CN208672562U - For detecting the micro-nano sensor of Organic substance in water content - Google Patents

For detecting the micro-nano sensor of Organic substance in water content Download PDF

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Publication number
CN208672562U
CN208672562U CN201820994896.3U CN201820994896U CN208672562U CN 208672562 U CN208672562 U CN 208672562U CN 201820994896 U CN201820994896 U CN 201820994896U CN 208672562 U CN208672562 U CN 208672562U
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electrode
micro
glass substrate
silicon chip
platinum
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Chinese (zh)
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金庆辉
张赞
尹加文
金涵
简家文
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Ningbo University
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Ningbo University
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Abstract

A kind of for detecting the micro-nano sensor of Organic substance in water content, platinum electrode lead (12) end segment setting silver/silver chloride electrode layer (2) in glass substrate (5) is provided;Glass substrate (5) is bonded covering silicon chip (1) above;Silicon chip (1) is provided with downwardly open formation liquid storage chamber (7), and liquid storage chamber (7) roof is arranged to form tapered micro holes (3) array, as the nanochannel with extraneous determinand ion exchange;Glass substrate (5) is provided with the liquid injection hole (14) communicated with liquid storage chamber (7), and configure Conductive sealant (8), platinum electrode lead (12) is drawn by Conductive sealant (8) lower end, and the saturated potassium chloride solution injected through liquid injection hole (14) is stored in liquid storage chamber (7);PbO2 working electrode (4) and platinum are arranged to electrode (9) in silicon chip (1) by tapered micro holes (3) battle array above;Realize the micromation of detection sensor, micropore (3) array substantially reduces velocity of ion exchange, significantly improves the service life of micro-nano sensor.

Description

For detecting the micro-nano sensor of Organic substance in water content
Technical field
The micro-nano biography that the utility model relates to a kind of for detecting the Organic substance in water content such as ocean, rivers, lake, reservoir Sensor belongs to environmental protection technical field, also belongs to sensor technical field.
Background technique
Chemical oxygen demand detection (Chemical Oxygen Demand) is chemically to measure to need in water sample by oxygen The amount of the reducing substances of change.It is one important and can comparatively fast measure the organic pollution parameter in water quality, Chang Yifu Number COD is indicated.Electrochemistry COD detection is that the hydroxyl radical free radical generated based on working electrode electrolysis has very strong oxidability, Rapid oxidation Organic substance in water can be synchronized, while hydroxyl radical free radical consumes, the electric current of working electrode will change.Work as work When electrode potential is constant, the variation of electric current and the content of Organic substance in water are proportional, can be surveyed by calculating current variation Measure the value of COD.Common electrochemistry COD is detected as three-electrode system, and furthermore there are also bichromates for common COD detection method Method, permanganimetric method, spectrophotometry, rapid-digestion method, rapid-digestion spectrophotometry etc..
Electrochemical measurement COD principle is: the hydroxyl radical free radical that working electrode surface generates leads to the organic matter in prepare liquid It is oxidized decomposition, oxidation reaction causes electron exchange to form electric current, the linear pass of content of organics in the size and water quality of electric current System.
In the three-electrode system of existing common electrochemical measurement COD, working electrode coats PbO using platinum wire2Material Material, reference electrode are Ag/AgCl reference electrode, use platinum electrode to electrode.The system is mostly three independent larger electricity Pole, cannot be with the integrated preparation of other electrodes in a sensor core on piece, working electrode and to spacing, relative area between electrode Inconvenience control, limits its application in terms of sensor.
