CN207623948U - Panel - Google Patents
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- CN207623948U CN207623948U CN201721870140.XU CN201721870140U CN207623948U CN 207623948 U CN207623948 U CN 207623948U CN 201721870140 U CN201721870140 U CN 201721870140U CN 207623948 U CN207623948 U CN 207623948U
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- China
- Prior art keywords
- splicing
- laser
- panel
- etched
- assisted parts
- Prior art date
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Abstract
The utility model discloses a kind of panels, including the first join domain, splicing regions and the second join domain, the splicing regions are connected between first join domain and second join domain, the panel further includes first laser etched figure and second laser etched figure, the first laser etched figure is formed in first join domain and the splicing regions by a laser-induced thermal etching, the second laser etched figure is formed in the splicing regions and second join domain by another secondary laser-induced thermal etching, the first laser etched figure splices with the second laser etched figure in the splicing regions, and then form continuous etched features.Since the first laser etched figure and the second laser etched figure are formed separately, the breadth of stimulated light galvanometer does not limit, and therefore, is conducive to the panel that large format is mass produced by laser etch process.
Description
Technical field
The utility model is related to a kind of panels.
Background technology
In recent years, touch screen is widely used in electronic product, such as mobile phone, tablet computer, game machine etc..Yellow light work
Skill, silk screen printing process and laser etch process are commonly applied to manufacture touch screen.However, the mistake of yellow light technique, silk screen printing process in manufacture
It will produce a large amount of waste liquids in journey, and technological process is complicated.In recent years, laser etch process is applied more in the touch screen of small size
Extensively, however, being limited to the breadth of laser galvanometer, laser etch process is difficult to the touch screen of large format.
Utility model content
In order to solve foregoing problems, the utility model provides a kind of substantially faceplate panels that can be prepared by laser.
A kind of panel comprising the first join domain, splicing regions and the second join domain, the splicing regions are connected to
Between first join domain and second join domain, the panel further includes that first laser etched figure and second swash
It is etched by light figure, the first laser etched figure is formed in first join domain and the spelling by a laser-induced thermal etching
Region is connect, the second laser etched figure is formed in the splicing regions and second connection by another secondary laser-induced thermal etching
Region, the first laser etched figure splice with the second laser etched figure in the splicing regions, and then the company of being formed
Continuous etched features.
Further, the first laser etched figure includes at least one first splice ends for stretching into the splicing regions
Portion, the second laser etched figure include at least one second splicing end for stretching into the splicing regions, and each described the
Two splicing ends, first splicing end splicing corresponding with one.
Further, the second laser etched figure further includes at least one assisted parts, each second splice ends
Portion and an assisted parts close to and be arranged in parallel, each first splicing end corresponding with one described second is spliced
Stitching section is collectively formed in end and an assisted parts connection.
Further, between the central axes of each assisted parts and the central axes of corresponding first splicing end
Vertical range is identical as the least radius of laser beam of laser-induced thermal etching.
Further, the length of each assisted parts is less than or equal to length of the splicing regions along first direction.
Further, every 1 first splicing end, the corresponding second splicing end and the assisted parts are along first
Direction extends.
Further, the assisted parts of each stitching section is located at the adjacent first splicing end and second splice ends
Between portion.
Further, the second laser etched figure further includes assisted parts, the assisted parts and first splice ends
Portion and the second splicing end interconnection setting, and then the first laser etched figure is made to be etched with the second laser
Graphic joining forms the continuous etched features.
Further, each first splicing end and each second splicing end extend in a first direction,
The assisted parts extends along the second direction vertical with the first direction.
Further, the panel includes the active block of invalid block and the adjacent invalid block side, the auxiliary position
In in the invalid block.
Further, the second laser etched figure further includes at least one first etching portion and at least one second quarter
Erosion portion, the part that each first etching portion stretches into the splicing regions are the second splicing end, at least one second etching
Portion is located at the splicing regions, and end and the second splicing end portions cross are spliced with described first in each second etching portion
Connection setting.
Further, the etched features include invalid block, and the entire splicing regions distribution is the invalid block.
Further, the panel is touch screen.
