CN207596984U - Terminal local continuous electroplanting device - Google Patents
Terminal local continuous electroplanting device Download PDFInfo
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- CN207596984U CN207596984U CN201721738881.2U CN201721738881U CN207596984U CN 207596984 U CN207596984 U CN 207596984U CN 201721738881 U CN201721738881 U CN 201721738881U CN 207596984 U CN207596984 U CN 207596984U
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- stabilier
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Abstract
This practicality newly discloses terminal local continuous electroplanting device, applied to advanced manufacture and technical field of automation, specially electroplating industry technical field.The device sets placing groove by imitative workpiece body, two layers of stabilier of setting inside upper water seat, it tends to be steady so that electroplate liquid contacts when reaching workpiece placing groove with workpiece, electroplate liquid contacts steadily with workpiece, improves electroplating quality, while open placing groove can realize the continuity locally selection plating of workpiece, improve production efficiency, solves in the prior art the problem of plating liquid level is not sufficiently stable, and is locally crossed area's inaccuracy, is declined so as to cause electroplating quality with electroplating cost rising.
Description
Technical field
The utility model is related to advanced manufacture and technical field of automation more particularly to terminal local continuous electroplanting devices
Background technology
In electroplating industry, electroplate liquid is needed in state is sprung up, and could so cause there be plating solute in electroplate liquid
Uniformly it is attached on product.Existing electroplanting device, it is impossible to which intact processing electroplate liquid stablizes processing, leads to electroplate liquid and work
The contact surface of part is irregular, and parcel plating effect is poor, and the quality of production declines, and electroplating cost rises.
Utility model content
Terminal local continuous electroplanting device provided by the utility model solves one in prior art problem or more
It is a.
Terminal local continuous electroplanting device provided by the utility model, including upper water seat, plating solution seat, feeding pressure mechanism, first
Stabilier, the second stabilier；
Upper water seat is the hollow structure with one side opening, and the first stabilier is sealingly fastened in the opening of water seat, second
Stabilier is fixed on inside water seat, and the second stabilier and the first stabilier are arranged in parallel, and upper water seat is internally located at the second current stabilization
Water inlet pipe is equipped with below plate, water inlet pipe is equipped with several spray-holes, is equipped in the middle part of the first stabilier, the second stabilier several logical
Hole；
Plating solution seat is fixed on the first stabilier, and intake chamber, plating solution seat are equipped with the through-hole corresponding position of the first stabilier
The side opposite with intake chamber is correspondingly provided with to be connected with the matched resettlement groove of workpiece configurations, resettlement groove with intake chamber, resettlement groove phase
To both sides be equipped with support workpiece concave station, between plating solution seat and the first stabilier be equipped with metal mesh；
Feeding pressure mechanism is set on the side of plating solution seat, is equipped with pressure wheel, and pressure wheel is located at the top of concave station and matches with concave station
Combined pressure closes workpiece.
Terminal local continuous electroplanting device provided by the utility model is handled by the current stabilization to electroplate liquid, improves plating
The stability of liquid level improves the accuracy that area is crossed in part, realizes the accurate plating to workpiece, while use profiling resettlement groove, energy
It enough improves production efficiency and ensures the continuity of production.
In some embodiments, spray-hole is along the straight line setting of water inlet tube axis direction, and quantity is two rows of, two rows of spray-holes
Central axes angle be 45 °, and positioned at water inlet pipe lower section.
So so that electroplate liquid out forms impulse force, and be 45 ° in the central axes angle of two rows of spray-holes from water inlet pipe
Shi Chongli is best, can cross guarantee electroplate liquid and so that electroplate liquid ion containing plating is more uniform in the state that springs up.
In some embodiments, plating solution seats against the side of nearly upper water seat and is equipped with the groove that can accommodate metal mesh, groove with
Intake chamber is corresponding.
It so, it is possible metal mesh is consolidated and be fixed between plating solution seat 2 and upper water seat 1, avoid shifting.
In some embodiments, several through-hole dispersions of distribution of the first stabilier are more than several through-holes of the second stabilier
The dispersion of distribution.
In this way, so design can increase the area for passing through electroplate liquid on the first stabilier, reach further current stabilization
Effect so that electroplate liquid pass through the first stabilier when, electroplate liquid has been intended to plateau, and electroplate liquid is avoided to be contacted with workpiece
When, electroplate liquid is excessively surge to cause workpiece parcel plating quality to decline.
