CN207541408U - A kind of semi-permeable membrane mask LCVD patch systems - Google Patents
A kind of semi-permeable membrane mask LCVD patch systems Download PDFInfo
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- CN207541408U CN207541408U CN201721254299.9U CN201721254299U CN207541408U CN 207541408 U CN207541408 U CN 207541408U CN 201721254299 U CN201721254299 U CN 201721254299U CN 207541408 U CN207541408 U CN 207541408U
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Abstract
The utility model discloses a kind of semi-permeable membrane mask LCVD patch systems, and using the mode of laser scanning, scanning light spot is less than 1um, one piece of layers of chrome that can control thickness and uniformity can be deposited with uniform scanning, is repaired so as to fulfill semi-permeable membrane mask.The patch system includes：Laser, grating light valve, filtering assembly, galvanometer and objective lens unit, the light source that the laser is sent out is by being shaped to a line source, the line source is radiated at the grating light valve back reflection and forms a uniform linear light source, the uniform linear light source is radiated at through objective lens unit aggregation on mask after being radiated at the galvanometer, the mask is arranged on an XY platforms, one piece of rectangular uniform laser scanning light spot, decomposition chromium carbonyl and deposition chromium are formed on the mask by the galvanometer to the mask.
Description
Technical field
The utility model is related to mask manufacture technology field, more particularly to a kind of semi-permeable membrane mask LCVD repairings system
System.
Background technology
In IC process, need to use reticle and photomask.It is whole that we, which define reticle to be,
A substrate exposes and necessary substep and the tool for including image of repetition.The size of usual image is amplified to substrate epigraph
2 times to 20 times, but in some cases also with equal image.Photomask is defined as in single exposure figure being turned
The tool of (or on another photomask) is moved on in entire silicon chip.There are two types of apply for reticle：1) lithography is arrived
In active mask version.2) image is transferred directly on silicon chip in Step-and-repeat aligner.In 1X silicon chip step photo-etching machines,
Figure on mask is big as figure with projecting on silicon chip；In step photo-etching machine is reduced, the figure on mask is to put
Big real devices image.In VLSI, the mask of electron beam exposure 10X or 5X or the work that 1X is directly generated with electron beam
Make mask.
In mask manufacturing process, due to plate defect or technological reason, it often will appear some white defects, need to do
Repairing treatment.Maximally efficient repairing method is LCVD (Laser chemical deposition) technology in industry, and chromium carbonyl is decomposed with laser
It deposits on glass.For the optical system that current this mode uses using final minification mode, pulsed laser irradiation can darkening to one
On door screen, reduce on projection imaging to mask.This mode is effective and feasible for repairing common Binary masks, but
It is that repairing for semi-permeable membrane mask but has the defects of very big.The optical transmittance of the semi-permeable membrane of semi-permeable membrane mask needs
Control it requires that the local film layer after repairing is highly uniform, and can accurately control deposition thickness +/- 2%.It uses
The laser energy that above-mentioned optical system requirement is irradiated in iris diaphgram is highly uniform, this is extremely difficult.
Utility model content
The technical problem to be solved by the present invention is to provide a kind of semi-permeable membrane mask LCVD patch systems, use laser
The mode of scanning, scanning light spot are less than 1um, one piece of layers of chrome that can control thickness and uniformity can be deposited with uniform scanning,
It is repaired so as to fulfill semi-permeable membrane mask.
In order to solve the above-mentioned technical problem, specifically, the technical solution of the utility model provides following technical solution：
A kind of semi-permeable membrane mask LCVD patch systems, including：Laser, grating light valve, filtering assembly, galvanometer and object
Mirror assembly, the light source that the laser is sent out is by being shaped to a line source, after the line source is radiated at the grating light valve
Reflect to form a uniform linear light source, the uniform linear light source is radiated at after the galvanometer to be radiated at through objective lens unit aggregation and cover
On masterplate, the mask is arranged on an XY platforms, formed on the mask by the galvanometer one piece it is rectangular uniformly
Laser scanning hot spot decomposes chromium carbonyl and deposition chromium to the mask.