Panel provided by the utility model sets splicing regions, and the first laser etched figure is etched with the second laser
Figure splices in the splicing regions, and then forms continuous etched features, due to the first laser etched figure and described
Second laser etched figure is formed separately, and the breadth of stimulated light galvanometer does not limit, and therefore, is conducive to big by laser etch process
The panel of large-scale production large format.
Description of the drawings
In order to illustrate the embodiment of the utility model or the technical proposal in the existing technology more clearly, below will be to embodiment
Or attached drawing needed to be used in the description of the prior art is briefly described, it should be apparent that, the accompanying drawings in the following description is only
It is some embodiments of the utility model, for those of ordinary skill in the art, in the premise not made the creative labor
Under, other drawings may also be obtained based on these drawings.
Fig. 1 is the partial plan view for the panel that the utility model first embodiment provides.
Fig. 2 is the enlarged diagram of the subregion of panel shown in Fig. 1.
Fig. 3 is the partial plan view for the panel that the utility model second embodiment provides.
Fig. 4 is the enlarged diagram of the subregion of panel shown in Fig. 3.
Fig. 5 is the partial plan view for the panel that the utility model third embodiment provides.
Specific implementation mode
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole
Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without creative efforts
The every other embodiment obtained, shall fall within the protection scope of the present invention.
Referring to Fig. 1, the utility model first embodiment provides a kind of panel 100.In present embodiment, the panel
100 be touch screen, is applied in electronic device, so that user's touch input controls.The panel 100 includes the first join domain
11, splicing regions 13 and the second join domain 15, the splicing regions 13 are connected to first join domain 11 and described the
Between two join domains 15, the panel 100 further includes first laser etched figure 30 and second laser etched figure 40, described
First laser etched figure 30 is formed in first join domain 11 and the splicing regions 13, institute by a laser-induced thermal etching
It states second laser etched figure 40 and the splicing regions 13 and second join domain is formed in by another secondary laser-induced thermal etching
15, the first laser etched figure 30 splices with the second laser etched figure 40 in the splicing regions 13, and then shape
At continuous etched features 50.
Specifically, the panel 100 is the Integral flat-plate of large format, in present embodiment, the size of the panel 100 is big
In 5 cun.
The first laser etched figure 30 includes at least one first etched part 31 and at least one second etched part 33.
In present embodiment, each first etched part 31 extends in a first direction, and each second etched part 33 is along second party
To extension, the first direction is vertical with the second direction.First etched part 31 is intersected with second etched part 33
Connection setting.In other words, at least one first etched part 31 is collectively formed at least one second etched part 33
The first laser etched figure 30.The first laser etched figure 30 is formed in described the by laser-induced thermal etching processing
One join domain 11 and the splicing regions 13.
The second laser etched figure 40 includes at least one first etching portion 41 and at least one second etching portion 43.
In present embodiment, each first etching portion 41 extends along the first direction, and each second etching portion 43 is along institute
State second direction extension.First etching portion 41 is arranged with second etching portion, 43 interconnection.In other words, at least one
The second laser etched figure 40 is collectively formed in a first etching portion 41 and at least one second etching portion 43.Institute
It states second laser etched figure 40 and second join domain 15 and the splice region is formed in by laser-induced thermal etching processing
Domain 13.
Referring to Fig. 2, further, the part that each first etched part 31 stretches into the splicing regions 13 is first
Splice end 22;The part that each first etching portion 41 stretches into the splicing regions 13 is the second splicing end 24.
The second laser etched figure 40 further includes at least one assisted parts 26.At least one assisted parts 26 is located at
The splicing regions 13.Corresponding with one assisted parts in each second splicing end 24 26 close to and be arranged in parallel.
Each first splicing end 22 connect common connection with a second splicing end 24 and an assisted parts 26 and is formed
Stitching section 28 so that the first laser etched figure 30 is spelled with the second laser etched figure 40 in the splicing regions 13
It connects to form continuous etched features 50.In present embodiment, in each stitching section 28, the assisted parts 26 is located at described first and spells
It connects between end 22 and second splicing end 24.The assisted parts 26 for increase it is each second splicing end 24 with it is corresponding
One it is described first splicing end 22 splice when splicing width, can preferably splice.
