CN208395314U - A kind of full nitrogen silicon single crystal crystal pulling device - Google Patents

A kind of full nitrogen silicon single crystal crystal pulling device Download PDF

Info

Publication number
CN208395314U
CN208395314U CN201820526612.8U CN201820526612U CN208395314U CN 208395314 U CN208395314 U CN 208395314U CN 201820526612 U CN201820526612 U CN 201820526612U CN 208395314 U CN208395314 U CN 208395314U
Authority
CN
China
Prior art keywords
furnace body
cantilever
crucible
nitrogen
air inlet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201820526612.8U
Other languages
Chinese (zh)
Inventor
张文霞
高树良
谷守伟
高润飞
裘孝顺
刘伟
武志军
张全顺
田野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Inner Mongolia Zhonghuan Solar Material Co Ltd
Original Assignee
Inner Mongolia Zhonghuan Solar Material Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inner Mongolia Zhonghuan Solar Material Co Ltd filed Critical Inner Mongolia Zhonghuan Solar Material Co Ltd
Priority to CN201820526612.8U priority Critical patent/CN208395314U/en
Application granted granted Critical
Publication of CN208395314U publication Critical patent/CN208395314U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

The utility model provides a kind of full nitrogen silicon single crystal crystal pulling device, including furnace body, crucible is set in furnace body, guide shell and suspension arrangement for hanging guide shell, guide shell is located at the top of crucible, nitrogen inlet is offered at the top of furnace body, suspension arrangement includes hollow cantilever and air inlet disk, air inlet disk is fixedly connected on the bottom of cantilever, furnace body is stretched out in one end of cantilever, the other end of cantilever is protruded under the bell of furnace body and is connected to air inlet disk, the top of cantilever connects argon inlet pipeline, the utility model has the beneficial effects that using argon gas as localised protection gas, nitrogen is as pressure maintaining gas, nitrogen is also avoided while realizing that monocrystalline is straightened as protective gas instead of argon gas in nitrogen to react with monocrystalline, both cost declining has been achieved the purpose that, product quality is in turn ensured simultaneously.