Reference electrode (Reference Electrode, abbreviation RE) is to compare when measuring various electrode potentials as reference Electrode, the reference electrode of measured electrode and accurately known electrode potential numerical value is constituted into battery, measures cell emf Numerical value, so that it may calculate the electrode potential of tested fixed electrode.Usually multi-purpose slightly soluble salt electrode is as reference electrode, common reference Electrode has calomel electrode and silver-silver chloride electrode, and in addition there are copper-copper sulfate electrode, quinhydrone electrode, solid reference electrodes Deng.Reference electrode current potential is constant, and main function is measurement cell emf, calculates the benchmark of electrode potential.Common glass Pipe Ag/AgCl reference electrode has preparation simply, easy to use, is widely used in field of electrochemical detection.But it is led in sensor Domain can only be used in combination with other electrodes, and cannot limit it with the integrated preparation of other electrodes in a sensor core on piece Application in terms of sensor.You Duojia research institution is based on minute manufacturing technology and has developed all solid state reference of miniature Ag/AgCl Electrode, but the saturated potassium chloride solution as needed for electrode is very short in the holding time of electrode surface, so electrode uses the longevity Life is not grown, and is not able to satisfy the requirement of sensor long time continuous working.
So that there are degree of integration is low for the three-electrode system of existing common electrochemical measurement COD, service life is short, electricity The problem of extremely stable property difference.
Applicant in this case has submitted entitled " silver/silver chloride reference electrode and its a production side on November 29th, 2017 The application for a patent for invention of method " is announced, document number CN107941876A on 04 20th, 2018, provides a kind of Ag/AgCl ginseng Than electrode and preparation method thereof, notable feature is to be integrated with the micro-structure of nanohole array, can both play ion exchange Function, the speed of ion exchange is also effectively reduced, greatly improves the stability and service life of electrode.The utility model can be with Regard the further developmental achievement in this technical foundation as.
Summary of the invention
The micro-nano biography that the technical problem to be solved by the utility model is to provide a kind of for detecting Organic substance in water content The degree of integration of sensor and preparation method thereof, the shortcomings that overcoming existing sensor, sensor is high, long service life, and stability is good.
In order to solve the above-mentioned technical problem, technical solution used by the utility model micro-nano sensor are as follows:
It is a kind of for detecting the micro-nano sensor of Organic substance in water content, including can be with 7740 glass of Pyrex of wafer bonding Glass substrate (5), which is characterized in that glass substrate (5) upper surface is provided with platinum electrode lead (12), in platinum electrode lead (12) upper surface of end segment is provided with silver/silver chloride reference electrode layer (2);Glass substrate (5) is above with side bonded thereto It is (100) crystal face, twin polishing and the silicon chip (1) aoxidized that formula, which is covered with surface, and the two bonds together to form one;The silicon chip (1) the downwardly open chamber of the silver/silver chloride electrode layer (2), the atrium and the glass substrate (5) shape are at least contained in setting At the liquid storage chamber (7) for storing saturated potassium chloride solution, the setting of liquid storage chamber (7) roof is etched multiple using wet etching The small nanoscale tapered micro holes (3) of the big inner wall hole diameter in outer wall aperture, form tapered micro holes (3) array, and each tapered micro holes (3) are made The nanochannel of both sides' ion exchange is carried out to be in contact with extraneous determinand;The glass substrate (5) is provided with and the storage The liquid injection hole (14) that sap cavity (7) communicates, and configured with the Conductive sealant (8) for encapsulating the liquid injection hole (14), the platinum Contact conductor (12) and Conductive sealant (8) connect, and are drawn by Conductive sealant (8) lower end, storage in the liquid storage chamber (7) There is the saturated potassium chloride solution injected through liquid injection hole (14);The silicon chip (1) sets by the tapered micro holes (3) battle array above Set PbO2Working electrode (4) and platinum are to electrode (9).
The following are the utility model micro-nano sensor further embodiments:
The PbO of independent closed hoop is arranged in the silicon chip (1) around the tapered micro holes (3) array above2Work Electrode (4), the working electrode draw working electrode lead-out wire (15) from its ring body, around the cyclic annular working electrode setting In the cricoid platinum of opening to electrode (9), the platinum to electrode (9), from it, wherein draw to electrode outlet line by a terminal (13), another terminal is free end.
Silver/the silver chloride electrode layer (2) successively includes titanium-platinum electrode base conductive layer, metallic silver from bottom to surface Layer and metallic silver layer are using the Ag/AgCl layer formed after HCl treatment.
The liquid injection hole (14) of the glass substrate (5) is circular hole, and the silicon chip (1) is at Conductive sealant (8) position Downwardly open (16) for accommodating Conductive sealant (8) are set, and the Conductive sealant (8) is in rivet-like, and inner end is fallen into At downwardly open (16) of silicon chip (1), the liquid injection hole (14) of middle section and the glass substrate (5) matches, and outer end is stuck in glass Outside substrate (5);Silicon chip (1) bottom surface opens up V-shaped groove (17) between downwardly open chamber and downwardly open (16), as Liquid injection hole (14) to liquid storage chamber (7) reservoir channel.
The back side of the glass substrate (5) is coated with one layer of epoxy and is protected from light layer (6).
The micro-nano sensor includes outer package, and the outer package is in tapered micro holes (3) array, PbO2Working electrode (4) it is open with platinum to electrode (9) region, other positions all encapsulate, and draw the lead-out wire of each electrode.
In order to solve the above-mentioned technical problem, technical solution used by the production method of the utility model micro-nano sensor Are as follows:
The production method of micro-nano sensor as described above respectively includes the production of the silicon chip (1), the glass base The production of piece (5) and the bonding of the two, the injection of saturated potassium chloride solution, which is characterized in that further include Conductive sealant (8) Generation;The production of the silicon chip (1) the following steps are included:
Step 1: select surface for the single-sided polishing of (100) crystal face and aoxidize silicon wafer as silicon chip (1) material, table Face has silicon oxide layer (10), and silicon chip surface flatness is less than 1um;
Step 2: spinning coating photoresist (11) in substrate front, photoetching development prepares silicon oxide layer window, then rotten with BOE Liquid wet etching silicon oxide layer is lost, the window of microwell array is prepared;
Step 3: anisotropic wet etch silicon layer, prepares and not yet etches under the conditions of 80 DEG C using 30%KOH corrosive liquid Tapered micro holes (3) array worn;
Storage is prepared with BOE corrosive liquid etching oxidation silicon layer Step 4: overleaf spinning coating photoresist (11), photoetching development The window of sap cavity (7);
Step 5: anisotropic wet etch silicon layer, prepares liquid storage chamber under the conditions of 80 DEG C using 30%KOH corrosive liquid (7), until tow sides etching is worn, make the size control of perforation in < 1um by control corrosion rate rate and etching time, formed Etch tapered micro holes (3) array worn;
Step 6: removing photomask surface glue (11) using acetone, surface oxidized silicon layer is removed using BOE, becoming has storage The silicon base chip of sap cavity (7) and nanoscale tapered micro holes (3) array;
The production of the glass substrate (5) includes that selection can be used with 7740 glass substrate of Pyrex (5) of wafer bonding Laser boring method or ultrasonic drilling method get the liquid injection hole (14) that a diameter is 1mm to 2mm in setting position, and configure with The Conductive sealant (8) that liquid injection hole (14) shape matches;It is first prepared on glass substrate (5) surface using lift-off technique Platinum electrode lead (12) and titanium-platinum electrode base conductive layer prepare one layer of metal using galvanoplastic in titanium-platinum conductive layer Silver, using forming the silver/silver chloride reference electrode layer (2) after HCl treatment;
The silicon chip (1) is bonded the silicon chip (1) including completing above-mentioned preparation with both glass substrates (5) It is aligned with glass substrate (5), one is formed using silicon-glass anodic bonding mode;The micro-nano sensor is placed in solution not The setting or obliquity of reflux, through injecting saturated potassium chloride solution in liquid injection hole (14) Xiang Suoshu liquid storage chamber (7);Complete liquid feeding The backward liquid injection hole (14) squeezes into Conductive sealant (8), after the micro-nano sensor is placed in Conductive sealant in baking oven (8) baking and curing.
Further embodiment:
It is synchronized and is prepared for accommodating Conductive sealant using same method in the making step four of the silicon chip (1) (8) window of downwardly open (16);It is synchronized and is prepared for accommodating Conductive sealant (8) using same method in step 5 Downwardly open (16);Squeeze into Conductive sealant (8) to downwardly open (16) of the silicon chip (1), after baking and curing Formation falls into Conductive sealant (8) inner end of silicon chip (1).
