooled down preferably The vapor discharge generated in slot, avoids impacting production.

Any of the above-described scheme is preferably, and is in sustained height at the top of the cooling bath and the potcher, the water is striven It takes and is higher than the potcher at the top of condensation region.

Any of the above-described scheme is preferably, and is in sustained height with the potcher at the top of the vapor condensation region, cold It but is L-type at the top of the partition between slot and potcher, i.e. first partition first half height is less than latter half.

On the other hand, in order to solve the sewage in previous rinse bath in the prior art be easy with product enter it is next The technical issues of slot pollutes the cleaning solution of next slot, may will affect cleaning effect, the utility model provide a kind of QPQ production Cleaning device after processing line, including cooling bath and potcher, wherein the cooling bath and potcher are respectively provided with spray system, Product leaves sink and enters before next sink, carries out spray prerinse to product, can effectively reduce the sewage of a rinse bath As product enters next rinse bath.

Preferably, the spray port of spray system is arranged in the cooling bath and potcher back.

Excess flow is big between each rinse bath of cleaning device after QPQ production line provided by the utility model, can have Working environment is discharged in the vapor generated in cooling bath by effect, avoids impacting production, and can effectively reduce a cleaning The sewage of slot enters next rinse bath with product.

Detailed description of the invention

Fig. 1 is shown according to the structure of a preferred embodiment of the rear cleaning device of QPQ production line of the utility model It is intended to.

Fig. 2 is the main view of rear cleaning device shown in Fig. 1.

Fig. 3 is the preferred reality according to the vapor baffle of the rear cleaning device of QPQ production line of the utility model Apply the structural schematic diagram of example.

Fig. 4 be according to the rear cleaning device of QPQ production line of the utility model vapor baffle it is another preferably The structural schematic diagram of embodiment.

Fig. 5 be according to the rear cleaning device of QPQ production line of the utility model vapor baffle it is another preferably The structural schematic diagram of embodiment.

Fig. 6 be according to the rear cleaning device of QPQ production line of the utility model vapor baffle it is another preferably The structural schematic diagram of embodiment.

Fig. 7 be according to the rear cleaning device of QPQ production line of the utility model vapor baffle it is another preferably The structural schematic diagram of embodiment

Fig. 8 is the main view according to another preferred embodiment of the rear cleaning device of QPQ production line of the utility model Figure.

Wherein, the meaning of each label is as follows:

1- cooling bath, the first potcher of 2-, the second potcher of 3-, 41- first partition, 42- second partition, 5- exhaust column Road, 6- suction opening, 7- spray port, 8- overflow launder, 9- catch pit, 10- compressed air snorkel, 11- tap water water inlet pipe, 12- Water level line, 13- vapor baffle, 14- recess, 15- vapor baffle left plate, 16- vapor baffle right side plate, 17- top cover, 18- groove body Left-Hand Panel, 19- cooling bath backboard, 20- vapor baffle backboard.

Specific embodiment

In order to it is clearer, correctly understand the content of the utility model, carried out combined with specific embodiments below with attached drawing It further illustrates, explain.

Cleaning device after a kind of QPQ production line, as shown in Figs. 1-2, cleaning device structure after the QPQ production line Form as follows: 3 two cooling bath 1, the first potcher 2 and the second potcher potchers, which watches outside is One whole rectangle groove body a, that is to say, that cooling bath 1, the first potcher 2 and the second potcher 3 are by this Partition formation is added in rectangle sink, divider height is height of water level.Divider height is from potcher to cooling bath direction It successively reduces, so that it is guaranteed that tap water is from most clean rinsing sink successively to cooling bath overflow.It is arranged on the outside of cooling bath 1 and overflows The setting height of chute 8, overflow launder 8 is identical as the water level line 12 in cooling bath 1, lower than the minimum constructive height of first partition 41.For Guarantee water flow be it is few to pollutant load multi-overflow from pollutant load, the height of partition successively increases in the direction of the process Add, i.e. height of the minimum constructive height of first partition 41 less than second partition 42.First between cooling bath 1 and the first potcher 2 Partition 41 is L-type, and the height of height small portion is the water level line 12 of the first potcher 2, this is highly greater than overflow launder 8 Setting height, that is, the water level line 12 being higher than in cooling bath 1, are higher by 5cm or so, preferably to realize the normal function of cooling bath 1 While energy, the sewage in cooling bath 1 will not be redirected back into the first potcher 2, and pollute the aqueous in the first potcher 2.The The height of second partition 42 between one potcher 2 and the second potcher 3 is greater than first partition 41, is preferably also higher than the left side 5cm The right side avoids the aqueous in the first potcher 2 from being redirected back into the second drift while equally realizing the normal function of the first potcher 2 Washing trough 3.The quantity of potcher can be increased or decreased suitably.