Description

A kind of full nitrogen silicon single crystal crystal pulling device
Technical field
The utility model belongs to silicon single crystal production technical field, more particularly, to a kind of full nitrogen silicon single crystal crystal pulling device.
Background technique
In the prior art, the overall process of silicon single crystal crystal pulling production is used as protection gas using high-purity argon gas, to protect monocrystalline The growth of silicon rod, with the increase of silicon rod diameter, the entire production process time is constantly extending, meanwhile, the high-purity argon of consumption Gas is also more and more, and production cost is caused to be continuously increased;Or the gaseous mixture by being passed through argon gas and nitrogen is produced into reduce This, but the ratio of argon gas and nitrogen controls difficulty in the actual production process, increases production burden, increases manpower and material resources, In a disguised form increase production cost.
Currently, being passed through the high pure nitrogen of low cost using whole process to substitute high-purity argon gas as guarantor by the improvement of technology Gas is protected to reduce production cost, but since nitrogen and pasc reaction generate silicon nitride and circulate silicon melt during production Nitrogen precipitation will affect into crystalline substance.
Summary of the invention
The purpose of this utility model is the problems in background technique to be solved, and provides a kind of full nitrogen silicon single crystal crystal pulling dress It sets.
In order to solve the above technical problems, the technical solution adopted in the utility model is: a kind of full nitrogen silicon single crystal crystal pulling dress It sets, including furnace body, setting crucible, guide shell and the suspension arrangement for hanging the guide shell, the water conservancy diversion in the furnace body Cylinder is located at the top of the crucible, and nitrogen inlet is offered at the top of the furnace body, and the suspension arrangement includes hollow hangs Arm and air inlet disk, the air inlet disk are fixedly connected on the bottom of the cantilever, and the furnace body is stretched out in one end of the cantilever, described The other end of cantilever is protruded under the bell of the furnace body and is connected to the air inlet disk, and the top of the cantilever connects argon inlet pipe Road.
Further, the air inlet disk is hollow structure, and the top of the air inlet disk is connected to the bottom of the cantilever, institute The bottom for stating air inlet disk is equipped with venthole, and the venthole direction is close to the position of melt in crucible.
Further, the cantilever is set as multiple, and the top of one of them cantilever is equipped with argon inlet mouth, is used for Argon inlet pipeline is connected, the cantilever connects power mechanism, for going up and down the suspension arrangement.
Further, the inboard wall of furnace body is additionally provided with attemperator, and having heaters is arranged in the attemperator, described to add Hot device heats the side of the crucible.
Further, the bottom of the heater is connected with electrode column, and the electrode column connects power supply.
It further, further include crucible bar in the furnace body, one end of the crucible bar is fixedly connected on the bottom of the crucible, The other end of the pot bar stretches out the furnace body.
Further, the sidewall of the furnace body is equipped with the pumping through-hole through the furnace body and the insulation barrel.
The utility model has the advantages and positive effects of:
1. replacing high-purity argon gas using high pure nitrogen, production cost is reduced, by being passed through argon gas conduct near liquid level Protective gas is passed through nitrogen in other positions with furnace pressure needed for maintaining monocrystalline normal growth, reduces crystal region nitrogen and molten silicon Reaction, reduce the content of nitrogen in monocrystalline, while reducing the generation of silicon nitride.
2. avoiding the silicon nitride crystal precipitation of saturation from leading to the disconnected bud of monocrystalline, using argon gas as localised protection gas, nitrogen As pressure maintaining gas, realizing that it is anti-with monocrystalline that nitrogen replaces argon gas to also avoid nitrogen while monocrystalline is straightened as protective gas It answers, has both achieved the purpose that cost declining, while in turn ensuring product quality.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of an embodiment of the present invention.
Fig. 2 is the structural schematic diagram of the air inlet disk of an embodiment of the present invention.
In figure:
1, furnace body 2, suspension arrangement 3, attemperator
4, electrode column 5, guide shell 6, crucible
7, heater 8, crucible bar 9, pumping through-hole
10, nitrogen inlet 21, argon inlet mouth 22, cantilever
23, air inlet disk 231, venthole
Specific embodiment
As shown in Figure 1, a kind of full nitrogen silicon single crystal crystal pulling device of this example, including furnace body 1, furnace body 1 is interior to be arranged crucible 6 With guide shell 5, crucible 6 uses silica crucible, and guide shell 5 is located at the top of crucible 6, and bottom and the crucible 6 of guide shell 5 do not connect Touching, guide shell 5 is equipped with suspension arrangement 2, for hanging fixed guide shell 5, in the growth course of silicon single crystal rod, with silicon rod Continuous growth, guide shell 5 is also required to be promoted together with argon gas access tube, passes through suspension dress by the way that setting suspension arrangement 2 is convenient The lifting of 2 drive guide shells 5 is set, structure is simple, and it is easy to use, meet the needs of actual production.