When etching, since the size of the panel 100 is larger, the laser-induced thermal etching equipment needs piecemeal (subregion) to be swashed
Photoetch.After formerly processing has etched the first laser etched figure 30, then the processing of second laser etched figure 40 is carried out,
Sentence is changed to say, first after first join domain 11 and the splicing regions 13 complete etching first laser etched figure 30, then
Etching second laser etched figure 40 is completed in the splicing regions 13 and second join domain 15.Carrying out described second
When the processing of laser-induced thermal etching figure 40, the galvanometer head of the laser-induced thermal etching equipment need to make laser beam described first into horizontal deflection
Direction, which etches to be formed, connect/the first etching portion 41 of connection with first etched part 31, however, being limited to existing laser erosion
The galvanometer for carving equipment deflects precision so that the first splicing end 22 of first etched part 31 and corresponding first etching portion 41
The second splicing end 24 be difficult to be spliced together to form continuous etching lines.Increase and is set close to second splicing end 24
The assisted parts 26 set can effectively increase the effective width of splicing, improve product yield.
Further, the length of the assisted parts 26 is less than or equal to length of the splicing regions 31 along the first direction
Degree, avoids the structure for influencing first join domain 11 and second join domain 15.
Further, the central axes of each assisted parts 26 and (the first etching of corresponding first splicing end 22
Portion 31) central axes between vertical range it is identical as the least radius of laser beam of laser ablation equipment.Due to etching
The laser of Shi Suoshu laser ablation equipment transmitting is the laser beam for having certain radius, and in other words, the laser ablation equipment exists
The path formed when etched features on the panel 100 have one fixed width, for example, the width of the first etched part 31 substantially with institute
The diameter for stating laser beam is identical.The central axes and the central axes of corresponding first etched part 31 of each assisted parts 26 it
Between vertical range it is identical as the least radius of laser beam of laser ablation equipment, avoid repeat process the panel 100
Burst point is generated, performance and yield are influenced.
Referring to Fig. 1, the etched features 50 further include active block 51 and invalid (dummy) block 53.In other words,
At least one first etched part 31, at least one second etched part 33, at least one first etching portion 41 and
At least one second etching portion 43 surrounds several invalid blocks 53, and each invalid block 53 is closed figure.Area except invalid block 53
Domain is active block 51.For example, in present embodiment, multiple invalid blocks 53 are prolonged from first join domain 11, splicing regions 31
Reach second join domain 15.In other words, each active block 51 is distributed in opposite the two of 53 region of several invalid blocks
Side.In other words, what the entire splicing regions 31 were distributed is invalid block 53.Each assisted parts 26 is located at described in one
In invalid block 53, to avoid the channel design of the panel 100 is influenced.Assisted parts in the invalid block 53 in 31 left side of splicing regions
26 are deviated to the right the active block 51 in left side, and the assisted parts 26 in the invalid block 53 on 31 right side of splicing regions is deviated to the left having for right side
Imitate block 51.
It is appreciated that each first etched part 31 does not limit and extends along the first direction, each second erosion
Portion 33 did not limited and extended along the second direction quarter, the first direction do not limit it is vertical with the second direction, it is each described
First etching portion 41 does not limit to be extended along the first direction, and each second etching portion 43 does not limit along the second direction
Extend, the assisted parts 26 does not limit to be extended along the first direction, and each first splicing end 22 is corresponding with one
Stitching section 28 is collectively formed in the second splicing end 24 and a connection of assisted parts 26.
It is appreciated that it includes at least one first etched part 31 and at least one not limit the first laser etched figure 30
A second etched part 33, it includes at least one first etching portion 41 and at least one not limit the second laser etched figure 40
Second etching portion 43, the first laser etched figure 30 stretch into the splicing regions 13 first splicing end 22 with it is corresponding
The second splicing end 24 that the second laser etched figure 40 stretches into the splicing regions 13 is spliced to form continuous etching figure
Shape 50.
It is appreciated that the panel 100 is not limited to touch screen, can be that other can be by laser etch process system
At panel.
It is appreciated that the quantity of the splicing regions 13 of the panel 100 is not limited to one, the quantity of join domain is more than
Two, i.e. the panel 100 can be formed by laser-induced thermal etching more than twice, i.e., the etched features 50 further include that third swashs
It is etched by light figure, the 4th etched figure etc., after the completion of last laser ablation figure, to next laser ablation pattern etching
While also spliced with the last laser ablation figure.
Referring to Fig. 3, the utility model second embodiment provides a kind of panel 200.In present embodiment, the panel
200 be touch screen, is applied in electronic device, so that user's touch input controls.The panel 200 includes the first join domain
61, splicing regions 63 and the second join domain 65, the splicing regions 63 are connected to first join domain 61 and described the
Between two join domains 65, the panel 200 further includes first laser etched figure 67 and second laser etched figure 69, described
First laser etched figure 67 is formed in first join domain 61 and the splicing regions 63, institute by a laser-induced thermal etching
It states second laser etched figure 69 and the splicing regions 63 and second join domain is formed in by another secondary laser-induced thermal etching
65, the first laser etched figure 67 splices with the second laser etched figure 69 in the splicing regions 13, and then shape
At continuous etched features 70.
The first laser etched figure 67 includes at least one first etched part 671 and at least one second etched part
673.Each first etched part 671 extends in a first direction, and each second etched part 673 extends in a second direction,
The first direction is vertical with the second direction.First etched part 671 is set with 673 interconnection of the second etched part
It sets.
The second laser etched figure 69 includes at least one first etching portion 691 and at least one second etching portion
693, each first etching portion 691 extends along the first direction, and each second etching portion 693 is along the second party
To extension.First etching portion 691 is arranged with second etching portion, 693 interconnection.
Further, the first etched part 671 of the first laser etched figure 67 stretches into the portion of the splicing regions 63
It is divided into the first splicing end 632;First etching portion 691 of the second laser etched figure 69 stretches into the splicing regions 63
Part is the second splicing end 634.
Also referring to Fig. 4, the second laser etched figure 69 further includes at least one assisted parts 636.
The assisted parts 636 and the first splicing end 632 and the second splicing 634 interconnection of end/be connected to
Setting so that the first laser etched figure 67 splices with the second laser etched figure 69 in the splicing regions 63,
And then form continuous etched features 70.In present embodiment, the assisted parts 636 extends along the second direction, described auxiliary
It helps portion 636 to splice end 632 and the second splicing 634 interconnection of end setting with described first, and then can effectively adjust
The splicing deviation of the whole first splicing end 632 and corresponding second splicing end 634 is suitable in the second direction
In reducing splicing precision.
Further, the length of the assisted parts 636 is less than or equal to the splicing regions 63 along the second direction
Length avoids the structure for influencing 200 other regions of the panel.
The etched features 70 include active block 71 and invalid block 73.In other words, in other words, at least one described
One etched part 671, at least one second etched part 673, at least one first etching portion 691 and at least one second
Etching portion 693 surrounds several invalid blocks 73, and each invalid block 73 is closed figure.Region except invalid block 73 is active block
71.For example, in present embodiment, multiple invalid blocks 73 extend to described from first join domain 61, splicing regions 63
Two join domains 65.In other words, each active block 71 is distributed in the opposite sides of 73 region of several invalid blocks.
In the third embodiment, the second laser etched figure 69 omits the assisted parts 636, referring to Fig. 5, extremely
Few second etching portion 693 is located at the splicing regions 63 and is spelled with the first splicing end 632 and described second
Connect end 634 interconnection setting so that the first laser etched figure 67 is with the second laser etched figure 69 in institute
The splicing of splicing regions 63 is stated, and then forms continuous etched features 70.Second etching portion 693 prolongs along the second direction
It stretches, end 632 and the second splicing 634 interconnection of end setting, energy are spliced with described first in second etching portion 693
Enough splicing deviations for effectively adjusting the first splicing end 632 and corresponding second splicing end 634, described second
Direction, which is equivalent to, reduces splicing precision.
In one embodiment, what the entire splicing regions 63 were distributed is invalid block 73, avoids splicing to active block 71
It impacts.
Panel provided by the utility model sets splicing regions, and the first laser etched figure is etched with the second laser
Figure splices in the splicing regions, and then forms continuous etched features, due to the first laser etched figure and described
Second laser etched figure is formed separately, and the breadth of stimulated light galvanometer does not limit, and therefore, is conducive to big by laser etch process
The panel of large-scale production large format.
Above disclosures are merely preferred embodiments of the utility model, with this utility model cannot be limited certainly
Interest field, therefore equivalent variations made according to the claim of the utility model still fall within the scope of the utility model.
Claims (13)
1. a kind of panel, which is characterized in that the panel includes the first join domain, splicing regions and the second join domain, institute
It states splicing regions to be connected between first join domain and second join domain, the panel further includes first laser
Etched figure and second laser etched figure, the first laser etched figure are formed in described first by a laser-induced thermal etching
Join domain and the splicing regions, the second laser etched figure are formed in the splice region by another secondary laser-induced thermal etching
Domain and second join domain, the first laser etched figure is with the second laser etched figure in the splicing regions
Splicing, and then form continuous etched features.
2. panel as described in claim 1, which is characterized in that the first laser etched figure includes stretching into the splice region
At least one first splicing end in domain, the second laser etched figure include stretch into the splicing regions at least one the
End splicing is spliced in two splicing ends, each second splicing end corresponding with one described first.
3. panel as claimed in claim 2, which is characterized in that the second laser etched figure further includes at least one auxiliary
Portion, each second splicing end and an assisted parts close to and be arranged in parallel, each first splicing end and
Stitching section is collectively formed in one corresponding second splicing end and an assisted parts connection.
4. panel as claimed in claim 3, which is characterized in that the central axes and corresponding described first of each assisted parts
The vertical range spliced between the central axes of end is identical as the least radius of laser beam of laser-induced thermal etching.
5. panel as claimed in claim 3, which is characterized in that the length of each assisted parts is less than or equal to the splicing
Length of the region along first direction.
6. panel as claimed in claim 3, which is characterized in that every 1 first splicing end, corresponding second splice ends
Portion and the assisted parts extend in a first direction.
7. panel as claimed in claim 3, which is characterized in that the assisted parts of each stitching section is located at adjacent described first and spells
It connects between end and second splicing end.
8. panel as claimed in claim 2, which is characterized in that the second laser etched figure further includes assisted parts, described
Assisted parts splices end and the second splicing end interconnection setting with described first, and then the first laser is made to etch
Figure is spliced to form the continuous etched features with the second laser etched figure.
9. panel as claimed in claim 8, which is characterized in that each first splicing end and each second splicing
End extends in a first direction, and the assisted parts extends along the second direction vertical with the first direction.
10. such as claim 3 to 9 any one of them panel, which is characterized in that the panel includes described in invalid block and adjoining
The active block of invalid block side, the assisted parts are located in the invalid block.
11. panel as claimed in claim 2, which is characterized in that the second laser etched figure further includes at least one
One etching portion and at least one second etching portion, the part that each first etching portion stretches into the splicing regions are the second splice ends
Portion, at least one second etching portion are located at the splicing regions, each second etching portion and first splice ends
Portion and the second splicing end interconnection setting.
12. the panel as described in claim 1 to 9 any one, which is characterized in that the etched features include invalid block, whole
A splicing regions distribution is the invalid block.
13. the panel as described in claim 1 to 9 any one, which is characterized in that the panel is touch screen.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201721870140.XU CN207623948U (en) | 2017-12-27 | 2017-12-27 | Panel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201721870140.XU CN207623948U (en) | 2017-12-27 | 2017-12-27 | Panel |
Publications (1)
Publication Number | Publication Date |
---|---|
CN207623948U true CN207623948U (en) | 2018-07-17 |
Family
ID=62830456
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201721870140.XU Expired - Fee Related CN207623948U (en) | 2017-12-27 | 2017-12-27 | Panel |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN207623948U (en) |
-
2017
- 2017-12-27 CN CN201721870140.XU patent/CN207623948U/en not_active Expired - Fee Related
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Legal Events
Date | Code | Title | Description |
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GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: Building 43, Dayun software Town, No. 8288 Longgang Avenue, Henggang street, Longgang District, Shenzhen City, Guangdong Province Patentee after: Shenzhen Ruoyu Technology Co.,Ltd. Address before: Building 43, Dayun software Town, No. 8288 Longgang Avenue, Henggang street, Longgang District, Shenzhen City, Guangdong Province Patentee before: SHENZHEN ROYOLE TECHNOLOGIES Co.,Ltd. |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20180717 Termination date: 20211227 |