CN208636652U - A kind of preparation facilities of organic photoresist stripper - Google Patents

A kind of preparation facilities of organic photoresist stripper Download PDF

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Publication number
CN208636652U
CN208636652U CN201821067938.5U CN201821067938U CN208636652U CN 208636652 U CN208636652 U CN 208636652U CN 201821067938 U CN201821067938 U CN 201821067938U CN 208636652 U CN208636652 U CN 208636652U
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China
Prior art keywords
filter
storage tank
tank
outlet
blending tank
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CN201821067938.5U
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Chinese (zh)
Inventor
戈士勇
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JIANGYIN RUNMA ELECTRONIC MATERIAL CO Ltd
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JIANGYIN RUNMA ELECTRONIC MATERIAL CO Ltd
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The utility model discloses a kind of preparation facilities of organic photoresist stripper, including sequentially connected monoethanolamine storage tank, first filter, blending tank, regulating valve, the 4th filter and finished pot, organic solvent storage tank and surfactant storage tank are also connected on the blending tank, the organic solvent storage tank and surfactant storage tank are connected with blending tank again after the second filter and the connection of third filter, and the monoethanolamine storage tank is set in water bath heating device container.Each raw material is being mixed after filtering in the present apparatus, keep impurity in product less, alleviate the pressure that product filters after the completion of mixing, wherein monoethanolamine storage tank is arranged in water bath, when temperature is lower, first passing through water-bath will mix again after the monoethanolamine mild heat in storage tank, so that each component is more fully mixed, more evenly, product impurity is less, and purity is higher.

