CN208438211U - A kind of protective device of low sodium ion GaAs polishing fluid anti-leak - Google Patents
A kind of protective device of low sodium ion GaAs polishing fluid anti-leak Download PDFInfo
- Publication number
- CN208438211U CN208438211U CN201821015284.1U CN201821015284U CN208438211U CN 208438211 U CN208438211 U CN 208438211U CN 201821015284 U CN201821015284 U CN 201821015284U CN 208438211 U CN208438211 U CN 208438211U
- Authority
- CN
- China
- Prior art keywords
- polishing fluid
- spareslots
- spare
- outside
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 97
- 239000012530 fluid Substances 0.000 title claims abstract description 69
- 230000001681 protective effect Effects 0.000 title claims abstract description 46
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 title claims abstract description 19
- 229910001415 sodium ion Inorganic materials 0.000 title claims abstract description 19
- 229910001218 Gallium arsenide Inorganic materials 0.000 title claims abstract description 18
- 239000007788 liquid Substances 0.000 claims abstract description 73
- 239000011521 glass Substances 0.000 claims description 5
- 238000003466 welding Methods 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims 1
- 230000000694 effects Effects 0.000 description 4
- 239000002699 waste material Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 230000003139 buffering effect Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910000967 As alloy Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 241000500881 Lepisma Species 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- VQLYBLABXAHUDN-UHFFFAOYSA-N bis(4-fluorophenyl)-methyl-(1,2,4-triazol-1-ylmethyl)silane;methyl n-(1h-benzimidazol-2-yl)carbamate Chemical compound C1=CC=C2NC(NC(=O)OC)=NC2=C1.C=1C=C(F)C=CC=1[Si](C=1C=CC(F)=CC=1)(C)CN1C=NC=N1 VQLYBLABXAHUDN-UHFFFAOYSA-N 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
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- Sampling And Sample Adjustment (AREA)
Abstract
The utility model discloses a kind of protective devices of low sodium ion GaAs polishing fluid anti-leak, including minim pipette and spareslots, latch plate is mounted at left and right sides of the minim pipette, and the upper end of latch plate is provided with latch axis, liquid funnel is installed out above the minim pipette, and movable folder is provided on the outside of liquid funnel out, spare pipe close is installed on the left of the spareslots, and spareslots is located at the top of liquid funnel, the spareslots is internally provided with spare slot plug, and elastic rod is installed above spare slot plug, spare pipe is provided on the left of the spare pipe close, and connecting tube is fixed with below spare pipe, the connecting tube is internally provided with rotation piston, and liquid push rod is installed out on the left of rotation piston.The protective device of the low sodium ion GaAs polishing fluid anti-leak is equipped with protective trough and rotation piston, can prevent polishing fluid from revealing, and can control the flow velocity of polishing fluid.
Description
Technical field
The utility model relates to the protective device technical field of liquid anti-leak, specially a kind of low sodium ion GaAs is thrown
The protective device of light liquid anti-leak.
Background technique
Polishing fluid be it is a kind of without any sulphur, phosphorus, chlorine additive water-soluble polishing agent, have good degreasing, prevent
Rust, is cleaned and performance of adding lustre to, and metal product can be made to be more than original gloss, and performance is stable, nontoxic, and no pollution to the environment etc. is made
With, polishing fluid application method, including ratchet spanner, open-end wrench, batch nozzle, box spanner, die nut, screwdriver etc., slicker solder
The metal products such as alloy, kirsite reuse polishing agent cooperation vibro-grinding light polishing machine, low sodium ion arsenic after grinding
Gallium polishing fluid belongs to one kind of polishing fluid.Modern polishing fluid, using bottled packaging, when use, opens bottle cap and pours out, so
And in actual use, after pouring out liquid, bottleneck has a small amount of residual liquid, this partially liq can flow down along body collar extension,
So the waste of resource is caused, and opens and closes bottle cap back and forth when using polishing fluid, it is extremely onerous, meanwhile, it throws
Light liquid is also easy to overturn leakage, for this purpose, it is proposed that a kind of protective device that can prevent polishing fluid from revealing.
Utility model content
The purpose of this utility model is to provide a kind of protective device of low sodium ion GaAs polishing fluid anti-leak, with
Solve polishing fluid mentioned above in the background art using when open bottle cap and pour out, however in actual use, pour out liquid
Bottleneck has a small amount of residual liquid afterwards, this partially liq can flow down along body collar extension, so causes resource
Waste, and bottle cap is opened and closed back and forth when using polishing fluid, it is extremely onerous, meanwhile, polishing fluid is also easy to overturn leakage
Problem.
