CN207431971U - A kind of polishing polycrystalline silicon device - Google Patents
A kind of polishing polycrystalline silicon device Download PDFInfo
- Publication number
- CN207431971U CN207431971U CN201721532630.9U CN201721532630U CN207431971U CN 207431971 U CN207431971 U CN 207431971U CN 201721532630 U CN201721532630 U CN 201721532630U CN 207431971 U CN207431971 U CN 207431971U
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- CN
- China
- Prior art keywords
- motor
- fixed plate
- polishing
- polycrystalline silicon
- emery wheel
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- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
The utility model relates generally to a kind of polishing polycrystalline silicon device, belong to field of machining, including finishing polish device and rough polishing electro-optical device, the finishing polish device includes fixed motor, the fixed motor is connected by telescopic rod through fixed plate with polysilicon fixed plate, the fixed plate is equipped with motor fixed plate by fixed link, the motor fixed plate lower end is symmetrical equipped with thickness mill mixing emery wheel motor, buffing wheel motor, the thickness mill mixing emery wheel motor lower end is equipped with thickness mill mixing emery wheel, the buffing wheel motor lower end is equipped with buffing wheel, the buffing wheel lower end is equipped with workbench.This patent is simple in structure, and polishing polycrystalline silicon device that is convenient, practicality and being polished processing to polysilicon automatically is conducive to improve processing speed, reduces cost of labor, improves productivity effect.
Description
Technical field
The utility model belongs to field of machining, relates generally to a kind of polishing polycrystalline silicon device.
Background technology
Polysilicon is a kind of form of elemental silicon.For the elemental silicon of melting when being solidified under the conditions of supercooling, silicon atom is with Buddha's warrior attendant
Stone lattice morphologic arrangement grows up to the different crystal grain of high preferred orientation into many nucleus, such as these nucleus, then these crystal grain combine,
Just crystallize into polysilicon.Utility value:It can be seen that its development trend is monocrystalline from the evolution of current international solar cell
Silicon, polysilicon, banding silicon, thin-film material.
Polishing is the technique for reducing rough object surfaces degree using physical mechanical or chemicals.Polishing technology is mainly in essence
It is used in close machinery and optics industry.Workpiece surface after polishing is smooth with good reflecting effect.
Mechanical polishing machinery polishing is to remove the protrusion after being polished by cutting, material surface plastic deformation and put down
The polishing method of sliding surface, generally using oilstone item, wool wheel, sand paper etc., based on manual operations, peculiar part such as turns round body surface
The auxiliary tools such as turntable, the high method that superfinishing polishing can be used of surface quality requirements can be used in face.Superfinishing polishing is using spy
The grinding tool of system in the polishing liquid containing abrasive material, is pressed on workpiece surface to be machined, makees high speed rotary motion.Utilize the skill
Art can reach Ra0.008 μm of surface roughness, be highest in various polishing methods.Optical lens die is frequently with this
Method.
The content of the invention
Slow for polishing polycrystalline silicon processing manual operation speed in reality, machining accuracy is low, works the problems such as heavy, this reality
It is simple in structure with new offer one kind, convenient, practicality and that processing can be polished to polysilicon automatically polishing polycrystalline silicon
Device.
Designing scheme is used by the utility model：A kind of polishing polycrystalline silicon device, including finishing polish device 12 and slightly
Burnishing device 13, the finishing polish device 12 include fixed motor 1, and the fixed motor 1 is passed through by telescopic rod 2 and fixed
Plate 3 is connected with polysilicon fixed plate 6, and the fixed plate 3 by fixed link 4 equipped with motor fixed plate 5, fix by the motor
5 lower end of plate is symmetrical equipped with thickness mill mixing emery wheel motor 7, buffing wheel motor 9, the thickness mill mixing emery wheel electricity
For 7 lower end of motivation equipped with thickness mill mixing emery wheel 8,9 lower end of buffing wheel motor is equipped with buffing wheel 10, the polishing sand
10 lower ends are taken turns equipped with workbench 11.
In designing scheme provided by the utility model, burr is carved on the buffing wheel 10.
In designing scheme provided by the utility model, the thickness mill mixing emery wheel 8 is smooth emery wheel.
In designing scheme provided by the utility model, the finishing polish device 12 and rough polishing electro-optical device 13 are consolidated by motor
Fixed board 5 is symmetrical above and below.
In designing scheme provided by the utility model, the thickness mill on the finishing polish device 12 and rough polishing electro-optical device 13 is mixed
It is opposite to close 8 direction of rotation of emery wheel.
In designing scheme provided by the utility model, the buffing wheel on the finishing polish device 12 and rough polishing electro-optical device 13
10 direction of rotation are opposite.
The utility model has the following advantages：
A kind of polishing polycrystalline silicon device provided by the utility model, it is simple in structure, it is convenient, practical and can be automatically right
Polysilicon is polished the polishing polycrystalline silicon device of processing, is conducive to improve processing speed, reduces cost of labor, improves production effect
Benefit.
Description of the drawings
The tomograph of Fig. 1 polishing polycrystalline silicon devices, wherein 1- fixed plates motor, 2- telescopic rods, 3- fixed plates, 4-
Fixed plate, 5- motor fixed plates, 6- polysilicon fixed plates, 7- thicknesses mill mixing emery wheel motor, 8- thicknesses mill mixing emery wheel,
9- buffing wheel motor, 10- buffing wheels, 11- workbench, 12- finishing polish devices, 13- rough polishing electro-optical devices.
Specific embodiment
Below in conjunction with the utility model attached drawing and specific designing scheme, to the designing scheme in the utility model embodiment
Be clearly and completely described, it is clear that described embodiment be only the utility model part of the embodiment rather than
Whole embodiments.Based on the embodiment in the utility model patent, those of ordinary skill in the art are not paying creativeness
All other embodiments obtained under the premise of work belong to the scope of this patent protection.
Embodiment 1
As shown in the tomograph of Fig. 1 polishing polycrystalline silicon devices, designing scheme is used by the utility model：It is a kind of
Polishing polycrystalline silicon device, including finishing polish device 12 and rough polishing electro-optical device 13, the finishing polish device 12 includes fixed motor
1, the fixed motor 1 is connected by telescopic rod 2 through fixed plate 3 with polysilicon fixed plate 6, and the fixed plate 3 passes through solid
Fixed pole 4 is equipped with motor fixed plate 5, and 5 lower end of motor fixed plate is symmetrical equipped with thickness mill mixing emery wheel motor
7th, buffing wheel motor 9,7 lower end of thickness mill mixing emery wheel motor is equipped with thickness mill mixing emery wheel 8, the polishing sand
9 lower end of motor is taken turns equipped with buffing wheel 10,10 lower end of buffing wheel is equipped with workbench 11.
Burr is carved on the buffing wheel 10.
The thickness mill mixing emery wheel 8 is smooth emery wheel.
The finishing polish device 12 and rough polishing electro-optical device 13 are symmetrical above and below by motor fixed plate 5.
The finishing polish device 12 is opposite with 8 direction of rotation of thickness mill mixing emery wheel on rough polishing electro-optical device 13.
The finishing polish device 12 is opposite with 10 direction of rotation of buffing wheel on rough polishing electro-optical device 13.
In use, first polysilicon is placed in the polysilicon fixed plate of rough polishing electro-optical device 13, starts finishing polish dress
Polysilicon is fixed on workbench 11 by the fixed plate motor 1 put in 12 and rough polishing electro-optical device 13, is started in rough polishing electro-optical device 13
Mixing emery wheel motor and buffing wheel motor, start to polysilicon carry out rough polishing processing, processing while rough polishing
Fixed plate motor slowly pushes up polysilicon in electro-optical device 13, at this time the thickness mill mixing emery wheel in finishing polish device 12
Motor 7 and buffing wheel motor 9 start, then thickness mill mixing emery wheel 8 and buffing wheel 10 start to carry out essence to polysilicon
Polishing, the continuation of fixed plate motor slowly pushes up polysilicon in rough polishing electro-optical device 13, until machining, takes out
Polysilicon.
Every technical staff's notice：Although the utility model describes according to above-mentioned specific embodiment, this
The invention thought of utility model is not limited to that patent, and any repacking with the utility model thought will all include this specially
In sharp scope of patent protection.
Claims (6)
1. a kind of polishing polycrystalline silicon device, which is characterized in that including finishing polish device（12）With rough polishing electro-optical device（13）, the essence
Burnishing device（12）Including fixed motor（1）, the fixed motor（1）Pass through telescopic rod（2）Through fixed plate（3）With it is more
Crystal silicon fixed plate（6）It is connected, the fixed plate（3）Pass through fixed link（4）Equipped with motor fixed plate（5）, the motor consolidates
Fixed board（5）Lower end is symmetrical equipped with thickness mill mixing emery wheel motor（7）, buffing wheel motor（9）, the thickness is ground mixed
Close emery wheel motor（7）Lower end is equipped with thickness mill mixing emery wheel（8）, the buffing wheel motor（9）Lower end is equipped with polishing sand
Wheel（10）, the buffing wheel（10）Lower end is equipped with workbench（11）.
A kind of 2. polishing polycrystalline silicon device according to claim 1, which is characterized in that the buffing wheel（10）On be carved with
Burr.
A kind of 3. polishing polycrystalline silicon device according to claim 1, which is characterized in that the thickness mill mixing emery wheel（8）
For smooth emery wheel.
A kind of 4. polishing polycrystalline silicon device according to claim 1, which is characterized in that the finishing polish device（12）With it is thick
Burnishing device（13）Pass through motor fixed plate（5）It is symmetrical above and below.
A kind of 5. polishing polycrystalline silicon device according to claim 1, which is characterized in that the finishing polish device（12）With it is thick
Burnishing device（13）On thickness mill mixing emery wheel（8）Direction of rotation is opposite.
A kind of 6. polishing polycrystalline silicon device according to claim 1, which is characterized in that the finishing polish device（12）With it is thick
Burnishing device（13）On buffing wheel（10）Direction of rotation is opposite.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721532630.9U CN207431971U (en) | 2017-11-16 | 2017-11-16 | A kind of polishing polycrystalline silicon device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721532630.9U CN207431971U (en) | 2017-11-16 | 2017-11-16 | A kind of polishing polycrystalline silicon device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207431971U true CN207431971U (en) | 2018-06-01 |
Family
ID=62290004
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721532630.9U Expired - Fee Related CN207431971U (en) | 2017-11-16 | 2017-11-16 | A kind of polishing polycrystalline silicon device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207431971U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112091787A (en) * | 2020-09-30 | 2020-12-18 | 武义县镀石机械设备有限公司 | Machine grinding equipment capable of accurately controlling grinding thickness |
-
2017
- 2017-11-16 CN CN201721532630.9U patent/CN207431971U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112091787A (en) * | 2020-09-30 | 2020-12-18 | 武义县镀石机械设备有限公司 | Machine grinding equipment capable of accurately controlling grinding thickness |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20180601 Termination date: 20201116 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |