CN208738193U - Wide-angle overturns wafer infuser device - Google Patents
Wide-angle overturns wafer infuser device Download PDFInfo
- Publication number
- CN208738193U CN208738193U CN201821643507.9U CN201821643507U CN208738193U CN 208738193 U CN208738193 U CN 208738193U CN 201821643507 U CN201821643507 U CN 201821643507U CN 208738193 U CN208738193 U CN 208738193U
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- wafer
- reservoir
- film magazine
- connecting rod
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The utility model relates to a kind of wide-angles to overturn wafer infuser device, reservoir and Electric Actuator are separately mounted on bottom plate, film magazine is located in reservoir, and the lower part in reservoir fills the chemical liquids for impregnating chip, and the biography piece window being sent into chip in film magazine is provided with for manipulator on the cell wall on top；One end of lifting linking member is connected by crane with the output end of Electric Actuator, and the other end is inserted into reservoir, is hinged with film magazine；Tilt cylinders are mounted on crane, and tilt linkage is embedded in lifting linking member, and one end is connected with the output end of tilt cylinders, and the other end is hinged by intermediate connecting rod component and film magazine.The utility model is placed the wafer in the film magazine in reservoir by manipulator, can impregnate more wafers simultaneously；Tilt linkage is embedded in lifting linking member, and movement is steady, and film magazine can realize that wide-angle is overturn, and is realized and is impregnated more efficient and safer requirement to wafer during wet-treating.
Description
Technical field
The utility model belongs to semicon industry wafer wet process field, and specifically a kind of wide-angle overturns wafer
Infuser device.
Background technique
Wafer is impregnated currently, often needing to use chemical liquids for wafer wet treatment process in semicon industry
Processing；And existing wafer immersion way is usually used whole box wafer while being put into chemical liquid bath and impregnates, and reaches pre- timing
Between after again whole box take out the process for carrying out next step.But it will appear every wafer successively in the process of next step
The case where processing, the time for thus causing the every a piece of waiting of whole box wafer is all different, may will affect the matter of final chip
Amount.So how to realize that the homogeneity of every wafer soaking time is an inevitable problem.
Disclosed on May 21st, 2014, " a kind of wafer impregnates the utility model patent of Publication No. CN103811374A
Device " meets the demand of wafer immersion.But lifting linking member and tilt linkage are arranged side by side in the device, the two design
When Parallel Design can be used, but in practice due to the upper surface mismachining tolerance of upper cover, cause two axially bored lines processing not parallel, or
For two axially bored lines of person not in the median plane of unit, the axis of two connecting rods after causing assembly is not parallel, in turn results in movement resistance
Plug, work have some setbacks, and make device Caton.Secondly, the film magazine in the device can only turn over 25 °, wafer is shaken in lifting
It swings and easily slides out.Further more, the device is by the way of bucket wall indirect heating, heating sheet is wrapped on the side wall of reservoir, heating
The heat of piece passes to chemical liquids by way of heat transfer, and then chemical liquids is made to heat up, the rate of heat addition of this heating method
Slowly.
Utility model content
In order to solve the above problem existing for existing soaking device, the purpose of this utility model is to provide a kind of wide-angles
Overturn wafer infuser device.