Cleaning device also sets up catch pit after the QPQ production line, and after 1 water of cooling bath is full, sewage is i.e. from overflow launder 8 It overflows in catch pit 9 and stores.

Working environment is discharged in order to which the product of heating to be entered in cooling bath 1 to a large amount of vapor generated, it can be above-mentioned After QPQ production line in cleaning device or existing structure basis, increase setting exhausting system, exhausting at 1 back of cooling bath System is made of suction opening 6, air draft pipe 5 and exhaust fan, suction opening 6 be it is horn-like, to expand air suction efficiency, be mounted on cooling 1 water level line of slot, 12 top, the big one end of diameter are mounted on 1 backboard of cooling bath institute in the plane, and the small one end of diameter and exhausting are logical Road 5 connects, and the air draft passage other end is connect with exhaust fan, and exhaust fan setting is connected on plant gas discharge outlet, will cool down The vapor discharge working environment generated in slot 1, avoids impacting production.It is fast that exhausting system is primarily used to extraction product Quickly cooling but when a large amount of vapor for generating.Preferably, the power of exhaust fan may be selected to be 2-5KW.

In order to obtain better vapor discharge effect, can be cleaned after the QPQ production line of setting exhausting system In the structure basis of device, vapor baffle 13, vapor baffle 13 and first partition 41, cooling are set at 1 back of cooling bath Slot backboard 19 and the groove body are provided with the top connection of overflow launder side panel (groove body Left-Hand Panel 18), and it is solidifying to form vapor Poly- area avoids impacting production in order to which preferably the vapor generated in cooling bath can be discharged for the exhausting system. Vapor baffle 13 can actively be connect with associated components, can also be fixed together with dependency structure.When vapor baffle 13 with associated components when actively connecting, and manual setting in place, can also be arranged automatically,

As shown in figure 3, vapor baffle 13 can be one flat plate, the side close to cooling bath front is equipped with recess 14, Enable part hanging apparatus normal activity, the length of vapor baffle 13 can be greater than the length of cooling bath 1, can also and cool down The length of slot 1 is identical, can be supported and be connected by cooling bath 1.

The structure of vapor baffle 13 can also be as shown in figure 4, vapor baffle 13 be U-shaped, U-shaped vapor baffle 13 Vapor baffle left plate 15, vapor baffle right side plate 16 and vapor baffle backboard 20 respectively with groove body Left-Hand Panel 18, first partition 41 is connected with the top of cooling bath backboard 19, with the vapor gear version left side connected at the top of groove body Left-Hand Panel 18 15 length of side plate is identical as groove body Left-Hand Panel 18, that is, the left plate 15 of vapor baffle 13 is longer than right side plate 16.

The structure of vapor baffle 13 can also as shown in figure 5, vapor baffle 13 be U-shaped, U-shaped vapor baffle Vapor baffle left plate 15, vapor baffle right side plate 16 and vapor baffle backboard 20 respectively with groove body Left-Hand Panel 18, First partition 41 is connected with the top of cooling bath backboard 19, keeps off version left plate with the vapor connected at the top of groove body Left-Hand Panel 18 15 length are identical as groove body Left-Hand Panel 18, that is, the left plate 15 of vapor baffle 13 is identical with 16 length of right side plate.

The structure of vapor baffle 13 can also as shown in fig. 6-7, and U-shaped vapor baffle 13 further includes top cover 17, top cover 17 are equipped with recess 14 close to the side of cooling bath front, enable part hanging apparatus normal activity.

