CN207961169U - A kind of photoresist fixing device - Google Patents

A kind of photoresist fixing device Download PDF

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Publication number
CN207961169U
CN207961169U CN201820294340.3U CN201820294340U CN207961169U CN 207961169 U CN207961169 U CN 207961169U CN 201820294340 U CN201820294340 U CN 201820294340U CN 207961169 U CN207961169 U CN 207961169U
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CN
China
Prior art keywords
pedestal
sebific duct
groove
spring
photoetching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201820294340.3U
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Chinese (zh)
Inventor
潘尧
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Suzhou Keen Semiconductor Co Ltd
Original Assignee
Suzhou Keen Semiconductor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suzhou Keen Semiconductor Co Ltd filed Critical Suzhou Keen Semiconductor Co Ltd
Priority to CN201820294340.3U priority Critical patent/CN207961169U/en
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Publication of CN207961169U publication Critical patent/CN207961169U/en
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Abstract

The utility model discloses kind of a photoresist fixing devices, suctorial pedestal is set including a bottom, the pedestal upper end is equipped with several in the scale strip being placed equidistant with, further include simultaneously at least five photoetching films, at least five photoetching films present lower superposition and are positioned over scale strip upper end, pedestal both sides are equipped with strip simultaneously, make to form connection between all photoetching films and pedestal, further include simultaneously a painting sebific duct, and one be set to the first groove on the right side of pedestal, it is connected by a spring between the painting sebific duct and the first bottom portion of groove, the elasticity of the spring and the size for applying sebific duct are:When spring is shunk completely, the painting sebific duct is fully located in the first groove;Setting is marked using photoresist fixing device in the utility model, and organic washing may be used to wipe label, and of low cost, easy to use, simple in structure.

Description

A kind of photoresist fixing device
Technical field
The utility model is related to a kind of fixing device more particularly to a kind of photoresist fixing devices.
Background technology
In the fields such as biology, chemistry, material, it is all be unable to do without microscopical observation, but for the sample of some discrete types, It is difficult to be positioned and observed, conventional method is to do label of corresponding size using metal, so that we targetedly observe.
The prior art is to do corresponding label using metal, can not but there are substrates to facilitate us to position and observation Use repeatly and it is of high cost the shortcomings of.
Invention content
The technical issues of being solved needed for of the invention be:A kind of one photoresist fixing device, the photoresist fixing device are provided It is easy to use, at low cost and simple in structure.
In order to solve the above technical problems, the utility model provides a kind of photoresist fixing device, including a bottom is equipped with and inhales The pedestal of disk, the pedestal upper end are equipped with several in the scale strip being placed equidistant with, while further including at least five photoetching films, institute It states at least five photoetching films and presents lower superposition and be positioned over scale strip upper end, while pedestal both sides are equipped with strip, make all photoetching Connection is formed between film and pedestal, while further including that a painting sebific duct and one are set to the first groove on the right side of pedestal, it is described It applies and is connected by a spring between sebific duct and the first bottom portion of groove, the elasticity of the spring and the size for applying sebific duct are:When When spring is shunk completely, the painting sebific duct is fully located in the first groove.
Further, it is additionally provided with the second groove on the left of the pedestal, the size of second groove is:Five can be fully inserted into Open the photoetching film of superposition.
Further, it is enclosed with fluorescence coating on the scale strip.
Setting is marked using photoresist fixing device in the utility model, and organic washing may be used to wipe Label, and it is of low cost, it is easy to use, it is simple in structure.
Description of the drawings
Described in Fig. 1 is the appearance assumption diagram of the utility model;
Wherein, 1, sucker;2, pedestal;3, scale strip;4, photoetching film;5, sebific duct is applied;6, the first groove;7, spring;8、 Second groove;9, fluorescence coating;10, strip.
Specific implementation mode
The utility model is described in more detail with reference to the accompanying drawings and detailed description.
As shown in Figure 1, a kind of photoresist fixing device, including a bottom are equipped with the pedestal 2 of sucker 1, which sets Have several in the scale strip 3 being placed equidistant with.
The utility model further includes at least five photoetching films 4 simultaneously, this at least five photoetching film 4 is put in superposition up and down Be placed in the upper end of scale strip 3, while 2 both sides of pedestal are equipped with strip 10, by strip 10 make all photoetching films 4 and pedestal 2 it Between formed connection.
The utility model further includes the first groove 6 that a painting sebific duct 5 and one is set to 2 right side of pedestal simultaneously, applies sebific duct It is connected by a spring 7 between 5 and 6 bottom of the first groove, the elasticity of spring 7 and the size for applying sebific duct 5 are:When spring 7 When shrinking completely, applies sebific duct 5 and be fully located in the first groove 6.
In use, photoetching film 4 is fixed on by strip 10 on pedestal 2, then it is marked on photoetching film 4, Bottom scale strip 3 plays the role of auxiliary positioning.Label after use, will apply sebific duct 5 and be drawn from the first groove 6 by spring 7 Go out to carry out wiping gluing, sebific duct 5 will be applied after use and is put into the first groove 6 and is hidden.
It is additionally provided with the second groove 8 in 2 left side of pedestal, the size of second groove 8 is:The light of five superpositions can be fully inserted into Photoresist piece 4.
It is enclosed with fluorescence coating 9 on scale strip 3 simultaneously, plays the role of floor light and positioning at night.
Generally speaking, setting is marked using photoresist fixing device in the utility model, and may be used organic Cleaning marks to wipe, and of low cost, easy to use, simple in structure.
The above is only the preferred embodiment of the utility model, it is noted that for the common skill of the art For art personnel, without deviating from the technical principle of the utility model, several improvements and modifications can also be made, these change The scope of protection of the utility model is also should be regarded as into modification.

Claims (3)

1. a kind of photoresist fixing device, including a bottom set suctorial pedestal, which is characterized in that the pedestal upper end is equipped with Several while further including at least five photoetching films in the scale strip being placed equidistant with, and at least five photoetching films are presented down Superposition is positioned over scale strip upper end, while pedestal both sides are equipped with strip, makes to form connection between all photoetching films and pedestal, together When further include that a painting sebific duct and one are set to the first groove on the right side of pedestal, between the painting sebific duct and the first bottom portion of groove It is connected by a spring, the elasticity of the spring and the size for applying sebific duct are:When spring is shunk completely, the painting sebific duct It is fully located in the first groove.
2. a kind of photoresist fixing device as described in claim 1, which is characterized in that it is recessed to be additionally provided with second on the left of the pedestal The size of slot, second groove is:The photoetching film of five superpositions can be fully inserted into.
3. a kind of photoresist fixing device as described in claim 1, which is characterized in that be enclosed with fluorescence on the scale strip Layer.
CN201820294340.3U 2018-03-02 2018-03-02 A kind of photoresist fixing device Active CN207961169U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201820294340.3U CN207961169U (en) 2018-03-02 2018-03-02 A kind of photoresist fixing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201820294340.3U CN207961169U (en) 2018-03-02 2018-03-02 A kind of photoresist fixing device

Publications (1)

Publication Number Publication Date
CN207961169U true CN207961169U (en) 2018-10-12

Family

ID=63740783

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201820294340.3U Active CN207961169U (en) 2018-03-02 2018-03-02 A kind of photoresist fixing device

Country Status (1)

Country Link
CN (1) CN207961169U (en)

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