CN207793410U - A kind of surface graded film preparation device of covering type based on ball valve - Google Patents
A kind of surface graded film preparation device of covering type based on ball valve Download PDFInfo
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- CN207793410U CN207793410U CN201721828154.5U CN201721828154U CN207793410U CN 207793410 U CN207793410 U CN 207793410U CN 201721828154 U CN201721828154 U CN 201721828154U CN 207793410 U CN207793410 U CN 207793410U
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- ball valve
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- baffle ring
- evaporation source
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Abstract
A kind of surface graded film preparation device of covering type based on ball valve, including vacuum chamber and setting, in the indoor matrix of vacuum chamber and evaporation source structure, the evaporation source structure is located at the top of the matrix and is suspended in vacuum chamber by fixed mechanism；The evaporation source structure includes crucible vaporising device, source material, ball valve flux control mechanism, elements diffusion correction channel and positive potential electrode, the source material is arranged in the crucible vaporising device, the center position of the opening of the crucible vaporising device towards matrix arranges that the ball valve flux control mechanism includes stepper motor, ball valve shell, the hollow baffle ring being arranged in ball valve shell and the baffle ring shaft rotated for hollow baffle ring.The utility model provides a kind of surface graded film preparation device of the covering type based on ball valve, elemental composition composition of proportions is controlled completely, the speed that can accelerate entire high-throughput experiment, uses manpower and material resources sparingly, can quickly prepare the polynary gradient film of component continuous gradation.
Description
Technical field
The utility model is related to high flux film preparing technical fields, more particularly, to a kind of covering type table based on ball valve
Face gradient film preparation facilities.
Background technology
Today of the gradual maturation of various science and technology, to reach a certain performance, in addition to the demand of physical arrangement, to material
The requirement of material itself is also that when the river rises the boat goes up.In high-end field, the high performance requirements of material will meet higher economy simultaneously,
It is often relatively difficult.In this case, high-quality material coating makes it become may be implemented.In numerous material coating film coating techniques
In, it is a kind of more mature processing method to plate last layer composite material film to material by PVD technique.PVD technique, that is, object
Physical vapor deposition technology refers to the substance transfer process being transferred to molecule or atom from source substance on substrate, it can allow
Certain material sprayings with property (heat-resisting quantity, wearability, corrosion resistance, intensity height, thermal diffusivity etc.) to performance compared with
On low substrate, make substrate that there is better performance.It is excellent to cheap base material plating last layer performance by PVD technique
Coating more, that is, meet use demand, and there has also been higher economy.
However having manufacturing technology, the formula of coating material is at the difficult point tackled key problems.Before to unitary material maturation research
It puts, the performance of a variety of materials has excavated the limit；The research of binary material also there has been a degree of development；Ternary material
Material or even more polynary combination of materials can only often lean on the research manufacturing experience of forefathers, in most of Material Field even blank
's.In research multicomponent material at the performance of subassembly, the material of research maximal number magnitude is generally required during finding optimal solution
Material combination, this will expend great manpower and materials.
Middle nineteen nineties in last century are born in high-throughput combined material experiment, are to seek combination of materials and find out optimal solution
A kind of technological means, it can be completed in a short time the preparation of lot of materials sample, can greatly shorten develop material group
Close the time.In ten several years of past, in order to which accelerated material science and material find, with the process optimized, to have developed multicomponent
The preparation of material and research method.These high-throughput experimental methods are in biomolecule science, catalysis, electrochemistry, photoelectricity section
It learns and the other fields such as material science is widely used.For material experimental method there are three key step.First
It is to prepare a large amount of different sample of material, these sample of material constitute each element of material depot.Second is to these materials
Component characteristic elaboration, with the forming of the entire material depot of determination, structure, stage distribution etc..The third is carried out in material depot
The performance of the test of each combination of materials ability, these materials includes catalytic activity, hardness, thermal conductivity etc..