Further, after the light source that the laser is sent out passes sequentially through a Bao Weier prism, cylindrical mirror and condensing lens
Form a line source.Short wavelength's (Powell) Bao Weier prism carries out shaping to the Gauss circle laser that laser comes out, and becomes
Linear laser.Cylindrical mirror further elongates linear laser, and linear laser is then irradiated to grating light valve by focus lamp
(GLV)。
Further, the filtering assembly includes Fourier transform mirror, Fourier filter, inverse fourier transform mirror, institute
The uniform linear light source for stating grating light valve transmitting passes sequentially through the Fourier transform mirror, the Fourier filter, the Fourier
Leaf inverse transformation mirror.Veiling glare in the diffraction light that Fourier transform optical filtering microscope group can come out grating light valve (GLV) filters out.
Further, the uniform linear light source is gathered after being radiated at the galvanometer after a relay lens by the objective lens unit
Coke is radiated on the mask, and the objective lens unit is mutually perpendicular to the mask.
Further, the laser is 266nm pulse lasers, and pulse frequency is 4K~50KHZ.
Further, the semi-permeable membrane mask LCVD patch systems further include master controller, power module and galvanometer
Adjust module, GLV fine tuning modules, the master controller and the laser, galvanometer adjustment module, GLV fine tuning moulds
Block is electrically connected, and the power module is finely tuned with the master controller, the laser, galvanometer adjustment module, the GLV
Module is electrically connected.
Further, the grating light valve (GLV) is made of 1088 small grating block, and each small grating block is by six
Line block forms, and the spacing between the line block is finely tuned module by the GLV and is finely adjusted, to shining the grating light valve
(GLV) energy of the line source on is corrected.Diffraction energy on grating light valve (GLV) is controlled by being loaded into the data of GLV
The energy of 1088 points is made, data are 10bit, the energy that can be each put with open and close and control.
Further, the galvanometer is vibrated under galvanometer adjustment module control with the frequency of at least 1KHZ per second, and
The scanning starting and ending angle of the galvanometer is controlled, during so as to adjust the size of scanning area, laser energy and chemical deposition
Between.
Further, the semi-permeable membrane mask LCVD patch systems further include time circuit module, the time circuit
Module is electrically connected with the master controller.
Using above-mentioned technical proposal, carried out as a result of grating light valve (GLV) and galvanometer and to the light source of laser
A series of shaping correction forms a rectangular uniform laser scanning light spot, decomposition chromium carbonyl and deposition chromium to institute on mask
Mask is stated, size, laser energy and the chemical deposition time of scanning area can be more accurately controlled, so as to
One piece of layers of chrome that can control thickness and uniformity is deposited with uniform scanning, is repaired so as to fulfill semi-permeable membrane mask.
Description of the drawings
Fig. 1 is the semi-permeable membrane mask LCVD patch system structure diagrams of the utility model；
Fig. 2 is the semi-permeable membrane mask LCVD patch system control structure block diagrams of the utility model；
In figure, 10- lasers, 11- Bao Weier prisms, 12- cylindrical mirrors, 13- focus lamps, 14- grating light valves (GLV), 15-
Filtering assembly, 151- Fourier transform mirrors, 152- Fourier filters, 153- inverse fourier transform mirrors, 16- galvanometers, 17- relayings
Mirror, 18- objective lens units, 20- masks, 21-XY platforms.
Specific embodiment
Specific embodiment of the present utility model is described further below in conjunction with the accompanying drawings.It should be noted that
The explanation of these embodiments is used to help to understand the utility model, but do not form the restriction to the utility model.This
Outside, technical characteristic involved in the various embodiments of the present invention described below is as long as they do not conflict with each other
It can be combined with each other.
As shown in Figure 1, a kind of semi-permeable membrane mask LCVD patch systems, laser 10, grating light valve 14, filtering assembly
15th, galvanometer 16 and objective lens unit 18, the light source that the laser 10 is sent out shine by being shaped to a line source, the line source
It penetrates and forms a uniform linear light source in 14 back reflection of grating light valve, the uniform linear light source is radiated at after the galvanometer 16 through institute
It states the aggregation of objective lens unit 18 to be radiated on mask 20, the mask 20 is arranged on an XY platforms 21, passes through the galvanometer
16 form one piece of rectangular uniform laser scanning light spot, decomposition chromium carbonyl and deposition chromium to the mask on the mask 20
20。
Wherein, the light source that the laser 10 is sent out passes sequentially through a Bao Weier prism 11, cylindrical mirror 12 and condensing lens
A line source is formed after 13.Short wavelength (Powell) Bao Weier prism 11 carries out the Gauss circle laser that laser comes out whole
Shape becomes linear laser.Cylindrical mirror 12 further elongates linear laser, and then linear laser is irradiated to by focus lamp 13
Grating light valve (GLV).
Wherein, the filtering assembly 15 includes Fourier transform mirror 151, Fourier filter 152, inverse fourier transform mirror
153, the uniform linear light source that the grating light valve 14 emits passes sequentially through the Fourier transform mirror 151, Fourier filtering
Piece 152, the inverse fourier transform mirror 153.The diffraction light that Fourier transform optical filtering microscope group can come out grating light valve (GLV)
In veiling glare filter out.
Wherein, the uniform linear light source is radiated at after the galvanometer 16 after a relay lens 17 through the objective lens unit 18
On the mask 20, the objective lens unit 18 is mutually perpendicular to focusing illumination with the mask 20.
Wherein, the laser 10 is 266nm pulse lasers, and pulse frequency is 4K~50KHZ.
As shown in Fig. 2, the semi-permeable membrane mask LCVD patch systems further include master controller, power module and galvanometer
Module, GLV fine tuning modules are adjusted, the master controller is finely tuned with the laser 10, galvanometer adjustment module, the GLV
Module is electrically connected, the power module and the master controller, the laser 10, galvanometer adjustment module, the GLV
Module is finely tuned to be electrically connected.
Wherein, the grating light valve 14 (GLV) is made of 1088 small grating block, and each small grating block is by six lines
Block forms, and the spacing between the line block is finely tuned module by the GLV and is finely adjusted, to shining the grating light valve 14
(GLV) energy of the line source on is corrected.Diffraction energy on grating light valve 14 (GLV) by be loaded into the data of GLV come
The energy of 1088 points is controlled, data are 10bit, the energy that can be each put with open and close and control.Grating light valve 14 is a kind of
Device based on micro-opto-electromechanical system has many advantages, such as that modulation accuracy is high, the speed of service is fast, it is strong to be amenable to high light, is well suited for
As laser scanning system control device.
Wherein, the galvanometer 16 is vibrated, and control under galvanometer adjustment module control with the frequency of at least 1KHZ per second
The scanning starting and ending angle of the galvanometer 16 is made, during so as to adjust the size of scanning area, laser energy and chemical deposition
Between.
Further, the semi-permeable membrane mask LCVD patch systems further include time circuit module, the time circuit
Module is electrically connected with the master controller.
Using above-mentioned technical proposal, carried out as a result of grating light valve (GLV) and galvanometer and to the light source of laser
A series of shaping correction forms a rectangular uniform laser scanning light spot, decomposition chromium carbonyl and deposition chromium to institute on mask
Mask is stated, size, laser energy and the chemical deposition time of scanning area can be more accurately controlled, so as to
One piece of layers of chrome that can control thickness and uniformity is deposited with uniform scanning, is repaired so as to fulfill semi-permeable membrane mask.
The embodiment of the utility model is explained in detail, but the utility model is not limited to be retouched above in association with attached drawing
The embodiment stated.For a person skilled in the art, it is right in the case where not departing from the utility model principle and spirit
These embodiments carry out a variety of change, modification, replacement and modification, still fall in the scope of protection of the utility model.
Claims (9)
1. a kind of semi-permeable membrane mask LCVD patch systems, which is characterized in that the system comprises laser, grating light valve, filters
Optical assembly, galvanometer and objective lens unit, the light source that the laser is sent out is by being shaped to a line source, the line source irradiation
A uniform linear light source is formed in the grating light valve back reflection, the uniform linear light source is radiated at after the galvanometer through the object lens
Component aggregates are radiated on mask, and the mask is arranged on an XY platforms, by the galvanometer on the mask
One piece of rectangular uniform laser scanning light spot, decomposition chromium carbonyl and deposition chromium are formed to the mask.
A kind of 2. semi-permeable membrane mask LCVD patch systems according to claim 1, which is characterized in that the laser hair
The light source gone out forms a line source after passing sequentially through a Bao Weier prism, cylindrical mirror and condensing lens.
A kind of 3. semi-permeable membrane mask LCVD patch systems according to claim 1, which is characterized in that the filtering assembly
Including Fourier transform mirror, Fourier filter, inverse fourier transform mirror, the uniform linear light source of the grating light valve transmitting is successively
Pass through the Fourier transform mirror, the Fourier filter, the inverse fourier transform mirror.
A kind of 4. semi-permeable membrane mask LCVD patch systems according to claim 1, which is characterized in that the uniform linear light
Source is radiated at after the galvanometer after a relay lens by the objective lens unit focusing illumination on the mask, the object lens
Component is mutually perpendicular to the mask.
5. a kind of semi-permeable membrane mask LCVD patch systems according to claim 2, which is characterized in that the laser is
266nm pulse lasers, pulse frequency are 4K~50KHZ.
6. according to a kind of semi-permeable membrane mask LCVD patch systems of claim 1-5 any one of them, which is characterized in that described
Semi-permeable membrane mask LCVD patch systems further include master controller, power module and galvanometer adjustment module, GLV fine tuning modules,
The master controller is electrically connected with the laser, galvanometer adjustment module, GLV fine tuning modules, the power supply mould
Block is electrically connected with the master controller, the laser, galvanometer adjustment module, GLV fine tuning modules.
A kind of 7. semi-permeable membrane mask LCVD patch systems according to claim 6, which is characterized in that the grating light valve
It is made of 1088 small grating block, each small grating block is made of six line blocks, and the spacing between the line block passes through institute
It states GLV fine tunings module to be finely adjusted, the energy of the line source to being irradiated on the grating light valve is corrected.
8. a kind of semi-permeable membrane mask LCVD patch systems according to claim 6, which is characterized in that the galvanometer is in institute
It states and is vibrated under galvanometer adjustment module control with the frequency of at least 1KHZ per second, and control the scanning starting and ending angle of the galvanometer
Degree, so as to adjust the size of scanning area, laser energy and chemical deposition time.
9. a kind of semi-permeable membrane mask LCVD patch systems according to claim 6, which is characterized in that the semi-permeable membrane is covered
Masterplate LCVD patch systems further include time circuit module, and the time circuit module is electrically connected with the master controller.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721254299.9U CN207541408U (en) | 2017-09-26 | 2017-09-26 | A kind of semi-permeable membrane mask LCVD patch systems |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721254299.9U CN207541408U (en) | 2017-09-26 | 2017-09-26 | A kind of semi-permeable membrane mask LCVD patch systems |
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| CN207541408U true CN207541408U (en) | 2018-06-26 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107678244A (en) * | 2017-09-26 | 2018-02-09 | 深圳清溢光电股份有限公司 | A kind of pellicle mask LCVD patch systems |
-
2017
- 2017-09-26 CN CN201721254299.9U patent/CN207541408U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107678244A (en) * | 2017-09-26 | 2018-02-09 | 深圳清溢光电股份有限公司 | A kind of pellicle mask LCVD patch systems |
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