To achieve the above object, the utility model provides the following technical solutions: a kind of low sodium ion GaAs polishing fluid use
The protective device of anti-leak, including minim pipette and spareslots are mounted on latch plate, and latch at left and right sides of the minim pipette
The upper end of plate is provided with latch axis, and liquid funnel is equipped with out above the minim pipette, and is provided with work on the outside of liquid funnel out
Dynamic folder, is equipped with spare pipe close on the left of the spareslots, and spareslots is located at the top of liquid funnel, the spareslots it is interior
Portion is provided with spare slot plug, and elastic rod is equipped with above spare slot plug, is provided with spare pipe on the left of the spare pipe close,
And connecting tube is fixed with below spare pipe, the connecting tube is internally provided with rotation piston, and rotates the left side peace of piston
Equipped with liquid push rod out, it is provided with separator tube above the liquid push rod out, and the inside of separator tube is fixed with and slips through the net, the buffering
Polishing liquid bath is installed, and the front for polishing liquid bath is provided with glass bar, is equipped with above the polishing liquid bath above pipe
Slot cover, and shaft is internally provided on the left of slot cover, outside, the outside of separator tube and the outside of connecting tube of the polishing liquid bath
It is provided with protective trough.
Preferably, the latch axis is embedded in out the left and right sides of liquid funnel, and latch plate is leaked by latch axis and liquid out
Bucket constitutes rotational structure.
Preferably, the lateral surface of the spare slot plug and the inner wall of spareslots are bonded to each other, and spare slot plug and elastic rod
Between for welding.
Preferably, shape of the rotation piston inside connecting tube is disk-shaped, and is rotated at top land plectane
Diameter size is equal with the inner wall size of connecting tube.
Preferably, the shaft is embedded in the inside of slot cover, and slot cover constitutes rotational structure by shaft and polishing liquid bath.
Preferably, the protective trough on the outside of the polishing liquid bath is communicated with the protective trough on the outside of separator tube, and on the outside of separator tube
Protective trough communicated with the protective trough on the outside of connecting tube, and the protective trough on the outside of separator tube is communicated with spare pipe, while spare
Pipe is communicated with spareslots.
Compared with prior art, the utility model has the beneficial effects that the low sodium ion GaAs polishing fluid anti-leak
Protective device be used cooperatively by latch plate and latch axis, in case of emergency latch board clamping minim pipette can be allowed, so that drop
Liquid pipe no longer dropping liquid, avoids the occurrence of the problem of polishing fluid overuses, and the setting of elastic rod and spare slot plug can stopped using
It,, can will be more in liquid funnel out using air pressure principle so that spare slot plug moves up by pulling elastic rod when polishing fluid
Remaining polishing fluid is drawn onto spareslots, facilitates next use, is unlikely to waste, and by the lower end of rotation rotation piston, is adjusted
Polishing fluid facilitates the dosage needed for controlling polishing fluid when in use, accomplishes accurately to use polishing fluid in the flow velocity Jing Guo connecting tube,
Slot cover can tightly be covered on polishing liquid bath by shaft, so that even if in the case where very shaking, polishing fluid will not be from
Spilling in polishing liquid bath, protective trough can prevent polishing liquid bath, separator tube and connecting tube when there is crack, polishing fluid outflow, when
When polishing fluid is revealed, polishing fluid can flow into protective trough, and protective trough is connected by spare pipe with spareslots, and spare pipe close is opened, and draw
The polishing fluid of leakage can be sucked in spareslots, realize leakage-preventing purpose by the elastic rod in dynamic spareslots.
Detailed description of the invention
FIG. 1 is a schematic structural view of the utility model；
Fig. 2 is the utility model surface structure schematic diagram；
Fig. 3 is enlarged structure schematic diagram at A in the utility model Fig. 1.
In figure: 1, minim pipette；2, latch plate；3, latch axis；4, go out liquid funnel；5, activity folder；6, spareslots；7, spare pipe
Plug；8, spare slot plug；9, elastic rod；10, spare pipe；11, connecting tube；12, piston is rotated；13, go out liquid push rod；14, separator tube；
15, it slips through the net；16, liquid bath is polished；17, glass bar；18, slot cover；19, shaft；20, protective trough.
Specific embodiment
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole
Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work
Every other embodiment obtained, fall within the protection scope of the utility model.
Please refer to Fig. 1-3, the utility model provides a kind of technical solution: a kind of low sodium ion GaAs polishing fluid is let out with anti-
The protective device of leakage, including minim pipette 1 and spareslots 6, the left and right sides of minim pipette 1 are mounted on latch plate 2, and latch plate 2
Upper end be provided with latch axis 3, the top of minim pipette 1 is equipped with out liquid funnel 4, and the outside of liquid funnel 4 is provided with activity out
Folder 5, latch axis 3 is embedded in out the left and right sides of liquid funnel 4, and latch plate 2 is made up of with liquid funnel 4 out latch axis 3 and rotates
The protective device of structure, the low sodium ion GaAs polishing fluid anti-leak is used cooperatively by latch plate 2 and latch axis 3, can
In case of emergency, latch plate 2 is allowed to clamp minim pipette 1, so that the no longer dropping liquid of minim pipette 1, avoids the occurrence of polishing fluid and overuse
The problem of, the left side of spareslots 6 is equipped with spare pipe close 7, and spareslots 6 is located at the top of liquid funnel 4, spareslots 6 it is interior
Portion is provided with spare slot plug 8, and the top of spare slot plug 8 is equipped with elastic rod 9, lateral surface and the spareslots 6 of spare slot plug 8
Inner wall is bonded to each other, and is welding between spare slot plug 8 and elastic rod 9, and the setting of elastic rod 9 and spare slot plug 8 can stop
When using polishing fluid, by pulling elastic rod 9, so that spare slot plug 8 moves up, using air pressure principle, it can will go out liquid funnel 4
In extra polishing fluid be drawn onto spareslots 6, facilitate next use, be unlikely to waste, the left side of spare pipe close 7 is provided with standby
It is fixed with connecting tube 11 with the lower section of pipe 10, and spare pipe 10, connecting tube 11 is internally provided with rotation piston 12, and rotates and live
The left side of plug 12 is equipped with out liquid push rod 13, and it is disk-shaped for rotating shape of the piston 12 inside connecting tube 11, and rotates piston
Diameter size at 12 top plectanes is equal with the inner wall size of connecting tube 11, adjustable by the lower end of rotation rotation piston 12
Polishing fluid is saved in the flow velocity Jing Guo connecting tube 11, facilitates the dosage needed for controlling polishing fluid when in use, accomplishes accurately to use and throw
Light liquid, the top of liquid push rod 13 is provided with separator tube 14 out, and the inside of separator tube 14 is fixed with and slips through the net 15, separator tube 14 it is upper
Side is equipped with polishing liquid bath 16, and the front for polishing liquid bath 16 is provided with glass bar 17, and the top of polishing liquid bath 16 is equipped with slot
Lid 18, and the left side of slot cover 18 is internally provided with shaft 19, shaft 19 is embedded in the inside of slot cover 18, and slot cover 18 passes through shaft
19 constitute rotational structure with polishing liquid bath 16, can tightly be covered slot cover 18 on polishing liquid bath 16 by shaft 19, so that even if
In the case where very shaking, polishing fluid will not spill from polishing liquid bath 16, polish the outside of liquid bath 16, separator tube 14
Outside and the outside of connecting tube 11 are provided with protective trough 20,14 outside of protective trough 20 and separator tube in 16 outside of polishing liquid bath
Protective trough 20 communicates, and the protective trough 20 in 14 outside of separator tube is communicated with the protective trough 20 in 11 outside of connecting tube, and separator tube
The protective trough 20 in 14 outsides is communicated with spare pipe 10, while spare pipe 10 is communicated with spareslots 6, and protective trough 20 can prevent polishing fluid
Slot 16, separator tube 14 and connecting tube 11 are when there is crack, polishing fluid outflow, when polishing fluid is flowed out from crack, polishing fluid
Protective trough 20 can be flowed into, protective trough 20 is connected by spare pipe 10 with spareslots 6, and spare pipe close 7 is opened, and is pulled in spareslots 6
Elastic rod 9, can by the polishing fluid of outflow suck spareslots 6 in, realize leakage-preventing purpose.
Working principle: shaft is passed through first for the protective device of this kind of low sodium ion GaAs polishing fluid anti-leak
Slot cover 18 is opened in 19 rotation, and polishing fluid is added into polishing liquid bath 16, observes polishing by the graduation mark on glass bar 17
Polishing liquid measure in liquid bath 16, it is convenient when polishing fluid runs low, it adds in time, polishing fluid flows into buffering from polishing liquid bath 16
Pipe 14, by inside separator tube 14 slip through the net 15 when, slipping through the net 15 can filter out impurity in polishing fluid, guarantee the pure of polishing fluid
Degree pulls out liquid push rod 13, and polishing fluid can flow into connecting tube 11 from the bottom of separator tube 14, and rotation piston 12 can control polishing fluid
Flow velocity, polishing fluid can flow into out liquid funnel 4 by connecting tube 11, and the upper end of liquid funnel 4 is communicated with spareslots 6 out, presses bullet
Property bar 9, so that spare slot plug 8 is dropped to 6 bottom of spareslots, thus make polishing fluid will not enter spareslots 6, polishing fluid from liquid out leak
The lower end of bucket 4 flows into minim pipette 1, flows out from minim pipette 1, and at the end of polishing fluid use, rotation rotation piston 12 blocks connecting tube
11, while liquid push rod 13 is pushed out, flow the polishing fluid in separator tube 14 no longer, rotation activity folder 5 clamps activity folder 5
Latch plate 2, the rotation of latch plate 2 clamp minim pipette 1, pull elastic rod 9, move up spare slot plug 8, can will be gone out using air pressure
, can be by whether thering is polishing fluid to be to judge polishing fluid in observation protective trough 20 in polishing fluid sucking spareslots 6 in liquid funnel 4
No leakage opens spare pipe close 7 when there is the polishing fluid of outflow in protective trough 20, can pass through elastic rod 9 and spare slot plug 8
It is used cooperatively, polishing fluid is sucked in spareslots 6, complete the guarantor of entire low sodium ion GaAs polishing fluid anti-leak like this
The use process of protection unit.