It includes two kinds of basic skills that existing PVD, which prepares gradient film technology,：Evaporation and sputtering method.The characteristics of evaporation is
With higher film purity.And evaporation has substantially following three kinds of methods.Such as a kind of method described in Fig. 1 a, 1 is source
Material, 2 be film, 3 be matrix, cvd precursor is placed on the position of substrate using chemical vapor deposition, and allow to spread,
So that gas phase is mixed, and complex gradient is formed between the bottom matrix in the region between the two sources.This method is relatively easy,
And allow to be thoroughly mixed elemental composition.However, this method can only extremely have film constituent ratio
The control of limit, and the film thickness and uneven generated.Second method in Fig. 1 b 1 is source material, 2 be film, 3 be base
Matter, 4 are cover board, using the uniform solder flux and contact cover board to matrix seal coat, can effectively change sedimentation time, then change
Become the thickness of different location on substrate.In this way, film is exactly by being continuously generated on different gradient vector directions.This method
One of limitation is exactly that coating is not fixed, and annealing later may also fail that matrix and overlay film is made to be thoroughly mixed, unless often
The overlay film thickness of layer is no more than an atomic monolayer.Another method for forming CSAFs is to use shaftless source in Fig. 1 c.2 be thin
Film, 3 be matrix, 5 be shaftless source, in this approach, source position is relative to stromal surface.This generates in matrix
The gradient of flux.CSAFs is mixed to form by the flux in multiple sources.In general, offset source method can allow multiple members
It is plain co-deposited, but it does not allow to process complete interblock space on single workpiece.Also, above-described several gradients
Method for manufacturing thin film has a problem that i.e. material cell diffusion velocity is slower so that whole preparation process is longer.
Invention content
In order to overcome the shortcomings of the prior art, the utility model provides a kind of covering type surface ladder based on ball valve
Film preparation device is spent, elemental composition composition of proportions is controlled completely, coating is enable to be firmly adsorbed in matrix, and
Complete interblock space is processed on single workpiece, and can faster prepare satisfactory gradient film, so as to accelerate
The speed of entire high-throughput experiment, uses manpower and material resources sparingly, can quickly prepare the polynary gradient film of component continuous gradation.
Technical solution adopted by the utility model to solve its technical problems is：
A kind of surface graded film preparation device of covering type based on ball valve, including vacuum chamber and setting are in vacuum chamber
Indoor matrix and evaporation source structure, the evaporation source structure are located at the top of the matrix and are suspended at very by fixed mechanism
In plenum chamber；
The evaporation source structure includes crucible vaporising device, source material, ball valve flux control mechanism, elements diffusion correction channel
With positive potential electrode, the source material is arranged in the crucible vaporising device, and the opening of the crucible vaporising device is towards matrix
Center position arrangement, the ball valve flux control mechanism includes stepper motor, ball valve shell, is arranged in ball valve shell
Neutral gear ring and baffle ring shaft for the rotation of hollow baffle ring, the upper and lower ends of the ball valve shell respectively with crucible vaporising device
The upper end that opening, elements diffusion correct channel is fixedly connected, and the elements diffusion corrects center position cloth of the channel towards matrix
It sets, the ball valve shell is connected to crucible vaporising device, elements diffusion correction channel respectively, and the baffle ring shaft is rotatably pacified
Center on ball valve shell and across ball valve shell, the baffle ring shaft is vertical with the central axes of crucible vaporising device, institute
It is that bowl-type and its open end are fixed in the baffle ring shaft to state hollow baffle ring, the stepper motor by gear reduction with
The baffle ring shaft connection；
The crucible vaporising device, ball valve shell, hollow baffle ring and elements diffusion correction channel are coaxially disposed；The earthenware
Crucible vaporising device is connect with the positive potential electrode, and the matrix is connect with negative potential electrode, and the bottom of the matrix is equipped with
Plated film in matrix carries out the heating device of Annealing Crystallization.
Further, the evaporation source structure setting has two sets, and two sets of evaporation source structures are symmetrically arranged.
Further, the evaporation source structure setting has four sets, two sets one group, front and back each one group, every group of two sets of evaporation sources
Structure is symmetrically arranged.
The beneficial effects of the utility model are mainly manifested in：In unitary shape can be prepared to quaternary graded elemental film is several
Arbitrarily switch in state, flexibility is very high；The advantages that preparation process is simple, quick, controllability is high.
Description of the drawings
Fig. 1 a, Fig. 1 b, Fig. 1 c are the principle of device schematic diagram that tradition prepares gradient film.
