CN208704659U - The linearity comparison device of F-P micro-displacement measuring system based on capacitance sensor - Google Patents

Abstract

The utility model discloses the linearity comparison devices of the F-P micro-displacement measuring system based on capacitance sensor." work " shape bracket one end is fixed on optical platform in the utility model, the F-P Etalon interference measuring system side of being placed on it, face battle array device arrangements are used for interference imaging before F-P Etalon interference measuring system and in same optical axis, the size of stress loading system change stress F, capacitance sensor probe passes through the variable quantity of detection capacitor, to obtain the deformation quantity of square equal cross-section beam according to circuit module.Corresponding displacement is obtained with F-P Etalon interference measuring system and capacitance sensor, is compared by the linearity that F-P etalon micro-displacement measuring system is completed in the comparison to the two linearity curve.The utility model has detection accuracy high, can synchronously complete the measurement of two methods, and the linearity suitable for high accuracy micro-displacement measuring system compares.

Description

The linearity comparison device of F-P micro-displacement measuring system based on capacitance sensor

Technical field

The utility model relates to the linearity comparison devices of micro-displacement measuring system, and in particular to based on capacitance sensor The linearity comparison device of F-P micro-displacement measuring system.

Background technique

Micro-displacement Technique as one of precision machinery and the key technology of precision instrument, recently as microelectric technique, The development of the subjects such as aerospace, bioengineering and rapidly grow up, while the micro-displacement measuring system of high accuracy is also more next More become the restraining factors that each field especially military field technology is constantly progressive.The measurement of micro-displacement is also widely answered simultaneously The features such as used in living and producing, application range requires measurement to have precision high, non-contact, real-time monitoring.Micro-displacement skill Art is a key technology in Ultra-precision Turning and detection.The especially rapid development of nanotechnology makes the precision of micro-displacement It is required that rising to nanoscale by micron order.

The measurement that micro-displacement may be implemented by the imaging of F-P Etalon interference, is caused using the change in location of interference imaging CCD on interference circle centre point position change, complete nanoscale microdisplacement measurement.Due to CCD occur displacement very little, It needs to be determined that the accuracy of interference circle center of circle displacement, so needing now a kind of for F-P etalon microdisplacement measurement system The linearity comparison device of system.

Utility model content

For the deficiency of background technique, the purpose of this utility model is to provide the F-P micro-displacements based on capacitance sensor The linearity comparison device of measuring system.

To achieve the above object, the technical solution adopted in the utility model is as follows:

The linearity comparison device of F-P micro-displacement measuring system based on capacitance sensor, including F-P Etalon interference are surveyed Amount system, face battle array device, " work " shape bracket, square equal cross-section beam, stress loading system, capacitance sensor probe and sensor are visited Head fixed module.

F-P Etalon interference measuring system is placed on above " work " shape bracket, and face battle array device arrangements are dry in F-P etalon It relates to before measuring system and is in same optical axis with F-P Etalon interference measuring system for being imaged, stress loading system passes through Change the deformation quantity of square equal cross-section beam to the change of stress F, capacitance sensor probe is fixed on by probe fixed module The surface of square equal cross-section beam, to experience the deformation quantity of cantilever.

There is a little groove at the square equal cross-section Liang Qi stress point, size can just be caught in a steel wire Line guarantees to occur to slide relatively between little groove and wire, and the capacitance sensor on the square equal cross-section beam is visited Head induction region posts one piece of liquid crystal flat glass without any defect and flatness less than 0.05 μm/mm.

Described " work " the shape bracket one end is fixed on optical platform, and the other end is for placing the measurement of F-P Etalon interference System, and on " work " shape bracket at stress point underface of square equal cross-section beam there are a cylindrical type is hollow, guarantee Contact is not generated between the wire to get off from overhung and " work " shape bracket.

The stress loading system includes that one end is suspended on wire on square equal cross-section beam at little groove, the other end It is connect behind the cylindrical type hollow part in " work " shape bracket with the float of lower section, float is placed in fill and be covered on water and the water surface The beaker container of oil reservoir (reducing experimental error brought by water evaporation to the greatest extent), is changed by screw mechanism landing platform and is burnt The position of cup, to change buoyancy size suffered by float, so that the size of stress F suffered by square equal cross-section beam changes Become, digital calculation balance is placed among beaker container and screw mechanism landing platform, for measuring buoyancy variation size.

The sensor probe fixed module includes column, sliding block, bracket, fastener and soket head cap screw, interior hexagonal The smooth column in surface is fixed on optical platform by screw, and sliding block can slide up and down on column, and fastener is used for sliding block It is fastened on column, bracket one end is fixed on sliding block, and the other end is used to install capacitance sensor probe.

The linearity comparison method of F-P micro-displacement measuring system based on capacitance sensor: when stress loading system makes to make When stress F size on square equal cross-section beam-ends face changes, so that the position of battle array device changes above end face, To change imaging position of the interference circle on the battle array device of face, interference circle 11-15 ring center before and after stress variation is utilized The mean value of coordinate changes to calculate the variable quantity of displacement；The capacitance change experienced simultaneously according to capacitance sensor probe, It is changed into electric signal output after signal condition detection circuit, to obtain displacement；Using stress variation as abscissa, with circle Heart location variation and displacement are that dependent variable draws respective linearity curve, by the comparison to two curves, are completed linear The comparison of degree.

The utility model has the beneficial effects that

The utility model solves the problems, such as to measure the linear ratio of micro-displacement based on F-P etalon to demonstrating and mark using F-P This classical optical device of quasi- tool can complete the microdisplacement measurement of nanoscale high accuracy.

Detailed description of the invention

Fig. 1 is the single unit system schematic diagram of the utility model；

Fig. 2 is the stress loading system schematic of the utility model；

In figure: 1, mercury lamp light source, 2, flexible optical fibre, 3, F-P etalon, 4, transmission object lens, 5, F-P interferometer measuration system, 6, face battle array device, 7, " work " shape bracket, 8, square equal cross-section beam, 9, stress loading system, 10, column, 11, sliding block, 12, branch Frame, 13, capacitance sensor probe, 14, fastener, 15, liquid crystal flat glass, 16, soket head cap screw, 17, sensor probe it is solid Cover half block, 18, optics vibration-isolating platform, 19, finer wire line, 20, float, 21, beaker container, 22, digital calculation balance, 23, screw machine Structure landing platform.

Specific embodiment

As shown in Figure 1, the measuring device of the utility model include F-P Etalon interference measuring system 5, face battle array device 6, " work " shape bracket 7, square equal cross-section beam 8, stress loading system 9, capacitance sensor probe 13 and sensor probe fixed module 17.7 one end of " work " shape bracket is fixed on optical platform 18, and the other end is for placing F-P Etalon interference measuring system 5；Face Battle array 6 long side of device and horizontal direction parallel are fixed on square equal cross-section beam 8, and its receiving surface and F-P Etalon interference are surveyed The optical axis of amount system 5 is vertical；The length of square equal cross-section beam 8 is about 1.5m, and one end is fixed on light with square equal cross-section girder construction It learns on vibration-isolating platform 18, and posts one piece without any defect in capacitance sensor probe induction zone domain and flatness is less than 0.05 μ The liquid crystal flat glass of m/mm；The size of stress F is changed by stress loading system 9.

F-P Etalon interference measuring system 5 include successively include mercury lamp light source 1, flexible optical fibre 2, F-P etalon 3, thoroughly Object lens 4 are penetrated, the spacing of the 3 two pieces of mirror boards in inside of F-P etalon is 2mm, transmits 4 focal length of object lens within the scope of 20~150mm. Before the light beam that mercury lamp light source 1 issues is transferred to F-P etalon 3 by optical fiber, and series standard circular cone light is generated on its exit facet Beam, series standard conical beam are imaged on face battle array device 6 after transmiting object lens 4.

Square equal cross-section beam 8 has a little groove at its stress point, and size can just be caught in a wire, protects Opposite slide will not occur between card little groove and wire.

" work " shape bracket 7 is about 15mm cylindrical type there are a diameter immediately below the stress point of square equal cross-section beam 8 It is hollow, guarantee not generating contact between the wire and bracket that get off from overhung.

Sensor probe fixed module 17 includes column 10, sliding block 11, bracket 12, fastener 14 and soket head cap screw 16, The smooth column 10 in surface is fixed on optical platform 18 by soket head cap screw 16, and sliding block 11 can slide up and down on column 10, Fastener 14 is used to sliding block 11 being fastened on column 10, and 12 one end of bracket is fixed on sliding block 11, and the other end is used to install electricity Hold sensor probe 13.