While there has been shown and described that the embodiments of the present invention, for the ordinary skill in the art,
It is understood that these embodiments can be carried out with a variety of variations in the case where not departing from the principles of the present invention and spirit, repaired
Change, replacement and variant, the scope of the utility model is defined by the appended claims and the equivalents thereof.
Claims (6)
1. a kind of protective device of low sodium ion GaAs polishing fluid anti-leak, including minim pipette (1) and spareslots (6),
It is characterized in that: being mounted on latch plate (2) at left and right sides of the minim pipette (1), and the upper end of latch plate (2) is provided with latch
Axis (3) is equipped with out liquid funnel (4) above the minim pipette (1), and is provided with movable folder on the outside of liquid funnel (4) out
(5), it is equipped with spare pipe close (7) on the left of the spareslots (6), and spareslots (6) is located at the top of liquid funnel (4), institute
Being internally provided with spare slot plug (8) for spareslots (6) is stated, and elastic rod (9) are installed above spare slot plug (8), it is described standby
With being provided with spare pipe (10) on the left of pipe close (7), and connecting tube (11), the connecting tube are fixed with below spare pipe (10)
(11) be internally provided with rotates piston (12), and rotates and be equipped with out liquid push rod (13) on the left of piston (12), the liquid out
It is provided with above push rod (13) separator tube (14), and the inside of separator tube (14) is fixed with slip through the net (15), the separator tube
(14) polishing liquid bath (16) is installed, and the front for polishing liquid bath (16) is provided with glass bar (17), the polishing fluid above
It is equipped with above slot (16) slot cover (18), and is internally provided with shaft (19) on the left of slot cover (18), the polishing liquid bath
(16) protective trough (20) are provided on the outside of the outside in outside, separator tube (14) and connecting tube (11).
2. a kind of protective device of low sodium ion GaAs polishing fluid anti-leak according to claim 1, feature exist
In: the latch axis (3) is embedded in out the left and right sides of liquid funnel (4), and latch plate (2) is leaked by latch axis (3) and liquid out
(4) composition that struggles against rotational structure.
3. a kind of protective device of low sodium ion GaAs polishing fluid anti-leak according to claim 1, feature exist
In: the inner wall of the lateral surface and spareslots (6) of the spare slot plug (8) is bonded to each other, and spare slot plug (8) and elastic rod (9)
Between for welding.
4. a kind of protective device of low sodium ion GaAs polishing fluid anti-leak according to claim 1, feature exist
In: rotation piston (12) is disk-shaped in the internal shape of connecting tube (11), and is rotated at the top of piston (12) at plectane
Diameter size is equal with the inner wall size of connecting tube (11).
5. a kind of protective device of low sodium ion GaAs polishing fluid anti-leak according to claim 1, feature exist
In: the shaft (19) is embedded in the inside of slot cover (18), and slot cover (18) is made up of shaft (19) and polishing liquid bath (16)
Rotational structure.
6. a kind of protective device of low sodium ion GaAs polishing fluid anti-leak according to claim 1, feature exist
In: the protective trough (20) on the outside of polishing liquid bath (16) is communicated with the protective trough (20) on the outside of separator tube (14), and separator tube
(14) protective trough (20) on the outside of is communicated with the protective trough (20) on the outside of connecting tube (11), and the protection on the outside of separator tube (14)
Slot (20) is communicated with spare pipe (10), while spare pipe (10) is communicated with spareslots (6).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821015284.1U CN208438211U (en) | 2018-06-29 | 2018-06-29 | A kind of protective device of low sodium ion GaAs polishing fluid anti-leak |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821015284.1U CN208438211U (en) | 2018-06-29 | 2018-06-29 | A kind of protective device of low sodium ion GaAs polishing fluid anti-leak |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208438211U true CN208438211U (en) | 2019-01-29 |
Family
ID=65087901
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821015284.1U Expired - Fee Related CN208438211U (en) | 2018-06-29 | 2018-06-29 | A kind of protective device of low sodium ion GaAs polishing fluid anti-leak |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN208438211U (en) |
-
2018
- 2018-06-29 CN CN201821015284.1U patent/CN208438211U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20190129 |