CN207929696U - A kind of phosphoric acid by wet process slot cleaning device - Google Patents
A kind of phosphoric acid by wet process slot cleaning device Download PDFInfo
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- CN207929696U CN207929696U CN201721721522.6U CN201721721522U CN207929696U CN 207929696 U CN207929696 U CN 207929696U CN 201721721522 U CN201721721522 U CN 201721721522U CN 207929696 U CN207929696 U CN 207929696U
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- phosphoric acid
- wet process
- cleaning
- check valve
- slot
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Abstract
The utility model provides a kind of phosphoric acid by wet process slot cleaning device, including phosphoric acid by wet process slot, pipeline, cleaning feed liquor equipment and cleaning liquid discharging apparatus;Hydrogen fluoride cleaning solution is passed through into pipeline by cleaning feed liquor equipment, realize the cleaning to the groove body of phosphoric acid by wet process slot, pipeline and the filtration core being connected on pipeline, the groove body and filtration core of cleaning pipeline, phosphoric acid groove can be achieved the purpose that by not needing detaching pipelines, improve the cleanliness factor of phosphoric acid by wet process slot, meanwhile improving the chip yield and reliability subsequently prepared.
Description
Technical field
The utility model belongs to semiconductor wet etching device field, cleans and fills more particularly to a kind of phosphoric acid by wet process slot
It sets.
Background technology
In semiconductor fabrication process, it is laminated with nitride film (such as silicon nitride as etching object on a semiconductor substrate
Si3N4) and as etching barrier layer oxidation film (such as silica SiO2), Wet-method etching device is selectively to semiconductor-based
Nitride film and oxidation film on plate perform etching.
In semiconductor etching process, usually phosphate aqueous solution is used to carry out wet etching to nitride film and oxidation film,
If the oxidation film of etching barrier layer disappears in etching technics, device will be manufactured and be had an impact.
Hot phosphoric acid wet etching is usually used for the etching of nitride film, hot phosphoric acid is to Si3N4And SiO2With good equal
Even property and higher selection ratio.Common hot phosphoric acid etching liquid is mixed by the deionized water of 85% concentrated phosphoric acid and 15%, and
It is maintained at 160 DEG C to Si3N4It performs etching.
By following reaction equation it is found that with reaction progress, SiO2Concentration it is higher and higher, accumulate to it is a certain amount of it
After will form particle, and due to SiO2Increase, according to strangling Saudi Arabia row principle, product SiO2It can inhibit Si3N4Quarter
Erosion, reaction will be unable to continue, and etch rate will degradation;Meanwhile if persistently carrying out the place of hot phosphoric acid aqueous solution
Reason, then hot phosphoric acid aqueous solution evaporation, SiO2Concentration can also rise, and form particle.Current way is to monitor SiO using densimeter2
Concentration, and carry out part drain and supplement the action of new liquid, it is ensured that etching rate and selection ratio.
In phosphoric acid by wet process slot device, due to SiO2Concentration increases, SiO2Solid matter can be precipitated, form particle, and it is attached
It on phosphoric acid by wet process slot device groove body, it is difficult to remove;To ensure etching rate and selection ratio, phosphoric acid by wet process slot device need to be carried out
Drain can remnants SiO in pipeline in discharge opeing process2, since detergent line structure is more complicated, the SiO in pipeline2
It usually cannot exclude clean;In phosphoric acid by wet process slot device, the filtration core for removing foreign matter in the phosphate aqueous solution for flowing through pipeline
Also SiO can be deposited2Solid matter, cause the filter effect of filtration core to reduce;Prolonged running, SiO2Granule density is continuous
Increase, SiO2Particle can adhere to the follow-up process for influencing product on the semiconductor device, cause chip yield loss and can
By property the problem of.
Utility model content
In view of the foregoing deficiencies of prior art, the purpose of this utility model is to provide a kind of cleanings of phosphoric acid by wet process slot
Device, for solving in phosphoric acid by wet process slot device in the prior art, due to SiO2Concentration increases, and forms particle, is attached to wet method
Phosphoric acid slot device groove body, it is difficult to remove;Pipeline structure is more complicated, the SiO in pipeline2It usually cannot exclude clean;Filtration core
Because depositing SiO2Solid matter, cause filter effect to reduce;SiO2Granule density constantly increases, and adheres on the semiconductor device,
Influence the follow-up process of product, the problem of causing loss and the reliability of chip yield.
In order to achieve the above objects and other related objects, the utility model provides a kind of phosphoric acid by wet process slot cleaning device, packet
It includes:
Phosphoric acid by wet process slot, pipeline, cleaning feed liquor equipment and cleaning liquid discharging apparatus, wherein:
The phosphoric acid by wet process slot includes groove body and the slot import for being connected to the groove body and slot outlet;
The pipeline includes first end and second end, and the first end is connected to the slot outlet, the second end connection
In the slot import, the pipeline is connected with pump, heater and filtration core in turn from the first end to the second end;
The cleaning feed liquor equipment includes the first check valve, and first check valve is connected to the pipeline, to institute
It states pipeline and cleaning solution is provided;
The cleaning liquid discharging apparatus includes the second check valve, and second check valve is connected to the pipeline, to be discharged
The cleaning solution in the pipeline.
Preferably, the cleaning feed liquor equipment further includes that reservoir, inlet tube and power stock enter portion;The inlet tube connection
The reservoir and the power stock enter portion, and the power stock enters portion and connects first check valve by the inlet tube.
Preferably, it includes magnetic drive pump that the power stock, which enters portion,.
Preferably, the cleaning liquid discharging apparatus further includes the drain pipe for being connected to second check valve.
Preferably, the inlet tube or the drain pipe include teflon hose.
Preferably, the cleaning solution includes hydrogen fluoride solution.
Preferably, further include recoverer, the recoverer is connected to the cleaning liquid discharging apparatus.
Preferably, the recoverer is also attached to the cleaning feed liquor equipment.
Preferably, the recoverer is connected with concentration, to detect the solution concentration in the recoverer.
Preferably, first check valve and second check valve include in swing type check valve and lift check valve
One kind or combination.
Preferably, first check valve is between the filtration core and the slot import, second check valve position
Between the pump and the heater.
As described above, the phosphoric acid by wet process slot cleaning device of the utility model, has the advantages that:It is molten using hydrogen fluoride
Liquid is as cleaning solution, and by cleaning feed liquor equipment and cleaning liquid discharging apparatus, internal duct need not be dismantled by, which realizing, to reach
To the purpose of the groove body of cleaning phosphoric acid by wet process slot, pipeline and filtration core, to improve the clean of phosphoric acid by wet process slot after changing liquid
Cleanliness improves the chip yield and reliability subsequently prepared.
Description of the drawings
Fig. 1 is shown as the structural schematic diagram of the phosphoric acid by wet process slot cleaning device in the utility model.
Component label instructions
100 phosphoric acid by wet process slots
101 secondary slots
200 pipelines
300 pumps
400 heaters
500 filtration cores
600 cleaning feed liquor equipment
601 reservoirs
602 inlet tubes
603 power stocks enter portion
604 first check valves
700 cleaning liquid discharging apparatus
701 second check valves
702 drain pipes
Specific implementation mode
Illustrate that the embodiment of the utility model, those skilled in the art can be by these by particular specific embodiment below
Content disclosed by specification understands other advantages and effect of the utility model easily.
It please refers to Fig.1.It should be clear that structure, ratio, size etc. depicted in this specification institute accompanying drawings, only coordinating
The revealed content of specification, so that those skilled in the art understands and reads, being not limited to the utility model can be real
The qualifications applied, therefore do not have technical essential meaning, the tune of the modification of any structure, the change of proportionate relationship or size
It is whole, in the case where not influencing the effect of the utility model can be generated and the purpose that can reach, should all still fall in the utility model institute
The technology contents of announcement obtain in the range of capable of covering.Meanwhile in this specification it is cited as "upper", "lower", "left", "right",
The term of " centre " and " one " etc. is merely convenient to being illustrated for narration, rather than to limit the enforceable range of the utility model,
Its relativeness is altered or modified, in the case where changing technology contents without essence, when being also considered as the enforceable scope of the utility model.
As shown in Figure 1, the structural schematic diagram for the phosphoric acid by wet process slot cleaning device being shown as in the utility model.This practicality is new
Type provides a kind of phosphoric acid by wet process slot cleaning device, including phosphoric acid by wet process slot 100, pipeline 200, cleaning feed liquor equipment 600 and cleaning
Liquid discharging apparatus 700.