As shown in Fig. 2, stress loading system 9 include finer wire line 19, float 20, container beaker 21, digital calculation balance 22 with And screw mechanism landing platform 23, the linearity of the digital calculation balance 22 are 10^-5.Rectangle is suspended on 19 one end of wire On uniform beam 8 at little groove, the other end connects behind the cylindrical type hollow part in " work " shape bracket 7 with the float 20 of lower section It connects, float 20 is put into the beaker container 21 that one fills water (uncovered), and side's layer overlay pasta waterborne (reduces to the greatest extent Experimental error brought by water evaporation), container 21 is placed on 22 pallet of digital calculation balance.There is a spiral below digital calculation balance 22 Mechanism landing platform 23 changes the size of buoyancy by changing the position of landing platform 23, to change the size of stress F.

Linearity comparison method: when stress loading system 9 makes the stress F size acted on 8 end face of square equal cross-section beam When changing, so that the position of battle array device 6 changes above end face, to change interference circle on the battle array device 6 of face Imaging position calculates the change of displacement using the variation of the mean value of interference circle 11-15 ring center coordinate before and after stress variation Change amount；The capacitance change experienced simultaneously according to capacitance sensor probe, through being changed into electricity after signal condition detection circuit Signal output, to obtain displacement；Using stress variation as abscissa, drawn using center location variable quantity and displacement as dependent variable Respective linearity curve out completes the comparison of the linearity by the comparison to two curves.

Claims (5)

1. the linearity comparison device of the F-P micro-displacement measuring system based on capacitance sensor, including the measurement of F-P Etalon interference System (5), face battle array device (6), " work " shape bracket (7), square equal cross-section beam (8), stress loading system (9), capacitance sensor Probe (13) and sensor probe fixed module (17), it is characterised in that:

F-P Etalon interference measuring system (5) is placed on above " work " shape bracket (7), and face battle array device (6) is placed on F-P standard It is in same optical axis before tool interferometer measuration system (5) and with F-P Etalon interference measuring system (5) for being imaged, stress adds Loading system (9) changes the deformation quantity of square equal cross-section beam (8) by the change to stress F, and capacitance sensor pops one's head in (13) The surface of square equal cross-section beam (8) is fixed on by probe fixed module (17), to experience the deformation of square equal cross-section beam (8) Amount.

2. the linearity comparison device of the F-P micro-displacement measuring system according to claim 1 based on capacitance sensor, Be characterized in that: the square equal cross-section beam (8) has a little groove at its stress point, and size can just be caught in one Wire, and the capacitance sensor probe induction zone domain on the square equal cross-section beam (8) is posted one piece without any defect and is put down Whole liquid crystal flat glass (15) of the degree less than 0.05 μm/mm.

3. the linearity comparison device of the F-P micro-displacement measuring system according to claim 1 based on capacitance sensor, Be characterized in that: there are a cylindrical type skies at the stress point underface of square equal cross-section beam (8) for " work " the shape bracket (7) The heart.

4. the linearity comparison device of the F-P micro-displacement measuring system according to claim 1 based on capacitance sensor, Be characterized in that: the stress loading system (9) includes that one end is suspended on wire on square equal cross-section beam (8) at little groove (19), the other end is connect after passing through the cylindrical type hollow part in " work " shape bracket (7) with the float (20) of lower section, and float (20) is put It is placed in and fills the beaker container (21) for being covered with oil reservoir on water and the water surface, beaker container is changed by screw mechanism landing platform (23) (21) position, to change buoyancy size suffered by float (20), so that stress F's suffered by square equal cross-section beam (8) is big Small change, digital calculation balance (22) is for measuring buoyancy variation size.

5. the linearity comparison device of the F-P micro-displacement measuring system according to claim 1 based on capacitance sensor, Be characterized in that: the sensor probe fixed module (17) includes column (10), sliding block (11), bracket (12), fastener (14) the smooth column in surface (10) is fixed on optical platform (18) with soket head cap screw (16), soket head cap screw (16), Sliding block (11) can slide up and down on column (10), and fastener (14) is used to sliding block (11) being fastened on column (10), bracket (12) one end is fixed on sliding block (11), and the other end is used to install capacitance sensor probe (13).