Description

A kind of preparation facilities of organic photoresist stripper
Technical field
The utility model relates to stripper preparation facilities technical fields, and in particular to a kind of system of organic photoresist stripper Standby device.
Background technique
Removing is materials'use chemical reaction or physical dissolution to be acted on and removed the technology of photoresist.Lift-off technology is divided into Wet process is removed photoresist removes photoresist with dry method, wherein it is using chemical reagent, via physical dissolution or chemical reaction photoresist that wet process, which is removed photoresist, Achieve the purpose that removing.Stripper is colourless transparent liquid, in the prior art, thin film transistor liquid crystal display, The removal that the industries such as light emitting diode, Organic Light Emitting Diode are used as photoresist in panel preparation process is mainly used by fluoride The stripper made of dangerous chemical reagent with hydrogen peroxide etc., but above-mentioned stripper has the following disadvantages: that detachment rate is difficult to Control, the peeling effect of different metal layer is variant, and treated that substrate has residual for stripper, influences the yield of product;Removing Liquid is undesirable to the photoresist lift off effect at figure deep hole;The chemical reagent such as fluoride and the hydrogen peroxide of product are influenced to work The safety operation for making personnel brings certain threat.
Chinese patent CN202522843U discloses a kind of preparation facilities of organic photoresist stripper, in the preparation facilities Organic solvent and organic amine mix after filtering respectively with surfactant, and finished product made from the preparation facilities still contains part Impurity, uneven in metal layer dispersion when use, still there are residuals in metal surface after removing.
Utility model content
The purpose of this utility model is that overcome defect existing in the prior art, provide that a kind of impurity is less, and purity is more Height, mixing more evenly, while can avoid temperature it is lower when monoethanolamine component crystallization organic photoresist stripper preparation dress It sets.
To achieve the above object, the technical solution of the utility model is to design a kind of preparation dress of organic photoresist stripper It sets, including monoethanolamine storage tank, organic solvent storage tank, surfactant storage tank, first filter, the second filter, third mistake Filter, blending tank, the 4th filter and finished pot;The monoethanolamine outlet is connected with first filter import, described First filter outlet is connected with blending tank import;The organic solvent outlet is connected with the second filter inlet, described Second filter outlet is connected with blending tank import, and the monoethanolamine storage tank is set in water bath heating device slot;The table Face activating agent outlet is connected with blending tank import again after being connected with third filter;The blending tank outlet and the 4th filtering Device import is connected, and is provided with regulating valve, the 4th mistake in the blending tank outlet and the connecting pipe of the 4th filter inlet Filter outlets are connected with finished pot import.
Preferred technical solution is that the first filter, the second filter, third filter and the 4th filter are Nuclepore membrane filter, wherein the aperture of the miillpore filter is 0.05-0.15 μm.
Preferred technical solution is that blender is equipped in the blending tank, and the blender is that rotational speed regulation formula ribbon stirs Mix device.Helical ribbon agitator is equipped in blending tank, and blender is that revolving speed is adjustable, has sticking each component and is mixed into When blending tank, using helical-ribbon type stirring rod, and according to the shape of mixture in blending tank, different mixing speeds is selected, is made each Component mixes more evenly.
Monoethanolamine in stripper component has lower fusing point and medium viscosity, in order to guarantee the seasons gas such as winter What temperature produced when lower goes on smoothly, and preferred technical solution is that an outer sleeve is arranged outside the blending tank, outside blending tank Collet cylinder is formed between wall and outer sleeve, is additionally provided with heating element in the collet cylinder;Opening, institute are equipped at the top of the outer sleeve It states opening and is embedded with spray equipment, the spray equipment is connect with external water system, and the outer sleeve bottom is equipped with water outlet Mouthful.
Preferred technical solution is that the blending tank and finished product top tank structure are stainless steel inner wall layer.
Advantages and beneficial effects of the utility model lie in that each raw material is being mixed after filtering in the present apparatus It closes, keeps impurity in product less, alleviate the pressure of product filtering after the completion of mixing, wherein being arranged monoethanolamine storage tank in water In bath, when temperature is lower, first passing through water-bath will mix again after the monoethanolamine mild heat in storage tank, so that each component Mixing more evenly, is stirred using the blender of ribbon stirring rod monoethanolamine higher for viscosity, makes each group in product It is point miscible more sufficiently, more evenly, product impurity is less, and purity is higher;Blending tank peripheral hardware collet cylinder sets heating element in collet cylinder And spray equipment, when temperature is lower in blending tank, starting spray equipment injects water, heating element starting, water into collet cylinder Temperature increases, and composition problem increases in blending tank body, promotes the uniform mixing of each component;When the temperature is excessively high, being beaten in blending tank Collet cylinder bottom discharge mouth is opened, hot water in collet cylinder is discharged, spray equipment spray condensed water is again started up, reduces temperature in blending tank Degree prevents from reacting between each component acutely in blending tank, reduces production risk, promotes orderly, the safety of stripper production task Progress.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the utility model organic photoresist stripper preparation facilities.
In figure: 1, monoethanolamine storage tank;2, organic solvent storage tank;3, surfactant storage tank;4, water bath heating device;5, First filter;6, the second filter;7, third filter;8, blending tank;9, helical ribbon agitator;10, regulating valve;11, the 4th Filter;12, finished pot.
Specific embodiment
With reference to the accompanying drawings and examples, specific embodiment of the present utility model is further described.Implement below Example is only used for clearly illustrating the technical solution of the utility model, and cannot be used as a limitation the protection model of limitation the utility model It encloses.
As shown in Figure 1, the utility model is a kind of preparation facilities of organic photoresist stripper, including monoethanolamine storage tank 1, organic solvent storage tank 2, surfactant storage tank 3, first filter 5, the second filter 6, third filter 7, blending tank 8, 4th filter 11 and finished pot 12;The outlet of monoethanolamine storage tank 1 is connected with 5 import of first filter, first mistake The outlet of filter 5 is connected with 8 import of blending tank;The organic solvent storage tank 2 outlet is connected with 6 import of the second filter, and described the The outlet of tow filtrator 6 is connected with 8 import of blending tank, and the monoethanolamine storage tank 1 is set in 4 slot of water bath heating device;It is described The outlet of surfactant storage tank 3 is connected with 8 import of blending tank again after being connected with third filter 7;The blending tank 8 outlet and the Four filters, 11 import is connected, and is provided with regulating valve in the outlet of blending tank 8 and the connecting pipe of 11 import of the 4th filter 10, the 4th filter 11 outlet is connected with 12 import of finished pot.Blender is equipped in the blending tank, the blender is Rotational speed regulation formula helical ribbon agitator 9.
The utility model organic photoresist stripper preparation facilities application method, includes the following steps:
First organic solvent, monoethanolamine and surfactant are passed through into micro-filtrate membrane filtration respectively, removes impurity, be then added In blending tank, after being uniformly mixed, by filtering, it is finally made the organic photoresist stripper that degree of purity is high, impurity is few Finished product.
The above is only the preferred embodiment of the utility model, it is noted that for the common skill of the art For art personnel, without deviating from the technical principle of the utility model, several improvements and modifications can also be made, these change It also should be regarded as the protection scope of the utility model into retouching.

Claims (5)

1. a kind of preparation facilities of organic photoresist stripper, which is characterized in that the preparation facilities include monoethanolamine storage tank, Organic solvent storage tank, surfactant storage tank, first filter, the second filter, third filter, blending tank, the 4th filtering Device and finished pot;The monoethanolamine outlet is connected with first filter import, and the first filter is exported and mixed Tank import is connected;The organic solvent outlet is connected with the second filter inlet, second filter outlet with mix Tank import is connected, and the monoethanolamine storage tank is set in water bath heating device container;The surfactant outlet with Third filter is connected with blending tank import again after being connected;The blending tank outlet is connected with the 4th filter inlet, described mixed Close be provided in tank outlet and the connecting pipe of the 4th filter inlet regulating valve, the 4th filter outlet and finished pot into Mouth is connected.
2. the preparation facilities of organic photoresist stripper according to claim 1, which is characterized in that first filtering Device, the second filter, third filter and the 4th filter are nuclepore membrane filter, wherein the aperture of the miillpore filter It is 0.05-0.15 μm.
3. the preparation facilities of organic photoresist stripper according to claim 2, which is characterized in that set in the blending tank There is blender, the blender is rotational speed regulation formula helical ribbon agitator.
4. the preparation facilities of organic photoresist stripper according to claim 3, which is characterized in that the blending tank housing If an outer sleeve, collet cylinder is formed between the outer wall and outer sleeve of blending tank, is additionally provided with heating element in the collet cylinder;Institute It states and is equipped with opening at the top of outer sleeve, the opening is embedded with spray equipment, and the spray equipment is connect with external water system, The outer sleeve bottom is equipped with water outlet.
5. the preparation facilities of organic photoresist stripper according to any one of claims 1-4, which is characterized in that described Blending tank and finished product top tank structure are stainless steel inner wall layer.
CN201821067938.5U 2018-07-06 2018-07-06 A kind of preparation facilities of organic photoresist stripper Active CN208636652U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201821067938.5U CN208636652U (en) 2018-07-06 2018-07-06 A kind of preparation facilities of organic photoresist stripper

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201821067938.5U CN208636652U (en) 2018-07-06 2018-07-06 A kind of preparation facilities of organic photoresist stripper

Publications (1)

Publication Number Publication Date
CN208636652U true CN208636652U (en) 2019-03-22

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CN201821067938.5U Active CN208636652U (en) 2018-07-06 2018-07-06 A kind of preparation facilities of organic photoresist stripper

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115337813A (en) * 2022-08-29 2022-11-15 合肥清溢光电有限公司 Waste photoresist regeneration device and regeneration method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115337813A (en) * 2022-08-29 2022-11-15 合肥清溢光电有限公司 Waste photoresist regeneration device and regeneration method thereof

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