Specifically, the phosphoric acid by wet process slot 100 is used to store phosphate aqueous solution, including groove body, slot import and slot outlet are (not
Diagram).The slot import into the phosphoric acid by wet process slot 100 being passed through solution;Slot outlet is to by the wet method phosphorus
Solution export in acid tank 100.In the present embodiment, the phosphoric acid by wet process slot 100 has 1 slot import and 1 slot
Outlet.In another embodiment, the slot import can be N number of, wherein N > 1, and the slot outlet or M are a, wherein M >
1, those skilled in the art can need to be configured according to production, not be restricted herein.
Specifically, the phosphoric acid by wet process slot 100 further includes concentration detection device, temperature testing equipment and secondary slot 101.This
In embodiment, the phosphoric acid by wet process slot 100 includes 2 secondary slots 101, is respectively used to installing phosphoric acid solution and aqueous solution, from
And regulate and control the SiO in 100 inside phosphate aqueous solution of the phosphoric acid by wet process slot2Concentration, it is ensured that etching rate and selection ratio.Another implementation
In example, the phosphoric acid by wet process slot 100 also may include for installing SiO2Secondary slot 101, for adjusting the phosphoric acid by wet process slot 100
The SiO in internal phosphate aqueous solution2Concentration is not required herein.The concentration detection device is for detecting the wet method
SiO in 100 inside phosphate aqueous solution of phosphoric acid groove2Concentration;The temperature testing equipment is for detecting the phosphoric acid by wet process slot 100
The temperature of internal phosphate aqueous solution.
Specifically, the pipeline 200 includes first end and second end, the first end is connected to the slot outlet, described
Second end is connected to the slot import, and pump 300, heater 400 and mistake are connected in turn from the first end to the second end
Filter core 500.The pipeline 200 includes teflon hose, and the teflon hose has excellent chemical stability,
Corrosion-resistant, electrical insulating property and ageing resistance can be used for conveying the strong corrosive medium under high temperature.The pump 300 constitutes phosphoric acid water
Solution recycles driving source, and driving phosphate aqueous solution moves in the pipeline 200.The heater 400 is to flowing through the pipeline
Phosphate aqueous solution in 200 is heated.The filtration core 500 is for removing in the phosphate aqueous solution for flowing through the pipeline 200
Foreign matter.
Specifically, the cleaning feed liquor equipment 600 includes inlet tube 602, the inlet tube 602, which is sequentially connected, to be useful for storing
Deposit the reservoir 601 of cleaning solution, power stock enters portion 603 and the first check valve 604, first check valve 604 is connected to described
Pipeline 200.
As an example, the cleaning solution includes hydrogen fluoride solution, the hydrogen fluoride solution can be with SiO2Reaction, to reach
Remove the SiO deposited in the groove body, pipeline 200 and filtration core 500 of the phosphoric acid by wet process slot 1002Particle reaches clean
Purpose.
As an example, it includes magnetic drive pump that the power stock, which enters portion 603,.The magnetic drive pump can be by the dynamic sealing knot of easy leakage
Structure is converted into the static seal structure of zero leakage, can thoroughly solve the problems, such as solution " run, drip, leak ".Therefore, in the present embodiment,
It is preferred that the magnetic drive pump enters portion 603 as the power stock in the present embodiment.
Specifically, the cleaning liquid discharging apparatus 700 is including the second check valve 701 and is connected to second check valve 701
Drain pipe 702, second check valve 701 is connected to the pipeline 200.
As an example, the inlet tube 602 or the drain pipe 702 include teflon hose.The polytetrafluoroethyl-ne
Alkene hose has excellent chemical stability, corrosion-resistant, electrical insulating property and ageing resistance, can be used for conveying the strong corruption under high temperature
Lose medium.Therefore, in the present embodiment, the preferably described teflon hose as in the present embodiment the inlet tube 602 and
The drain pipe 702.
As an example, the phosphoric acid by wet process slot cleaning device further includes recoverer (not shown), the recoverer is connected to
The drain pipe 702.The recoverer to be recycled after the hydrogen fluoride solution.
As an example, the recoverer is also attached to the cleaning feed liquor equipment 600.In the cleaning feed liquor equipment 600
The reservoir 601 further include secondary reservoir (not shown), it is described pair reservoir be connected to the recoverer.