The purpose of this utility model is achieved through the following technical solutions:
The utility model includes film magazine, reservoir, bottom plate, Electric Actuator, tilt linkage, tilt cylinders, lifting linking member
And piece window is passed, the reservoir and Electric Actuator are separately mounted on bottom plate, and film magazine is located in reservoir, in the reservoir
Lower part fill the chemical liquids for impregnating chip, the biography gate being sent into chip in film magazine is provided with for manipulator on the cell wall on top
Mouthful；One end of the lifting linking member is connected by crane with the output end of Electric Actuator, and the other end is inserted into the reservoir
It is interior, hinged with the film magazine；The tilt cylinders are mounted on crane, and the tilt linkage is embedded in lifting linking member, and one
End is connected with the output end of the tilt cylinders, and the other end is hinged by intermediate connecting rod component and the film magazine；The electronic execution
Device drives lifting linking member, tilt cylinders and tilt linkage synchronization lifting by crane, so drive the film magazine rise to
The corresponding height of the biography piece window takes/puts wafer, or so that film magazine decline is immersed in chemical liquids or less and impregnate wafer, described to incline
Oblique cylinder drives film magazine overturning by tilt linkage, intermediate connecting rod component；
Wherein: the lifting linking member is hollow structure inside, and the tilt linkage and lifting linking member are coaxially disposed；
The intermediate connecting rod component includes intermediate connecting rod A and intermediate connecting rod B, and intermediate connecting rod A is articulated with the film magazine
On, one end of the intermediate connecting rod B is connected with the other end of tilt linkage, and the other end of intermediate connecting rod B and the centre connect
Bar A is hinged；
The intermediate connecting rod A is " U "-shaped, and the both ends of " u "-shaped opening are hingedly connected on the film magazine；The centre connects
Bar B is L-shaped, and a line of the L shape and the other end of the tilt linkage are affixed, another a line and the intermediate connecting rod A
" u "-shaped bottom among it is hinged；
Lifting cylinder is installed at the top of the reservoir, the output end of the lifting cylinder is connected with the switch biography gate
The baffle of mouth；
The gas blow pipe connecting with gas source is provided on the biography piece window；
It is equipped in the reservoir to the direct-fired heater strip of chemical liquids；
Maintenance window is provided on the reservoir；
The top surface of the reservoir is provided with filling opening, is provided with leakage fluid dram on the bottom surface of the reservoir and bottom plate；
It is equipped with the temperature sensor of perception temperature of chemical liquid in the reservoir and perceives the liquid level of chemical liquids liquid level
Sensor.
The advantages of the utility model and good effect are as follows:
1. the tilt linkage of the utility model is embedded in lifting linking member, movement is steady, avoids because mismachining tolerance causes
Movement obstruction, have some setbacks and generation the phenomenon that Caton, realize wafer is impregnated during wet-treating it is more efficient and more
The requirement of safety.
2. the film magazine of the utility model can wide-angle (90 °~120 °) tip tilt, wafer can be at vertical state, in lifting
It will not be skidded off by film magazine, can also prevent metal fillings from after-tacking.
3. heater strip is arranged in reservoir the utility model, directly chemical liquids are heated, keep the rate of heat addition fast；
Also, since heater strip is built in inside reservoir, so that the shape of reservoir is unrestricted.
Detailed description of the invention
Fig. 1 is the overall structure main view of the utility model；
Fig. 2 is the schematic perspective view of the utility model；
Fig. 3 is the utility model lifting linking member, tilt linkage passes through intermediate connecting rod component and the hinged structural representation of film magazine
Figure；
Wherein: 1 is wafer, and 2 be film magazine, and 3 be reservoir, and 4 be bottom plate, and 5 be bracket, and 6 be Electric Actuator, and 7 be ultrasound
Wave producer, 8 be maintenance window, and 9 be tilt linkage, and 10 be tilt cylinders, and 11 be lifting linking member, and 12 is pass piece window, and 13 are
Upper gas blow pipe, 14 be lower gas blow pipe, and 15 be heater strip, and 16 be intermediate connecting rod A, and 17 be intermediate connecting rod B, and 18 be lifting cylinder,
19 be crane, and 20 be filling opening, and 21 be leakage fluid dram, and 22 be baffle, and 23 be bar.
Specific embodiment
The utility model is described in further detail with reference to the accompanying drawing.