The inner wall of furnace body 1 is additionally provided with attemperator 3, and attemperator 3 uses the high temperature resistant material of tubbiness, for example, silicon carbide, Quartz etc., steel drum is interior to place thermal insulation material, and the top of insulation barrel is equipped with the insulation cover of annular, fixed in the inner ring of insulation cover to lead Flow cartridge 5, is arranged having heaters 7 in attemperator 3, and in crucible 6 is enclosed in by heater, heater 7 adds the side of crucible 6 Heat, the bottom of heater are connected with electrode column 4, and it further includes the crucible bar 8 that 6 bottom of crucible is fixedly connected that electrode column 4, which connects power supply, Crucible bar 8 stretches out the bottom of furnace body 1, and the outside of crucible bar 8 is also enclosed with protective quartz, and for protecting crucible bar 8,1 side wall of furnace body is set There is the pumping through-hole 9 through furnace body 1 and insulation barrel.
Suspension arrangement 2 includes hollow cantilever 22 and air inlet disk 23, and air inlet disk 23 is fixedly connected on the bottom of cantilever 22, is hanged One end of arm 22 is stretched out outside furnace body 1, and the other end of cantilever 22 is protruded under the bell of furnace body 1 and is connected to air inlet disk 23, cantilever 22 Top connects argon inlet pipeline, and argon inlet pipe 11 uses hose, facilitates connection, cantilever 22 can be set according to needs of production It is set to multiple, two cantilevers 22 is set in this example, and the top of one of cantilever 22 is equipped with argon inlet mouth 21, for connecting Argon inlet pipeline, the upper connection power mechanism of another cantilever 22 are used for lifting hanging device.
The top of furnace body 1 offers nitrogen inlet 10, and nitrogen inlet 10 is located at the top of furnace body, and nitrogen passes through nitrogen Gas air inlet is passed through in furnace body 1.As shown in Fig. 2, air inlet disk 23 use in hollow disc structure, the top of air inlet disk 23 and outstanding The bottom of arm 22 is connected to, and the bottom of air inlet disk 23 is equipped with venthole 231, and four ventholes 231, and venthole is arranged in this example 231 directions are close to the position of melt in crucible.It is passed through position of the mouth close to solution by the way that argon gas is arranged, prevents nitrogen anti-with solution It answers, reduction crystal region nitrogen is reacted with molten silicon, the content of nitrogen in monocrystalline is reduced, while reducing the generation of silicon nitride, High-purity argon gas is replaced using high pure nitrogen, reduces production cost, by being passed through argon gas near liquid level as protective gas, Other positions are passed through nitrogen with furnace pressure needed for maintaining monocrystalline normal growth, and the silicon nitride crystal precipitation of saturation is avoided to cause monocrystalline disconnected Bud, using argon gas as localised protection gas, nitrogen is realizing nitrogen instead of argon gas as protective gas drawing as pressure maintaining gas Nitrogen is also avoided while straight monocrystalline to react with monocrystalline, has both achieved the purpose that cost declining, while in turn ensuring product quality.
The course of work of the present embodiment: during silicon single crystal crystal pulling, material, steady temperature, seeding, shouldering, turn shoulder, etc. The stages such as diameter, ending are all made of nitrogen and are passed through in furnace body by the nitrogen inlet at the top of furnace body, meanwhile, argon gas passes through furnace body The argon inlet mouth of two sides is passed into avoids the silicon nitride crystal precipitation of saturation from causing monocrystalline disconnected close to the position of melt in crucible Bud, using argon gas as localised protection gas, nitrogen is realizing nitrogen instead of argon gas as protective gas drawing as pressure maintaining gas Nitrogen is also avoided while straight monocrystalline to react with monocrystalline, has both achieved the purpose that cost declining, while in turn ensuring product quality.
The beneficial effects of the utility model are:
1. replacing high-purity argon gas using high pure nitrogen, production cost is reduced, by being passed through argon gas conduct near liquid level Protective gas is passed through nitrogen in other positions with furnace pressure needed for maintaining monocrystalline normal growth, reduces crystal region nitrogen and molten silicon Reaction, reduce the content of nitrogen in monocrystalline, while reducing the generation of silicon nitride.
2. avoiding the silicon nitride crystal precipitation of saturation from leading to the disconnected bud of monocrystalline, using argon gas as localised protection gas, nitrogen As pressure maintaining gas, realizing that it is anti-with monocrystalline that nitrogen replaces argon gas to also avoid nitrogen while monocrystalline is straightened as protective gas It answers, has both achieved the purpose that cost declining, while in turn ensuring product quality.
One embodiment of the utility model is described in detail above, but the content is only the utility model Preferred embodiment should not be considered as limiting the scope of the present invention.It is all to be made according to application scope of the utility model All the changes and improvements etc., should still belong within the patent covering scope of the utility model.

