CN208399888U - The LED illumination System of high usage high evenness in a kind of direct-write lithography machine - Google Patents

Abstract

The utility model provides a kind of LED illumination System of high usage high evenness in direct-write lithography machine, including LED light source, it further include collimation microscope group, smoothing mirror group, collector lens and steering prism, the LED light source, the center for collimating microscope group, smoothing mirror group and collector lens are respectively positioned on same axis, the lower section for turning to prism and being located at DMD number mask plate；The corresponding numerical aperture of the emergent light angle of divergence of the LED light source is NA0.85；The smoothing mirror group is that a pair of of microlens array Symmetric Composite forms；The plane of incidence for turning to prism is vertical with the axis, and the exit facet for turning to prism is parallel with the DMD number mask plate.The utility model has the characteristics that light source utilization rate is high, illumination uniformity is good, structure is simple, assembly is easy, required precision is low, at low cost, yields is high.

Description

The LED illumination System of high usage high evenness in a kind of direct-write lithography machine

Technical field

The utility model relates to the Optical System Design technical field of direct-write lithography machine, in specifically a kind of direct-write lithography machine The LED illumination System of high usage high evenness.

Background technique

Litho machine is the equipment for printing composition on the surface of a substrate, and direct-write lithography machine is different from conventional lithography machine, By independently addressable and control pixel array, i.e. DMD number mask plate, photaesthesia member is projected to certain enlargement ratio The composition of feature is generated on part substrate, to eliminate required manufacture and the exposure mask used in traditional photoetching process, is reduced Time and cost.

Lighting system is one of the important component of direct-write lithography machine optical system, and light source type and system structure are not Only influence litho machine optical property, can also be related to the complexity and design difficulty of equipment, these all with the ruler of litho machine Very little, weight, stability, the maintenance core competitiveness such as convenience and cost are closely bound up.

Ultrahigh pressure mercury lamp, laser or the LED illumination System that direct-write lithography machine product generally uses at present, from light source characteristic And there are following problems from the point of view of system structure:

1, in terms of light source characteristic angle, mercury lamp light source service life itself is short, and can use in systems as light source is always on, and causes Make the service life of mercury lamp only about 3 months, so frequent replace light source not only reduce production efficiency, also add maintenance at This；The power consumption of mercury lamp is big, and ultrahigh pressure mercury lamp needs the power of 2000W or more, belongs to high energy consumption light source, is unfavorable for energy-saving ring It protects, while increasing operating cost；The high power laser sources price of lithographic wavelength is very expensive, leads to laser direct-write photoetching machine Cost is difficult to decline；The LED light source angle of divergence is big, it is more difficult to receive light, usually have biggish energy loss, light source in the illumination system Utilization rate is low.

2, in terms of light structures angle, direct-write lithography machine using mercury lamp as light source, the chamber design of light source is more Complexity needs biggish elliptical reflecting cup to carry out boundling, meanwhile, lighting part also needs to increase power supply, water-cooling, optical filtering The cooperation of the components such as piece, so that space proportion shared by lighting system is larger, causes photoetching machine equipment to be difficult to reduce volume；Mercury lamp is in light Position and angle in road is very sensitive, will have a direct impact on illumination uniformity, therefore its adjustment process is cumbersome, needs professional Debugging and periodic maintenance are carried out, the operating cost of litho machine is increased；Mercury lamp temperature in use is up to thousands of degree, and litho machine There are strict requirements for environment temperature, temperature, which significantlys change, can seriously affect its stability, therefore, in setting using mercury lamp In standby, light source refrigeration and system temperature control part need to carry out a large amount of research and complicated design, required water pump, vacuum tube etc. Attachment increases the complexity of complete machine.Litho machine using laser as light source, it usually needs optical fiber cooperates light out, and due to It is very high that optical fiber goes out light end encircled energy, once contamination dust granule will lead to ablation phenomen, therefore very tight to environmental requirement Lattice.Meanwhile optical fiber is unable to overflexing and pulls, and is using, is needing Additional Protection in transportational process, it is difficult to improve structure design Degree.Optical fiber belongs to vulnerable part, once the above problem occur must be replaced, increases system maintenance cost.Using LED conduct The litho machine of light source cannot completely collect light source emergent light in structure since its light source angle of divergence is big, can generally utilize machinery Part blocks, absorbs stray light, but this mode can generate hot stack in structure, influence litho machine stability.

Utility model content

In view of existing direct-write lithography machine lighting system, that there are light source utilization rates is low, structure is complicated, debugging maintenance is difficult, cost The problems such as high, the purpose of this utility model is to provide a kind of LED illumination systems of high usage high evenness in direct-write lithography machine System, with light source utilization rate is high, illumination uniformity is good, structure is simple, assembly is easy, required precision is low, at low cost, yields is high The characteristics of.

The technical solution of the utility model are as follows:

The LED illumination System of high usage high evenness in a kind of direct-write lithography machine, including LED light source further include collimation Microscope group, smoothing mirror group, collector lens and steering prism, the LED light source collimate in microscope group, smoothing mirror group and collector lens The heart is respectively positioned on same axis, the lower section for turning to prism and being located at DMD number mask plate；The emergent light of the LED light source is sent out Dissipating the corresponding numerical aperture in angle is NA0.85；The smoothing mirror group is that a pair of of microlens array Symmetric Composite forms；The steering The plane of incidence of prism is vertical with the axis, and the exit facet for turning to prism is parallel with the DMD number mask plate.

The LED illumination System of high usage high evenness in the direct-write lithography machine, the LED light source use single LED lamp bead or plurality of LEDs lamp bead array.

The LED illumination System of high usage high evenness in the direct-write lithography machine, the steering prism is using internal Total reflection prism.

The utility model has the following beneficial effects:

(1) the utility model uses lens light gathering, effectively reduces light source chamber, facilitates the whole ruler for improving litho machine It is very little；

(2) light that LED light source issues in the utility model can be almost all introduced into optical path, and capacity usage ratio is high； It is seldom accordingly, due to stray light, it is blocked without using mechanical structure, therefore not will cause hot stack, reduces temperature control system Complexity and design difficulty；

(3) LED light source service life is long, and generally 10000 hours or more, and can exposed without being always in use It lights, extinguishes after end exposure in the process, theory calculates that litho machine in no replacement is required in two years light source, reduces maintenance cost；

(4) LED light source power consumption is low, and luminous efficiency is high, is beneficial to energy conservation environmental protection；

(5) the utility model devises reasonable, exquisite smoothing mirror group, and compared with traditional optical wand, length is small, uses material Few, channel is more, and even light effect is more preferable；The position of LED light source, angle will not cause to significantly affect to even light effect, therefore not only The high evenness of lighting system is realized, and avoids the cumbersome adjustment for LED light source angle, position, improves adjustment Efficiency；

(6) tolerance that the utility model installs LED light source is larger, thus assemble, replacement LED light source it is convenient；

(7) LED light source of the utility model goes out light without optical fiber, avoids using risk brought by optical fiber, increases Reliability is added；

(8) LED light source price is far below the laser of lithographic wavelength, reduces litho machine cost.

Detailed description of the invention

Fig. 1 is the structural schematic diagram of the utility model；

Fig. 2 is the smoothing mirror group structural schematic diagram of the utility model；

Fig. 3 is the steering prism structure schematic diagram of the utility model；

Fig. 4 is that the smoothing mirror group of the utility model and DMD number mask plate match and adjust schematic diagram；

Fig. 5 is the illumination spot effect picture of the utility model.

Specific embodiment

The utility model is further illustrated in the following with reference to the drawings and specific embodiments.

As shown in Figure 1, in a kind of direct-write lithography machine high usage high evenness LED illumination System, including LED light source 1, It collimates microscope group 2, smoothing mirror group 3, collector lens 4 and turns to prism 5.LED light source 1, collimation microscope group 2, smoothing mirror group 3 and optically focused are saturating The center of mirror 4 is respectively positioned on same axis, turns to the lower section that prism 5 is located at DMD number mask plate 6.The emergent light of LED light source 1 The corresponding numerical aperture of the angle of divergence realizes the high usage of lighting system using the hyper NA for NA0.85.LED light Source 1 can be single LED lamp bead or plurality of LEDs lamp bead array.As shown in Fig. 2, smoothing mirror group 3 is that a pair of of microlens array 31 is right Title is composed, and the high evenness of lighting system is realized in the smoothing mirror group design using this rationally, exquisite.As shown in figure 3, turning Inner full-reflection prism is used to prism 5, the plane of incidence 51 for turning to prism 5 is vertical with aforementioned axis, turns to the exit facet of prism 5 It is parallel with DMD number mask plate 6.

The working principle of the utility model are as follows:

The light that LED light source 1 issues vertically enters after the collimation collimation of microscope group 2, the even light of smoothing mirror group 3, collector lens 4 focus It is mapped to the plane of incidence 51 for turning to prism 5, is radiated at DMD number mask plate 6 after turning to 5 inner full-reflection of prism and changing direction Effective coverage, formed illumination spot.

The adjustment process of the utility model are as follows:

(1) as shown in Fig. 2, by 31 eyeglass Striking symmetry of two panels microlens array, being co-axially mounted composition smoothing mirror group 3.

(2) LED light source 1, collimation microscope group 2, smoothing mirror group 3, collector lens 4 are co-axially mounted, it is corresponding with prism 5 is turned to, Turn to the lower section that DMD number mask plate 6 is arranged in prism 5.

(3) turning to prism 5 is inner full-reflection prism, as shown in figure 3, the pitching of adjusting steering prism 5, makes its plane of incidence 51 perpendicular to incident light axis.

(4) pitch angle for adjusting DMD number mask plate 6, makes it be parallel to the exit facet 52 for turning to prism 5.

(5) smoothing mirror group 3 is adjusted as shown in figure 4, rotating perpendicular to axis direction, can satisfy the direction of illumination spot DMD number mask plate 6 itself rotation angle in the plane.

(6) horizontal direction fine tuning turns to the position of prism 5, and illumination spot is made to be radiated at the effective district of DMD number mask plate 6 Domain, as shown in Figure 5.

Embodiment described above is only that preferred embodiments of the present invention are described, not practical to this Novel range is defined, and under the premise of not departing from the spirit of the design of the utility model, those of ordinary skill in the art are to this The various changes and improvements that the technical solution of utility model is made should all fall into the guarantor that claims of the utility model determine It protects in range.

Claims (3)

1. the LED illumination System of high usage high evenness in a kind of direct-write lithography machine, including LED light source, it is characterised in that: also Including collimation microscope group, smoothing mirror group, collector lens and prism is turned to, the LED light source, collimation microscope group, smoothing mirror group and optically focused The center of lens is respectively positioned on same axis, the lower section for turning to prism and being located at DMD number mask plate；The LED light source The corresponding numerical aperture of the emergent light angle of divergence is NA0.85；The smoothing mirror group is that a pair of of microlens array Symmetric Composite forms； The plane of incidence for turning to prism is vertical with the axis, and the exit facet for turning to prism and the DMD number mask plate are flat Row.

2. the LED illumination System of high usage high evenness, feature exist in direct-write lithography machine according to claim 1 In: the LED light source is using single LED lamp bead or plurality of LEDs lamp bead array.

3. the LED illumination System of high usage high evenness, feature exist in direct-write lithography machine according to claim 1 In: the steering prism uses inner full-reflection prism.