In some embodiments, it further includes set on the first stabilier, the lower section of the second stabilier and positioned at several through-holes
The water fender of opposite sides, water fender are arranged in parallel with water inlet tube axis direction；
The first stabilier is fixed in water fender one end below the first stabilier, and the other end is fixed on the second current stabilization
Plate is located at the outermost edge of through-hole on the first stabilier with the fixed one end of the first stabilier, fixed with the second stabilier
One end is located at the outside of through-hole on the second stabilier；
The second stabilier is fixed in water fender one end below the second stabilier, and the other end is fixed on water seat bottom
Portion, the ragged edge source of through-hole on the second stabilier is located at the fixed one end of the first stabilier, and the other end is located at water inlet pipe
Both sides.
In this way, water fender can stop that electroplate liquid rests on the first stabilier close to the side of the second stabilier and upper water seat side
The angle of the angle of wall, the second stabilier side and upper water seat side wall far from the first stabilier, can be to avoid first
The lower section side of stabilier and the second stabilier generates bubble by through-hole, and bubble is caused to follow on electroplate liquid adherency and workpiece,
Electroplating quality is caused to decline.
In some embodiments, feeding pressure mechanism further includes guide rod, connecting lever, adjusting screw rod, screw rod fixed plate；
The inflection point of connecting lever is articulated with the side of plating solution seat, and screw rod fixed plate is fixed on the upper surface of plating solution seat, adjusting screw rod
Thread fitting is fixed on screw rod fixed plate and positioned at the top of connecting lever galianconism, adjusting screw rod precession or screws out with closer or far from turning
The galianconism of arm is realized and adjusts the amount of spin that connecting lever is rotated around hinged place；
Guide rod is perpendicularly fixed at that connecting lever is long-armed, and extends to the top of plating solution seat, and pressure wheel central shaft is matched with guide rod
Merge and fix.
In this way, by adjusting the galianconism distance of adjusting screw rod and connecting lever, realize the workpiece of different-thickness by pressure wheel and
When between concave station, pressure wheel can be caused to move up and down in a certain range up and down, in the case where that can be pressed to workpiece, also
It can guarantee that the different-thickness position of same workpiece passes through, ensure the continuity of production.
In some embodiments, pressure wheel perpendicular to the direction of central shaft be equipped with screw hole, screw precession screw hole with
Guide rod offsets.
In this way, unscrewing screw hole, the installation site of pressure wheel can be adjusted, to adapt to the production of different size workpiece.
In some embodiments, leveling component is further included, leveling component includes bottom plate, leveling lower margin, and upper water seat is fixed
In bottom plate, leveling lower margin is fixed on four angles of bottom plate.
In this way, can according to production environment to terminal local continuous electroplanting device carry out horizontal adjustment, ensure electroplate liquid with
Workpiece contact ensures the quality of production in horizontality.
Description of the drawings
Fig. 1 is a kind of side view of the terminal local continuous electroplanting device of embodiment provided by the utility model；
Fig. 2 is a kind of front view of the terminal local continuous electroplanting device of embodiment provided by the utility model；
Fig. 3 is a kind of vertical view of the terminal local continuous electroplanting device of embodiment provided by the utility model.
Specific embodiment
The utility model is further described with reference to the accompanying drawings of the specification.
Referring to Fig. 1-3, terminal local continuous electroplanting device, including upper water seat 1, plating solution seat 2, feeding pressure mechanism 3, the first current stabilization
Plate 4, the second stabilier 5, upper water seat 1 are the hollow structure with one side opening, and the first stabilier 4 is sealingly fastened in water seat 1
Opening, the second stabilier 5 is fixed on inside water seat 1, and the second stabilier 5 and the first stabilier 4 are arranged in parallel, upper water seat 1
It is internally located at 5 lower section of the second stabilier and is equipped with water inlet pipe 6, water inlet pipe 6 is equipped with several spray-holes 61, the first stabilier 4, second
5 middle part of stabilier is equipped with several through-holes 45, and plating solution seat 2 is fixed on the first stabilier 4, the through-hole 45 with the first stabilier 4
Corresponding position is equipped with intake chamber 21, and the side opposite with intake chamber 21 of plating solution seat 2 is correspondingly provided with and the matched placement of workpiece configurations
Slot 22, resettlement groove 22 are connected with intake chamber 21, the opposite both sides of resettlement groove 22 be equipped with support workpiece concave station 23, plating solution seat 2 with
Metal mesh 7 is equipped between first stabilier 4, feeding pressure mechanism 3 is set on the side of plating solution seat 2, is equipped with pressure wheel 31, pressure wheel 31
Coordinate pressing workpiece positioned at the top of concave station 23 and with concave station 23.
During work, workpiece 99 is placed on resettlement groove 22 first, the both sides of workpiece 99 are against on concave station 23, harmonize swager
Structure 3 makes pressure wheel 31 be located at the top of concave station 23 and presses workpiece 99.Electroplate liquid is passed through from water inlet pipe 6, and electroplate liquid is from water inlet pipe 6
Into upper water seat 1, electroplate liquid is up gushed to be entered by the through-hole 45 of the second stabilier 5 by the through-hole 45 of the first stabilier 4 again
Into intake chamber 21, fill electroplate liquid after intake chamber 21 continue on gush and gush out from resettlement groove 22, the speed that adjustment electroplate liquid pours in,
And then the depth that electroplate liquid impregnates workpiece 99 is adjusted, it can realize that workpiece local selective is electroplated, workpiece 99 is on mounting groove 22
It is moved toward discharging direction, workpiece is locally bathed in electroplate liquid, realizes that product continuously produces.
Terminal local continuous electroplanting device provided by the utility model, since electroplate liquid passes through the first stabilier 4 and second
The secondary current stabilization processing of stabilier 5 so that electroplate liquid during station to be electroplated to, in splendid plateau, improving workpiece
The quality of 99 localized productions, while the depth of the immersion workpiece 99 of electroplate liquid can be more accurately adjusted, it can adapt to different lifes
The workpiece 99 of production requirement produces.
Specifically, spray-hole 61 is set along 6 axis direction straight line of water inlet pipe, quantity is two rows of, in two rows of spray-holes 61
Axis angle is 45 °, and positioned at the lower section of water inlet pipe 6.In this way, so so that electroplate liquid out forms impulse force from water inlet pipe 6,
And when the angle of two rows of spray-holes 61 is 45 °, impulse force is best, can cross guarantee electroplate liquid be in spring up state so that being electroplated
Liquid ion containing plating is more uniform.
Plating solution seat 2 is equipped with the groove 24 that can accommodate metal mesh 7, groove 24 and 21 phase of intake chamber close to the side of upper water seat 1
It is corresponding.It so, it is possible metal mesh 7 is consolidated and be fixed between plating solution seat 2 and upper water seat 1, avoid shifting.
Further, 45 dispersion of distribution of several through-holes of the first stabilier 4 is more than several through-holes 45 of the second stabilier 5
The dispersion of distribution.So design can increase the area for passing through electroplate liquid on the first stabilier 4, reach the work of further current stabilization
With so that when electroplate liquid passes through the first stabilier 4, electroplate liquid has been intended to plateau, and electroplate liquid is avoided to be contacted with workpiece 99
When, electroplate liquid is excessively surge to cause 99 parcel plating quality of workpiece to decline.
Further, further include set on the first stabilier 4, the lower section of the second stabilier 5 and positioned at several through-holes 45 it is opposite
The water fender 9 of both sides, water fender 9 are arranged in parallel with 6 axis direction of water inlet pipe, the water fender 9 one set on 4 lower section of the first stabilier
The first stabilier 4 is fixed at end, and the other end is fixed on the second stabilier 5, is located at first with 4 fixed one end of the first stabilier
The outermost edge of through-hole 45 on stabilier 4 is located at the outer of through-hole 45 on the second stabilier 5 with 5 fixed one end of the second stabilier
The second stabilier 5 is fixed on set on 9 one end of water fender of 5 lower section of the second stabilier in portion, and the other end is fixed on 1 bottom of water seat,
It is located at the ragged edge source of through-hole 45 on the second stabilier 5 with 4 fixed one end of the first stabilier, and the other end is located at water inlet pipe 6
Both sides.
In this way, water fender 9 can stop that electroplate liquid rests on the first stabilier 4 close to the side of the second stabilier 5 and upper water
The angle of angle, the second stabilier 5 side and upper 1 side wall of water seat far from the first stabilier 4 of 1 side wall of seat, avoids
The lower section side of first stabilier 4 and the second stabilier 5 in the side of through-hole 45 generation bubble, cause bubble follow electroplate liquid adherency with
On workpiece 99, electroplating quality is caused to decline.
Specifically, feeding pressure mechanism 3 further includes guide rod 32, connecting lever 33, adjusting screw rod 34, screw rod fixed plate 35, connecting lever 33
Inflection point is articulated with the side of plating solution seat 2, and screw rod fixed plate 35 is fixed on the upper surface of plating solution seat 2,34 thread fitting of adjusting screw rod
It is fixed on screw rod fixed plate 35 and positioned at the top of 33 galianconism of connecting lever, 34 precession of adjusting screw rod or back-out are with closer or far from connecting lever
33 galianconism realizes and adjusts the amount of spin that is rotated around hinged place of connecting lever 33, and it is long-armed that 32 one end of guide rod is perpendicularly fixed at connecting lever 33, and
The top of plating solution seat 2 is extended to, 31 central shaft of pressure wheel matches with guide rod 32 and merges fixation.
During work, according to the maximum gauge of workpiece 99, (for workpiece 99 due to being spliced, there are connectors, and thickness is compared with other
Position is thicker), the distance of rotation adjusting screw rod 34 and the galianconism of connecting lever 33, this distance is equal to the maximum gauge of workpiece 99, just
Under normal state, pressure wheel 31 on workpiece 99, makes workpiece 99 be bonded concave station 23 using the gravity pressure of itself, ensures that workpiece 99 can be with
Plating solution contacts to set depth, the larger thickness position of workpiece 99 by when, pressure wheel 31 can be strutted so that passing through,
It ensure that the continuity of production.
Further, pressure wheel 31 perpendicular to the direction of central shaft be equipped with screw hole 311, screw precession screw hole 311 with
Guide rod 32 offsets.In this way, pressure wheel 31 can be moved on guide rod 32 by unscrewing screw, adjust after suitable position
Screw is tightened, pressure wheel 31 can be adjusted according to practical condition.
In the present embodiment, the pressure wheel 31 of 23 both sides of concave station can be symmetrical arranged, can also stagger setting.For example,
It sets two pressure wheels 31 that a pressure wheel 31 is either set only on a guide rod 32 on same root guide rod 32, and sets more
Group feeding pressure mechanism 3.Feeding pressure mechanism 3 in the present embodiment does not limit quantity, can set multigroup pressure according to the length of concave station 23
Expect mechanism 3.
Further, leveling component 8 is further included, leveling component 8 includes bottom plate 81, leveling lower margin 83, and upper water seat 1 is fixed on
Bottom plate 81, leveling lower margin 82 are fixed on four angles of bottom plate 81.It can be according to production environment to terminal local continuous electroplanting device
Horizontal adjustment is carried out, ensures that electroplate liquid is contacted with workpiece 99 in horizontality, ensures the quality of production.
Above is only some embodiments of the utility model.For those of ordinary skill in the art, not
Under the premise of being detached from the utility model creation design, various modifications and improvements can be made, these belong to the utility model
Protection domain.
Claims (8)
1. terminal local continuous electroplanting device, which is characterized in that including upper water seat (1), plating solution seat (2), feeding pressure mechanism (3),
One stabilier (4), the second stabilier (5)；
The upper water seat (1) is the hollow structure with one side opening, and first stabilier (4) is sealingly fastened in the upper water
The opening of seat (1), second stabilier (5) are fixed on water seat (1) inside, second stabilier (5) and the first current stabilization
Plate (4) is arranged in parallel, and the upper water seat (1), which is internally located at below the second stabilier (5), is equipped with water inlet pipe (6), the water inlet pipe
(6) several spray-holes (61) are equipped with, several through-holes are equipped in the middle part of first stabilier (4), the second stabilier (5)
(45)；
The plating solution seat (2) is fixed on first stabilier (4), through-hole (45) corresponding position with the first stabilier (4)
Equipped with intake chamber (21), the plating solution seat (2) side opposite with intake chamber (21) is correspondingly provided with and the matched peace of workpiece configurations
Slot (22) is put, the resettlement groove (22) connects with intake chamber (21), and the opposite both sides of the resettlement groove (22) are equipped with support workpiece
Concave station (23), between the plating solution seat (2) and the first stabilier (4) be equipped with metal mesh (7)；
The feeding pressure mechanism (3) is equipped with pressure wheel (31), the pressure wheel (31) is positioned at recessed set on the side of plating solution seat (2)
The top of platform (23) simultaneously coordinates pressing workpiece with concave station (23).
2. terminal local continuous electroplanting device according to claim 1, which is characterized in that spray-hole (61) edge water inlet
Manage the setting of (6) axis direction straight line, quantity is two rows, and the central axes angle of two rows of spray-holes (61) is 45 °, and positioned at into
The lower section of water pipe (6).
3. terminal local continuous electroplanting device according to claim 1, which is characterized in that the plating solution seat (2) is close to upper
The side of water seat (1) is equipped with the groove (24) that can accommodate metal mesh (7), and the groove (24) is corresponding with intake chamber (21).
4. terminal local continuous electroplanting device according to claim 1, which is characterized in that first stabilier (4)
Several through-hole (45) dispersions of distribution are more than the dispersion of distribution of several through-holes (45) of second stabilier (5).
5. terminal local continuous electroplanting device according to claim 4, which is characterized in that further include set on the first stabilier
(4), the lower section of the second stabilier (5) and positioned at several through-holes (45) opposite sides water fender (9), the water fender (9) with
Water inlet pipe (6) axis direction is arranged in parallel；
The first stabilier (4) is fixed in water fender (9) one end below the first stabilier (4), and the other end is fixed on second
Stabilier (5) is located at the outermost edge of through-hole (45) on the first stabilier (4) with the first stabilier (4) fixed one end, with
Second stabilier (5) fixed one end is located at the outside of through-hole (45) on the second stabilier (5)；
The second stabilier (5) is fixed in water fender (9) one end below the second stabilier (5), and the other end is fixed on Shang Shui
Seat (1) bottom is located at the ragged edge source of through-hole (45) on the second stabilier (5) with the first stabilier (4) fixed one end, separately
One end is located at the both sides of water inlet pipe (6).
6. terminal local continuous electroplanting device according to claim 1, which is characterized in that the feeding pressure mechanism (3) is also wrapped
Include guide rod (32), connecting lever (33), adjusting screw rod (34), screw rod fixed plate (35)；
The inflection point of the connecting lever (33) is articulated with the side of plating solution seat (2), and screw rod fixed plate (35) is fixed on the upper of plating solution seat (2)
Surface, adjusting screw rod (34) thread fitting are fixed on screw rod fixed plate (35) and positioned at the tops of connecting lever (33) galianconism, adjust spiral shell
Bar (34) precession is screwed out with the galianconism closer or far from connecting lever (33), is realized and is adjusted the rotation that connecting lever (33) is rotated around hinged place
Amount；
It is long-armed that described guide rod (32) one end is perpendicularly fixed at connecting lever (33), and extends to the top of plating solution seat (2), the pressure wheel
(31) central shaft and the guide rod (32) are fixed with merging.
7. terminal local continuous electroplanting device according to claim 6, which is characterized in that the pressure wheel (31) perpendicular to
The direction of central shaft is equipped with screw hole (311), and screw hole (311) described in screw precession offsets with guide rod (32).
8. according to claim 1-7 any one of them terminal local continuous electroplanting devices, which is characterized in that further include leveling group
Part (8), the leveling component (8) include bottom plate (81), leveling lower margin (82), and the upper water seat (1) is fixed on the bottom plate
(81), the leveling lower margin (82) is fixed on four angles of the bottom plate (81).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721738881.2U CN207596984U (en) | 2017-12-13 | 2017-12-13 | Terminal local continuous electroplanting device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721738881.2U CN207596984U (en) | 2017-12-13 | 2017-12-13 | Terminal local continuous electroplanting device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207596984U true CN207596984U (en) | 2018-07-10 |
Family
ID=62765197
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721738881.2U Active CN207596984U (en) | 2017-12-13 | 2017-12-13 | Terminal local continuous electroplanting device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207596984U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112323111A (en) * | 2020-11-02 | 2021-02-05 | 昆山一鼎工业科技有限公司 | Method for electrolyzing continuous terminal |
-
2017
- 2017-12-13 CN CN201721738881.2U patent/CN207596984U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112323111A (en) * | 2020-11-02 | 2021-02-05 | 昆山一鼎工业科技有限公司 | Method for electrolyzing continuous terminal |
| CN112323111B (en) * | 2020-11-02 | 2021-07-23 | 昆山一鼎工业科技有限公司 | Method for electrolyzing continuous terminal |
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