Claims (7)

1. a kind of full nitrogen silicon single crystal crystal pulling device, including furnace body, it is characterised in that: crucible, guide shell are arranged in the furnace body With the suspension arrangement for hanging the guide shell, the guide shell is located at the top of the crucible, opens at the top of the furnace body Equipped with nitrogen inlet, the suspension arrangement includes hollow cantilever and air inlet disk, and the air inlet disk is fixedly connected on described outstanding The furnace body is stretched out in the bottom of arm, one end of the cantilever, the other end of the cantilever protrude under the bell of the furnace body with institute Air inlet disk connection is stated, the top of the cantilever connects argon inlet pipeline.
2. a kind of full nitrogen silicon single crystal crystal pulling device according to claim 1, it is characterised in that: the air inlet disk is hollow Structure, the top of the air inlet disk are connected to the bottom of the cantilever, and the bottom of the air inlet disk is equipped with venthole, the ventilation Hole direction is close to the position of melt in crucible.
3. a kind of full nitrogen silicon single crystal crystal pulling device according to claim 2, it is characterised in that: the cantilever is set as more A, the top of one of them cantilever is equipped with argon inlet mouth, and for connecting argon inlet pipeline, the cantilever connects power Mechanism, for going up and down the suspension arrangement.
4. a kind of full nitrogen silicon single crystal crystal pulling device according to claim 1, it is characterised in that: the inboard wall of furnace body is also set There is attemperator, having heaters is set in the attemperator, the heater heats the side of the crucible.
5. a kind of full nitrogen silicon single crystal crystal pulling device according to claim 4, it is characterised in that: the bottom of the heater It is connected with electrode column, the electrode column connects power supply.
6. a kind of full nitrogen silicon single crystal crystal pulling device according to claim 1, it is characterised in that: further include in the furnace body Crucible bar, one end of the crucible bar are fixedly connected on the bottom of the crucible, and the other end of the crucible bar stretches out the furnace body.
7. a kind of full nitrogen silicon single crystal crystal pulling device according to claim 1, it is characterised in that: the sidewall of the furnace body is equipped with Through the pumping through-hole of the furnace body and insulation barrel.
CN201820526612.8U 2018-04-13 2018-04-13 A kind of full nitrogen silicon single crystal crystal pulling device Active CN208395314U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201820526612.8U CN208395314U (en) 2018-04-13 2018-04-13 A kind of full nitrogen silicon single crystal crystal pulling device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201820526612.8U CN208395314U (en) 2018-04-13 2018-04-13 A kind of full nitrogen silicon single crystal crystal pulling device

Publications (1)

Publication Number Publication Date
CN208395314U true CN208395314U (en) 2019-01-18

Family

ID=65065190

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201820526612.8U Active CN208395314U (en) 2018-04-13 2018-04-13 A kind of full nitrogen silicon single crystal crystal pulling device

Country Status (1)

Country Link
CN (1) CN208395314U (en)

Similar Documents

Publication Publication Date Title
CN103215461B (en) 15-ton inverted-U-shaped combination device and production process for producing sponge titanium
CN108425149A (en) A kind of full nitrogen silicon single crystal crystal pulling device
RU2007148476A (en) DEVICE FOR THE INTRODUCTION OF REACTIVE GASES TO THE REACTION CHAMBER AND EPITAXIAL REACTOR IN WHICH THE INDICATED DEVICE IS USED
CN208395314U (en) A kind of full nitrogen silicon single crystal crystal pulling device
CN205893453U (en) Guide cylinder for single crystal furnaces
CN206015134U (en) A kind of Czochralski method mono-crystal furnace discharge duct cleaning device
CN206902213U (en) A kind of device of Smelting magnesium reductive jar vacuum breaker
CN203270007U (en) 15-ton inverted U-shaped integrated device for producing titanium sponge
CN203212612U (en) Annealing device for alloy wire
CN205687571U (en) A kind of polycrystalline silicon reducing furnace of band internal cooling system
CN208983008U (en) A kind of quick charging system of COS
CN202808991U (en) Zone-melting thermal field
CN101713095A (en) Silicon crystal growing device with two-way airflow
CN201598184U (en) Fluidized bed reactor capable of stabilizing reaction temperature in production of trichlorosilane
CN205217958U (en) Crystallizer of production cast iron thick -walled pipe
CN206986325U (en) A kind of anti-deposition structure of single-crystal furnace guide shell
CN206768273U (en) A kind of semiconductor single-crystal growth thermal field
CN210663905U (en) Tubular furnace capable of feeding and reacting at preset high temperature and high pressure
CN209227096U (en) Single crystal growing furnace heat shielding structure
CN209082035U (en) Reduce the polycrystalline silicon ingot or purifying furnace of high-purity argon gas usage amount
CN202849589U (en) Single crystal furnace device
CN206828673U (en) Direct-pulling single crystal furnace thermal field kuppe
CN203411334U (en) Trichlorosilane fluidized bed reactor
CN206347864U (en) A kind of exhaust apparatus of smelting furnace
CN109137066A (en) Reduce the polycrystalline silicon ingot or purifying furnace of high-purity argon gas usage amount

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant