CN208489179U - A kind of portable deburring carrier for the wafer with Notch - Google Patents
A kind of portable deburring carrier for the wafer with Notch Download PDFInfo
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- CN208489179U CN208489179U CN201821017070.8U CN201821017070U CN208489179U CN 208489179 U CN208489179 U CN 208489179U CN 201821017070 U CN201821017070 U CN 201821017070U CN 208489179 U CN208489179 U CN 208489179U
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- notch
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- carrier
- bottom plate
- circular
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Abstract
The utility model discloses a kind of portable deburring carriers for the wafer with Notch, including carrier and independently of the mask plate of the carrier；The carrier includes circular bottom plate, and the first circular hole is arranged in the middle part of the circular bottom plate, and first circular hole is provided with the second circular hole；The side wall of the circular bottom plate is sequentially arranged at intervals with arc locating piece around circumference；In the side wall close to the circular bottom plate and the setting of the position apart from the adjacent arc locating piece equidistance of any two Notch location hole；The mask plate includes mask plate inner ring and mask plate outer ring, and the diameter of the mask plate outer ring is with the diameter of the circular bottom plate and the brilliant diameter of a circle with Notch is consistent.The utility model facilitates the deburring of the wafer with Notch, wafer with Notch is placed in center, make edge one enclose photoresist hardening by edge exposure to be difficult to remove, while guaranteeing that glue surface is intact smooth, solves the problems, such as that subsequent plating metal salient point is uneven.
Description
Technical field
The utility model relates to wafer technology fields more particularly to a kind of portable for the wafer with Notch to repair
Side carrier.
Background technique
After the completion of photoresist coats exposure operation automatically at present, the wafer disk edge one with Notch encloses inactive area
It has opening to be outputed, affect to subsequent electroplating technology.To avoid inactive area from outputing, plating is reduced
It is lost caused by technique, needs to carry out deburring processing manually again, increase certain task difficulty and extend time cost.
Utility model content
Technical problem to be solved in the utility model is to overcome the defect of background technique, is provided a kind of for having
The portable deburring carrier of the wafer of Notch.By deburring carrier described in the utility model, the wafer with Notch is facilitated
Deburring and greatly reduce operating cost, the wafer with Notch is placed in center, by the mode of edge exposure
Make edge one enclose photoresist hardening to be difficult to remove, while guaranteeing that glue surface is intact smooth, solves subsequent plating metal (or alloy)
The problem of salient point is uneven；Avoid the problem that the wafer manual positioning low precision with Notch；First circular hole, second
Circular hole belongs to vacuum hole, improves the stability of the wafer position with Notch in operation process；The utility model structure arrangement
Compact, structure is simple, is skillfully constructed, practical.
It is as follows that the utility model solves technical solution used by above-mentioned technical problem:
A kind of portable deburring carrier for the wafer with Notch, including carrier and covering independently of the carrier
Diaphragm plate；The carrier includes circular bottom plate, and the first circular hole is arranged in the middle part of the circular bottom plate, equal around first circular hole
It is even to be provided with several the second circular holes；The side wall of the circular bottom plate, which is sequentially arranged at intervals with several arcs around circumference, to be determined
Position block；The side wall of the close circular bottom plate and the arc locating piece adjacent apart from any two in the circular bottom plate
Notch location hole is arranged in the position of equidistance；The mask plate includes mask plate inner ring and mask plate outer ring, the mask plate
Brilliant diameter of a circle of the diameter of outer ring with the diameter of the circular bottom plate and with Notch is consistent；The mask plate can be effective
Solve the problems, such as expose side when position.
Further, the aperture of first circular hole is less than the aperture of second circular hole.
Further, the quantity of first circular hole is one, and the quantity of second circular hole is four.
Further, the quantity of the arc locating piece is four pieces.
Further, the circular bottom plate and the arc locating piece are integrally formed.
Further, the Notch location hole includes the first Notch location hole being triangularly arranged, the 2nd Notch fixed
Position hole and the 3rd Notch location hole；The first Notch location hole, the 2nd Notch location hole and the 3rd Notch
The Notch of location hole and the wafer with Notch contraposition coincide.
Further, the aperture of the first Notch location hole is greater than the aperture of the 2nd Notch location hole and described
The aperture of 3rd Notch location hole, the 2nd Notch location hole aperture are equal to the aperture of the 3rd Notch location hole.
Further, the mask plate outer ring with a thickness of 3mm；The mask plate outer ring is transparent, and belongs to transparent area
Domain, the transparent region make photoresist exposure after-hardening be difficult to remove after light transmission operation, keep glue surface intact smooth, so as to
It enough solves the problems, such as to be uneven when subsequent plating metal (or alloy) salient point.
Further, the size of the wafer with Notch is 8 cun.
Compared with prior art, the utility model has the beneficial effects that
(1) the utility model includes and 8 cun of consistent special carriers of wafer size with Notch and matched special covers
Diaphragm plate facilitates the deburring of the wafer with Notch for the placement positioning and exposure operation of 8 cun of wafers with Notch
And operating cost is greatly reduced, the wafer with Notch, which is placed in center, makes edge by the mode of edge exposure
One circle photoresist hardening is difficult to remove, while guaranteeing that glue surface is intact smooth, solves subsequent plating metal (or alloy) salient point and goes out
The problem of being now uneven；
(2) carrier described in the utility model includes arc locating piece and Notch location hole, avoids the wafer with Notch
The problem of manualling locate low precision；
(3) first circular hole in carrier described in the utility model and second circular hole belong to vacuum hole, improve and make
The stability of wafer position during industry；
(4) the consistent special mask plate of diameter of diameter and circular bottom plate of the utility model equipped with mask plate outer ring, institute
Stating mask plate can be effectively solved the problem of positioning when exposing side；The mask plate outer ring with a thickness of 3mm, be transparent, belong to
In transmission region, photoresist exposure after-hardening is made to be difficult to remove by light transmission operation；
(5) the utility model structure characteristics of compact layout, structure is simple, is skillfully constructed, practical.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of carrier described in the utility model embodiment 1；
Fig. 2 is the structural schematic diagram of mask plate described in the utility model embodiment 1；
Fig. 3 is the structural schematic diagram that carrier described in the utility model embodiment 1 installs 8 cun of wafers with Notch；
Fig. 4 is the structural schematic diagram that carrier described in the utility model embodiment 1 installs the mask plate.
The corresponding component names of each appended drawing reference are in figure: 1- carrier；2- mask plate；3- circular bottom plate；4- first
Circular hole；The second circular hole of 5-；6- arc locating piece；7-Notch location hole；8- mask plate inner ring；9- mask plate outer ring；10- has
The wafer of Notch；The first Notch location hole of 11-；The 2nd Notch location hole of 12-；The 3rd Notch location hole of 13-；14-
Notch。
Specific embodiment
The content of the utility model in order to better understand, is described further with attached drawing combined with specific embodiments below.
It should be understood that these embodiments are only used for, the present invention will be further described, rather than limitation the scope of the utility model.This
Outer to should be understood that after having read content described in the utility model, person skilled in art makes the utility model
Nonessential change or adjustment, still fall within the protection scope of the utility model.
Embodiment 1
A kind of portable deburring carrier for the wafer with Notch, as shown in figures 1-4, including carrier 1 and independence
In the mask plate 2 of the carrier 1；The carrier 1 includes circular bottom plate 3, and the first circular hole 4 is arranged in the middle part of the circular bottom plate 3,
Several the second circular holes 5 are evenly arranged with around first circular hole 4；The side wall of the circular bottom plate 3 around circumference according to
Minor tick is provided with several arc locating pieces 6；Close to the side wall and distance of the circular bottom plate 3 in the circular bottom plate 3
Notch location hole 7 is arranged in the position of adjacent 6 equidistance of arc locating piece of any two；The mask plate 2 includes covering
Diaphragm plate inner ring 8 and mask plate outer ring 9, the diameter of the mask plate outer ring 9 and the diameter of the circular bottom plate 3 and have Notch
Wafer 10 diameter it is consistent.
The aperture of first circular hole 4 is less than the aperture of second circular hole 5.
The quantity of first circular hole 4 is one, and the quantity of second circular hole 5 is four.
The quantity of the arc locating piece 6 is four pieces.
The circular bottom plate 3 and the arc locating piece 6 are integrally formed.
The mask plate outer ring 9 with a thickness of 3mm.
The size of the wafer 10 with Notch is 8 cun.
Embodiment 2
As further embodiment, the present embodiment is substantially the same manner as Example 1, and difference is, as shown in figures 1 and 3,
The Notch location hole 7 includes the first Notch location hole 11, the 2nd Notch location hole 12 and the third being triangularly arranged
Notch location hole 13；The first Notch location hole 11, the 2nd Notch location hole 12 and the 3rd Notch positioning
The Notch 14 of hole 13 and the wafer 10 with Notch contraposition coincide.
Aperture of the aperture of the first Notch location hole 11 greater than the 2nd Notch location hole 12 and the third
The aperture of Notch location hole 13,12 aperture of the 2nd Notch location hole are equal to the aperture of the 3rd Notch location hole 13.
This implements novel process for using:
(1) as shown in Figure 1, the design size of carrier described in the utility model 1 and exposure machine platform coincide, arc is utilized
The carrier 1 is placed on board and fixes position by locating piece 6, enables the carrier 1 is stable to be stuck on board；
(2) described to have Notch's as shown in figure 3,8 cun of wafers 10 with Notch are placed on the carrier 1
Wafer 10 and the Notch location hole 7 contraposition coincide, and enable 8 cun of 10 firm stables of wafer with Notch in the load
On tool 1；
(3) as shown in Figure 2 and Figure 4, the diameter of mask plate outer ring 9 and the diameter of the circular bottom plate 3 is consistent mating
Mask plate 2 be placed on the wafer 10 with Notch, pass through the fixed positions of four pieces of arc locating pieces 6；
(4) finally execute expose side movement, mask plate outer ring 9 with a thickness of 3mm, be transparent, belong to transmission region, have
After overexposure, glue surface hardening is difficult to remove the glue-line transmission region of 10 surface of the wafer coating of Notch, keeps glue surface intact flat
It is whole, so as to be uneven when solving the problems, such as subsequent plating metal (or alloy) salient point.
The utility model has the beneficial effects that
(1) the utility model includes with 8 cun with the consistent special carrier 1 of wafer size of Notch and matched special
Mask plate 2 facilitates the wafer with Notch for the placement positioning and exposure operation of 8 cun of wafers 10 with Notch
10 deburring and operating cost is greatly reduced, the wafer 10 with Notch is placed in center by edge exposure
Mode makes edge one enclose photoresist hardening to be difficult to remove, while guaranteeing that glue surface is intact smooth, solves subsequent plating metal and (or closes
Gold) salient point the problem of being uneven；
(2) carrier described in the utility model includes arc locating piece 6 and Notch location hole 7, avoids the crystalline substance with Notch
The problem of 10 manual positioning low precision of circle；
(3) first circular hole 4 in carrier described in the utility model and second circular hole 5 belong to vacuum hole, improve
The stability of wafer position in operation process；
(4) the consistent special mask plate 2 of diameter of diameter and circular bottom plate 3 of the utility model equipped with mask plate outer ring 9,
The mask plate 2 can be effectively solved the problem of positioning when exposing side；The mask plate outer ring 9 with a thickness of 3mm, it is transparent
Shape belongs to transmission region, makes photoresist exposure after-hardening be difficult to remove by light transmission operation；
(5) the utility model structure characteristics of compact layout, structure is simple, is skillfully constructed, practical.
Above description is not limitation of the utility model, and the utility model is also not limited to the example above.This technology neck
In the essential scope of the utility model, the variations, modifications, additions or substitutions made also should belong to the those of ordinary skill in domain
The protection scope of the utility model.
Claims (9)
1. a kind of portable deburring carrier for the wafer with Notch, which is characterized in that including carrier (1) and independently of
The mask plate (2) of the carrier (1)；The carrier (1) includes circular bottom plate (3), the middle part of the circular bottom plate (3) setting the
One circular hole (4) is evenly arranged with several the second circular holes (5) around first circular hole (4)；The circular bottom plate (3)
Side wall is sequentially arranged at intervals with several arc locating pieces (6) around circumference；Close to the circle on the circular bottom plate (3)
The side wall of shape bottom plate (3) and position setting Notch apart from adjacent arc locating piece (6) equidistance of any two is fixed
Position hole (7)；The mask plate (2) includes mask plate inner ring (8) and mask plate outer ring (9), the diameter of the mask plate outer ring (9)
With the diameter of the circular bottom plate (3) and the diameter of wafer (10) with Notch is consistent.
2. a kind of portable deburring carrier for the wafer with Notch as described in claim 1, which is characterized in that institute
The aperture for stating the first circular hole (4) is less than the aperture of second circular hole (5).
3. a kind of portable deburring carrier for the wafer with Notch as described in claim 1, which is characterized in that institute
The quantity for stating the first circular hole (4) is one, and the quantity of second circular hole (5) is four.
4. a kind of portable deburring carrier for the wafer with Notch as described in claim 1, which is characterized in that institute
The quantity for stating arc locating piece (6) is four pieces.
5. a kind of portable deburring carrier for the wafer with Notch as described in Claims 1 to 4 any one,
It is characterized in that, the circular bottom plate (3) and the arc locating piece (6) are integrally formed.
6. a kind of portable deburring carrier for the wafer with Notch as described in claim 1, which is characterized in that institute
Stating Notch location hole (7) includes the first Notch location hole (11) being triangularly arranged, the 2nd Notch location hole (12) and
Three Notch location holes (13)；The first Notch location hole (11), the 2nd Notch location hole (12) and the third
The Notch (14) of Notch location hole (13) and the wafer (10) with Notch contraposition coincide.
7. a kind of portable deburring carrier for the wafer with Notch as claimed in claim 6, which is characterized in that institute
The aperture for stating the first Notch location hole (11) is greater than the aperture of the 2nd Notch location hole (12) and the 3rd Notch determines
The aperture in position hole (13), the 2nd Notch location hole (12) aperture are equal to the aperture of the 3rd Notch location hole (13).
8. a kind of portable deburring carrier for the wafer with Notch as described in claim 1, which is characterized in that institute
State mask plate outer ring (9) with a thickness of 3mm.
9. a kind of portable deburring carrier for the wafer with Notch as described in claim 1, which is characterized in that institute
The size for stating the wafer (10) with Notch is 8 cun.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821017070.8U CN208489179U (en) | 2018-06-29 | 2018-06-29 | A kind of portable deburring carrier for the wafer with Notch |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821017070.8U CN208489179U (en) | 2018-06-29 | 2018-06-29 | A kind of portable deburring carrier for the wafer with Notch |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208489179U true CN208489179U (en) | 2019-02-12 |
Family
ID=65248905
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821017070.8U Active CN208489179U (en) | 2018-06-29 | 2018-06-29 | A kind of portable deburring carrier for the wafer with Notch |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN208489179U (en) |
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2018
- 2018-06-29 CN CN201821017070.8U patent/CN208489179U/en active Active
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