As an example, the recoverer is connected with concentration (not shown), to detect the institute in the recoverer
State hydrogen fluoride solution concentration.When the concentration detects that the hydrogen fluoride solution concentration in the recoverer meets in advance
If when value, the hydrogen fluoride solution in the recoverer can be conveyed into the secondary reservoir of the reservoir 601, be followed
Ring utilizes, to economize on resources;When the concentration detects that the hydrogen fluoride solution concentration in the recoverer is discontented
When the foot preset value, the solution in the recoverer will be retained in the recoverer, to be recycled, prevent from polluting.
It is described to be configured according to production requirement by those skilled in the art when setting value, it is not limited herein.
As an example, first check valve 604 and second check valve 701 include swing type check valve and lift
One kind in check valve or combination.First check valve 604 is the one-way cock of only import but no export, second check valve 701
For the one-way cock of only export but no import, to prevent solution reverse flow.In the present embodiment, first check valve 604 and described
Second check valve 701 preferably has low pressure drop and the swing type check valve to liquid inventory less-restrictive.It is another
In example, first check valve 604 and second check valve 701 also can be by the swing type check valve and the lifts
Check valve combination is constituted, or is only made of the lift check valve, is not restricted herein.
As an example, first check valve 604 is between the filtration core 500 and the slot import, described second
Check valve 701 is located between the pump 300 and the heater 400.
Enter portion 603 since first check valve 604 is connected to the power stock by the inlet tube 602, it is described dynamic
Power stock, which enters portion 603, to provide power for the hydrogen fluoride solution;Can be to flow through institute since the pump 300 constitutes cycle driving source
The liquid stated in pipeline 200 provides power, and therefore, in the present embodiment, preferably described first check valve 604 is located at the filtration core
Between 500 and the slot import, second check valve 701 is located between the pump 300 and the heater 400, with for institute
It states hydrogen fluoride solution and sufficient feed liquor and drain power is provided, improve cleaning efficiency.
The cleaning solution enters from the reservoir 601 in the cleaning feed liquor equipment 600 in the inlet tube 602,
The power stock enters after portion 603 provides power for the cleaning solution enters first check valve 604 through the inlet tube 602,
Then enter and is connected in the pipeline 200 of first check valve 604;The cleaning solution is from 200 second end of the pipeline
Into the slot import of the phosphoric acid by wet process slot 100, after the groove body for flowing through the phosphoric acid by wet process slot 100, from the phosphoric acid by wet process slot
100 slot outlet enter 200 first end of pipeline, then followed by the pipeline 200 the pump 300, plus
Hot device 400 and filtration core 500, then enter in the groove body of the phosphoric acid by wet process slot 100 through 200 second end of the pipeline, to real
The existing cleaning solution circulates, and is most excluded afterwards through the cleaning liquid discharging apparatus 700, to reach to the phosphoric acid by wet process slot
The purpose that 100 groove bodies, pipeline 200 and the filtration core 500 that is connected on the pipeline 200 are cleaned, removes deposition
SiO2。
The phosphoric acid by wet process slot cleaning device of the utility model is passed through hydrogen fluoride cleaning into pipeline by cleaning feed liquor equipment
Solution, by cleaning feed liquor equipment and cleaning liquid discharging apparatus, to groove body, the pipe of the phosphoric acid by wet process slot that hydrogen fluoride cleaning solution flows through
Road and the filtration core being connected on pipeline are cleaned, and the SiO of deposition is removed2, to realize the groove body to phosphoric acid by wet process slot, pipe
The cleaning of road and filtration core.Complicated pipeline, which need not be dismantled, can achieve the effect that cleaning;Improve phosphoric acid by wet process
The cleanliness factor of the groove body of slot;The cleanliness factor for improving filtration core, to improve the filter effect of filtration core;Meanwhile after improving
The continuous chip yield and reliability prepared.
In conclusion the phosphoric acid by wet process slot cleaning device of the utility model is passed through using hydrogen fluoride solution as cleaning solution
Feed liquor equipment and cleaning liquid discharging apparatus are cleaned, is realized to SiO in phosphoric acid by wet process slot2Cleaning, complex pipeline need not be dismantled just
It can achieve the purpose that the groove body, pipeline and filtration core of cleaning phosphoric acid groove, to improve the cleaning of phosphoric acid by wet process slot
Degree, improves the chip yield and reliability subsequently prepared.So the utility model effectively overcomes in the prior art kind
It plants disadvantage and has high industrial utilization.