Fig. 2 is the schematic diagram that the utility model prepares that gradient film evaporates source structure.
Fig. 3 is the apparatus structure schematic diagram that the utility model implements prepared by gradient film.
Specific implementation mode
The utility model is further described below in conjunction with the accompanying drawings.
With reference to Fig. 2 and Fig. 3, a kind of surface graded film preparation device of covering type based on ball valve, including vacuum chamber 18
And the matrix 16 being arranged in vacuum chamber 18 and evaporation source structure, the evaporation source structure are located at the top of the matrix 16
And it is suspended in vacuum chamber 18 by fixed mechanism 17；
The evaporation source structure includes crucible vaporising device 11, source material 10, ball valve flux control mechanism, elements diffusion correction
Channel 14 and positive potential electrode 9, the source material are arranged in the crucible vaporising device, the opening of the crucible vaporising device 11
It is arranged towards the center position of matrix, the ball valve flux control mechanism includes stepper motor 6, ball valve shell 13, is arranged in ball
Hollow baffle ring 12 in valve shell 13 and the baffle ring shaft 8 rotated for hollow baffle ring 12, up and down the two of the ball valve shell 13
The upper end that channel 14 is corrected at end with the opening of crucible vaporising device 11, elements diffusion respectively is fixedly connected, and the elements diffusion is rectified
The center position of positive channel 14 towards matrix 16 arranges, the ball valve shell 13 respectively with crucible vaporising device 11, elements diffusion
Channel 14 to be corrected to be connected to, the baffle ring shaft 8 is rotatably mounted on the center on ball valve shell 13 and across ball valve shell 13,
The baffle ring shaft 8 is vertical with the central axes of crucible vaporising device 11, and the hollow baffle ring 12 is bowl-type and its open end is fixed
In the baffle ring shaft 8, the stepper motor 6 is connect by gear reduction 7 with the baffle ring shaft 8；
The crucible vaporising device 11, ball valve shell 13, hollow baffle ring 12 and elements diffusion correction channel 14 are coaxially set
It sets；The crucible vaporising device 11 is connect with the positive potential electrode 9, and the matrix 16 is connect with negative potential electrode 15, described
The bottom of matrix 16 is equipped with the heating device 19 that Annealing Crystallization is carried out for the plated film in matrix 16.
Further, the evaporation source structure setting has two sets, and two sets of evaporation source structures are symmetrically arranged.
Further, the evaporation source structure setting has four sets, two sets one group, front and back each one group, every group of two sets of evaporation sources
Structure is symmetrically arranged.
As shown in Fig. 2, evaporation source structure is the core of entire gradient film preparation facilities.Positive potential electrode 9 is connected to earthenware
The bottom of crucible vaporising device 11 makes the source material 10 being contained in crucible vaporising device 11 become positively charged, to crucible carry out heating or
Person is allowed to heat up by modes such as laser beams to the enough energy of source material, and finally evaporates, and evaporation source chamber is diffused into atomic state
It is interior.Ball valve flux control mechanism is the key that so that entire gradient film preparation process and gradient film component is constituted controllable.Ball
Valve shell 8 is bolted on crucible vaporising device 11, and there is the hollow baffle ring 12 that can be rotated around baffle ring shaft 8 in inside,
This mechanism can carry out evaporation source chamber passage 0~100% covering, be the core of entire ball valve flux control mechanism,
When neutral gear ring 12 goes to position shown in Fig. 2 in the middle, it will entire evaporation source chamber passage is fully sealed, material flux in source is 0 at this time；
When turning over 90 °, evaporation source chamber passage will be fully opened hollow baffle ring 12, and material flux in source is 100 at this time；And turn over 0 °~
Angle within 90 °, you can by controlling the size of evaporation source chamber passage, make part source material beat on hollow baffle ring 12, portion
Divide and elements diffusion correction channel 9 is entered by channel, achievees the purpose that voltage input material flux.Stepper motor 6 passes through gear shift
The rotational angle of stepper motor 6 amplifies in mechanism 7, reduces stepper motor requirement and cost, can also more precisely control hollow
The rotational angle of baffle ring 12 keeps the gradual change of gradient film more natural.Stepper motor 6 can then be regulated and controled by various modes
It is allowed to turn an angle, and then hollow baffle ring 12 is made to go to the certain space that desired angle covers evaporation source chamber passage,
It can be finally reached the not homologous material flux of control with three evaporation sources of independent control and make it possible into continuously linear ladder in conjunction with other
Spend the film that change profile prepares gradient consecutive variations.When source material reaches elements diffusion correction channel 14, due to logical by ball valve
Turbulent flow and sinuous flow are generated when measuring the irregular channel of control mechanism, channel 14 is corrected to this portion by the elements diffusion of certain length
Divide turbulent flow and sinuous flow to carry out water conservancy diversion and rectification, source material is enable more uniformly to be deposited in matrix 16.Gear reduction is
By being formed with the pinion gear of the motor axis connection of stepper motor 6 and the gear wheel being connect with baffle ring shaft.
As shown in figure 3, evaporation source and matrix 16 are mounted in vacuum chamber 18, four evaporation sources pass through fixed mechanism
17 are mutually a fixed angle composition evaporation source structure and are rigidly fixed in 18 top of vacuum chamber, and matrix 16 is in vacuum chamber
18 lower parts, face evaporate source structure.Before the deposition, it needs to ensure the indoor vacuum degree of vacuum chamber, it is miscellaneous in air to reduce
Matter is mixed into the purity that gradient film is reduced in the source material gas evaporated, can also avoid the appearance of defect to a certain extent.
Evaporating source structure by inversion makes the source material evaporated by downward gravity, is allowed to faster decline, and accelerates deposition velocity.
It is connected with negative potential electrode 15 in matrix 16, downward electricity is formed with connecting between the evaporation source of positive potential electrode 9
, the gas source material evaporated from positively charged crucible vaporising device 11 can also become positively charged, forced downwards in the electric field,
In addition being inverted evaporation source structure, compared with equipment before, source material is made to also suffer from the gravity for being directed toward matrix 16 rather than backwards to base
The power of matter 16.Electric field force add gravity, source material can be made quickly to deposit in matrix 16, shortening prepare gradient film when
Between.16 lower section of matrix is equipped with heating device 19, for being made annealing treatment to the heating of matrix 16, so as to deposit in matrix 16
Film crystallization, promoted film performance.
The operation principle of the utility model is：It is polynary continuous that ball valve flux control mechanism is prepared by entire gradient film device
The core of depth-graded film.Source material is heated to vapourizing temperature by crucible vaporising device 11, and it is in atom or molecule to make source material 10
Unit form is diffused into channel；The source material of unit form can pass through 6 rotating ball of stepper motor of ball valve flux control mechanism
Hollow baffle ring 12 in valve shell 13, the flux of control material element diffusion are logical in conjunction with four evaporation independent ball valves of source structure
Control mechanism is measured, the component composition that gradient can be constituted to the element of Working position controls；Elements diffusion corrects channel 14
Then finally can uniformly it be diffused into matrix 16 to carrying out water conservancy diversion, rectification by the elemental composition of ball valve flux control mechanism.Peace
The key of whole preparation process is to speed up loaded on the positive and negative potential electrode on crucible vaporising device 11 and matrix 16.Positive potential electrode
9 are connected on crucible vaporising device 11, and the source material being evaporated can also become positively charged, due to the electricity between evaporation source and matrix 16
, in addition evaporating source structure in upper, matrix 16 under, gaseous source material can be by downward electric field force and gravity, Ke Yigeng
It deposits in matrix 16 downwards soon.Since particle radiation carries sizable energy, meeting fast cooling in matrix 16 is deposited to,
And the film thickness formed is very thin, character can not form crystal, and performance is also low compared with block materials, therefore at 16 back side of matrix
One heating device 19 is set, is made annealing treatment, so that film crystallization, promotes the performance of film.This equipment in total there are four
The evaporation source that can individually control, that is to say, that can carry out binary to quaternary multicomponent continuous gradation gradient film
It prepares, can also individually carry out the physical vapour deposition (PVD) of unitary component.And control therein can pass through the control to stepper motor 6
System controls whole preparation process element composition.