The production of the glass substrate (5) further includes spinning coating one layer of epoxy at the back side of glass substrate (5) to be protected from light layer (6).
The production of the glass substrate (5) further includes spinning coating one layer of epoxy at the back side of glass substrate (5) to be protected from light layer (6).
The production method of reference electrode as described above, further includes finally being packaged by sets requirement.
The key technology of the utility model first is that the method for preparing Ag/AgCl electrode based on miromaching.Choosing Titanium-platinum electrode substrate can first be prepared using lift-off technique first and lead with 7740 glass substrate of Pyrex of wafer bonding by selecting Electric layer and contact conductor, second step prepare one layer of metallic silver using galvanoplastic in electrode site, and third step metallic silver layer uses salt Ag/AgCl electrode is formed after acid processing.
The key technology of the utility model second is that based on miromaching preparation work electrode on a silicon substrate Method.Selection can carry out (100) crystal orientation silicon wafer of anisotropic wet corrosion as substrate, carry out two-sided oxidation first, secondly Titanium substrate conductive layer and contact conductor are first prepared using lift-off technique, finally prepare one layer using galvanoplastic in electrode site PbO2Form working electrode.
The key technology of the utility model third is that preparing the side to electrode on a silicon substrate based on miromaching Method.Selection can carry out (100) crystal orientation silicon wafer of anisotropic wet corrosion as substrate, carry out two-sided oxidation first, next is adopted Titanium substrate conductive layer and contact conductor, shape paired electrode are first prepared with lift-off technique.
Described in the utility model a kind of for detecting the micro-nano sensor of Organic substance in water content, notable feature is to collect At the micro-structure of nanohole array, the stability and service life of electrode are improved, and is integrated into one with working electrode, to electrode Three-electrode system is integrated complete, the flexible and convenience of enhancing electrochemistry COD detection by body.
Compared with prior art, nanohole array, the potassium chloride of ion exchange are used for based on miromaching preparation Saturated solution liquid storage tank, Ag/AgCl electrode.Since nanohole array not only has the function of ion exchange, more due to nanoscale Aperture, velocity of ion exchange substantially reduce, and can effectively improve saturated potassium chloride solution uses the time, significantly improve its reference The service life of electrode, and then significantly improve the service life of micro-nano sensor.The utility model is by each electrode Integrated manufacture, in fact The now micromation of entire detection sensor, while there is longer service life, a kind of novel sensor microchip is formed, is had Can mass preparation, the remarkable advantages such as cost, consistency be good are reduced, for micro-nano sensor in water quality monitoring field using providing Support that there is important practical application value.
Detailed description of the invention
Fig. 1 is the utility model micro-nano sensor the schematic diagram of the section structure;
Fig. 2 is that each step shape changes schematic diagram in glass substrate manufacturing process;
Fig. 3 is that each step shape changes schematic diagram in silicon chip manufacturing process;
Fig. 4 is the utility model micro-nano three-dimensional sensor schematic diagram;
Fig. 5 is the utility model micro-nano sensor base stereoscopic schematic diagram;
Fig. 6 is glass substrate and platinum electrode lead, silver/silver chloride reference electrode layer stereoscopic schematic diagram;
Fig. 7 is glass substrate elevated bottom perspective schematic diagram;
Fig. 8 is silicon chip and PbO2Working electrode, platinum are to electrode stereoscopic schematic diagram;
Fig. 9 is silicon chip elevated bottom perspective schematic diagram.
Specific embodiment
The utility model is described in further detail below in conjunction with figure embodiment.
The utility model is used to detect the micro-nano sensor of Organic substance in water content, as shown in Fig. 1, Fig. 4 or Fig. 5, including Can be with 7740 glass substrate 5 of Pyrex of wafer bonding, 5 upper surface of glass substrate is provided with platinum electrode lead 12, in platinum electrode The upper surface of 12 end segment of lead is provided with silver/silver chloride reference electrode layer 2;Glass substrate 5 is above in mode bonded thereto Being covered with surface is (100) crystal face, twin polishing and the silicon chip 1 aoxidized, and the two bonds together to form one;Silicon chip 1 is arranged extremely Few downwardly open chamber for containing silver/silver chloride electrode layer 2, the atrium and glass substrate 5 are formed for storing potassium chloride saturation The liquid storage chamber 7 of solution, the big inner wall hole diameter in multiple outer wall apertures that the setting of 7 roof of liquid storage chamber is etched using wet etching is small to be received Meter level tapered micro holes 3, formed 3 array of tapered micro holes, each tapered micro holes 3 as be in contact with extraneous determinand carry out both sides from The nanochannel of son exchange;Glass substrate 5 is provided with the liquid injection hole 14 communicated with liquid storage chamber 7, and configured with for encapsulating fluid injection The Conductive sealant 8 in hole 14, platinum electrode lead 12 and Conductive sealant 8 connect, and are drawn by 8 lower end of Conductive sealant, storage The saturated potassium chloride solution injected through liquid injection hole 14 is stored in sap cavity 7;Silicon chip 1 is above in 3 gusts of tapered micro holes other settings PbO2Working electrode 4 and platinum are to electrode 9.Conductive sealant 8 is mixed by the metal powder and adhesive to conduct electricity very well Pulp, metal powder are preferred with silver powder, and curing molding is the good sealing element of electric conductivity after heating, drying.
As shown in Fig. 4 or Fig. 8, the PbO of independent closed hoop is arranged in silicon chip 1 around 3 array of tapered micro holes above2Work Make electrode 4, working electrode draws working electrode lead-out wire 15 from its ring body, around cyclic annular working electrode setting in open cyclic annular Platinum to electrode 9, platinum to electrode 9, from it, wherein draw to electrode outlet line 13 by a terminal, and another terminal is free end. Silver/silver chloride electrode layer 2 successively includes titanium-platinum electrode base conductive layer, metallic silver layer and metallic silver layer from bottom to surface Using the Ag/AgCl layer formed after HCl treatment.
As shown in Figure 6, Figure 7, the liquid injection hole 14 of glass substrate 5 is circular hole.As shown in figure 9, silicon chip 1 is in Conductive sealant Downwardly open 16 for accommodating Conductive sealant 8 are set at 8 positions.As shown in Figure 1, Conductive sealant 8 is in rivet-like, in It holds larger, falls at downwardly open the 16 of silicon chip 1, the liquid injection hole 14 of middle section and glass substrate 5 matches, and outer end is stuck in glass base 5 outside of piece;As shown in figure 9,1 bottom surface of silicon chip opens up V-shaped groove 17 between downwardly open chamber and downwardly open 16, as fluid injection Hole 14 to liquid storage chamber 7 reservoir channel.
As shown in Figure 1, the back side of glass substrate 5, which is coated with one layer of epoxy, is protected from light layer 6.Micro-nano sensor includes outer package, outside It is encapsulated in 3 array of tapered micro holes, PbO2Working electrode 4 and platinum are open to 9 region of electrode, and other positions all encapsulate, And draw the lead-out wire of each electrode.Metal shell can be used in outer package, as measured the plastics being more suitable for greatly using injection molding Part.
The production method of the utility model micro-nano sensor respectively includes the production of silicon chip 1, the production of glass substrate 5 And the bonding of the two, the injection of saturated potassium chloride solution, it further include the generation of Conductive sealant 8.The production of silicon chip 1 is as schemed Shown in 3, comprising the following steps:
Step 1: select surface for the single-sided polishing of (100) crystal face and aoxidize silicon wafer as 1 material of silicon chip, surface With silicon oxide layer 10, with a thickness of 2um or so, silicon chip surface flatness is less than 1um.
Step 2: photoetching development prepares silicon oxide layer window, then wet with BOE corrosive liquid in substrate front photoresist 11 Method etching oxidation silicon layer, prepares the window of microwell array;Photoresist 11 is suitble to use positive photoresist photoresist.