Vapor baffle 13 is U-shaped, and setting forms half-surrounded around vapor suction opening at 1 top of cooling bath State forms vapor condensation region, and when cooling in favor of product, suction opening extracts the cooling vapor generated and discharge, while Convenient for when spray port is sprayed, protection shower water flashes.There are two types of implementations, first, as shown in Fig. 2, vapor is kept off 13 top of plate is concordant with potcher, and in this case, the height that cooling bath itself can be set is less than potcher, then by U-shaped The setting of type vapor baffle 13 is in 1 top of cooling bath, vapor baffle 13 and cooling bath backboard, first partition 41, the groove body The top connection of the side plate of overflow launder is installed；It can also be directly using 1 top of cooling bath as vapor baffle 13, at this point, cooling (the preferably higher part of posterior facial height accounts for beam overall to the latter half of the backboard of slot 1, the side plate for installing overflow launder and first partition 41 The 1/4-1/2 of degree) vapor condensation region will be formed；Second, as shown in figure 8,1 height of cooling bath is identical as potcher, in cooling U-shaped vapor baffle 13 is set at the top of slot 1, and vapor baffle 13 and cooling bath backboard, first partition 41, the groove body are installed The top of the side plate of overflow launder connects, at this point, being higher than the potcher, in this case, water at the top of the water vapor accumulation area The cooling bath side plate width of steam baffle 13 and installation overflow launder 8 can be unanimously or inconsistent.

In order to effectively reduce the sewage of a upper rinse bath as product enters next rinse bath, reduces aqueous replacement frequency, Water resource is saved, environment is protected, it can be after above-mentioned QPQ production line in cleaning device or existing structure basis, cold But slot 1, the first potcher 2 and the second potcher 3 are respectively provided with spray system, and the spray port 7 of the spray system is arranged in cooling bath 1, the rinse bath is left into before next rinse bath in product in 3 back of the first potcher 2 and the second potcher, clear by this The spray port 7 at washing trough back carries out spray prerinse to product with tap water, can effectively reduce the sewage of a rinse bath with Product enters next rinse bath, meanwhile, this can also supplement the aqueous of the rinse bath, in cooling bath 1, due to vapor Evaporation causes aqueous that can reduce, and spray can supplement the aqueous of reduction, for the first potcher 2 and the second potcher 3, After aqueous overflows to previous rinse bath, spray can also be supplemented the aqueous in slot.All spray ports 7 can connect jointly The same tap water water inlet pipe 11 is connect, this tap water water inlet pipe can be as shown in Figure 1, be mounted on the top of the second potcher 3； Certainly, the spray port 7 in each rinse bath can also be separately connected individual tap water water inlet pipe.Preferably, spray port 7 is installed Top half at rinse bath back is such as higher than the rinse bath water surface.It is corresponding when product has cleaned in the sink hangs out sink The spray system of sink is just opened, and with originally water spray, the cleaning sullage on product can pour screw clamp with shower water In, the cleaning waste water carrying amount on product can be reduced to greatest extent in this way, to reach water conservation purpose.

In order to further strengthen cleaning effect, can after above-mentioned QPQ production line cleaning device or existing structure On the basis of, it can choose and aeration mixing device is set in potcher, such as use compressed air for gas source, it is logical by compressed air Tracheae 10 carries out bubbling stirring.Also it can choose and aeration mixing device be set in cooling bath 1 or is floated in cooling bath 1 and first Washing trough 2 and the and aeration mixing device is set simultaneously in potcher 3.Compressed air snorkel can be Z-shaped, and one end is arranged in It at the top of potcher, is connect with compressed air source, the other end is introduced directly among rinsing trench bottom as gas outlet, with potcher Ontology fitting avoids bringing inconvenience to product cleaning.When product cleans in the sink, that is, open snorkel stirring and washing.

Cleaning device after the QPQ production line, three sinks are not provided with drainpipe, need to drain using immersible pump successively Extraction, extracting order is: cooling bath waste water is drawn into vaporising device；Water in potcher pass through again immersible pump be drawn into it is cold But it is used in slot, realizes water circulation use, avoid water resource waste.

In order to recycle cleaning waste water, the waste water of preceding cleaning device can be processed by waste water filtering processing system Afterwards, rear cleaning device is drained into be recycled.

It should be noted that the above various embodiments is only to illustrate the technical solution of the utility model, rather than its limitations； Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should manage Solution: it is still possible to modify the technical solutions described in the foregoing embodiments, or to some or all of skills Art feature is equivalently replaced；And these are modified or replaceed, it does not separate the essence of the corresponding technical solution the utility model The range of each embodiment technical solution.

Claims

Cleaning device after 1.QPQ production line, including producing the cooling bath for carrying out being sequentially arranged on direction and rinsing in technique Slot, it is characterised in that: the cooling bath and potcher are structure as a whole, and the cooling bath and potcher are a groove bodies by setting It sets partition to be formed, the divider height is not higher than the height of the groove body, and the height of the partition is producing progress side with technique It is successively reduced in the opposite direction.
2. cleaning device after as described in claim 1, it is characterised in that: overflow launder is set on the outside of cooling bath, setting height in Cooling bath water level line is identical.
3. cleaning device after as claimed in claim 2, it is characterised in that: the setting height of the overflow launder is lower than the cooling The minimum constructive height of the spacing board of slot and the potcher.
4. cleaning device after as claimed in claim 1 or 3, it is characterised in that: exhausting system is arranged at the cooling bath back.
5. cleaning device after as claimed in claim 4, it is characterised in that: the exhausting system includes suction opening, air draft pipe And exhaust fan, the suction opening are arranged above cooling bath water level line, described air draft pipe one end connects the suction opening, another End connection exhaust fan, exhaust fan setting are connected on plant gas discharge outlet.
6. cleaning device after as claimed in claim 5, it is characterised in that: the suction opening is horn-like, separate cooling bath one Diameter is held to be less than the diameter close to cooling bath one end.
7. cleaning device after as claimed in claim 6, it is characterised in that: further include vapor baffle, carried on the back with the cooling bath Plate, the cooling bath are connect with the top that the spacing board of the potcher, the groove body are provided with overflow launder side panel, are formed Vapor condensation region.
8. cleaning device after as claimed in claim 7, it is characterised in that: the vapor baffle is one flat plate, close to cold But the side of slot front is equipped with recess, enables part hanging apparatus normal activity.
9. cleaning device after as claimed in claim 7, it is characterised in that: the vapor baffle is U-shaped, and U-shaped water steams Spacing board, the groove body of three sides of gas baffle and the cooling bath backboard, the cooling bath and the potcher are provided with excessive The top of chute side panel connects.
10. cleaning device after as claimed in claim 9, it is characterised in that: the U-shaped vapor baffle further includes top cover, The top cover is equipped with recess close to the side of cooling bath front, enables part hanging apparatus normal activity.
11. the rear cleaning device as described in claim 9 or 10, it is characterised in that: at the top of the cooling bath and the potcher In sustained height, the potcher is higher than at the top of the water vapor accumulation area.
12. cleaning device after as claimed in claim 11, it is characterised in that: the vapor condensation region top and the rinsing Slot is in sustained height, is L-type at the top of the partition between cooling bath and potcher, i.e., after first partition first half height is less than Half part.
13. cleaning device after as claimed in claim 12, it is characterised in that: the partition between the cooling bath and potcher is high Spend the 1/4-1/2 that big a part accounts for overall width.
14. the rear cleaning device as described in claim 1 or 3 or 6 or 12 or 13, it is characterised in that: the cooling bath and rinsing Slot is respectively provided with spray system, leaves sink into before next sink in product, spray prerinse is carried out to product, on reducing The sewage of one rinse bath enters next rinse bath with product.
15. cleaning device after as claimed in claim 14, it is characterised in that: the spray port of spray system is arranged in the cooling Slot and potcher back.
16. cleaning device after as claimed in claim 15, it is characterised in that: the spray port and tap water water inlet pipe fluid connect It is logical.
17. cleaning device after as claimed in claim 16, it is characterised in that: all spray ports and the same tap water water inlet pipe It is in fluid communication.
18. cleaning device after as claimed in claim 17, it is characterised in that: the tap water water inlet pipe setting is filled in rear cleaning Set the potcher of technique end.
19. cleaning device after as claimed in claim 18, it is characterised in that: the tap water water inlet pipe setting is filled in rear cleaning Set the top of technique end potcher.
20. cleaning device after as claimed in claim 16, it is characterised in that: the spray port of each cooling bath and each potcher Respectively with individual tap water water inlet pipe.
21. the rear cleaning device as described in any one of claim 17-20, it is characterised in that: the spray port setting height Higher than the rinse bath water surface.
22. cleaning device after as claimed in claim 21, it is characterised in that: the cooling bath and/or potcher include ventilation Agitating device, the aeration mixing device are compressed air snorkel, are bubbled and are stirred using compressed air.
23. cleaning device after as claimed in claim 22, it is characterised in that: the compressed air snorkel is Z-type, one end cloth It sets at the top of potcher, is connect with compressed air source, the other end is introduced directly among rinsing trench bottom as gas outlet.
24. cleaning device after as claimed in claim 23, it is characterised in that: the potcher includes the first potcher and second Second partition is arranged between two potchers in potcher.
25. cleaning device after a kind of QPQ line of production technology, including cooling bath and potcher, it is characterised in that: in the cooling bath Exhausting system is arranged in back.
26. cleaning device after as claimed in claim 25, it is characterised in that: the exhausting system includes suction opening, exhaust column Road and exhaust fan, the suction opening are arranged above cooling bath water level line, and described air draft pipe one end connects the suction opening, separately One end connects exhaust fan, and the exhaust fan setting is connected on plant gas discharge outlet.
27. cleaning device after as claimed in claim 26, it is characterised in that: the suction opening is horn-like, separate cooling bath One end diameter is less than the diameter close to cooling bath one end.
28. cleaning device after as claimed in claim 27, it is characterised in that: further include vapor baffle, with the cooling bath Backboard, the cooling bath are connect with the top that the spacing board of the potcher, groove body are provided with overflow launder side panel, form water Devaporation area；Spacing board, the groove body of the vapor baffle and the cooling bath backboard, the cooling bath and the potcher The top of the top of the Left-Hand Panel cooling bath backboard, the spacing board of the cooling bath and the potcher, groove body Left-Hand Panel Portion's activity is fixedly connected, and flexible connection is manually or automatically realized.
29. cleaning device after as claimed in claim 28, it is characterised in that: the vapor baffle is one flat plate, close The side of cooling bath front is equipped with recess, enables part hanging apparatus normal activity.
30. cleaning device after as claimed in claim 28, it is characterised in that: the vapor baffle is U-shaped, U-shaped water Three sides of steam baffle and spacing board, the groove body of the cooling bath backboard, the cooling bath and the potcher are provided with The top of overflow launder side panel connects.
31. cleaning device after as claimed in claim 30, it is characterised in that: the U-shaped vapor baffle further includes top cover, The top cover is equipped with recess close to the side of cooling bath front, enables part hanging apparatus normal activity.
32. the rear cleaning device as described in any one of claim 28-31, it is characterised in that: the cooling bath and the drift It is in sustained height at the top of washing trough, is higher than the potcher at the top of the water vapor accumulation area.
33. the rear cleaning device as described in any one of claim 28-31, it is characterised in that: vapor condensation region top Portion and the potcher are in sustained height, are L-type, i.e. first partition first half at the top of the partition between cooling bath and potcher Height is divided to be less than latter half.
34. cleaning device after as claimed in claim 33, it is characterised in that: the partition between the cooling bath and potcher is high Spend the 1/4-1/2 that big a part accounts for overall width.
35. cleaning device after a kind of QPQ line of production technology, including cooling bath and potcher, it is characterised in that: the cooling bath and Potcher is respectively provided with spray system, leaves sink into before next sink in product, spray prerinse is carried out to product, to subtract Less the sewage of a upper rinse bath with product enter next rinse bath.
36. cleaning device after as claimed in claim 35, it is characterised in that: the spray port of spray system is arranged in the cooling Slot and potcher back.
37. cleaning device after as claimed in claim 36, it is characterised in that: the spray port and tap water water inlet pipe fluid connect It is logical.
38. cleaning device after as claimed in claim 37, it is characterised in that: all spray ports and the same tap water water inlet pipe It is in fluid communication.
39. cleaning device after as claimed in claim 38, it is characterised in that: the tap water water inlet pipe setting is filled in rear cleaning Set the top of technique end potcher.
40. cleaning device after as claimed in claim 37, it is characterised in that: the spray port of each cooling bath and each potcher Respectively with individual tap water water inlet pipe.
41. the rear cleaning device as described in any one of claim 36-40, it is characterised in that: the spray port setting height Higher than the rinse bath water surface.