CN207502755U - A kind of high intensity optical mirror slip - Google Patents
A kind of high intensity optical mirror slip Download PDFInfo
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- CN207502755U CN207502755U CN201721681254.XU CN201721681254U CN207502755U CN 207502755 U CN207502755 U CN 207502755U CN 201721681254 U CN201721681254 U CN 201721681254U CN 207502755 U CN207502755 U CN 207502755U
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- mirror slip
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Abstract
The utility model discloses a kind of high intensity optical mirror slips, including substrate, the first nanometer film is fixedly connected at the top of the substrate, the bottom of the substrate is fixedly connected with the second nanometer film, first nanometer film and the second nanometer film include easy clean layer, wearing layer, enhancement layer, radiation protective layer, anti-blue light layer, anti-reflection layer, antireflection layer, anti oxidation layer, the easy clean layer is located at the outside of wearing layer, and the enhancement layer is located at the inside of wearing layer, and the radiation protective layer is located at the inside of enhancement layer.The cooperation that the utility model passes through substrate, the first nanometer film, the second nanometer film, easy clean layer, wearing layer, enhancement layer, radiation protective layer, anti-blue light layer, anti-reflection layer, antireflection layer and anti oxidation layer, solve the problems, such as existing optical mirror slip intensity is low and poor practicability, the optical mirror slip has the advantages of intensity height and very strong practicability, the practicability of the optical mirror slip is enhanced, is used convenient for user.
Description
Technical field
The utility model is related to optical mirror slip technical field, specially a kind of high intensity optical mirror slip.
Background technology
Optical glass is to be mixed with the oxide of high purity silicon, boron, sodium, potassium, zinc, lead, magnesium, calcium, barium etc. by special formulation,
Melt in platinum crucible high temperature, stirred evenly with ultrasonic wave, remove bubble；Then through a long time slowly cools down, in order to avoid glass
Block generates internal stress, glass blocks after cooling, it is necessary to be measured by optical instrument, examine purity, transparency, the uniformity, refraction
Whether rate and dispersive power close specification, and qualified glass blocks is forged and pressed by heating, into optical lens blank.
The utilization of optical mirror slip is very extensive, can be applied in the eyeglass and glasses of optical instrument, but existing optics
The intensity of eyeglass is low, poor practicability, reduces the practicability of optical mirror slip, and the person of being not convenient to use uses.
Utility model content
The purpose of this utility model is to provide a kind of high intensity optical mirror slip, have very strong excellent of intensity height and practicability
Point, solve the problems, such as existing optical mirror slip intensity is low and poor practicability.
To achieve the above object, the utility model provides following technical solution：A kind of high intensity optical mirror slip, including base
Piece is fixedly connected with the first nanometer film at the top of the substrate, and the bottom of the substrate is fixedly connected with the second nanometer film, described
First nanometer film and the second nanometer film include easy clean layer, wearing layer, enhancement layer, radiation protective layer, anti-blue light layer, anti-reflection layer,
Antireflection layer, anti oxidation layer, the easy clean layer are located at the outside of wearing layer, and the enhancement layer is located at the inside of wearing layer, described anti-
Radiating layer is located at the inside of enhancement layer, and the anti-blue light layer is located at the inside of radiation protective layer, and the anti-reflection layer is located at anti-blue light
The inside of layer, the antireflection layer are located at the inside of anti-reflection layer, and the anti oxidation layer is located at the inside of antireflection layer.
Preferably, first nanometer film is identical with the structure of the second nanometer film.
Preferably, first nanometer film and the second nanometer film are centrosymmetric setting about substrate.
Preferably, the thickness of first nanometer film and the second nanometer film is respectively less than 0. 1 millimeters.
Compared with prior art, the beneficial effects of the utility model are as follows：
1st, the utility model passes through substrate, the first nanometer film, the second nanometer film, easy clean layer, wearing layer, enhancement layer, anti-spoke
The cooperation of layer, anti-blue light layer, anti-reflection layer, antireflection layer and anti oxidation layer is penetrated, the intensity for solving existing optical mirror slip is low and real
With property it is poor the problem of, which has the advantages of intensity height and very strong practicability, enhances the practicability of the optical mirror slip,
It is used convenient for user.
2nd, the utility model can be avoided eyeglass from scratching, ensure that the cleaning degree of eyeglass, pass through by the setting of wearing layer
The setting of easy clean layer can be easy to use and clean, spot is avoided to remain, and by the setting of enhancement layer, can strengthen the eyeglass
Hardness, the service life of eyeglass can be extended.
Description of the drawings
FIG. 1 is a schematic structural view of the utility model；
Fig. 2 is the sectional view of the first nanometer film of the utility model.
In figure：1 substrate, 2 first nanometer films, 3 second nanometer films, 4 easy clean layers, 5 wearing layers, 6 enhancement layers, 7 radiation protective layers,
8 anti-blue light layers, 9 anti-reflection layers, 10 antireflection layers, 11 anti oxidation layers.
Specific embodiment
The following is a combination of the drawings in the embodiments of the present utility model, and the technical scheme in the embodiment of the utility model is carried out
It clearly and completely describes, it is clear that the described embodiments are only a part of the embodiments of the utility model rather than whole
Embodiment.Based on the embodiment in the utility model, those of ordinary skill in the art are without making creative work
All other embodiments obtained shall fall within the protection scope of the present invention.
- 2 are please referred to Fig.1, a kind of high intensity optical mirror slip, including substrate 1, the top of substrate 1 is fixedly connected with first and receives
Rice film 2, the bottom of substrate 1 are fixedly connected with the second nanometer film 3, and the first nanometer film 2 is identical with the structure of the second nanometer film 3, the
The thickness of one nanometer film 2 and the second nanometer film 3 is respectively less than 0. 1 millimeters, and the first nanometer film 2 and the second nanometer film 3 are about substrate
1 is centrosymmetric setting, and the first nanometer film 2 and the second nanometer film 3 include easy clean layer 4, wearing layer 5, enhancement layer 6, radiation protection
Layer 7, anti-blue light layer 8, anti-reflection layer 9, antireflection layer 10 and anti oxidation layer 11, by the setting of wearing layer 5, can avoid eyeglass from scraping
Wound, ensure that the cleaning degree of eyeglass, by the setting of easy clean layer 4, can be easy to use and clean, spot is avoided to remain, pass through
The setting of enhancement layer 6 can strengthen the hardness of the eyeglass, can extend the service life of eyeglass, and easy clean layer 4 is located at wearing layer 5
Outside, enhancement layer 6 is located at the inside of wearing layer 5, and radiation protective layer 7 is located at the inside of enhancement layer 6, and anti-blue light layer 8 is located at anti-spoke
The inside of layer 7 is penetrated, anti-reflection layer 9 is located at the inside of anti-blue light layer 8, and antireflection layer 10 is located at the inside of anti-reflection layer 9, anti oxidation layer
11 are located at the inside of antireflection layer 10.
In use, by the setting of wearing layer 5, eyeglass can be avoided to scratch, the cleaning degree of eyeglass be ensure that, by easy clean
The setting of layer 4, can be easy to use and clean, spot is avoided to remain, by the setting of enhancement layer 6, can strengthen the eyeglass
Hardness can extend the service life of eyeglass, pass through substrate 1, the first nanometer film 2, the second nanometer film 3, easy clean layer 4, wearing layer
5th, the cooperation of enhancement layer 6, radiation protective layer 7, anti-blue light layer 8, anti-reflection layer 9, antireflection layer 10 and anti oxidation layer 11, solves existing
The intensity of optical mirror slip is low and the problem of poor practicability, which has the advantages of intensity height and very strong practicability, enhancing
The practicability of the optical mirror slip uses convenient for user.
In summary：The high intensity optical mirror slip, by substrate 1, the first nanometer film 2, the second nanometer film 3, easy clean layer 4,
The cooperation of wearing layer 5, enhancement layer 6, radiation protective layer 7, anti-blue light layer 8, anti-reflection layer 9, antireflection layer 10 and anti oxidation layer 11 solves
The intensity of existing optical mirror slip is low and the problem of poor practicability.
While there has been shown and described that the embodiment of the utility model, for the ordinary skill in the art,
It is appreciated that can these embodiments be carried out with a variety of variations in the case of the principle and spirit for not departing from the utility model, repaiied
Change, replace and modification, the scope of the utility model are defined by the appended claims and the equivalents thereof.
Claims (4)
1. a kind of high intensity optical mirror slip, including substrate（1）, it is characterised in that：The substrate（1）Top be fixedly connected with
One nanometer film（2）, the substrate（1）Bottom be fixedly connected with the second nanometer film（3）, first nanometer film（2）With second
Nanometer film（3）Include easy clean layer（4）, wearing layer（5）, enhancement layer（6）, radiation protective layer（7）, anti-blue light layer（8）, anti-reflection layer
（9）, antireflection layer（10）, anti oxidation layer（11）, the easy clean layer（4）Positioned at wearing layer（5）Outside, the enhancement layer（6）Position
In wearing layer（5）Inside, the radiation protective layer（7）Positioned at enhancement layer（6）Inside, the anti-blue light layer（8）Positioned at anti-spoke
Penetrate layer（7）Inside, the anti-reflection layer（9）Positioned at anti-blue light layer（8）Inside, the antireflection layer（10）Positioned at anti-reflection layer
（9）Inside, the anti oxidation layer（11）Positioned at antireflection layer（10）Inside.
2. a kind of high intensity optical mirror slip according to claim 1, it is characterised in that：First nanometer film（2）With
Two nanometer films（3）Structure it is identical.
3. a kind of high intensity optical mirror slip according to claim 1, it is characterised in that：First nanometer film（2）With
Two nanometer films（3）About substrate（1）Be centrosymmetric setting.
4. a kind of high intensity optical mirror slip according to claim 1, it is characterised in that：First nanometer film（2）With
Two nanometer films（3）Thickness be respectively less than 0. 1 millimeters.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721681254.XU CN207502755U (en) | 2017-12-06 | 2017-12-06 | A kind of high intensity optical mirror slip |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721681254.XU CN207502755U (en) | 2017-12-06 | 2017-12-06 | A kind of high intensity optical mirror slip |
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| Publication Number | Publication Date |
|---|---|
| CN207502755U true CN207502755U (en) | 2018-06-15 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721681254.XU Active CN207502755U (en) | 2017-12-06 | 2017-12-06 | A kind of high intensity optical mirror slip |
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| Country | Link |
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| CN (1) | CN207502755U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112034538A (en) * | 2020-04-21 | 2020-12-04 | 江苏新唯尊光学眼镜有限公司 | Blue-light-proof anti-ultraviolet lens and production process thereof |
-
2017
- 2017-12-06 CN CN201721681254.XU patent/CN207502755U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112034538A (en) * | 2020-04-21 | 2020-12-04 | 江苏新唯尊光学眼镜有限公司 | Blue-light-proof anti-ultraviolet lens and production process thereof |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of utility model: A high strength optical lens Effective date of registration: 20210506 Granted publication date: 20180615 Pledgee: Dongguan branch of Bank of Dongguan Co.,Ltd. Pledgor: DONGGUAN KEPUDA PHOTOELECTRIC TECHNOLOGY Co.,Ltd. Registration number: Y2021440000169 |
|
| PE01 | Entry into force of the registration of the contract for pledge of patent right |