CN208182856U - A kind of low-E glass producing system - Google Patents
A kind of low-E glass producing system Download PDFInfo
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- CN208182856U CN208182856U CN201820631393.XU CN201820631393U CN208182856U CN 208182856 U CN208182856 U CN 208182856U CN 201820631393 U CN201820631393 U CN 201820631393U CN 208182856 U CN208182856 U CN 208182856U
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- strong magnet
- sputtering target
- glass substrate
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- glass
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Abstract
A kind of low-E glass producing system, including upper section, plated film area and lower section, its plated film area includes sequentially connected into mortice lock room, into piece transition chamber, into piece surge chamber, coating chamber, slice surge chamber, slice transition chamber, mortice lock room out, coating film production line is provided in coating chamber, coating film production line includes strong magnet, sputtering target, glass substrate, discharge gas, deposition film, shielding power supply, strong magnet upper and lower ends are fixed with sputtering target, strong magnet middle and upper part is provided with shielding case, glass substrate is provided with below the sputtering target of strong magnet lower end, glass substrate middle and lower part is provided with cavity pedestal, discharge gas is filled between glass substrate and strong magnet lower end sputtering target, strong magnet upper end sputtering target and cavity pedestal lower end are separately connected shielding power supply.The film formed through sputter coating method has stronger binding force and preferable compactness, and controllability is strong, and applicability is wide, and coating film production line structure is simple, and without human intervention, coating effects are good.
Description
Technical field
The utility model belongs to glass manufacturing area more particularly to a kind of low-E glass producing system.
Background technique
Low-E glass is also known as low emissivity glass, is to plate the film of multiple layer metal or other compounds composition in glass surface
It is product.Its film plating layer has to the characteristic of visible light high transmission and centering far infrared high reflection, make it with simple glass and
Traditional coated glass for building is compared, have excellent heat insulation and good translucency, be widely used in glass curtain wall and
Medi-empty glass window etc..
Traditional coating film on glass is mechanical, and structure is complicated, bulky, and process environments require harsh, live electromagnetic environment evil
Bad, the technique optical property and chemical stability of coated glass are poor.It is simple to be badly in need of a kind of structure thus, easy to operate, plated film
The good glass producing system of effect.
Utility model content
In order to solve problem above, the utility model provides a kind of low-E glass producing system.
The utility model is realized in this way: a kind of low-E glass producing system, offline low-E plated film are glass platings
The main production technology of low-E film, including upper section, plated film area and lower section, plated film area include sequentially connected into mortice lock
Room, into piece transition chamber, into piece surge chamber, coating chamber, slice surge chamber, slice transition chamber, mortice lock room out is set in the coating chamber
It is equipped with coating film production line, the coating film production line includes strong magnet, sputtering target, glass substrate, discharge gas, deposition film, sputtering
Power supply, the strong magnet upper and lower ends are fixed with sputtering target, and the strong magnet middle and upper part is provided with shielding case, under the strong magnet
Be provided with glass substrate below the sputtering target of end, the glass substrate middle and lower part is provided with cavity pedestal, the glass substrate with
Be filled with discharge gas between the sputtering target of the strong magnet lower end, generally argon gas, strong magnet upper end sputtering target with it is described
Cavity pedestal lower end is separately connected the shielding power supply.
Preferably, multiple strong magnets are connected in parallel, and the strong magnet at both ends is the pole upper end S, and the lower end pole N, intermediate is strong
Magnet is the pole upper end N, the lower end pole S.
Preferably, strong magnet upper end sputtering target connects the shielding power supply cathode, the connection of cavity pedestal lower end
The shielding power supply anode.
Preferably, the glass substrate upper surface forms deposition under the action of strong magnet, shielding power supply and discharge gas
Film.
Preferably, the coating film production line is vacuum environment.
Preferably, the position of the strong magnet is vertical with the direction of travel of the glass substrate.
The beneficial effects of the utility model are: low-E glass producing system provided by the utility model, using sputter coating
Method, the film formed through sputter coating method have stronger binding force and preferable compactness, and controllability is strong, and applicability is wide, plated film
Production cable architecture is simple, and without human intervention, coating effects are good.
Detailed description of the invention
Fig. 1 is the schematic diagram of the section structure of the utility model；
Fig. 2 is the overlooking structure diagram of the utility model；
Fig. 3 is the coating process flow chart of the utility model；
In figure: 1. strong magnets；2. sputtering target；3. glass substrate；4. discharge gas；5. deposition film；6. shielding case；7. cavity
Pedestal；8. shielding power supply；9. anode；10. cathode；21. into mortice lock room；22. into piece transition chamber；23. into piece surge chamber；24. plating
Film room；25. slice surge chamber；26. slice transition chamber；27. going out mortice lock room.
Specific embodiment
It is further to the utility model with reference to the accompanying drawing in order to be more clearly understood that the technical solution of the utility model
Explanation.
A kind of low-E glass producing system as shown in FIG. 1 to FIG. 3, offline low-E plated film are the masters of glass plating low-E film
Production technology, including upper section, plated film area and lower section are wanted, plated film area includes sequentially connected into mortice lock room 21, into piece mistake
Room 22 is crossed, into piece surge chamber 23, coating chamber 24, slice surge chamber 25, slice transition chamber 26, mortice lock room 27 out, the coating chamber
It is provided with coating film production line in 24, the coating film production line includes strong magnet 1, sputtering target 2, glass substrate 3, and discharge gas 4 sinks
Integrated membrane 5, shielding power supply 8,1 upper and lower ends of strong magnet are fixed with sputtering target 2, and 1 middle and upper part of strong magnet is provided with shielding
Cover 6, the lower section of the 1 lower end sputtering target 2 of strong magnet is provided with glass substrate 3, and 3 middle and lower part of glass substrate is provided with cavity
Pedestal 7 is filled with discharge gas 4, generally argon gas, institute between 1 lower end sputtering target 2 of the glass substrate 3 and the strong magnet
It states 1 upper end sputtering target 2 of strong magnet and is separately connected the shielding power supply 8 with 7 lower end of cavity pedestal.
Multiple strong magnets 1 are connected in parallel, and the strong magnet 1 at both ends is the pole upper end S, the lower end pole N, intermediate strong magnet 1
For the upper end pole N, the lower end pole S.
The 1 upper end sputtering target 2 of strong magnet connects 8 cathode of shielding power supply, described in 7 lower end of the cavity pedestal connection
8 anode of shielding power supply.
3 upper surface of glass substrate forms deposition film 5 under the action of strong magnet 1, shielding power supply 8 and discharge gas 4.
The coating film production line is vacuum environment.
The position of the strong magnet 1 is vertical with the direction of travel of the glass substrate 3.
Using target as cathode, anode connects shielding case, and placing kicker magnet after target is mutually perpendicular to electric field with magnetic field,
By gases such as argon gas, glow discharge ionizes out electronics in vacuum environment and ion forms plasma, and electronics is in orthogonal electricity
Field and magnetic fields downloading target nearby do spiral movement collision gas molecule and ionize out more electronics and gas in space
Ion.The electronics ionized out is comfortable in target material surface space by magnetic field and electric field, improves the ionization level of gas molecule, reduces
Operating air pressure, while bombardment of the high energy electron to glass substrate and anode is avoided, reduce the temperature of glass substrate and sputtering chamber
It rises.The gas ion ionized out accelerates bombardment target with certain kinetic energy and by electromagnetic field, and target atom is collided out lattice,
It falls off from target material surface sputtering, the target particle sputtered out has certain kinetic energy, in gravity, the effect of electric and magnetic fields
Lower directive glass substrate surface, deposits and forms film.
The above description is only a preferred embodiment of the present invention, therefore all according to described in the utility model patent application range
The equivalent change or modification done of structure, feature and principle, be included in the scope of the utility model patent application.
Claims (6)
1. a kind of low-E glass producing system, including upper section, plated film area and lower section, plated film area include sequentially connected
Into mortice lock room, into piece transition chamber, into piece surge chamber, coating chamber, slice surge chamber, slice transition chamber, mortice lock room, feature exist out
In being provided with coating film production line in the coating chamber, the coating film production line includes strong magnet, sputtering target, glass substrate, electric discharge
Gas, deposition film, shielding power supply, the strong magnet upper and lower ends are fixed with sputtering target, and the strong magnet middle and upper part is provided with screen
Cover is covered, glass substrate is provided with below the sputtering target of the strong magnet lower end, the glass substrate middle and lower part is provided with cavity base
Seat is filled with discharge gas, strong magnet upper end sputtering target between the glass substrate and strong magnet lower end sputtering target
The shielding power supply is separately connected with cavity pedestal lower end.
2. a kind of low-E glass producing system according to claim 1, which is characterized in that multiple strong magnets are in parallel
Connection, the strong magnet at both ends are the pole upper end S, and the lower end pole N, intermediate strong magnet is the pole upper end N, the lower end pole S.
3. a kind of low-E glass producing system according to claim 1, which is characterized in that the strong magnet upper end sputtering
Target connects the shielding power supply cathode, and cavity pedestal lower end connects the shielding power supply anode.
4. a kind of low-E glass producing system according to claim 1, which is characterized in that the glass substrate upper surface
Deposition film is formed under the action of strong magnet, shielding power supply and discharge gas.
5. a kind of low-E glass producing system according to claim 1, which is characterized in that the coating film production line is true
Altitude.
6. a kind of low-E glass producing system according to claim 1, which is characterized in that the position of the strong magnet with
The direction of travel of the glass substrate is vertical.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820631393.XU CN208182856U (en) | 2018-04-28 | 2018-04-28 | A kind of low-E glass producing system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820631393.XU CN208182856U (en) | 2018-04-28 | 2018-04-28 | A kind of low-E glass producing system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208182856U true CN208182856U (en) | 2018-12-04 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201820631393.XU Active CN208182856U (en) | 2018-04-28 | 2018-04-28 | A kind of low-E glass producing system |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109161842A (en) * | 2018-08-09 | 2019-01-08 | 江西沃格光电股份有限公司 | The manufacturing method of coating system and coated glass |
| CN111187007A (en) * | 2020-03-06 | 2020-05-22 | 东莞南玻工程玻璃有限公司 | Glass coating equipment with height limit detection protection |
-
2018
- 2018-04-28 CN CN201820631393.XU patent/CN208182856U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109161842A (en) * | 2018-08-09 | 2019-01-08 | 江西沃格光电股份有限公司 | The manufacturing method of coating system and coated glass |
| CN109161842B (en) * | 2018-08-09 | 2020-12-18 | 江西沃格光电股份有限公司 | Coating system and method for manufacturing coated glass |
| CN111187007A (en) * | 2020-03-06 | 2020-05-22 | 东莞南玻工程玻璃有限公司 | Glass coating equipment with height limit detection protection |
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