As shown in Figures 1 to 3, the utility model includes film magazine 2, reservoir 3, bottom plate 4, bracket 5, Electric Actuator 6, ultrasound
Wave producer 7, tilt cylinders 10, lifting linking member 11, passes piece window 12, heater strip 15, intermediate connecting rod component, rises tilt linkage 9
Sending down abnormally ascending cylinder 18, crane 19 and baffle 22, wherein reservoir 3 is fixed on bottom plate 4, is closed cuboid or square；Electricity
Dynamic actuator 6 is fixed on bottom plate 4 by bracket 5, and is located at the side of reservoir 3.Film magazine 2 is located in reservoir 3, film magazine 2
In can load more wafers 1.One end of lifting linking member 11 is connected by crane 19 with the output end of Electric Actuator 6, another
In end insertion reservoir 3, with film magazine 2 hingedly；Tilt cylinders 10 are mounted on crane 19, and tilt linkage 9 is embedded in lifting and connects
It in bar 11, can be coaxially disposed with lifting linking member 11, one end of tilt linkage 9 is connected with the output end of the tilt cylinders 10, another
End is hinged by intermediate connecting rod component and film magazine 2.
Intermediate connecting rod component includes intermediate connecting rod A16 and intermediate connecting rod B17, and intermediate connecting rod A16 is " U "-shaped, the " u "-shaped
The both ends of opening are hingedly connected on film magazine 2；Intermediate connecting rod B17 is L-shaped, a line and the tilt linkage 9 of the L shape
The other end is affixed, hinged among the " u "-shaped bottom of another a line and intermediate connecting rod A16.
Had on the cell wall on 3 top of reservoir and pass piece window 12 and maintenance window 8, the present embodiment be in cuboid or
In four sides of the reservoir 3 of square, Electric Actuator 6 have to the two sides of one side will be brilliant for manipulator
Circle 1 is sent into biography piece window 12 and maintenance window 8 in film magazine 2.The top edge peace for passing 12 one side of piece window is opened up in reservoir 3
Equipped with lifting cylinder 18, the output end of the lifting cylinder 18 is connected with the baffle 22 that switch passes piece window 12.In reservoir 3
Lower part fills the chemical liquids for impregnating chip 1, is equipped on the bottom surface in lower part to the direct-fired heater strip of chemical liquids 15.Liquid storage
The top surface of slot 3 is provided with filling opening 20, is provided with leakage fluid dram 21 on the bottom surface of reservoir 3 and bottom plate 4, realize the injections of chemical liquids with
Discharge.Electric Actuator 6 drives lifting linking member 11,9 synchronization lifting of tilt cylinders 10 and tilt linkage by crane 19, in turn
Drive film magazine 2 to rise to and pass the corresponding height of piece window 12 and take/put wafer 1, or make film magazine 2 decline be immersed in chemical liquids with
Lower immersion wafer 1, tilt cylinders 10 drive film magazine 2 to overturn by tilt linkage 9, intermediate connecting rod component.The piece of the utility model
Box 2, can wide-angle (being less than or equal to 120 °) overturning backward when immersing in chemical liquids；When doing pure degumming process, film magazine 2 can be to
90 ° of rear-inclined, when doing lift-off (tearing golden removing) technique, to prevent metal fillings from after-tacking, film magazine 2 can tilt backwards 120 °,
Wafer 1 can be supported, wafer 1 will not be skidded off in lifting at vertical state by the bar 23 on film magazine 2.It is contained in reservoir 3
There is the lower part of chemical liquids that supersonic generator 7 is installed.Be additionally provided in reservoir 3 perception temperature of chemical liquid temperature sensor and
The liquid level sensor for perceiving chemical liquids liquid level monitors the temperature of chemical liquids, by temperature sensor to control heater strip 15
Work or stopping；The chemical liquids height in reservoir 3 is monitored by liquid level sensor, and can be with automatic liquid-feeding and drain.
It is provided with the gas blow pipe connecting with gas source on passing piece window 12, the gas blow pipe of the utility model is divided into gas blow pipe 13
And lower gas blow pipe 14, two gas blow pipes are connected with gas source respectively.Gas source can be nitrogen.
The working principle of the utility model are as follows:
When carrying out process, chemical liquids in reservoir 3, which can be, to be heated.Manipulator can be by the preset time
Wafer 1 is continuously fed in film magazine 2 by interval, until film magazine 2 is piled；Film magazine 2 can be in chemical liquid level under reclined position
It vibrates by a small margin below, to accelerate treatment effeciency and uniformity.Specified time is reached in any 1 soaking time of wafer
Afterwards, which will be taken out by manipulator.
When needing to fetch and deliver wafer 1, film magazine 2 rises to corresponding position, and then tilt cylinders 10 rise, and keeps film magazine 2
Horizontality, after the baffle 22 of biography piece window 12 is opened by the driving of lifting cylinder 18, manipulator can carry out fetching and delivering the dynamic of wafer
Make.After the completion of wafer placement, tilt cylinders 10 are retracted, and are made wide-angle tilt (90 °~120 °) backward of film magazine 2, are then gone up and down
Connecting rod 11 slowly declines under the drive of Electric Actuator 6, until film magazine 2 and wafer are immersed in liquid level or less.It is specified when reaching
After soaking time, opposite movement is taken to can be taken off wafer.During taking out wafer, upper and lower gas blow pipe 13,14 starts
Nitrogen is blown out, an air-brush is formed, the chemical liquids for being covered on crystal column surface is blown off.
Claims (10)
1. a kind of wide-angle overturns wafer infuser device, including film magazine, reservoir, bottom plate, Electric Actuator, tilt linkage, incline
Oblique cylinder, lifting linking member and biography piece window, the reservoir and Electric Actuator are separately mounted on bottom plate, and film magazine is located at reservoir
Interior, the lower part in the reservoir fills the chemical liquids for impregnating chip, is provided on the cell wall on top and is sent into chip for manipulator
Biography piece window in film magazine；It is characterized by: one end of the lifting linking member (11) passes through crane (19) and Electric Actuator
(6) output end is connected, and the other end is inserted into the reservoir (3), is hinged with the film magazine (2)；The tilt cylinders (10)
It is mounted on crane (19), the tilt linkage (9) is embedded in lifting linking member (11), one end and the tilt cylinders (10)
Output end is connected, and the other end is hinged by intermediate connecting rod component and the film magazine (2)；The Electric Actuator (6) passes through lifting
Frame (19) drives lifting linking member (11), tilt cylinders (10) and tilt linkage (9) synchronization lifting, and then drives the film magazine (2)
It rises to height corresponding with biography piece window (12) and takes/put wafer (1), or film magazine (2) decline is made to be immersed in chemical liquids
Wafer (1) is impregnated below, the tilt cylinders (10) drive film magazine (2) overturning by tilt linkage (9), intermediate connecting rod component.
2. wide-angle according to claim 1 overturns wafer infuser device, it is characterised in that: the lifting linking member (11) is
Hollow structure inside, the tilt linkage (9) and lifting linking member (11) are coaxially disposed.
3. wide-angle according to claim 1 overturns wafer infuser device, it is characterised in that: the intermediate connecting rod component packet
Intermediate connecting rod A (16) and intermediate connecting rod B (17) is included, intermediate connecting rod A (16) is articulated on the film magazine (2), and the centre connects
One end of bar B (17) is connected with the other end of tilt linkage (9), the other end of intermediate connecting rod B (17) and the intermediate connecting rod A
(16) hinged.
4. wide-angle according to claim 3 overturns wafer infuser device, it is characterised in that: the intermediate connecting rod A (16)
" U "-shaped, the both ends of " u "-shaped opening are hingedly connected on the film magazine (2)；The intermediate connecting rod B (17) is L-shaped, should
The a line of L shape and the other end of the tilt linkage (9) are affixed, the " u "-shaped of another a line and the intermediate connecting rod A (16)
It is hinged among bottom.
5. wide-angle according to claim 1 overturns wafer infuser device, it is characterised in that: the top of the reservoir (3)
Portion is equipped with lifting cylinder (18), and the output end of the lifting cylinder (18), which is connected with, switchs the baffle for passing piece window (12)
(22)。
6. wide-angle according to claim 1 overturns wafer infuser device, it is characterised in that: on the biography piece window (12)
It is provided with the gas blow pipe connecting with gas source.
7. wide-angle according to claim 1 overturns wafer infuser device, it is characterised in that: set in the reservoir (3)
Have to the direct-fired heater strip of chemical liquids (15).
8. wide-angle according to claim 1 overturns wafer infuser device, it is characterised in that: opened on the reservoir (3)
There are maintenance window (8).
9. wide-angle according to claim 1 overturns wafer infuser device, it is characterised in that: the top of the reservoir (3)
Face is provided with filling opening (20), is provided with leakage fluid dram (21) on the bottom surface of the reservoir (3) and bottom plate (4).
10. wide-angle according to claim 1 overturns wafer infuser device, it is characterised in that: set in the reservoir (3)
There is the temperature sensor of perception temperature of chemical liquid and perceives the liquid level sensor of chemical liquids liquid level.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821643507.9U CN208738193U (en) | 2018-10-10 | 2018-10-10 | Wide-angle overturns wafer infuser device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821643507.9U CN208738193U (en) | 2018-10-10 | 2018-10-10 | Wide-angle overturns wafer infuser device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208738193U true CN208738193U (en) | 2019-04-12 |
Family
ID=66035231
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821643507.9U Active CN208738193U (en) | 2018-10-10 | 2018-10-10 | Wide-angle overturns wafer infuser device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN208738193U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110487680A (en) * | 2019-08-15 | 2019-11-22 | 芜湖迅齐纺织有限公司 | A kind of hydrophobic fibre detection system and its detection method |
| CN110931401A (en) * | 2020-01-02 | 2020-03-27 | 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） | Wafer box rotating device and wafer box rotating and lifting equipment |
| CN110970333A (en) * | 2019-12-26 | 2020-04-07 | 天津中环领先材料技术有限公司 | Photoresist removing equipment for large-diameter silicon wafer and using method |
| CN111863654A (en) * | 2019-04-26 | 2020-10-30 | 昆山基侑电子科技有限公司 | Wafer soaking tank |
-
2018
- 2018-10-10 CN CN201821643507.9U patent/CN208738193U/en active Active
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111863654A (en) * | 2019-04-26 | 2020-10-30 | 昆山基侑电子科技有限公司 | Wafer soaking tank |
| CN111863654B (en) * | 2019-04-26 | 2023-07-25 | 昆山基侑电子科技有限公司 | Wafer soaking tank |
| CN110487680A (en) * | 2019-08-15 | 2019-11-22 | 芜湖迅齐纺织有限公司 | A kind of hydrophobic fibre detection system and its detection method |
| CN110970333A (en) * | 2019-12-26 | 2020-04-07 | 天津中环领先材料技术有限公司 | Photoresist removing equipment for large-diameter silicon wafer and using method |
| CN110931401A (en) * | 2020-01-02 | 2020-03-27 | 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） | Wafer box rotating device and wafer box rotating and lifting equipment |
| CN110931401B (en) * | 2020-01-02 | 2022-06-03 | 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） | Wafer box rotating device and wafer box rotating and lifting equipment |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address |
Address after: 110168 No. 16 Feiyun Road, Hunnan District, Shenyang City, Liaoning Province Patentee after: Shenyang Core Source Microelectronic Equipment Co., Ltd. Address before: 110168 No. 16 Feiyun Road, Hunnan New District, Shenyang City, Liaoning Province Patentee before: Shenyang Siayuan Electronic Equipment Co., Ltd. |
|
| CP03 | Change of name, title or address |