In conclusion the utility model following points advantage.When in whole preparation process, it can be by four
The stepper motor 6 of independent evaporation source is separately controlled, can to make the elemental constituent each put in matrix 16 composition become
Control can look into.Second is that with Preparation equipment before under, matrix 16 will originally be made in upper distribution, equipment described in the utility model
Gravity to produce detrimental resistance becomes producing advantageous resistance；In addition arranging positive potential electrode 9 on evaporation source, in matrix 16
It arranges negative potential electrode 15, allows and generate downward electric field between evaporation source and matrix 16, make the source material of evaporation by downward electricity
Field force is allowed to faster deposit, accelerates whole preparation process.Third, four evaporation sources can also control it with independent control
Whether work, so as to arbitrarily switch in unitary to several preparing processes of quaternary graded elemental film, flexibility is very high.
The utility model can produce element species abundance with single, and gradient is evenly distributed continuously, and it is complete that ingredient constitutes range
The complete gradient film in face, and can arbitrarily switch in unitary to quaternary element species, preparation process is stablized quickly, also has
Higher production flexibility has very strong realistic meaning for the experiment of high-throughput combined material.
The above is preferred embodiments of the present invention, it is noted that for the ordinary skill of the art
For personnel, under the premise of not departing from principle described in the utility model, it can also make several improvements and retouch, these improvement
The scope of protection of the utility model is also should be regarded as with retouching.
Claims (3)
1. a kind of surface graded film preparation device of covering type based on ball valve, it is characterised in that：Including vacuum chamber and set
It sets in the indoor matrix of vacuum chamber and evaporation source structure, the evaporation source structure is located at the top of the matrix and by fixed machine
Structure is suspended in vacuum chamber；
The evaporation source structure includes crucible vaporising device, source material, ball valve flux control mechanism, elements diffusion correction channel and just
Potential electrode, the source material are arranged in the crucible vaporising device, and the opening of the crucible vaporising device is towards in matrix
Heart direction arranges that the ball valve flux control mechanism includes stepper motor, ball valve shell, the middle neutral gear being arranged in ball valve shell
Ring and baffle ring shaft for the rotation of hollow baffle ring, the upper and lower ends of the ball valve shell are opened with crucible vaporising device respectively
The upper end that mouth, elements diffusion correct channel is fixedly connected, and the center position that the elements diffusion corrects channel towards matrix is arranged,
The ball valve shell is connected to crucible vaporising device, elements diffusion correction channel respectively, and the baffle ring shaft is rotatably installed
Center on ball valve shell and across ball valve shell, the baffle ring shaft is vertical with the central axes of crucible vaporising device, described
Hollow baffle ring is bowl-type and its open end is fixed in the baffle ring shaft, and the stepper motor passes through gear reduction and institute
State the connection of baffle ring shaft；
The crucible vaporising device, ball valve shell, hollow baffle ring and elements diffusion correction channel are coaxially disposed；The crucible steams
Transmitting apparatus is connect with the positive potential electrode, and the matrix is connect with negative potential electrode, and the bottom of the matrix, which is equipped with, to be used for
Plated film in matrix carries out the heating device of Annealing Crystallization.
2. a kind of surface graded film preparation device of covering type based on ball valve as described in claim 1, it is characterised in that：Institute
Stating evaporation source structure setting has two sets, and two sets of evaporation source structures are symmetrically arranged.
3. a kind of surface graded film preparation device of covering type based on ball valve as described in claim 1, it is characterised in that：Institute
Stating evaporation source structure setting has four sets, and two sets one group, front and back each one group, every group of two sets of evaporation source structures are symmetrically arranged.
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| CN201721828154.5U CN207793410U (en) | 2017-12-25 | 2017-12-25 | A kind of surface graded film preparation device of covering type based on ball valve |
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| CN201721828154.5U CN207793410U (en) | 2017-12-25 | 2017-12-25 | A kind of surface graded film preparation device of covering type based on ball valve |
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| CN207793410U true CN207793410U (en) | 2018-08-31 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108103453A (en) * | 2017-12-25 | 2018-06-01 | 浙江工业大学 | A kind of surface graded film preparation device of covering type based on ball valve |
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- 2017-12-25 CN CN201721828154.5U patent/CN207793410U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108103453A (en) * | 2017-12-25 | 2018-06-01 | 浙江工业大学 | A kind of surface graded film preparation device of covering type based on ball valve |
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