Step 3: anisotropic wet etch silicon layer, prepares and not yet etches under the conditions of 80 DEG C using 30%KOH corrosive liquid 3 array of tapered micro holes worn.
Liquid storage is prepared with BOE corrosive liquid etching oxidation silicon layer Step 4: overleaf spinning coating photoresist 11, photoetching development The window of chamber 7.
Step 5: anisotropic wet etch silicon layer under the conditions of 80 DEG C prepares liquid storage chamber 7 using 30%KOH corrosive liquid, Until tow sides etching is worn, makes the size control of perforation in < 1um by control corrosion rate rate and etching time, form etching 3 array of tapered micro holes worn.
Step 6: removing photomask surface glue 11 using acetone, surface oxidized silicon layer is removed using BOE, is become with liquid storage The silicon base chip of 3 array of chamber 7 and nanoscale tapered micro holes.
The specific fabrication processing of silicon chip 1 is as shown in figure 3, in figure:
The Wafer Cleaning of process A. twin polishing oxidation;
The front process B resist coating;Process C. photoetching, development;
Step D sputters platinum layer;
Process E. lift-off removes photoresist;
Process F. double-face spray painting photoresist;
Process G. photoetching, development;
Step H removes silicon oxide layer;
Process I. KOH corrodes nano-pore out;
PbO is electroplated in process J. platinum base bottom2Layer
The production of glass substrate 5 is as shown in Fig. 2, include that selection can be adopted with 7740 glass substrate 5 of Pyrex of wafer bonding Get the liquid injection hole 14 that a diameter is 1mm to 2mm in setting position with laser boring method or ultrasonic drilling method, and configure with The Conductive sealant 8 that 14 shape of liquid injection hole matches;Platinum electrode lead is first prepared using lift-off technique on 5 surface of glass substrate 12 and titanium-platinum electrode base conductive layer, one layer of metallic silver is prepared using galvanoplastic in titanium-platinum conductive layer, at hydrochloric acid Silver/silver chloride reference electrode layer 2 is formed after reason.
The specific fabrication processing of glass substrate 5 is as shown in Fig. 2, in figure:
The punching of process K. ultrasound, lift-off prepare titanium-platinum electrode site and lead;
Process L. electrochemistry plating metal Ag, HCl treatment form Ag/AgCl electrode;
Process M. epoxy is protected from light layer spin coating, completes electrode preparation.
Silicon chip 1 and the silicon chip 1 of both glass substrates 5 being bonded including completing above-mentioned preparation and glass substrate 5 are right Standard forms one using silicon-glass anodic bonding mode.Micro-nano sensor is placed in the setting or inclination position that solution does not flow back It sets, injects saturated potassium chloride solution into liquid storage chamber 7 through liquid injection hole 14.Conductive sealant is squeezed into liquid injection hole 14 after completion liquid feeding 8, after micro-nano sensor is placed in 8 baking and curing of Conductive sealant in baking oven.
Can be used in the making step four of silicon chip 1 same method synchronize prepare for accommodate Conductive sealant 8 to The window of under shed 16;It is synchronized and is prepared for accommodating the downwardly open of Conductive sealant 8 using same method in step 5 16;It squeezes into Conductive sealant 8 to downwardly open the 16 of silicon chip 1, is formed after baking and curing and fall into the conductive close of silicon chip 1 8 inner end of sealing.The production of glass substrate 5 further includes spinning coating one layer of epoxy at the back side of glass substrate 5 to be protected from light layer 6.It is described above Reference electrode production method, further include finally being packaged by sets requirement, and connect each contact conductor.
The utility model micro-nano sensor can be used for the Organic substance in water such as ocean, rivers, lake, reservoir COD detection, make It is identical as conventional three electrode detection COD System Utilization Procedures with method.

Claims (6)

1. a kind of for detecting the micro-nano sensor of Organic substance in water content, including can be with 7740 glass of Pyrex of wafer bonding Substrate (5), which is characterized in that glass substrate (5) upper surface is provided with platinum electrode lead (12), in platinum electrode lead (12) The upper surface of end segment is provided with silver/silver chloride reference electrode layer (2);Glass substrate (5) is covered above in mode bonded thereto Being stamped surface is (100) crystal face, twin polishing and the silicon chip (1) aoxidized, and the two bonds together to form one;The silicon chip (1) It is arranged and at least contains the downwardly open chamber of the silver/silver chloride reference electrode layer (2), the atrium and the glass substrate (5) The liquid storage chamber (7) for storing saturated potassium chloride solution is formed, the setting of liquid storage chamber (7) roof etches more using wet etching The small nanoscale tapered micro holes (3) of a big inner wall hole diameter in outer wall aperture form tapered micro holes (3) array, each tapered micro holes (3) The nanochannel of both sides' ion exchange is carried out as being in contact with extraneous determinand;The glass substrate (5) be provided with it is described The liquid injection hole (14) that liquid storage chamber (7) communicates, and configured with the Conductive sealant (8) for encapsulating the liquid injection hole (14), it is described Platinum electrode lead (12) and Conductive sealant (8) connect, and are drawn by Conductive sealant (8) lower end, in the liquid storage chamber (7) Store the saturated potassium chloride solution injected through liquid injection hole (14);The silicon chip (1) is above by the tapered micro holes (3) battle array PbO is set2Working electrode (4) and platinum are to electrode (9).
2. micro-nano sensor as described in claim 1, which is characterized in that the silicon chip (1) is micro- around the taper above The PbO of independent closed hoop is arranged in hole (3) array2Working electrode (4), the working electrode draw work electricity from its ring body Pole lead-out wire (15), around the cyclic annular working electrode setting in open cricoid platinum to electrode (9), the platinum is to electrode (9) from it, wherein a terminal is drawn to electrode outlet line (13), and another terminal is free end.
3. micro-nano sensor as described in claim 1, which is characterized in that the silver/silver chloride reference electrode layer (2) is from bottom It successively include being formed after titanium-platinum electrode base conductive layer, metallic silver layer and metallic silver layer uses HCl treatment to surface Ag/AgCl layers.
4. micro-nano sensor as described in claim 1, which is characterized in that the liquid injection hole (14) of the glass substrate (5) is circle Downwardly open (16) for accommodating Conductive sealant (8) are arranged in hole, the silicon chip (1) at Conductive sealant (8) position, The Conductive sealant (8) is in rivet-like, and inner end is fallen at downwardly open (16) of silicon chip (1), middle section and the glass The liquid injection hole (14) of substrate (5) matches, and outer end is stuck in outside glass substrate (5);Silicon chip (1) bottom surface is in downwardly open chamber V-shaped groove (17) are opened up between downwardly open (16), the reservoir channel as liquid injection hole (14) to liquid storage chamber (7).
5. micro-nano sensor as described in claim 1, which is characterized in that the back side of the glass substrate (5) is coated with one layer of ring Oxygen is protected from light layer (6).
6. micro-nano sensor as described in claim 1, which is characterized in that including outer package, the outer package is in tapered micro holes (3) array, PbO2Working electrode (4) and platinum are open to electrode (9) region, and other positions all encapsulate, and draw each The lead-out wire of electrode.
CN201820994896.3U 2018-06-27 2018-06-27 For detecting the micro-nano sensor of Organic substance in water content Withdrawn - After Issue CN208672562U (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108680627A (en) * 2018-06-27 2018-10-19 宁波大学 Micro-nano sensor and preparation method thereof for detecting Organic substance in water content
WO2021127169A1 (en) * 2019-12-17 2021-06-24 Elemental Scientific, Inc. Automated system for online detection of organic molecular impurities in semiconductor grade chemicals

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108680627A (en) * 2018-06-27 2018-10-19 宁波大学 Micro-nano sensor and preparation method thereof for detecting Organic substance in water content
CN108680627B (en) * 2018-06-27 2023-09-12 宁波大学 Micro-nano sensor for detecting organic matter content in water and manufacturing method thereof
WO2021127169A1 (en) * 2019-12-17 2021-06-24 Elemental Scientific, Inc. Automated system for online detection of organic molecular impurities in semiconductor grade chemicals

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