CN207636809U - A kind of optically isolated structure of multichannel integrated optical filter - Google Patents
A kind of optically isolated structure of multichannel integrated optical filter Download PDFInfo
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- CN207636809U CN207636809U CN201721838903.2U CN201721838903U CN207636809U CN 207636809 U CN207636809 U CN 207636809U CN 201721838903 U CN201721838903 U CN 201721838903U CN 207636809 U CN207636809 U CN 207636809U
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- film layer
- oxide film
- layer
- optical filter
- chromium oxide
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Abstract
The utility model discloses a kind of optically isolated structure of multichannel integrated optical filter, includes the black chromium metallic diaphragm of setting over the substrate surface, to prevent light from passing through, black chromium metallic diaphragm is distributed in the white space of multichannel integrated optical filter interchannel；Further include extinction layer, extinction layer is made of the first chromium oxide film layer, the first silica coating, the second chromium oxide film layer, the second silica coating.The extinction layer that black chromium metallic diaphragm is arranged by technique for vacuum coating and is made of four layers of oxide optical films over the substrate surface for the utility model, meet the low requirement of optical transmittance using black chromium metallic diaphragm, simultaneously, the reflected light of black chromium metal film layer surface is eliminated using extinction layer, it can effectively realize the isolation between each channel of multichannel integrated optical filter, ensure the working performance of multichannel integrated optical filter.
Description
Technical field
The utility model is related to technical field of optical instrument, and in particular to a kind of optically isolated knot of multichannel integrated optical filter
Structure.
Background technology
The optical imaging system used on remote sensing of the earth and observation satellite, due to its high reliability request and harsh body
Product requires, and usually realizes the separation of different wavelengths of light using multichannel integrated optical filter in the optical path.Multichannel integrated filtering
Piece is to be sequentially prepared the spike filter in several channels by special multiple tracks technique to be formed on same substrate.It is logical
Isolation between road will use optically isolated structure, to realize the white space blacking to interchannel, prevent light by clear area,
Avoid the crosstalk for causing interchannel signal；Optically isolated structure does not cause the reflection of incident ray again simultaneously, in order to avoid residual reflection
Light cause signal noise after multiple reflections.This requires optically isolated structures to have two effects：One, prevent light logical
It crosses (transmitance is low on requiring wave band)；Two, delustring (there is low residual reflectance on requiring wave band).
In the prior art, the white space for being typically employed in interchannel coats pitch-dark mode and forms optically isolated structure, though
The low requirement of optical transmittance can so be met, but delustring purpose is not achieved.
Utility model content
The purpose of this utility model is to provide a kind of optically isolated structures of multichannel integrated optical filter.
To realize above-mentioned purpose of utility model, the utility model adopts the following technical solution：
A kind of optically isolated structure of multichannel integrated optical filter includes the black chromium metallic diaphragm of setting over the substrate surface,
To prevent light from passing through, the black chromium metallic diaphragm is distributed in the white space of multichannel integrated optical filter interchannel；
Further include extinction layer, the extinction layer is by the first chromium oxide film layer, the first silica coating, the second chromium oxide film
Layer, the second silica coating composition, the first chromium oxide film layer are arranged on the black chromium metallic diaphragm, and the described 1st
Membranous layer of silicon oxide is arranged in the first chromium oxide film layer, and the second chromium oxide film layer is arranged in first silica
In film layer, second silica coating is arranged in the second chromium oxide film layer.
As the further improved technical solution of the utility model, the thickness of the black chromium metallic diaphragm is received for 200-500
The thickness of rice, the first chromium oxide film layer is 45-50 nanometers, and the thickness of first silica coating is received for 200-220
The thickness of rice, the second chromium oxide film layer is 120-140 nanometers, and the thickness of second silica coating is received for 85-95
Rice.
Compared with the existing technology, the utility model has technical effect that：
Black chromium metallic diaphragm is arranged by technique for vacuum coating and over the substrate surface by four layers of oxide for the utility model
The extinction layer of optical thin film composition, meets the low requirement of optical transmittance using black chromium metallic diaphragm, meanwhile, utilize extinction layer
The reflected light of black chromium metal film layer surface is eliminated, can effectively realize the isolation between each channel of multichannel integrated optical filter, is ensured
The working performance of multichannel integrated optical filter.
Description of the drawings
Fig. 1 is a kind of structural representation of the optically isolated structure of multichannel integrated optical filter in the utility model embodiment
Figure；
Fig. 2 is a kind of another visual angle of optically isolated structure of multichannel integrated optical filter in the utility model embodiment
Structural schematic diagram.
Specific implementation mode
The utility model is described in detail below with reference to specific implementation mode.But these embodiments are not intended to limit
The utility model, structure that those skilled in the art are made according to these embodiments, method or change functionally
It changes and is all contained in the scope of protection of the utility model.
A kind of embodiment of the utility model presented below：
The optically isolated structure of multichannel integrated optical filter in Fig. 1 to 2, specially binary channels integrated optical filter is optically isolated
Structure is merely exemplary to illustrate, should not be construed as a limitation of the present invention.In other embodiments, optically isolated knot
Structure can also be applied to the integrated filtering on piece with more multichannel such as triple channel.
Fig. 1 to 2, a kind of optically isolated structure 1 of multichannel integrated optical filter are referred to, including is arranged on 2 surface of substrate
Black chromium metallic diaphragm 11, to prevent light from passing through, the black chromium metallic diaphragm 11 is distributed in multichannel integrated optical filter channel
Between white space；
Further include extinction layer, the extinction layer is aoxidized by the first chromium oxide film layer 12, the first silica coating 13, second
Chromium film layer 14, the second silica coating 15 composition, the first chromium oxide film layer 12 are arranged in the black chromium metallic diaphragm 11
On, first silica coating 13 is arranged in the first chromium oxide film layer 12, and the second chromium oxide film layer 14 is set
It sets on first silica coating 13, second silica coating 15 is arranged in the second chromium oxide film layer 14
On.
Further, the thickness of the black chromium metallic diaphragm 11 is 200-500 nanometers, the first chromium oxide film layer 12
Thickness is 45-50 nanometers, and the thickness of first silica coating 13 is 200-220 nanometers, the second chromium oxide film layer
14 thickness is 120-140 nanometers, and the thickness of second silica coating 15 is 85-95 nanometers.
A kind of manufacturing method of the optically isolated structure 1 of multichannel integrated optical filter, includes the following steps：
S1, using mechanical mask fixture clamping substrate 2 so that on substrate 2 only need to be arranged optically isolated structure 1 surface dew
Go out；
S2, mechanical mask fixture and substrate 2 are put into togerther film-coating workpiece load plate, are reloaded into vacuum coating system；
S3, black chromium metallic diaphragm 11 is coated on 2 exposing surface of substrate；
S4, the first chromium oxide film layer 12 is coated on black chromium metallic diaphragm 11；
S5, the first silica coating 13 is coated in the first chromium oxide film layer 12；
S6, the second chromium oxide film layer 14 is coated on the first silica coating 13；
S7, the second silica coating 15 is coated in the second chromium oxide film layer 14 up to optically isolated structure 1.
Further, the one kind of the substrate 2 in glass, quartz, sapphire, zinc sulphide, zinc selenide optical material.
Further, the thickness of the black chromium metallic diaphragm 11 is 200-500 nanometers, the first chromium oxide film layer 12
Thickness is 45-50 nanometers, and the thickness of first silica coating 13 is 200-220 nanometers, the second chromium oxide film layer
14 thickness is 120-140 nanometers, and the thickness of second silica coating 15 is 85-95 nanometers.
Further, the thickness of the first chromium oxide film layer 12 is 50 nanometers, first silica coating 13
Thickness be 200 nanometers, the thickness of the second chromium oxide film layer 14 is 130 nanometers, second silica coating 15
Thickness is 90 nanometers.
Further, precision is used to vibrate thicknesses of layers controller for 1 nanometer of quartz crystal in step S3 to step S7
Control black chromium metallic diaphragm 11, the first chromium oxide film layer 12, the first silica coating 13, the second chromium oxide film layer 14, second
The thickness of silica coating 15.
Further, the first chromium oxide film is coated with using oxygen ion assisted deposition technique auxiliary in step S4 to step S7
The 12, first silica coating 13 of layer, the second chromium oxide film layer 14, the second silica coating 15.It is assisted using oxygen ion
Coating process assists the deposition of extinction layer, the mechanical performance of extinction layer structure can be made more solid and reliable, in adverse circumstances
In longer life expectancy.
Further, the implementation temperature of step S3 is room temperature to 100 degrees Celsius, and the implementation temperature of step S4-S7 is 150 to take the photograph
Family name's degree is to 300 degrees Celsius.
Further, the implementation vacuum pressure of step S3 is not more than 1x10-3The implementation vacuum pressure of Pa, step S4-S7 are not
More than 3x10-2Pa。
Embodiment 1
S1, prepare substrate and the corresponding mechanical mask fixture for exposing optically isolated structure region, clean the substrate
And it dries.The one kind of the mechanical mask clamp material in the metal that stainless steel, aluminium, copper or iron etc. are easily worked, shape
Shape is designed and processes according to substrate shape and channel shape, position；Its open area corresponds to optically isolated structure in substrate
On position；
S2, mechanical mask fixture and substrate are put into togerther film-coating workpiece load plate, are reloaded into vacuum coating system；
S3, by optics high vacuum vapor deposition technique, start vacuum pressure when plated film and be not more than 1x10-3Pa, implementing temperature is
Room temperature is to 100 DEG C；Thicknesses of layers controller is vibrated with quartz crystal, is coated with the black chromium metallic diaphragm of one layer of 200 nanometer thickness；
S4, by optics high vacuum vapor deposition technique, vacuum pressure is not more than 3x10 when plated film-2Pa, it is 150 DEG C to implement temperature
To 300 DEG C, thickness is controlled with quartz crystal oscillation thicknesses of layers controller, is coated with the first chromium oxide film of one layer of 50 nanometer thickness
Layer；
S5, by optics high vacuum vapor deposition technique, vacuum pressure is not more than 3x10 when plated film-2Pa, it is 150 DEG C to implement temperature
To 300 DEG C, thickness is controlled with quartz crystal oscillation thicknesses of layers controller, is coated with the first silicon dioxide film of one layer of 200nm thickness
Layer；
S6, by optics high vacuum vapor deposition technique, vacuum pressure is not more than 3x10 when plated film-2Pa, it is 150 DEG C to implement temperature
To 300 DEG C, thickness is controlled with quartz crystal oscillation thicknesses of layers controller, is coated with the second chromium oxide film of one layer of 130 nanometer thickness
Layer；
S7, by optics high vacuum vapor deposition technique, vacuum pressure is not more than 3x10 when plated film-2Pa, it is 150 DEG C to implement temperature
To 300 DEG C, thickness is controlled with quartz crystal oscillation thicknesses of layers controller, is coated with the second silicon dioxide film of one layer of 90 nanometer thickness
Layer.
The finished product that step S7 plated films are obtained takes out, cleaning, drying.
Embodiment 2
The thickness of black chromium metallic diaphragm is 300 nanometers in step S3, and the first chromium oxide film layer thickness is received for 45 in step S4
Meter, the first silicon dioxide film layer thickness is 210 nanometers in step S5, and the second chromium oxide film layer thickness is 120 nanometers in step S6,
The second silicon dioxide film layer thickness is 85 nanometers in step S7.Remaining content is same as Example 1.
Embodiment 3
The thickness of black chromium metallic diaphragm is 500 nanometers in step S3, and the first chromium oxide film layer thickness is received for 50 in step S4
Meter, the first silicon dioxide film layer thickness is 220 nanometers in step S5, and the second chromium oxide film layer thickness is 140 nanometers in step S6,
The second silicon dioxide film layer thickness is 95 nanometers in step S7.Remaining content is same as Example 1.
Compared with the existing technology, the utility model has technical effect that：
Black chromium metallic diaphragm is arranged by technique for vacuum coating and over the substrate surface by four layers of oxide for the utility model
The extinction layer of optical thin film composition, meets the low requirement of optical transmittance using black chromium metallic diaphragm, meanwhile, utilize extinction layer
The reflected light of black chromium metal film layer surface is eliminated, can effectively realize the isolation between each channel of multichannel integrated optical filter, is ensured
The working performance of multichannel integrated optical filter.
Finally it should be noted that：Embodiment of above is only to illustrate the technical solution of the utility model, rather than limits it
System；Although the utility model is described in detail with reference to aforementioned embodiments, those skilled in the art should
Understand：It can still modify to the technical solution recorded in aforementioned each embodiment, or special to which part technology
Sign carries out equivalent replacement；And these modifications or replacements, each reality of the utility model that it does not separate the essence of the corresponding technical solution
Apply the spirit and scope of mode technical solution.
Claims (2)
1. a kind of optically isolated structure of multichannel integrated optical filter, which is characterized in that including black chromium over the substrate surface is arranged
Metallic diaphragm, to prevent light from passing through, the black chromium metallic diaphragm is distributed in the clear area of multichannel integrated optical filter interchannel
Domain；
Further include extinction layer, the extinction layer by the first chromium oxide film layer, the first silica coating, the second chromium oxide film layer,
Second silica coating forms, and the first chromium oxide film layer is arranged on the black chromium metallic diaphragm, first dioxy
SiClx film layer is arranged in the first chromium oxide film layer, and the second chromium oxide film layer is arranged in first silicon dioxide film
On layer, second silica coating is arranged in the second chromium oxide film layer.
2. a kind of optically isolated structure of multichannel integrated optical filter according to claim 1, which is characterized in that the black chromium
The thickness of metallic diaphragm is 200-500 nanometers, and the thickness of the first chromium oxide film layer is 45-50 nanometers, first dioxy
The thickness of SiClx film layer is 200-220 nanometer, and the thickness of the second chromium oxide film layer is 120-140 nanometers, the described 2nd 2
The thickness of membranous layer of silicon oxide is 85-95 nanometers.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721838903.2U CN207636809U (en) | 2017-12-26 | 2017-12-26 | A kind of optically isolated structure of multichannel integrated optical filter |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721838903.2U CN207636809U (en) | 2017-12-26 | 2017-12-26 | A kind of optically isolated structure of multichannel integrated optical filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207636809U true CN207636809U (en) | 2018-07-20 |
Family
ID=62852744
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| CN201721838903.2U Active CN207636809U (en) | 2017-12-26 | 2017-12-26 | A kind of optically isolated structure of multichannel integrated optical filter |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107907935A (en) * | 2017-12-26 | 2018-04-13 | 苏州晶鼎鑫光电科技有限公司 | The optically isolated structure and its manufacture method of a kind of multichannel integrated optical filter |
-
2017
- 2017-12-26 CN CN201721838903.2U patent/CN207636809U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107907935A (en) * | 2017-12-26 | 2018-04-13 | 苏州晶鼎鑫光电科技有限公司 | The optically isolated structure and its manufacture method of a kind of multichannel integrated optical filter |
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Address after: 2-1-b, 2-2-b, phase III, Zhongxin Technology Industrial Park, no.6, Louyang Road, Suzhou Industrial Park, Jiangsu Province Patentee after: Suzhou Houpu Sensing Technology Co.,Ltd. Address before: 2-1-b, 2-2-b, phase III, Zhongxin Technology Industrial Park, no.6, Louyang Road, Suzhou Industrial Park, Jiangsu Province Patentee before: SUZHOU JINGXING PHOTOELECTRIC TECHNOLOGY CO.,LTD. |