The above embodiments are only illustrative of the principle and efficacy of the utility model, new not for this practicality is limited
Type.Any person skilled in the art can all carry out above-described embodiment under the spirit and scope without prejudice to the utility model
Modifications and changes.Therefore, such as those of ordinary skill in the art without departing from the revealed essence of the utility model
All equivalent modifications completed under refreshing and technological thought or change, should be covered by the claim of the utility model.
Claims (10)
1. a kind of phosphoric acid by wet process slot cleaning device, which is characterized in that including:Phosphoric acid by wet process slot, pipeline, cleaning feed liquor equipment and clear
Liquid discharging apparatus is washed, wherein:
The phosphoric acid by wet process slot includes groove body and the slot import for being connected to the groove body and slot outlet;
The pipeline includes first end and second end, and the first end is connected to the slot outlet, and the second end is connected to institute
Slot import is stated, the pipeline is connected with pump, heater and filtration core in turn from the first end to the second end;
The cleaning feed liquor equipment includes the first check valve, and first check valve is connected to the pipeline, to the pipe
Road provides cleaning solution;
The cleaning liquid discharging apparatus includes the second check valve, and second check valve is connected to the pipeline, described to be discharged
The cleaning solution in pipeline.
2. phosphoric acid by wet process slot cleaning device according to claim 1, it is characterised in that:The cleaning feed liquor equipment further includes
Reservoir, inlet tube and power stock enter portion;The inlet tube connects the reservoir and the power stock enters portion, the power stock
Enter portion and first check valve is connected by the inlet tube, the inlet tube includes teflon hose.
3. phosphoric acid by wet process slot cleaning device according to claim 2, it is characterised in that:It includes magnetic force that the power stock, which enters portion,
Pump.
4. phosphoric acid by wet process slot cleaning device according to claim 1, it is characterised in that:The cleaning liquid discharging apparatus further includes
It is connected to the drain pipe of second check valve, the drain pipe includes teflon hose.
5. phosphoric acid by wet process slot cleaning device according to claim 1, it is characterised in that:The cleaning solution includes that hydrogen fluoride is molten
Liquid.
6. phosphoric acid by wet process slot cleaning device according to claim 1, it is characterised in that:Further include recoverer, the recycling
Portion is connected to the cleaning liquid discharging apparatus.
7. phosphoric acid by wet process slot cleaning device according to claim 6, it is characterised in that:The recoverer is also attached to described
Clean feed liquor equipment.
8. phosphoric acid by wet process slot cleaning device according to claim 6, it is characterised in that:The recoverer is connected with concentration inspection
Survey portion, to detect the solution concentration in the recoverer.
9. phosphoric acid by wet process slot cleaning device according to claim 1, it is characterised in that:First check valve and described
Two check valves include one kind or combination in swing type check valve and lift check valve.
10. phosphoric acid by wet process slot cleaning device according to claim 1, it is characterised in that:First check valve is located at institute
It states between filtration core and the slot import, second check valve is located between the pump and the heater.
Priority Applications (1)
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CN201721721522.6U CN207929696U (en) | 2017-12-12 | 2017-12-12 | A kind of phosphoric acid by wet process slot cleaning device |
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CN201721721522.6U CN207929696U (en) | 2017-12-12 | 2017-12-12 | A kind of phosphoric acid by wet process slot cleaning device |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110067029A (en) * | 2019-06-03 | 2019-07-30 | 西安奕斯伟硅片技术有限公司 | The working method of Etaching device and Etaching device |
CN111014205A (en) * | 2020-01-02 | 2020-04-17 | 湖南普照信息材料有限公司 | Tank body cleaning, maintaining and maintaining method and cleaning tank system |
-
2017
- 2017-12-12 CN CN201721721522.6U patent/CN207929696U/en active Active
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110067029A (en) * | 2019-06-03 | 2019-07-30 | 西安奕斯伟硅片技术有限公司 | The working method of Etaching device and Etaching device |
CN111014205A (en) * | 2020-01-02 | 2020-04-17 | 湖南普照信息材料有限公司 | Tank body cleaning, maintaining and maintaining method and cleaning tank system |
CN111014205B (en) * | 2020-01-02 | 2021-06-25 | 湖南普照信息材料有限公司 | Tank body cleaning, maintaining and maintaining method and cleaning tank system |
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